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11. 发明授权

US06335472B1 Method of hydrogenating epoxidized C6—C12 cyclohydrocarbon compounds 失效
标题翻译：环氧化C6-C12环烃化合物的加氢方法
公开(公告)号：US06335472B1
公开(公告)日：2002-01-01
申请号：US09469376
申请日：1999-12-22
申请人： Tokuo Matsuzaki , Yasuo Nakamura , Takumi Manabe , Takato Nakamura , Nobuyuki Kuroda , Hiroshi Shiraishi
发明人： Tokuo Matsuzaki , Yasuo Nakamura , Takumi Manabe , Takato Nakamura , Nobuyuki Kuroda , Hiroshi Shiraishi
IPC分类号： C07C4923
CPC分类号： C07C45/58 , C07C29/132 , C07C2601/20 , C07C35/205
摘要： Epoxidized C6-C12 cyclohydrocarbon compounds, for example, epoxidized C6-C12 cycloalkanes, cycloalkenes and/or cycloalkadienes are converted to cycloalkanols, cycloalkanones and cycloalkanes by hydrogenating the epoxidized C6-C12 cyclohydrocarbon compounds with hydrogen under a pressure of 0.1 to 5.4 MPa at a temperature of 100 to 280° C. in the presence of a catalyst containing at least one platinum group metal, for example, Pd or Ru.
摘要翻译：环氧化的C 6 -C 12环烃化合物，例如环氧化的C 6 -C 12环烷烃，环烯烃和/或环链烯二烯通过在0.1至5.4MPa的压力下在氢气中氢化环烷化的C 6 -C 12环烃化合物而被转化为环烷醇，环烷酮和环烷烃在含有至少一种铂族金属的催化剂，例如Pd或Ru的存在下，温度为100-280℃。

12. 发明授权

US5389601A 3-alkoxy-N-cycloalkylsulfonyalkanoic amide derivative and herbicide using the same 失效
标题翻译： 3-烷氧基-N-环烷基磺基烯丙酰胺衍生物和除草剂
公开(公告)号：US5389601A
公开(公告)日：1995-02-14
申请号：US93859
申请日：1993-07-20
申请人： Takaaki Abe , Yuji Akiyoshi , Hiroshi Shiraishi , Ikuo Shiraishi , Takashi Hayama
发明人： Takaaki Abe , Yuji Akiyoshi , Hiroshi Shiraishi , Ikuo Shiraishi , Takashi Hayama
IPC分类号： A01N43/54 , A01N43/66 , C07D239/60 , C07D251/30 , C07D251/34 , C07D251/38
CPC分类号： A01N43/66 , A01N43/54 , C07D239/60 , C07D251/30 , C07D251/38
摘要： Disclosed are a 3-alkoxy-N-cyclolalkylsulfonylalkanoic amide compound represented by the formula (I): ##STR1## wherein R represents a lower alkyl group, a lower alkenyl group, a lower alkynyl group, a halo-lower alkyl group or a cyano-lower alkyl group; X represents an oxygen atom or a sulfur atom; Z represents a --CH.dbd. group or a nitrogen atom; and n represents an integer of 2 to 9,a process for preparing the same and a herbicide containing the same as an active ingredient(s).
摘要翻译：公开了由式（I）表示的3-烷氧基-N-环烷基磺酰基链烷酰胺化合物：其中R表示低级烷基，低级烯基，低级炔基，卤代低级烷基或氰基 - 低级烷基; X表示氧原子或硫原子; Z表示-CH =基团或氮原子; n表示2〜9的整数，其制备方法和含有活性成分的除草剂。

13. 发明授权

US4956052A Process for separation using supercritical fluid 失效
标题翻译：使用超临界流体分离方法
公开(公告)号：US4956052A
公开(公告)日：1990-09-11
申请号：US407704
申请日：1989-09-13
申请人： Mitsuho Hirata , Takeshi Ishikawa , Hiroshi Shiraishi
发明人： Mitsuho Hirata , Takeshi Ishikawa , Hiroshi Shiraishi
IPC分类号： C07B63/00 , B01D11/00 , B01D11/04 , C07B31/00 , C07C27/00 , C07C29/76 , C07C31/08 , C07C51/00 , C07C51/43 , C07C53/08 , C07C67/00
CPC分类号： B01D11/0407
摘要： A process for separation of components of a mixture of more than one organic substance or of a mixture of at least one organic substance and water by extraction using a supercritical fluid as an extractant. During the extraction an extraction aid having a higher affinity with an unextractable component of the mixture than with an extractable component of the mixture is present. Also disclosed is an apparatus for carrying out this process.
摘要翻译：通过使用超临界流体作为萃取剂萃取，分离多于一种有机物质或至少一种有机物质与水的混合物的组分的组分的方法。在提取期间，存在与混合物的可提取组分相比具有比不可萃取组分更高亲和力的萃取助剂。还公开了一种用于执行该过程的装置。

14. 发明授权

US06319649B1 Photosensitive resin composition and method of forming resist images 失效
标题翻译：光敏树脂组合物和形成抗蚀剂图像的方法
公开(公告)号：US06319649B1
公开(公告)日：2001-11-20
申请号：US09024873
申请日：1998-02-17
申请人： Koji Kato , Masahiro Hashimoto , Michiaki Hashimoto , Toshio Sakamizu , Hiroshi Shiraishi
发明人： Koji Kato , Masahiro Hashimoto , Michiaki Hashimoto , Toshio Sakamizu , Hiroshi Shiraishi
IPC分类号： G03F7021
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/111
摘要： A chemically amplified photosensitive resin composition containing a first compound forming an acid by irradiation of actinic ray and a second compound that changes the solubility to an aqueous alkali solution with acid-catalyzed reaction wherein an ion dissociative compound having the composition represented by the general formula (1) or (2), as well a method of forming a resist pattern using the composition are disclosed, the formulae being expressed by: where each of R2, R3 and R4 represents hydrogen, and an alkyl or aryl group of 1 to 7 carbon atoms, at least one of R1, R2, R3 and R4 represents hydrogen, Y1 represents chlorine, bromine, iodine, carbonate group of 1 to 7 carbon atoms or sulfonate group of 1 to 7 carbon atoms, and
摘要翻译：一种化学放大型光敏树脂组合物，其含有通过光化射线照射形成酸的第一化合物和通过酸催化反应改变其对碱性水溶液的溶解度的第二化合物，其中具有由通式表示的组成的离子解离化合物（ 1）或（2），以及使用该组合物形成抗蚀剂图案的方法，其公式表示为：其中R2，R3和R4各自表示氢，并且具有1至7个碳原子的烷基或芳基 R1，R2，R3和R4中的至少一个表示氢，Y1表示氯，溴，碘，1〜7个碳原子的碳酸酯基或1〜7个碳原子的磺酸酯基，

15. 发明授权

US4958057A Transfer-type plasma torch with ring-shaped cathode and with processing gas passage provide interiorly of the cathode 失效
标题翻译：具有环形阴极和处理气体通道的转移式等离子体焰炬内部提供阴极
公开(公告)号：US4958057A
公开(公告)日：1990-09-18
申请号：US340188
申请日：1989-04-19
申请人： Hiroshi Shiraishi , Nobuo Tajima , Tsuyoshi Shinoda , Nobuyoshi Hirotsu
发明人： Hiroshi Shiraishi , Nobuo Tajima , Tsuyoshi Shinoda , Nobuyoshi Hirotsu
IPC分类号： H05H1/32 , B22D11/10 , H05H1/28 , H05H1/34
CPC分类号： H05H1/34 , H05H1/28 , H05H2001/3421 , H05H2001/3436 , H05H2001/3478
摘要： A transfer-type plasma torch may be used to heat objects, for example, to heat molten steel at a certain stage of being supplied from a converter to a continuous casting mold. After a trigger electric discharge has been produced between the cathode and the ignition anode of the plasma torch, an electric discharge is effected between the cathode and an object to be treated that is set as the anode. The plasma torch includes a cylindrical cathode-holding member having therein a space allowing for the flow of coolant, an ignition anode disposed within the cathode-holding member, and a ring-shaped cathode disposed on an inner periphery of the cathode-holding member and positioned below the tip of the ignition anode, with the tip portion of the cathode projecting downwardly from the bottom face of the cathode-holding member. This arrangement eliminates a conventional nozzle, thereby allowing for a reduction in a diameter of the entire torch while enabling a relative increase in the diameter of the cathode. Thus, the plasma torch exhibits a large capacity for arc current.

16. 发明授权

US4722881A Radiation-sensitive resist composition with an admixture of cis-(1,3,5,7-tetrahydroxy)-1,3,5,7-tetraphenylcyclotetrasiloxane and a polysilsesquioxane 失效
标题翻译：具有顺式 - （1,3,5,7-四羟基）-1,3,5,7-四苯基环四硅氧烷与聚倍半硅氧烷混合物的辐射敏感抗蚀剂组合物
公开(公告)号：US4722881A
公开(公告)日：1988-02-02
申请号：US809203
申请日：1985-12-16
申请人： Takumi Ueno , Hiroshi Shiraishi , Takashi Nishida , Nobuaki Hayashi
发明人： Takumi Ueno , Hiroshi Shiraishi , Takashi Nishida , Nobuaki Hayashi
IPC分类号： G03C1/72 , G03C1/00 , G03C5/08 , G03F7/008 , G03F7/038 , G03F7/075 , G03F7/20 , G03C1/60 , G03C1/71
CPC分类号： G03F7/0757 , Y10S430/167 , Y10S430/168
摘要： This invention relates to a radiation-sensitive composition having resistance to oxygen reactive-ion etching and a process for forming a pattern by using the same.The radiation-sensitive composition of this invention comprises a mixture of cis-(1,3,5,7-tetrahydroxy)-1,3,5,7-tetraphenylcyclotetrasiloxane and a polysilsesquioxane, said mixture containing 5 to 100 wt. % of cis-(1,3,5,7-tetrahydroxy)-1,3,5,7-tetraphenylcyclotetrasiloxane, and a resist containing a phenolic resin soluble in an aqueous alkali solution.
摘要翻译：本发明涉及具有耐氧反应离子蚀刻性的耐辐射敏感组合物和通过使用该方法形成图案的方法。本发明的辐射敏感组合物包含顺式 - （1,3,5,7-四羟基）-1,3,5,7-四苯基环四硅氧烷和聚倍半硅氧烷的混合物，所述混合物含有5至100wt。％的顺式 - （1,3,5,7-四羟基）-1,3,5,7-四苯基环四硅氧烷，以及含有可溶于碱性水溶液的酚醛树脂的抗蚀剂。

17. 发明授权

US4401830A Process for preparation of 3-alkoxy-4-hydroxyphenylacetic acid 失效
标题翻译： 3-烷氧基-4-羟基苯基乙酸的制备方法
公开(公告)号：US4401830A
公开(公告)日：1983-08-30
申请号：US222155
申请日：1981-01-02
申请人： Sumio Umumura , Fumio Iwata , Kikuo Ataka , Hiroshi Shiraishi
发明人： Sumio Umumura , Fumio Iwata , Kikuo Ataka , Hiroshi Shiraishi
IPC分类号： B01J23/00 , C07B61/00 , C07C51/00 , C07C51/347 , C07C51/367 , C07C59/64 , C07C67/00 , C07C65/01
CPC分类号： C07C59/64 , C07C51/347 , C07C51/367
摘要： 3-Alkoxy-4-hydroxyphenylacetic acid useful as intermediate for preparation of pharmaceuticals is prepared by catalytic reduction with hydrogen using a palladium catalyst of corresponding 3-alkoxy-4-hydroxymandelic acid occurring as the reaction product between 2-alkoxyphenol and glyoxylic acid at high conversion and yield.
摘要翻译：用作制备药物的中间体的3-烷氧基-4-羟基苯基乙酸通过使用在高浓度下作为2-烷氧基苯酚和乙醛酸之间的反应产物而出现的相应的3-烷氧基-4-羟基扁桃酸的钯催化剂通过氢气的还原来制备转化率和产量。

18. 发明授权

US4165341A Process for preparing protocatechualdehyde and its derivatives 失效
标题翻译：原儿茶醛及其衍生物的制备方法
公开(公告)号：US4165341A
公开(公告)日：1979-08-21
申请号：US869608
申请日：1978-01-16
申请人： Sumio Umemura , Nagaaki Takamitsu , Takuji Enomiya , Hiroshi Shiraishi , Takato Nakamura
发明人： Sumio Umemura , Nagaaki Takamitsu , Takuji Enomiya , Hiroshi Shiraishi , Takato Nakamura
IPC分类号： C07C45/29 , C07C45/31 , C07C45/39 , C07C51/367 , C07C45/18
CPC分类号： C07C45/292 , C07C45/298 , C07C45/31 , C07C45/39 , C07C51/367 , Y02P20/582
摘要： A process for preparing protocatechualdehyde or a 3-alkoxy-4-hydroxybenzaldehyde which comprises subjecting catechol or a 2-alkoxyphenol to reaction with glyoxylic acid in a basic aqueous medium in the presence of a catalyst containing one or more compounds selected from aluminium oxide, silicon oxide and hydrated aluminium oxide in an amount of not less than 0.01 g per 1 g of the starting catechol or 2-alkoxyphenol at a temperature of 0.degree. to 50.degree. C., and then oxidizing the thus obtained reaction mixture in a basic medium.
摘要翻译：一种制备原儿茶醛或3-烷氧基-4-羟基苯甲醛的方法，该方法包括在含有一种或多种选自氧化铝，硅的化合物的催化剂的存在下，在碱性水性介质中使儿茶酚或2-烷氧基苯酚与乙醛酸反应氧化物和水合氧化铝，其量为每1g起始邻苯二酚或2-烷氧基苯酚在0至50℃温度下不少于0.01g，然后在碱性介质中氧化所得反应混合物。

19. 发明申请

US20110086360A1 METHOD FOR DETECTION OF IDIOPATHIC INTERSTITIAL PNEUMONIA 有权
标题翻译：检测肺炎间质性肺炎的方法
公开(公告)号：US20110086360A1
公开(公告)日：2011-04-14
申请号：US12995769
申请日：2009-06-03
申请人： Kenji Izuhara , Shoichiro Ohta , Hiroshi Shiraishi , Hisamichi Aizawa , Tomoaki Hoshino , Masaki Okamoto
发明人： Kenji Izuhara , Shoichiro Ohta , Hiroshi Shiraishi , Hisamichi Aizawa , Tomoaki Hoshino , Masaki Okamoto
IPC分类号： C12Q1/68 , G01N33/68 , C07H21/00 , C07K16/18 , C12N5/07
CPC分类号： G01N33/6884 , C07K16/28 , C12Q1/6883 , C12Q2600/136 , G01N2333/51 , G01N2500/00 , G01N2500/10 , G01N2800/12 , G01N2800/26
摘要： The present invention provides a method for detecting idiopathic interstitial pneumonia, which comprises measuring the expression level of a periostin gene or the amount of a periostin protein in a biological sample. Thereby, a method for detecting idiopathic interstitial pneumonia using a marker is provided.
摘要翻译：本发明提供一种检测特发性间质性肺炎的方法，其包括测量生物样品中骨膜素基因的表达水平或骨膜素蛋白的量。因此，提供了使用标记物检测特发性间质性肺炎的方法。

20. 发明授权

US07005216B2 Photo mask 有权
标题翻译：照片面具
公开(公告)号：US07005216B2
公开(公告)日：2006-02-28
申请号：US10299692
申请日：2002-11-20
申请人： Hiroshi Shiraishi , Sonoko Migitaka , Takashi Hattori , Tadashi Arai , Toshio Sakamizu
发明人： Hiroshi Shiraishi , Sonoko Migitaka , Takashi Hattori , Tadashi Arai , Toshio Sakamizu
IPC分类号： G03F9/00
CPC分类号： G03F1/56
摘要： Providing a photo mask for KrF excimer laser lithography, which can be produced with high accuracy and low defects in a smaller number of steps. A photo mask for KrF excimer laser lithography according to the present invention is one in which a resist pattern 18 efficiently absorbing a KrF excimer laser light (wavelength: about 248 nm) is formed directly on a quartz substrate 10. The resist pattern 18 comprises: an aqueous alkali-soluble resin having a high light shielding property, which incorporates a naphthol structure having at least one hydroxyl group bound to a naphthalene nucleus; or a radiation sensitive resist having, as a main component, an aqueous alkali-soluble resin containing a derivative of the above-mentioned aqueous alkali-soluble resin as a resin matrix.
摘要翻译：提供KrF准分子激光光刻的光掩模，可以在较小数量的步骤中以高精度和低缺陷生产。根据本发明的用于KrF准分子激光光刻的光掩模是其中直接在石英衬底10上形成有效吸收KrF准分子激光（波长：约248nm）的抗蚀剂图案18的光掩模。抗蚀剂图案18包括：具有高遮光性的碱性水溶性树脂，其包含具有至少一个与萘核结合的羟基的萘酚结构; 或具有作为主要成分的含有上述碱溶性水溶性树脂的衍生物的碱溶性树脂作为树脂基质的辐射敏感性抗蚀剂。

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