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11. 发明授权

US5078495A Monochromator 失效
标题翻译：单色器
公开(公告)号：US5078495A
公开(公告)日：1992-01-07
申请号：US478568
申请日：1990-02-12
申请人： Tatsuo Harada , Toshiei Kurosaki , Tsuneo Terasawa , Toshiaki Kita
发明人： Tatsuo Harada , Toshiei Kurosaki , Tsuneo Terasawa , Toshiaki Kita
IPC分类号： G01J3/18 , G02B5/18
CPC分类号： G01J3/1804 , G01J2003/1847
摘要： A plane grating, particularly for a monochronomator, is provided with varied-spaced straight and parallel grooves in a light beam path to compensate for other light affecting components, for example a spherical mirror used for collimating or focusing the light beam. The angle of incidence with respect to the light for each of the grooves may vary and the angle of diffraction with respect to the light for each groove may be required to vary with the imperfection of collimation and focusing of the beam. The grooves are varied in their spacing to compensate for the variation of both incidence and diffraction direction.
摘要翻译：特别是用于单声道同步器的平面光栅在光束路径中设置有不同间隔的直的和平行的凹槽，以补偿其它影响光的部件，例如用于准直或聚焦光束的球面镜。相对于每个凹槽的光的入射角可以变化，并且可能需要相对于每个凹槽的光的衍射角度随着光束的准直和聚焦的不完善而变化。凹槽的间距是变化的，以补偿入射和衍射方向的变化。

12. 发明授权

US4226616A Diphenyl ether and herbicide containing the same 失效
标题翻译：二苯醚和除草剂含有相同
公开(公告)号：US4226616A
公开(公告)日：1980-10-07
申请号：US872338
申请日：1978-01-25
申请人： Kunikazu Hiraga , Shoichi Shibayama , Isao Yanai , Tatsuo Harada
发明人： Kunikazu Hiraga , Shoichi Shibayama , Isao Yanai , Tatsuo Harada
IPC分类号： A01N33/22 , A01N47/02 , C07B61/00 , C07C41/14 , C07C67/00 , C07C201/00 , C07C205/38 , C07C41/00 , A01N9/24 , C07C43/22
CPC分类号： A01N47/02 , C07C205/38
摘要： A diphenyl ether represented by the general formula (I), ##STR1## wherein R is a lower alkyl group having 1 to 4 carbon atoms, a lower alkoxyethyl group, the alkoxy substituent of which having 1 to 4 carbon atoms, or a lower alkoxyethoxyethyl group, the alkoxy substituent of which having 1 to 4 carbon atoms is capable of controlling annual and perennial weeds.
摘要翻译：由通式（I）表示的二苯基醚，其中R是具有1至4个碳原子的低级烷基，低级烷氧基乙基，其烷氧基取代基具有1至4个碳原子，或一个低级烷氧基乙氧基乙基，其具有1至4个碳原子的烷氧基取代基能够控制一年生和多年生杂草。

13. 发明授权

US08112980B2 Finish for synthetic filament yarn processed in friction false-twist texturing and application thereof 失效
标题翻译：用于摩擦假捻加工的合成长丝纱线的表面处理及其应用
公开(公告)号：US08112980B2
公开(公告)日：2012-02-14
申请号：US12677253
申请日：2008-09-02
申请人： Shinichi Tatemoto , Tatsuo Harada , Kaori Kimoto
发明人： Shinichi Tatemoto , Tatsuo Harada , Kaori Kimoto
IPC分类号： D01H13/30
CPC分类号： D06M13/292 , D02G1/04 , D06M7/00 , D06M13/184 , D06M13/207 , D06M13/342 , D06M2200/40 , Y10T428/2933
摘要： A finish for synthetic filament yarn which decreases broken filaments and ends down in friction false-twist texturing includes 40 to 98 wt % of a polyether compound, and essentially comprises components (A) and (B); wherein the component (A) is at least one member selected from the group consisting of (A1) a C1-C10 fatty acid, (A2) a C1-C10 hydroxyfatty acid, (A3) a sarcosine derivative, and salts thereof, and the amount of the component (A) in the finish ranges from 0.05 to 5 wt %; and wherein the component (B) is an alkylphosphate salt and the amount of the component (B) in the finish ranges from 0.01 to 3 wt %.
摘要翻译：合成长丝纱线的修整，其减少断裂的细丝并在摩擦假捻变形中终止，包括40至98重量％的聚醚化合物，并且基本上包含组分（A）和（B）; 其中组分（A）为选自（A1）C1-C10脂肪酸，（A2）C1-C10羟基脂肪酸，（A3）肌氨酸衍生物及其盐的至少一种，和组分（A）的含量在0.05〜5重量％范围内; 并且其中组分（B）是烷基磷酸盐，并且组合物（B）的量在0.01至3重量％范围内。

14. 发明授权

US06765239B2 Semiconductor device having junction-termination structure of resurf type 有权
标题翻译：具有resurf型连接终端结构的半导体器件
公开(公告)号：US06765239B2
公开(公告)日：2004-07-20
申请号：US10187369
申请日：2002-07-02
申请人： Michiaki Hiyoshi , Shigeru Hasegawa , Naoyuki Inoue , Tatsuo Harada
发明人： Michiaki Hiyoshi , Shigeru Hasegawa , Naoyuki Inoue , Tatsuo Harada
IPC分类号： H01L2974
CPC分类号： H01L29/405 , H01L29/7395
摘要： A semiconductor device includes an active region with a main semiconductor device section, and a junction-termination region therearound. A first diffusion layer of a second conductivity type is formed in a surface of a first semiconductor layer of a first conductivity type, and extends from the active region into the junction-termination region. A second diffusion layer of the second conductivity type is formed in contact with the first diffusion layer, and extends in the junction-termination region. A first contact electrode is disposed in the active region and in contact with the first diffusion layer, and electrically connected to a first main electrode of the main semiconductor device section. A second contact electrode is disposed in the junction-termination region and in contact with the first diffusion layer, and surrounds the active region. A connection electrode electrically connects the first and second contact electrodes to each other.
摘要翻译：半导体器件包括具有主半导体器件部分的有源区和其周围的结终端区。在第一导电类型的第一半导体层的表面中形成第二导电类型的第一扩散层，并且从有源区延伸到结终端区域。形成与第一扩散层接触的第二导电类型的第二扩散层，并且在接合端子区域中延伸。第一接触电极设置在有源区中并与第一扩散层接触，并且电连接到主半导体器件部分的第一主电极。第二接触电极设置在接合端子区域中并且与第一扩散层接触并且围绕有源区域。连接电极将第一和第二接触电极彼此电连接。

15. 发明授权

US4690506A Method of producing varied line-space diffraction gratings 失效
$Method of producing varied line-space diffraction gratings$
标题翻译：生产各种线间距衍射光栅的方法
公开(公告)号：US4690506A
公开(公告)日：1987-09-01
申请号：US783363
申请日：1985-10-03
申请人： Toshiaki Kita , Tatsuo Harada
发明人： Toshiaki Kita , Tatsuo Harada
IPC分类号： B43L13/24 , G02B5/18
CPC分类号： G02B5/1852 , B43L13/24 , Y10S359/90
摘要： In a method of producing diffraction gratings by feeding either one of a blank or a groove-ruling tool by an amount consisting of the amount of constant transference and the amount of variable transference that is added thereto, or subtracted therefrom, while reciprocally moving the other one of said blank or said groove-ruling tool, in order to rule grooves of irregular intervals on said blank, a method of producing varied line-space diffraction gratings wherein the region of ruling is divided into a plurality of small regions so that the difference between a maximum value and a minimum value of distance between grooves becomes smaller than a predetermined value, and the amount of constant transference is set to the nearly equal to an average distance between grooves in each of said small regions.
摘要翻译：在制造衍射光栅的方法中，通过将坯料或凹槽划线工具中的任一个进给到由常数转移量和添加到其中的可变转移量或从其中减去的量，同时使另一个所述坯料或所述凹槽划线工具中的一个，以便规定所述坯件上的不规则间隔的凹槽，制造不同的线间距衍射光栅的方法，其中刻划区域被划分成多个小区域，使得差异在凹槽之间的最大值和最小距离之间变得小于预定值，并且恒定移动量被设置为几乎等于每个所述小区域中的凹槽之间的平均距离。

16. 发明授权

US4318731A .DELTA..sup.2 -1,2,4-triazolin-5-one derivatives and herbicidal usage thereof 失效
标题翻译： DELTA 2-1,2,4-三唑啉-5-酮衍生物及其除草用途
公开(公告)号：US4318731A
公开(公告)日：1982-03-09
申请号：US162558
申请日：1980-06-24
申请人： Mitsuru Kajioka , Hitoshi Kurono , Katsumasa Okawa , Tatsuo Harada
发明人： Mitsuru Kajioka , Hitoshi Kurono , Katsumasa Okawa , Tatsuo Harada
IPC分类号： A01N43/653 , C07D249/12 , A01N43/64
CPC分类号： A01N43/653 , C07D249/12
摘要： A novel .DELTA..sup.2 -1,2,4-triazolin-5-one derivative having a herbicidal activity, which is represented by the formula ##STR1## wherein, R.sup.1 is a C.sub.1 -C.sub.4 alkyl; R.sup.2 is a hydrogen atom, a C.sub.1 -C.sub.6 alkyl group, or a C.sub.2 -C.sub.4 alkenyl group; and X is a hydroxy group, a C.sub.1 -C.sub.4 alkyl group, a C.sub.1 -C.sub.6 alkyloxy group, an alkyloxyalkyloxy group of which two alkyls may be same as or different from each other and each alkyl is of C.sub.1 -C.sub.4, a C.sub.2 -C.sub.4 alkenyloxy, or an alkyloxycarbonylalkyloxy group of which two alkyls may be same as or different from each other and each alkyl is of C.sub.1 -C.sub.4.
摘要翻译：具有除草活性的新颖的具有除草活性的DELTA 2-1,2,4-三唑啉-5-酮衍生物，其由下式表示：其中R1是C1-C4烷基; R2是氢原子，C1-C6烷基或C2-C4烯基; X为羟基，C 1〜C 4烷基，C 1〜C 6烷氧基，2个烷基可以相同或不同的烷氧基烷氧基，各烷基为C1-C4，C2-C4 链烯氧基或烷氧基羰基烷氧基，其中两个烷基可以彼此相同或不同，并且每个烷基是C1-C4。

17. 发明授权

US4157256A Tetrahydrophthalimide and herbicide containing the same 失效
标题翻译：含有四氢邻苯二甲酰亚胺和除草剂
公开(公告)号：US4157256A
公开(公告)日：1979-06-05
申请号：US872339
申请日：1978-01-25
申请人： Kunikazu Hiraga , Shoichi Shibayama , Isao Yanai , Tatsuo Harada
发明人： Kunikazu Hiraga , Shoichi Shibayama , Isao Yanai , Tatsuo Harada
IPC分类号： A01N37/32 , A01N47/02 , C07D209/48 , A01N9/12 , A01N9/22 , A01N9/24
CPC分类号： C07D209/48 , A01N47/02
摘要： N-(p-trifluoromethoxyphenyl)-3,4,5,6-tetrahydrophthalimide and N-(p-trifluoromethylthiophenyl)-3,4,5,6-tetrahydrophthalimide are capable of controlling annual and perennial weeds with high selectivity.
摘要翻译： N-（对三氟甲氧基苯基）-3,4,5,6-四氢邻苯二甲酰亚胺和N-（对三氟甲硫基苯基）-3,4,5,6-四氢邻苯二甲酰亚胺能够以高选择性控制年和多年生杂草。

18. 发明授权

US07750438B2 Semiconductor device 有权
标题翻译：半导体器件
公开(公告)号：US07750438B2
公开(公告)日：2010-07-06
申请号：US12356891
申请日：2009-01-21
申请人： Tatsuo Harada
发明人： Tatsuo Harada
IPC分类号： H01L29/70
CPC分类号： H01L29/7395 , H01L29/0834
摘要： An n-type buffer region 6 is arranged between an n− drift region 1 and a p-type collector region 7, and has a higher impurity concentration than n− drift region 1 Assuming that α represents the ratio (WTA/WTB) between WTA expressed as: WTA = 2 ⁢ ɛ s ⁢ ɛ 0 ⁢ V qNd and the thickness WTB of the drift region held between the base region and the buffer region, the ratio (DC/DB) of the net dose DC of the collector region with respect to the net dose DB of the buffer region is at least α. Thus, a semiconductor device capable of ensuring a proper margin of SCSOA resistance can be obtained.
摘要翻译： n型缓冲区域6布置在n漂移区域1和p型集电极区域7之间，并且具有比n-漂移区域1更高的杂质浓度。假设α表示WTA之间的比率（WTA / WTB）表示为：WTA =2εsε0 V qNd，保持在基极区域和缓冲区域之间的漂移区域的厚度WTB，集电极区域的净剂量DC的比（DC / DB）与相对于缓冲区域的净剂量DB至少为α。因此，可以获得能够确保SCSOA电阻的适当余量的半导体器件。

19. 发明授权

US4480910A Pattern forming apparatus 失效
标题翻译：图案形成装置
公开(公告)号：US4480910A
公开(公告)日：1984-11-06
申请号：US358436
申请日：1982-03-15
申请人： Akihiro Takanashi , Tatsuo Harada , Masamoto Akeyama , Yataro Kondo , Toshiei Kurosaki , Shinji Kuniyoshi , Sumio Hosaka , Yoshio Kawamura
发明人： Akihiro Takanashi , Tatsuo Harada , Masamoto Akeyama , Yataro Kondo , Toshiei Kurosaki , Shinji Kuniyoshi , Sumio Hosaka , Yoshio Kawamura
IPC分类号： H01L21/30 , G03F7/20 , H01L21/027 , G03B27/52 , G03B27/68
CPC分类号： G03F7/70241 , G03F7/2041 , G03F7/70341
摘要： There is disclosed a pattern forming apparatus for projecting a pattern which is formed on a reticle upon a photoresist layer on a substrate which comprises an illumination system for illuminating the pattern for forming an optical image, a reduction lenses for reducing the optical pattern image at a certain reduction ratio and projecting the reduced optical pattern image upon the photoresist layer formed on the substrate for exposing the photoresist layer, and liquid sustaining means for filling a gap between at least a portion of the reduction lenses and the photoresist layer with an optically transparent liquid having a refractive index of more than 1 (one).
摘要翻译：公开了一种图案形成装置，用于将形成在掩模版上的图案投影在基板上的光致抗蚀剂层上，该基板包括用于照射用于形成光学图像的图案的照明系统，用于减少光学图案图像的缩小透镜特定的缩小率，并且将减小的光学图案图像投影到形成在用于曝光光致抗蚀剂层的基板上的光致抗蚀剂层上;以及液体维持装置，用于用光学透明液体填充至少一部分还原透镜和光致抗蚀剂层之间的间隙折射率大于1（1）。

20. 发明授权

US4455485A Laser beam scanning system 失效
标题翻译：激光束扫描系统
公开(公告)号：US4455485A
公开(公告)日：1984-06-19
申请号：US324791
申请日：1981-11-25
申请人： Sumio Hosaka , Tatsuo Harada , Akihiro Takanashi
发明人： Sumio Hosaka , Tatsuo Harada , Akihiro Takanashi
IPC分类号： H01S3/00 , G02B26/10 , G02F1/33 , G03F7/20 , H01J3/14
CPC分类号： G03F7/704 , G02B26/108 , G02F1/33
摘要： A laser beam scanning system for focusing a laser beam to a fine spot and for scanning precisely a large field includes an acousto-optical deflector enabled to deflect a laser beam in the direction of one axis or in the directions of two axes, while maintaining the fine spot diameter, to scan a small field, a relay lens for projecting said deflection point to the center of an objective lens, to effect the focusing of the beam to a fine spot, a high speed carriage enabled to move with high accuracy in biaxial directions, a precise position detector enabled to detect the position of the carriage, and a controller for organically controlling the aforementioned respective functions thereby to make it possible to precisely deflect the laser beam over a large field, whereby a scanning operation of a large field at a high speed and with a high accuracy is performed by the laser beam.
摘要翻译：用于将激光束聚焦到细小点并且精确地扫描大场的激光束扫描系统包括能够使激光束沿着一个轴线或两个轴线的方向偏转的声光偏转器，同时保持精细直径，扫描小场，用于将所述偏转点投影到物镜中心的中继透镜，以实现将光束聚焦到细微点，能够以双轴向高精度移动的高速滑架方向，能够检测托架的位置的精确位置检测器和用于有机地控制上述各个功能的控制器，从而使得可以在大场上精确地偏转激光束，由此大场的扫描操作通过激光束执行高速度和高精度。

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