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    • 17. 发明授权
    • Curable fluorine-containing polymer, curable resin composition prepared from same and antireflection film
    • 可固化的含氟聚合物,由其制备的可固化树脂组合物和抗反射膜
    • US07670640B2
    • 2010-03-02
    • US11226355
    • 2005-09-15
    • Takayuki ArakiMihoko OhashiYoshito TanakaTetsuo Shimizu
    • Takayuki ArakiMihoko OhashiYoshito TanakaTetsuo Shimizu
    • B05D5/06
    • C09D127/12C08F8/00C08F8/14C08F16/32C08F214/18C08F290/04Y10T428/3154C08F14/18
    • There are provided a curable fluorine-containing polymer which can realize a high hardness by photo-curing while maintaining a low refractive index, an antireflection film possessing improved scratch resistance and abrasion resistance while maintaining a reflection reducing effect, and an antireflection-treated article provided with such an antireflection film. The curable fluorine-containing polymer has a number average molecular weight of from 500 to 1,000,000 and is represented by the formula (1): AM  (1) in which the structural unit M is a structural unit derived from a fluorine-containing ethylenic monomer and represented by the formula (M): wherein X1 and X2 are the same or different and each is H or F; X3 is H, F, CH3 or CF3; X4 and X5 are the same or different and each is H, F or CF3; Rf is an organic group in which 1 to 3 of Y1 (Y1 is a monovalent organic group having 2 to 10 carbon atoms and an ethylenic carbon-carbon double bond at its end) are bonded to a fluorine-containing alkyl group having 1 to 40 carbon atoms or a fluorine-containing alkyl group having 2 to 100 carbon atoms and ether bond; a is 0 or an integer of from 1 to 3; b and c are the same or different and each is 0 or 1, the structural unit A is a structural unit derived from a monomer copolymerizable with the fluorine-containing ethylenic monomer represented by the formula (M), and the structural unit M and the structural unit A are contained in amounts of from 0.1 to 100% by mole and from 0 to 99.9% by mole, respectively.
    • 提供了一种可固化的含氟聚合物,其可以通过光固化同时保持低折射率实现高硬度,在保持反射降低效果的同时具有改善的耐擦伤性和耐磨性的抗反射膜,以及提供的抗反射处理制品 具有这样的抗反射膜。 可固化含氟聚合物的数均分子量为500〜1,000,000,由式(1)表示:AM(1)其中,结构单元M是来自含氟乙烯性单体的结构单元, 由式(M)表示:其中X1和X2相同或不同,各自为H或F; X3是H,F,CH3或CF3; X4和X5相同或不同,分别为H,F或CF 3; Rf为1〜3的Y1(Y1为碳原子数为2〜10的一价有机基团,末端为烯属碳 - 碳双键)的1〜3的有机基团与1〜40的含氟烷基 碳原子或碳原子数2〜100的含氟烷基和醚键; a为0或1〜3的整数; b和c相同或不同,分别为0或1,结构单元A是衍生自与式(M)表示的含氟乙烯性单体共聚的单体的结构单元,结构单元M和 结构单元A的含量分别为0.1至100摩尔%和0至99.9摩尔%。
    • 19. 发明授权
    • Fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same
    • 具有酸反应性基团的含氟聚合物和由其制备的化学放大型光致抗蚀剂组合物
    • US06908724B2
    • 2005-06-21
    • US10262893
    • 2002-10-03
    • Takayuki ArakiMeiten KohYoshito TanakaTakuji IshikawaHirokazu AoyamaTetsuo Shimizu
    • Takayuki ArakiMeiten KohYoshito TanakaTakuji IshikawaHirokazu AoyamaTetsuo Shimizu
    • G03F7/004G03F7/038G03F7/039G03F7/075
    • G03F7/039G03F7/0045G03F7/0046G03F7/0382G03F7/0392G03F7/0395G03F7/0397G03F7/0758Y10S430/106Y10S430/108
    • There is provided a novel fluorine-containing polymer having an acid-reactive group which has a high transparency against energy rays (radioactive rays) in a vacuum ultraviolet region (157 nm), and further there are provided a material for fluorine-containing base polymer prepared from the polymer and suitable for a photoresist and a chemically amplifying type resist composition obtained therefrom.The polymer has a number average molecular weight of from 1,000 to 1,000,000 and represented by the formula: —(M1)—(M2)—(A)—, wherein M1 is a structural unit having an acid-labile or acid-degradable functional group, M2 is a structural unit of fluorine-containing acryl ester, A is a structural unit derived from other copolymerizable monomer, the percent by mole ratio M1/M2 is 1 to 99/99 to 1 and the polymer comprises from 1 to 99% by mole of the structural unit M1, from 1 to 99% by mole of the structural unit M2 and from 0 to 98% by mole of the structural unit A1. The material for fluorine-containing base polymer comprises a fluorine-containing polymer having an acid-reactive group such as the above-mentioned polymer and is suitable for a photoresist, and the chemically amplifying type resist composition is obtained from those polymer and material.
    • 提供了一种具有酸反应性基团的新型含氟聚合物,其具有对真空紫外区域(157nm)中的能量射线(放射线)的高透明性,并且还提供了含氟基础聚合物 由聚合物制备并适用于由其获得的光致抗蚀剂和化学放大型抗蚀剂组合物。 聚合物的数均分子量为1,000〜1,000,000,由下式表示: - (M1) - (M2) - (A) - ,其中M1是具有酸不稳定性或酸可降解官能团的结构单元 M2是含氟丙烯酸酯的结构单元,A是来自其它可共聚单体的结构单元,M1 / M2的摩尔比为1〜99/99〜1,聚合物的含量为1〜99% 结构单元M1的摩尔数,结构单元M2的1〜99摩尔%和结构单元A1的0〜98摩尔%。 含氟基础聚合物的材料包括具有酸反应性基团的含氟聚合物如上述聚合物,并且适用于光致抗蚀剂,化学放大型抗蚀剂组合物由那些聚合物和材料获得。