专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

11. 发明申请

US20050030510A1 Projection exposure apparatus and device manufacturing method 审中-公开
公开(公告)号：US20050030510A1
公开(公告)日：2005-02-10
申请号：US10937431
申请日：2004-09-10
申请人： Toshihiko Tsuji
发明人： Toshihiko Tsuji
IPC分类号： G03F7/20 , H01L21/027 , G03B27/72
CPC分类号： G03F7/70233 , G03F7/7025 , G03F7/70258 , G03F7/70283
摘要： Disclosed is an exposure apparatus for illuminating a reflection type mask with light from a light source and for exposing a substrate with a pattern of the illuminated reflection type mask, wherein the apparatus includes a projection optical system for projecting the pattern of the reflection type mask onto the substrate, the projection optical system having a stop, wherein the stop has a first opening for defining a numerical aperture of the projection optical system, and a second opening through which light from the reflection type mask passes. This structure effective avoids unwanted physical interference among optical components of an illumination system or the projection optical system even when the size of the whole exposure apparatus is made compact to some degree.

12. 发明授权

US06606195B2 Optical unit and optical instrument having the same 失效
标题翻译：光学单元和具有相同的光学仪器
公开(公告)号：US06606195B2
公开(公告)日：2003-08-12
申请号：US09411633
申请日：1999-10-01
申请人： Toshihiko Tsuji
发明人： Toshihiko Tsuji
IPC分类号： G02B2744
CPC分类号： G03F7/70058 , G02B27/0018 , G02B27/0043 , G02B27/4211 , G02B27/4222 , G03F7/70241 , G03F7/70825
摘要： An optical unit includes an optical element for propagating incident light toward a predetermined direction, a barrel for supporting the optical element, and an attenuating device including a plurality of grooved portions, for attenuating, through multiple reflection, at least a portion of light emitted from the optical element toward a direction different from the predetermined direction. The attenuating device includes two recesses each having a horn-like section shape, the two recesses being bent in directions away from each other.
摘要翻译：光学单元包括用于向预定方向传播入射光的光学元件，用于支撑光学元件的镜筒，以及包括多个凹槽部分的衰减装置，用于通过多次反射来衰减至少一部分从所述光学元件朝向与所述规定方向不同的方向。该衰减装置包括两个具有喇叭状截面形状的凹部，两个凹部沿彼此远离的方向弯曲。

13. 发明授权

US06392742B1 Illumination system and projection exposure apparatus 有权
标题翻译：照明系统和投影曝光装置
公开(公告)号：US06392742B1
公开(公告)日：2002-05-21
申请号：US09323031
申请日：1999-06-01
申请人： Toshihiko Tsuji
发明人： Toshihiko Tsuji
IPC分类号： G03B2754
CPC分类号： G03F7/70183
摘要： An illumination system includes a light source, an emission angle preserving optical element for emitting light from the light source, at a certain emission angle, a collecting optical system for collecting the light from the emission angle preserving optical element, a pattern forming optical system having at least a diffractive optical element, for producing, on a predetermined plane, a light pattern of a desired shape having a uniform light intensity distribution, by use of light from the light collecting optical system, a multiple-beam producing system for producing a plurality of light beams, a zooming optical system for projecting the light intensity distribution on the predetermined plane, onto a light entrance surface of the multiple-beam producing system at a predetermined magnification, and an illuminating device for superposedly projecting lights from a light exit surface of the multiple-beam producing system, upon a surface to be illuminated.
摘要翻译：照明系统包括：光源，用于以一定的发射角发射来自光源的光的发射角保持光学元件，用于收集来自发射角保持光学元件的光的收集光学系统;具有至少一个衍射光学元件，用于在预定平面上通过使用来自聚光光学系统的光产生具有均匀光强分布的所需形状的光图案，用于产生多个光束的多光束产生系统的光束，用于将预定平面上的光强度分布投射到预定放大倍数的多光束产生系统的光入射表面上的变焦光学系统，以及用于将来自光束的光出射表面的光重叠地投射的照明装置多光束产生系统在被照射的表面上。

14. 发明授权

US06169602A Inspection method and apparatus for projection optical systems 失效
标题翻译：投影光学系统的检测方法和装置
公开(公告)号：US06169602A
公开(公告)日：2001-01-02
申请号：US09253711
申请日：1999-02-22
申请人： Tetsuo Taniguchi , Toshihiko Tsuji
发明人： Tetsuo Taniguchi , Toshihiko Tsuji
IPC分类号： G01B1100
CPC分类号： G03F7/70358 , G03F7/706 , G03F7/70691
摘要： The present invention relates to a method of detecting an image formation characteristic of a projection optical system for projecting a reference pattern on a reticle on a substrate. According to the detection method, a reticle stage is moved so that a reference mark on the reticle comes to a first reference position and a second reference position, and a wafer stage is moved so that a light transmission portion on the wafer stage crosses an image forming position of a projected image of the reference mark obtained through the projection optical system. The positions of the reticle stage and the wafer stage at the first and second reference positions are measured as moved distances of the stages, respectively. From the distances of movement of the reticle and wafer stages measured, the image formation characteristic of the projection optical system is calculated.
摘要翻译：本发明涉及一种检测投影光学系统的图像形成特性的方法，用于将基准图案投影在基板上的掩模版上。根据检测方法，移动标线片台，使得标线上的基准标记进入第一基准位置和第二基准位置，并移动晶片台，使得晶片台上的光透射部分跨越图像形成通过投影光学系统获得的参考标记的投影图像的位置。在第一和第二参考位置处的标线片台和晶片台的位置分别被测量为阶段的移动距离。从测量的标线片和晶片台的移动距离来计算投影光学系统的图像形成特性。

15. 发明授权

US5798838A Projection exposure apparatus having function of detecting intensity distribution of spatial image, and method of detecting the same 失效
标题翻译：具有检测空间图像的强度分布功能的投影曝光装置及其检测方法
公开(公告)号：US5798838A
公开(公告)日：1998-08-25
申请号：US713719
申请日：1996-09-13
申请人： Tetsuo Taniguchi , Toshihiko Tsuji , Tadashi Nagayama
发明人： Tetsuo Taniguchi , Toshihiko Tsuji , Tadashi Nagayama
IPC分类号： G03F7/20 , H01L21/30 , G01B11/00
CPC分类号： G03F7/70591 , G03F7/70133 , G03F7/70241 , G03F7/70258 , G03F7/70358
摘要： The invention relates to a projection exposure apparatus for detecting a light-intensity distribution of a spatial image of a mask pattern formed through a projection optical system. The projection exposure apparatus has a knife-edge member which is disposed on the main surface of a wafer stage such that a plane including an exposure surface of a photosensitive substrate is leveled with a light incidence surface of the knife-edge member. The knife-edge member has a transmission area for transmitting the exposure light passing through the projection optical system, a light shielding area for preventing transmission of the exposure light, and a knife-edge defined as a boundary line between the transmission area and the light shielding area. The projection exposure apparatus detects the light-intensity distribution of light from the spatial image while moving the spatial image of the mask pattern and the knife-edge of the knife-edge member relatively to each other. The information related to the light-intensity distribution is used in optically adjusting a projection optical system, or the like.
摘要翻译：本发明涉及一种用于检测通过投影光学系统形成的掩模图案的空间图像的光强度分布的投影曝光装置。投影曝光装置具有刀片部件，其设置在晶片台的主表面上，使得包括感光基板的曝光表面的平面与刀刃部件的光入射面平齐。刀刃部件具有用于透射通过投影光学系统的曝光光的透射区域，用于防止曝光光的透射的遮光区域和被定义为透射区域与光线之间的边界线的刀刃屏蔽区域。投影曝光装置在将掩模图案的空间图像和刀刃部件的刀刃相对于彼此移动的同时，检测来自空间图像的光的光强度分布。与光强分布有关的信息用于光学调整投影光学系统等。

16. 发明授权

US5591985A Surface state inspecting system including a scanning optical system for scanning a surface to be inspected with a first light and for simultaneously scanning a diffraction grating with a second light 失效
$Surface state inspecting system including a scanning optical system for scanning a surface to be inspected with a first light and for simultaneously scanning a diffraction grating with a second light$
标题翻译：表面状态检查系统，包括用第一光扫描待检查表面的扫描光学系统，并且用第二光同时扫描衍射光栅
公开(公告)号：US5591985A
公开(公告)日：1997-01-07
申请号：US374884
申请日：1995-01-19
申请人： Toshihiko Tsuji , Michio Kohno
发明人： Toshihiko Tsuji , Michio Kohno
IPC分类号： G01N21/88 , G01N21/94 , G01N21/956 , G03F1/84 , H01L21/027 , G01N21/89
CPC分类号： G01N21/94
摘要： A surface state inspecting system includes a scanning optical system for scanning a surface to be inspected, with first light and simultaneously for scanning a diffraction grating with second light, wherein the first light and the second light have mutually different wavelengths and mutually different polarization directions, a light receiving optical system for receiving scattered light produced sidewardly from the surface and diffraction light produced sidewardly from the diffraction grating, and for superposing the received lights one upon another, and a photoelectric converting device for converting light from the light receiving optical system into an electric signal, wherein the scanning optical system and the light receiving optical system provide an optical system which is telecentric with respect to the surface to be inspected.
摘要翻译：表面状态检查系统包括用第一光扫描待检查表面的扫描光学系统，同时用第二光扫描衍射光栅，其中第一光和第二光具有相互不同的波长和相互不同的偏振方向，用于接收从表面侧面产生的散射光的光接收光学系统和从衍射光栅侧面产生的衍射光，并将所接收的光叠加在一起的光接收光学系统，以及用于将来自光接收光学系统的光转换为电信号，其中所述扫描光学系统和所述光接收光学系统提供相对于要检查的表面是远心的光学系统。

17. 发明授权

US4390209A Plastic seat-back framework and method for the manufacture thereof 失效
标题翻译：塑料座椅靠背框架及其制造方法
公开(公告)号：US4390209A
公开(公告)日：1983-06-28
申请号：US223292
申请日：1981-01-08
申请人： Sadami Izuno , Isao Kiyomitsu , Toshihiko Tsuji
发明人： Sadami Izuno , Isao Kiyomitsu , Toshihiko Tsuji
IPC分类号： A47C7/38 , A47C7/40 , B60N2/48 , A47C7/36
CPC分类号： A47C7/40 , A47C7/38 , B60N2/4808
摘要： A seat back framework of one-piece construction together with a head rest support is made from a single blank of fiber-reinforced plastics. The seat back framework comprises a generally rectangular body having opposite upper and lower walls, a pair of opposite side walls and a connecting wall extending between the side walls in spaced relation to the upper wall with a support space defined therebetween. A pair of guide members for axially adjustably supporting corresponding legs forming a part of the head rest assembly together with a head rest are formed on the rectangular body within the support space.
摘要翻译：单件结构的座椅靠背框架以及头枕支撑件由纤维增强塑料的单个坯料制成。座椅靠背框架包括具有相对的上壁和下壁的大致矩形的主体，一对相对的侧壁和在侧壁之间延伸的连接壁，所述连接壁与上壁间隔开，并且其间限定有支撑空间。在支撑空间内的矩形主体上形成有用于轴向可调节地支撑形成头枕组件的一部分与头枕一起的一对引导构件。

18. 发明授权

US4021843A Color tone control device in color television receiver 失效
标题翻译：彩色电视接收机中的色调控制装置
公开(公告)号：US4021843A
公开(公告)日：1977-05-03
申请号：US544268
申请日：1975-01-27
申请人： Yoshisada Taniguchi , Toshihiko Tsuji , Masanori Oguino
发明人： Yoshisada Taniguchi , Toshihiko Tsuji , Masanori Oguino
IPC分类号： H04N9/64 , H04N9/535
CPC分类号： H04N9/643
摘要： Red, blue and green color difference signals are supplied to the bases of first, second and third transistors amplifying the tri-color signals of red, blue and green, and a luminance signal is introduced to the emitter of each transistor through a parallel circuit of two resistors. One of the resistors in each parallel circuit is connected through a switch. The switches are associatively operated so that the on-off operation of the switch connected to the emitter of the first transistor is opposite to that of the switches connected to the emitters of the second and the third transistor. By operating the switches, the amplification degree of the first transistor is increased and simultaneously the amplification degrees of the second and third transistors are decreased, and therefore an image with red emphasized can be obtained with no change in luminance.
摘要翻译：红色，蓝色和绿色差信号被提供给放大红色，蓝色和绿色三色信号的第一，第二和第三晶体管的基极，并且亮度信号通过并行电路被引入到每个晶体管的发射极两个电阻。每个并联电路中的一个电阻通过开关连接。这些开关被联接操作，使得连接到第一晶体管的发射极的开关的导通截止操作与连接到第二和第三晶体管的发射极的开关的开关操作相反。通过操作开关，第一晶体管的放大度增加，同时第二和第三晶体管的放大度减小，因此可以获得亮度不变的红色图像。

19. 发明申请

US20130222569A1 IMAGING APPARATUS 审中-公开
标题翻译：成像设备
公开(公告)号：US20130222569A1
公开(公告)日：2013-08-29
申请号：US13881302
申请日：2011-10-17
申请人： Tomoaki Kawakami , Toshihiko Tsuji
发明人： Tomoaki Kawakami , Toshihiko Tsuji
IPC分类号： H04N5/225
CPC分类号： H04N5/2256 , G02B21/086 , G02B21/367 , G02B27/0905 , G02B27/0961 , G02B27/0994 , H04N5/3454
摘要： An imaging apparatus includes: an illumination optical system including a light source and guiding the light from the light source to an illuminated surface B including an object; a plurality of image sensors for acquiring an image of the illuminated surface formed by an imaging optical system; a measurement unit for measuring a size of the object; and a control unit for determining an image sensor to be used when acquiring the image of the illuminated surface, among the plurality of image sensors, based on a measurement result of the measurement unit.
摘要翻译：一种成像设备包括：照明光学系统，包括光源并将来自光源的光引导到包括物体的照明表面B; 用于获取由成像光学系统形成的照明表面的图像的多个图像传感器; 用于测量物体的尺寸的测量单元; 以及控制单元，用于基于测量单元的测量结果确定在获取多个图像传感器中的照明表面的图像时要使用的图像传感器。

20. 发明申请

US20120327208A1 IMAGING APPARATUS 有权
标题翻译：成像设备
公开(公告)号：US20120327208A1
公开(公告)日：2012-12-27
申请号：US13488601
申请日：2012-06-05
申请人： Yoshinari Higaki , Miyoko Kawashima , Toshihiko Tsuji
发明人： Yoshinari Higaki , Miyoko Kawashima , Toshihiko Tsuji
IPC分类号： H04N5/217 , H04N7/18
CPC分类号： G02B21/365 , G02B13/18 , G02B27/0068 , H04N5/3572
摘要： An imaging apparatus comprises: an imaging unit having an imaging optical system and an imaging device; a measuring unit that measures, for each of a plurality of regions on a specimen, an optical aberration or a physical quantity causing the aberration before the imaging of the specimen is performed; a plurality of optical elements that are inserted in an optical path of the imaging optical system for correcting the aberration and that differ in correction amount; and a control unit that selects an optical element from among the optical elements on the basis of a measurement result of the measuring unit, and inserts the selected optical element into the optical path of the imaging optical system before the imaging of the specimen. The imaging optical system is configured to be capable of forming simultaneously images of the plurality of regions on the imaging device.
摘要翻译：一种成像装置包括：具有成像光学系统和成像装置的成像单元; 测量单元，其针对样本的多个区域中的每一个测量导致在所述样本的成像之前产生像差的光学像差或物理量; 多个光学元件，其插入到成像光学系统的光路中，用于校正像差，并且校正量不同; 以及控制单元，其基于所述测量单元的测量结果从所述光学元件中选择光学元件，并且在所述样本的成像之前将所选择的光学元件插入所述成像光学系统的光路中。成像光学系统被配置为能够同时形成成像装置上的多个区域的图像。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式