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11. 发明申请

US20130148406A1 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND READ METHOD FOR THE SAME 有权
标题翻译：非易失性半导体存储器件及其读取方法
公开(公告)号：US20130148406A1
公开(公告)日：2013-06-13
申请号：US13700329
申请日：2012-07-11
申请人： Kazuhiko Shimakawa , Kiyotaka Tsuji , Ryotaro Azuma
发明人： Kazuhiko Shimakawa , Kiyotaka Tsuji , Ryotaro Azuma
IPC分类号： G11C13/00
CPC分类号： G11C13/004 , G11C7/14 , G11C11/1673 , G11C13/0004 , G11C2013/0054 , G11C2213/71 , G11C2213/72 , G11C2213/73 , G11C2213/77
摘要： A cross point nonvolatile memory device capable of suppressing sneak-current-caused reduction in sensitivity of detection of a resistance value of a memory element is provided. The device includes perpendicular bit and word lines; a cross-point cell array including memory cells each having a resistance value reversibly changing between at least two resistance states according to electrical signals, arranged on cross-points of the word and bit lines; an offset detection cell array including an offset detection cell having a resistance higher than that of the memory cell in a high resistance state, the word lines being shared by the offset detection cell array; a read circuit (a sense amplifier) that determines a resistance state of a selected memory cell based on a current through the selected bit line; and a current source which supplies current to the offset detection cell array in a read operation period.
摘要翻译：提供一种能够抑制潜流引起的对存储元件的电阻值的检测灵敏度的降低的交叉点非易失性存储装置。该设备包括垂直位和字线; 交叉点单元阵列，其包括存储单元，每个存储单元具有电阻值，该电阻值根据电信号在至少两个电阻状态之间可逆地改变;布置在字和位线的交叉点上; 偏移检测单元阵列，包括在高电阻状态下具有高于存储单元的电阻的偏移检测单元，所述字线由偏移检测单元阵列共享; 读取电路（读出放大器），其基于通过所选位线的电流确定所选存储单元的电阻状态; 以及在读取操作时段中向偏移检测单元阵列提供电流的电流源。

12. 发明授权

US08325508B2 Writing method for variable resistance nonvolatile memory element, and variable resistance nonvolatile memory device 有权
标题翻译：可变电阻非易失性存储元件和可变电阻非易失性存储器件的写入方法
公开(公告)号：US08325508B2
公开(公告)日：2012-12-04
申请号：US13001905
申请日：2010-06-08
申请人： Ken Kawai , Kazuhiko Shimakawa , Shunsaku Muraoka , Ryotaro Azuma
发明人： Ken Kawai , Kazuhiko Shimakawa , Shunsaku Muraoka , Ryotaro Azuma
IPC分类号： G11C11/00
CPC分类号： G11C11/5685 , G11C13/0007 , G11C13/0038 , G11C13/0064 , G11C13/0069 , G11C2013/0071 , G11C2013/0073 , G11C2013/0083 , G11C2213/56 , G11C2213/79
摘要： A writing method optimum for a variable resistance element which can maximize an operation window of the variable resistance element is provided. The writing method is performed for a variable resistance element that reversibly changes between a high resistance state and a low resistance state depending on a polarity of an applied voltage pulse. The writing method includes a preparation step (S50) and a writing step (S51, S51a, S51b). At the preparation step (S50), resistance values of the variable resistance element are measured by applying voltage pulses of voltages that are gradually increased to the variable resistance element, thereby determining the first voltage V1 for starting high resistance writing and the second voltage V2 having a maximum resistance value. At the HR writing step (S51a), a voltage pulse having a voltage Vp that is equal to or higher than the first voltage V1 and equal to or lower than the second voltage V2 is applied to the variable resistance element, thereby changing the variable resistance element from the low resistance state (S52) to the high resistance state (S53).
摘要翻译：提供了一种最佳可变电阻元件的写入方法，其可以使可变电阻元件的操作窗口最大化。对于根据施加的电压脉冲的极性在高电阻状态和低电阻状态之间可逆地变化的可变电阻元件执行写入方法。写入方法包括准备步骤（S50）和写入步骤（S51，S51a，S51b）。在准备步骤（S50）中，通过向可变电阻元件施加逐渐增加的电压的电压脉冲来测量可变电阻元件的电阻值，从而确定用于开始高电阻写入的第一电压V1和具有最大电阻值。在HR写入步骤（S51a）中，将具有等于或高于第一电压V1并且等于或低于第二电压V2的电压Vp的电压脉冲施加到可变电阻元件，从而改变可变电阻元件从低电阻状态（S52）到高电阻状态（S53）。

13. 发明授权

US08982603B2 Cross point variable resistance nonvolatile memory device and method of reading thereby 有权
标题翻译：交叉点可变电阻非易失性存储器件及其读取方法
公开(公告)号：US08982603B2
公开(公告)日：2015-03-17
申请号：US13636169
申请日：2012-04-27
申请人： Ryotaro Azuma , Kazuhiko Shimakawa , Yoshikazu Katoh
发明人： Ryotaro Azuma , Kazuhiko Shimakawa , Yoshikazu Katoh
IPC分类号： G11C11/00 , G11C11/21 , G11C13/00
CPC分类号： G11C11/21 , G11C8/08 , G11C13/00 , G11C13/0007 , G11C13/0023 , G11C13/0028 , G11C13/004 , G11C2213/15 , G11C2213/71
摘要： A cross point variable resistance nonvolatile memory device including: a cross point memory cell array having memory cells each of which is placed at a different one of cross points of bit lines and word lines; a word line decoder circuit that selects at least one of the memory cells from the memory cell array; a read circuit that reads data from the selected memory cell; an unselected word line current source that supplies a first constant current; and a control circuit that controls the reading of the data from the selected memory cell, wherein the control circuit controls the word line decoder circuit, the read circuit, and the unselected word line current source so that when the read circuit reads data, the first constant current is supplied to an unselected word line.
摘要翻译：一种交叉点可变电阻非易失性存储器件，包括：具有存储单元的交叉点存储单元阵列，每个存储单元位于位线和字线的交叉点的不同位置; 字线解码器电路，从存储单元阵列中选择至少一个存储单元; 从所选择的存储单元读取数据的读取电路; 提供第一恒定电流的未选字线电流源; 以及控制电路，其控制来自所选择的存储单元的数据的读取，其中所述控制电路控制所述字线解码器电路，所述读取电路和所述未选字线电流源，使得当所述读取电路读取数据时，所述第一恒定电流被提供给未选择的字线。

14. 发明授权

US08942050B2 Method of inspecting variable resistance nonvolatile memory device and variable resistance nonvolatile memory device 有权
标题翻译：检查可变电阻非易失性存储器件和可变电阻非易失性存储器件的方法
公开(公告)号：US08942050B2
公开(公告)日：2015-01-27
申请号：US13637428
申请日：2011-09-07
申请人： Hiroshi Tomotani , Kazuhiko Shimakawa , Ryotaro Azuma , Yoshikazu Katoh , Yuichiro Ikeda
发明人： Hiroshi Tomotani , Kazuhiko Shimakawa , Ryotaro Azuma , Yoshikazu Katoh , Yuichiro Ikeda
IPC分类号： G11C7/06 , G11C13/00 , G11C29/50
CPC分类号： G11C13/0007 , G11C13/00 , G11C13/003 , G11C29/50008 , G11C2213/15
摘要： A method of inspecting a variable resistance nonvolatile memory device detecting a faulty memory cell of a memory cell array employing a current steering element, and a variable resistance nonvolatile memory device are provided. The method of inspecting a variable resistance nonvolatile memory device having a memory cell array, a memory cell selection circuit, and a read circuit includes: determining that a current steering element has a short-circuit fault when a variable resistance element is in a low resistance state and a current higher than or equal to a predetermined current passes through the current steering element, when the resistance state of the memory cell is read using a second voltage; and determining whether the variable resistance element is in the low or high resistance state, when the resistance state of the memory cell is read using a first voltage.
摘要翻译：提供了检测使用电流导向元件的存储单元阵列的故障存储单元的可变电阻非易失性存储器件和可变电阻非易失性存储器件的方法。检查具有存储单元阵列的可变电阻非易失性存储器件，存储单元选择电路和读取电路的方法包括：当可变电阻元件处于低电阻时，确定当前的导向元件具有短路故障当使用第二电压读取存储单元的电阻状态时，高于或等于预定电流的电流通过电流导向元件; 以及当使用第一电压读取存储单元的电阻状态时，确定可变电阻元件是处于低电阻还是高电阻状态。

15. 发明申请

US20130223133A1 CROSS POINT VARIABLE RESISTANCE NONVOLATILE MEMORY DEVICE AND METHOD OF WRITING THEREBY 有权
标题翻译：交叉点可变电阻非易失性存储器件及其写入方法
公开(公告)号：US20130223133A1
公开(公告)日：2013-08-29
申请号：US13883785
申请日：2012-09-06
申请人： Ryotaro Azuma , Kazuhiko Shimakawa , Yoshikazu Katoh
发明人： Ryotaro Azuma , Kazuhiko Shimakawa , Yoshikazu Katoh
IPC分类号： G11C13/00
CPC分类号： G11C13/0069 , G11C11/5685 , G11C13/0007 , G11C13/0023 , G11C2013/0073 , G11C2013/0088
摘要： A cross point variable nonvolatile memory device includes a memory cell array including: first memory cells (e.g., part of a memory cell array) having a common word line; and second memory cells (e.g., another part of the memory cell array or a compensation cell unit). When a predetermined memory cell among the first memory cells is written to by changing the predetermined memory cell to a first resistance state, a word line write circuit supplies a first voltage or a first current to a selected word line, a first bit line write circuit supplies a third voltage or a third current to one bit line of the first memory cells, and a second bit line write circuit supplies the third voltage or the third current to A bit line or lines of the second memory cells.
摘要翻译：交叉点可变非易失性存储器件包括存储单元阵列，其包括：具有公共字线的第一存储器单元（例如，存储单元阵列的一部分）; 和第二存储单元（例如，存储单元阵列的另一部分或补偿单元单元）。当通过将预定存储单元改变为第一电阻状态来将第一存储单元中的预定存储单元写入时，字线写入电路向所选字线提供第一电压或第一电流，第一位线写入电路向第一存储器单元的一个位线提供第三电压或第三电流，并且第二位线写入电路将第三电压或第三电流提供给第二存储器单元的A位线或第二行。

16. 发明授权

US08467228B2 Variable resistance nonvolatile memory device 有权
标题翻译：可变电阻非易失性存储器件
公开(公告)号：US08467228B2
公开(公告)日：2013-06-18
申请号：US13496895
申请日：2011-08-10
申请人： Yuichiro Ikeda , Kazuhiko Shimakawa , Ryotaro Azuma
发明人： Yuichiro Ikeda , Kazuhiko Shimakawa , Ryotaro Azuma
IPC分类号： G11C11/00
CPC分类号： H01L27/101 , G11C13/004 , G11C2213/71 , G11C2213/72 , H01L27/0688 , H01L27/2409 , H01L27/2481 , H01L45/08 , H01L45/1233 , H01L45/146
摘要： Each of basic array planes has a first via group that interconnects only even-layer bit lines in the basic array plane, and a second via group that interconnects only odd-layer bit lines in the basic array plane, the first via group in a first basic array plane and the second via group in a second basic array plane adjacent to the first basic array in a Y direction are adjacent to each other in the Y direction, and the second via group in the first basic array plane and the first via group in the second basic array plane are adjacent to each other in the Y direction, and the second via group in the second basic array plane is disconnected from a second global line when connecting the first via group in the first basic array plane to a first global line.
摘要翻译：每个基本阵列平面具有仅在基本阵列平面中互连偶数位线的第一通孔组和仅在基本阵列平面中互连奇数位线的第二通孔组，第一通孔组在第一通孔组在Y方向上与第一基本阵列相邻的第二基本阵列平面中的基本阵列平面和第二通孔组在Y方向上彼此相邻，并且第一基本阵列平面中的第二通孔组和第一通孔组在第二基本阵列平面中在Y方向上彼此相邻，并且当将第一基本阵列平面中的第一通孔组连接到第一全局线阵列时，第二基本阵列平面中的第二通孔组与第二全局线断开连接线。

17. 发明授权

US08441839B2 Cross point variable resistance nonvolatile memory device 有权
标题翻译：交叉点可变电阻非易失性存储器件
公开(公告)号：US08441839B2
公开(公告)日：2013-05-14
申请号：US13380624
申请日：2011-06-02
申请人： Ryotaro Azuma , Kazuhiko Shimakawa
发明人： Ryotaro Azuma , Kazuhiko Shimakawa
IPC分类号： G11C11/00
CPC分类号： H01L27/101 , G11C13/0007 , G11C13/0023 , G11C13/003 , G11C13/0069 , G11C2013/0073 , G11C2213/71 , G11C2213/76 , H01L27/0688 , H01L27/2418 , H01L27/2481 , H01L45/08 , H01L45/1233 , H01L45/146
摘要： A cross point variable resistance nonvolatile memory device includes memory cells having the same orientation for stable characteristics of all layers. Each memory cell (51) is placed at a different one of cross points of bit lines (53) in an X direction and word lines (52) in a Y direction formed in layers. In a multilayer cross point structure where vertical array planes sharing the word lines are aligned in the Y direction each for a group of bit lines aligned in a Z direction, even and odd layer bit line selection switch elements (57, 58) switch electrical connection and disconnection between a global bit line (56) and commonly-connected even layer bit lines and commonly-connected odd layer bit lines, respectively. A bidirectional current limiting circuit (92) having parallel-connected P-type current limiting element (91) and N-type current limiting element (90) is provided between the global bit line and the switch elements.
摘要翻译：交叉点可变电阻非易失性存储器件包括具有相同取向的存储单元，用于所有层的稳定特性。每个存储单元（51）被放置在X方向上的位线（53）的交叉点的不同的一个和Y层方向上形成的字线（52）。在多路交叉点结构中，共享字线的垂直阵列平面在Y方向上对齐，对于在Z方向上排列的一组位线，偶数和奇数位位线选择开关元件（57,58）切换电连接以及全局位线（56）和共同连接的偶数层位线和共同连接的奇数位位线之间的断开。在全局位线和开关元件之间提供具有并联P型限流元件（91）和N型限流元件（90）的双向限流电路（92）。

18. 发明授权

US08441837B2 Variable resistance nonvolatile memory device 有权
标题翻译：可变电阻非易失性存储器件
公开(公告)号：US08441837B2
公开(公告)日：2013-05-14
申请号：US13054312
申请日：2010-04-14
申请人： Yuuichirou Ikeda , Kazuhiko Shimakawa , Yoshihiko Kanzawa , Shunsaku Muraoka , Ryotaro Azuma
发明人： Yuuichirou Ikeda , Kazuhiko Shimakawa , Yoshihiko Kanzawa , Shunsaku Muraoka , Ryotaro Azuma
IPC分类号： G11C11/00
CPC分类号： G11C13/0007 , G11C13/0069 , G11C2013/0073 , G11C2213/12 , G11C2213/15 , G11C2213/34 , G11C2213/72 , H01L27/24
摘要： A nonvolatile resistance variable memory device (100) includes memory cells (M11, M12, . . . ) in each of which a variable resistance element (R11, R12, . . . ) including a variable resistance layer placed between and in contact with a first electrode and a second electrode, and a current steering element (D11, D12, . . . ) including a current steering layer placed between and in contact with a third electrode and a fourth electrode, are connected in series, and the device is driven by a first LR drive circuit (105a1) via a current limit circuit (105b) to decrease resistance of the variable resistance element while the device is driven by a second HR drive circuit (105a2) to increase resistance of the variable resistance element, thus using the current limit circuit (105b) to make a current for decreasing resistance of the variable resistance element lower than a current for increasing resistance of the variable resistance element.
摘要翻译：一种非易失性电阻可变存储器件（100）包括存储单元（M11，M12 ...），每个存储单元包括可变电阻元件（R11，R12 ...），该可变电阻元件（R11，R12 ...）第一电极和第二电极，以及包括放置在第三电极和第四电极之间并与第三电极和第四电极接触的电流导向层的电流导向元件（D11，D12 ...）串联连接，并且驱动该装置通过第一LR驱动电路（105a1）经由限流电路（105b），以在器件被第二HR驱动电路（105a2）驱动时降低可变电阻元件的电阻，以增加可变电阻元件的电阻，从而使用电流限制电路（105b），用于使可变电阻元件的电阻降低的电流低于用于增加可变电阻元件的电阻的电流。

19. 发明授权

US08384061B2 Nonvolatile memory device and manufacturing method 有权
标题翻译：非易失存储器件及其制造方法
公开(公告)号：US08384061B2
公开(公告)日：2013-02-26
申请号：US12745190
申请日：2008-11-06
申请人： Takumi Mikawa , Kenji Tominaga , Kazuhiko Shimakawa , Ryotaro Azuma
发明人： Takumi Mikawa , Kenji Tominaga , Kazuhiko Shimakawa , Ryotaro Azuma
IPC分类号： H01L27/26 , H01L29/8605 , H01L21/02
CPC分类号： H01L27/2409 , G11C13/0002 , G11C2213/71 , G11C2213/72 , H01L27/101 , H01L27/2481 , H01L45/04 , H01L45/1233 , H01L45/146 , H01L45/1683
摘要： A nonvolatile memory device of the present invention includes a substrate (1), first wires (3), first resistance variable elements (5) and lower electrodes (6) of first diode elements which are filled in first through-holes (4), respectively, second wires (11) which cross the first wires 3 perpendicularly to the first wires 3, respectively, and each of which includes a semiconductor layer (7) of a first diode elements, a conductive layer (8) and a semiconductor layer (10) of a second diode elements which are stacked together in this order, second resistance variable elements (16) and upper electrodes (14) of second diode elements which are filled into second through holes (13), respectively, and third wires (17), and the conductive layer (8) of each second wires (11) also serves as the upper electrode of the first diode elements (9) and the lower electrode of the second diode elements (15).
摘要翻译：本发明的非易失性存储器件包括填充在第一通孔（4）中的基片（1），第一布线（3），第一电阻可变元件（5）和第一二极管元件的下电极（6）分别与第一布线3分别垂直于第一布线3交叉的第二布线（11），每条布线包括第一二极管元件的半导体层（7），导电层（8）和半导体层（ 10）分别被填充到第二通孔（13）中的第二电阻可变元件（16）和第二二极管元件的上电极（14）以及第三电线（17）），并且每个第二布线（11）的导电层（8）也用作第一二极管元件（9）的上电极和第二二极管元件（15）的下电极。

20. 发明申请

US20120120712A1 FORMING METHOD FOR VARIABLE RESISTANCE NONVOLATILE MEMORY ELEMENT, AND VARIABLE RESISTANCE NONVOLATILE MEMORY DEVICE 有权
标题翻译：可变电阻非易失性存储器元件的形成方法和可变电阻非易失性存储器件
公开(公告)号：US20120120712A1
公开(公告)日：2012-05-17
申请号：US13001943
申请日：2010-06-04
申请人： Ken Kawai , Kazuhiko Shimakawa , Shunsaku Muraoka , Ryotaro Azuma
发明人： Ken Kawai , Kazuhiko Shimakawa , Shunsaku Muraoka , Ryotaro Azuma
IPC分类号： G11C11/00 , H01L21/8239
CPC分类号： G11C13/0069 , G11C13/0007 , G11C13/0064 , G11C2013/0083 , G11C2213/32 , G11C2213/34 , G11C2213/79 , H01L27/101 , H01L27/2436 , H01L45/08 , H01L45/1233 , H01L45/146
摘要： An optimum forming method of performing a forming for a variable resistance element to maximize an operation window of the variable resistance element is provided. The forming method is used to initialize a variable resistance element (100). The forming method includes: a determination step (S35) of determining whether or not a current resistance value of the variable resistance element (100) is lower than a resistance value in a high resistance state; and a voltage application step (S36) of applying a voltage pulse having a voltage not exceeding a sum of a forming voltage and a forming margin when the determination is made that the current resistance value is not lower than the resistance value in the high resistance state (No at S35). The determination step (S35) and the voltage application step (S36) are repeated to process all memory cells in a memory array (202) (S34 to S37).
摘要翻译：提供了一种用于对可变电阻元件进行成形以最大化可变电阻元件的操作窗口的最佳形成方法。成形方法用于初始化可变电阻元件（100）。形成方法包括：确定可变电阻元件（100）的当前电阻值是否低于高电阻状态下的电阻值的确定步骤（S35）以及当确定当前电阻值不低于高电阻状态下的电阻值时，施加具有不超过形成电压和形成余量之和的电压的电压脉冲的电压施加步骤（S36）（S35否）。重复确定步骤（S35）和电压施加步骤（S36）以处理存储器阵列（202）中的所有存储器单元（S34至S37）。

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