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    • 14. 发明授权
    • Wafer inspecting apparatus
    • 晶圆检查仪
    • US06191849B1
    • 2001-02-20
    • US09219873
    • 1998-12-24
    • Muneo MaeshimaKazuo TakedaShigeru Matsui
    • Muneo MaeshimaKazuo TakedaShigeru Matsui
    • G01N2147
    • G01N21/9501G01N21/9505
    • Disclosed is a wafer inspecting apparatus suitable to determine whether a scattering substance is a surface foreign matter or an internal defect even if the particle size of the scattering substance is smaller than the wavelength of irradiation rays used for inspection. The wafer is obliquely irradiated with irradiation rays at the Brewster angle, and scattered rays which are scattered from a scattering substance on or in the wafer are detected at and angle 0° and an angle of the Brewster angle or more by detectors. Then, it is determined whether the scattering substance is a surface foreign matter or an internal defect on the basis of a ratio between the intensities of the scattered rays detected by the detectors. The intensity of scattered rays which are scattered from a surface foreign matter and detected at an angle of the Brewster angle or more is larger than the intensity of scattered rays which are scattered from the foreign matter and detected at an angle 0°, and the intensity of scattered rays which are scattered from an internal defect and detected at an angle of the Brewster angle or more is smaller than the intensity of scattered rays which are scattered from the internal defect and detected at an angle 0°. This makes it possible to distinguish the surface foreign matter and the internal defect from each other.
    • 公开了一种适用于确定散射物质是表面异物还是内部缺陷的晶片检查装置,即使散射物质的粒径小于用于检查的照射射线的波长。 以布鲁斯特角度的照射光线倾斜照射晶片,从晶片上或晶片上的散射物质散射的散射光线以0°的角度和布鲁斯特角度以上的角度检测。 然后,基于由检测器检测到的散射光线的强度之间的比例来确定散射物质是表面异物还是内部缺陷。 从表面异物散射并以布鲁斯特角度以上的角度检测的散射光的强度大于从异物散射并以0°的角度检测的散射光的强度,强度 从内部缺陷散射并以布鲁斯特角度以上的角度检测的散射光的散射光小于从内部缺陷散射并以0°的角度检测的散射光的强度。 这使得可以将表面异物和内部缺陷彼此区分开。