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11. 发明授权

US4731319A Positive-working naphthoquinone diazide photoresist composition with two cresol novolac resins 失效
标题翻译：具有两种甲酚酚醛清漆树脂的正性萘醌二叠氮化合物光致抗蚀剂组合物
公开(公告)号：US4731319A
公开(公告)日：1988-03-15
申请号：US886839
申请日：1986-07-18
申请人： Hidekatsu Kohara , Hatsuyuki Tanaka , Masanori Miyabe , Yoshiaki Arai , Shingo Asaumi , Toshimasa Nakayama
发明人： Hidekatsu Kohara , Hatsuyuki Tanaka , Masanori Miyabe , Yoshiaki Arai , Shingo Asaumi , Toshimasa Nakayama
IPC分类号： G03C1/72 , G03F7/022 , G03F7/023 , H01L21/027 , G03C1/54 , G03C1/60
CPC分类号： G03F7/0236
摘要： A positive-working photoresist composition suitable for fine patterning in the manufacture of semiconductor devices, e.g. VLSIs, with high fidelity is proposed. The composition comprises a cresol novolac resin and a naphthoquinone diazide sulfonic acid ester as the photosensitive component while the cresol novolac resin component is characteristically a combination of two different cresol novolac resins differentiated in respects of the weight-average molecular weight, one large and the other small, and the weight proportion of the m- and p-isomers of cresol, one rich in the m-isomer and the other rich in the p-isomer, used in the preparation of the novolac and the overall weight ratio of the m-cresol and p-cresol moieties in the thus combined cresol novolac resins also should be in a specified range.
摘要翻译：适用于制造半导体器件的精细图案化的正性光致抗蚀剂组合物，例如，提出了高保真的VLSI。该组合物包含甲酚酚醛清漆树脂和萘醌二叠氮化物磺酸酯作为感光组分，而甲酚酚醛清漆树脂组分特征是两种不同甲酚酚醛清漆树脂的组合，其重均分子量分别为大，一小的，并且用于制备酚醛清漆的甲酚和m-异构体的m-和p-异构体的重量比例，其中一个富含m-异构体和另一个富含p-异构体的重量比例，这样组合的甲酚酚醛清漆树脂中的甲酚和对甲酚部分也应在特定的范围内。

12. 发明授权

US5520952A Method for forming a protective coating film on electronic parts and devices 失效
标题翻译：在电子零件和装置上形成保护涂膜的方法
公开(公告)号：US5520952A
公开(公告)日：1996-05-28
申请号：US274021
申请日：1994-07-12
申请人： Katsuya Tanitsu , Atsushi Kawakami , Hatsuyuki Tanaka , Toshimasa Nakayama
发明人： Katsuya Tanitsu , Atsushi Kawakami , Hatsuyuki Tanaka , Toshimasa Nakayama
IPC分类号： B05D5/00 , C03C17/00 , C03C17/30 , C09D183/02 , C09D183/06 , G02F1/1333 , B05D3/02
CPC分类号： G02F1/133345 , B05D5/00 , C03C17/009 , C03C17/30 , C09D183/02 , C09D183/06 , Y10T428/1045
摘要： Proposed is a novel method for the formation of a protective coating film having a pencil hardness of up to 9 H on the surface of various substrates or, in particular, electronic parts such as color filters and liquid crystal display panels. The method comprises: coating the surface with a liquid coating composition of which the principal ingredient is a partial cohydrolysis-condensation product of a tetraalkoxy silane, e.g., tetraethoxy silane, and a functional alkoxy silane, e.g., 3-methacryloxypropyl trimethoxy silane, and drying and heating the coating layer to effect complete curing. The hardness of the cured protective film can be increased by admixing the liquid coating composition with a finely divided inorganic filler such as a colloidal silica. It is optional that the functional alkoxy silane is subjected to the cohydrolysis reaction after it is polymerized alone or after it is copolymerized with a polyfunctional acrylic monomer.
摘要翻译：提出了在各种基板的表面上形成铅笔硬度高达9H的保护涂膜的新颖方法，特别是电子部件如滤色器和液晶显示面板。该方法包括：用液体涂料组合物涂覆表面，其中主要成分是四烷氧基硅烷（例如四乙氧基硅烷）和官能的烷氧基硅烷（例如3-甲基丙烯酰氧基丙基三甲氧基硅烷）的部分共水解缩合产物和干燥并加热涂层以完成固化。固化保护膜的硬度可以通过将液体涂料组合物与细碎的无机填料如胶体二氧化硅混合来提高。功能性烷氧基硅烷在单独聚合或与多官能丙烯酸单体共聚后，可进行共水解反应是可选的。

13. 发明授权

US5496402A Method and liquid coating composition for the formation of silica-based coating film on substrate surface 失效
标题翻译：用于在基材表面形成二氧化硅基涂膜的方法和液体涂料组合物
公开(公告)号：US5496402A
公开(公告)日：1996-03-05
申请号：US307063
申请日：1994-09-16
申请人： Yoshinori Sakamoto , Yoshio Hagiwara , Hatsuyuki Tanaka , Toshimasa Nakayama
发明人： Yoshinori Sakamoto , Yoshio Hagiwara , Hatsuyuki Tanaka , Toshimasa Nakayama
IPC分类号： C08G77/18 , C03C1/00 , C08G77/06 , C09D183/02 , C09D183/04 , C09D183/05 , C09D183/06 , C03C3/06
CPC分类号： C03C1/008 , C09D183/02 , C09D183/04
摘要： Proposed is a liquid coating composition for the formation of a siliceous coating film having good storage stability against gelation for the protection, levelling or electric insulation of various substrate surfaces. The composition is a uniform solution comprising:(A) a partial cohydrolysis-cocondensation product of(a) a first hydrolyzable silane compound represented by the general formulaHSi(OR).sub.3, in which each R is, independently from the others, an alkyl group having 1 to 4 carbon atoms or a phenyl group, and(b) a second hydrolyzable silane compound represented by the general formulaSi(OR).sub.4, in which each R has the same meaning as defined above, in a molar ratio of (a):(b) in the range from 1:9 to 9:1; and (B) an organic solvent to dissolve the component (A). The storage stability of the coating composition can be improved by removing the alcohol contained therein as the hydrolysis product of the silane compounds to such a content as not to exceed 15% by weight.
摘要翻译：提出了一种液体涂料组合物，用于形成具有良好保存稳定性的硅质涂膜，用于各种基材表面的保护，调平或电绝缘。该组合物是均匀的溶液，其包含：（A）（a）由通式HSi（OR）3表示的第一可水解硅烷化合物的部分共水解 - 缩聚产物，其中每个R独立地为烷基具有1至4个碳原子的基团或苯基，和（b）由通式Si（OR）4表示的第二可水解硅烷化合物，其中每个R具有与上述相同的含义，摩尔比为 a）:( b）在1:9至9:1的范围内; 和（B）有机溶剂以溶解组分（A）。通过将其中含有的醇作为硅烷化合物的水解产物除去不超过15重量％的含量，可以提高涂料组合物的保存稳定性。

14. 发明授权

US5457153A Liquid coating composition 失效
标题翻译：液体涂料组合物
公开(公告)号：US5457153A
公开(公告)日：1995-10-10
申请号：US289032
申请日：1994-08-11
申请人： Yoshio Hagiwara , Isao Satoh , Hatsuyuki Tanaka , Toshimasa Nakayama
发明人： Yoshio Hagiwara , Isao Satoh , Hatsuyuki Tanaka , Toshimasa Nakayama
IPC分类号： G02B5/20 , C08K5/20 , C08K5/435 , G03F7/004 , G03F7/11 , H01L21/027 , H05K3/28 , C08K5/02 , C08L27/14
CPC分类号： C08K5/20 , C08K5/435
摘要： Proposed is an aqueous coating composition based on a polyvinyl alcohol suitable for use to provide a protective film on various electronic materials. The composition comprises, as dissolved in water, a partially saponified polyvinyl alcohol having a specified average degree of polymerization and a specified degree of saponification, a fluorine-containing surface active agent and, optionally, a quaternary ammonium hydroxide. The liquid coating composition is preferably freed from sodium ions as an impurity by an ion-exchange treatment.
摘要翻译：提出了一种基于适用于在各种电子材料上提供保护膜的聚乙烯醇的水性涂料组合物。该组合物包含溶解在水中的具有指定平均聚合度和特定皂化度的部分皂化的聚乙烯醇，含氟表面活性剂和任选的季铵氢氧化物。液体涂料组合物优选通过离子交换处理除去作为杂质的钠离子。

15. 发明授权

US4873177A Method for forming a resist pattern on a substrate surface and a scum-remover therefor 失效
标题翻译：在基板表面上形成抗蚀剂图案的方法和用于其的浮渣除去器
公开(公告)号：US4873177A
公开(公告)日：1989-10-10
申请号：US229762
申请日：1988-08-05
申请人： Hatsuyuki Tanaka , Yoshiyuki Sato , Hidekatsu Kohara , Toshimasa Nakayama
发明人： Hatsuyuki Tanaka , Yoshiyuki Sato , Hidekatsu Kohara , Toshimasa Nakayama
IPC分类号： G03F7/32
CPC分类号： G03F7/322
摘要： The pattern-wise photoresist layer formed on the surface of a substrate according to the inventive method is imparted with a greatly improved resolving power as a result of complete removal of the scum residua left after the development treatment. Namely, the positive-working photoresist layer formed on the substrate surface is exposed pattern-wise to actinic rays, developed with a developer solution which is typically a 2-7% aqueous solution of a quaternary ammonium hydroxide and then rinsed with a scum-remover solution which is a mixture of 100 parts of a 0.1-1.5% aqueous solution of a quaternary ammonium hydroxide and 1-30 parts of a water-miscible organic solvent and capable of dissolving away the scum residua in the pattern-wise photoresist layer without affecting the quality of the photoresist pattern reproduction.
摘要翻译：根据本发明方法形成在基材表面上的图案光致抗蚀剂层由于在显影处理后完全除去剩余的浮渣残留物而赋予极大改进的分辨能力。也就是说，形成在基板表面上的正性光致抗蚀剂层以图案方式暴露于光化学射线，用显影剂溶液显影，显影剂溶液通常为2-7％氢氧化季铵水溶液，然后用浮渣除去剂溶液，其为100份0.1-1.5％的季铵氢氧化物水溶液和1-30份水混溶性有机溶剂的混合物，并且能够将浮渣残留物溶解在图案化光致抗蚀剂层中而不影响光刻胶图案再现的质量。

16. 发明授权

US5614251A Method and liquid coating composition for the formation of silica-based coating film on substrate surface 失效
标题翻译：用于在基材表面形成二氧化硅基涂膜的方法和液体涂料组合物
公开(公告)号：US5614251A
公开(公告)日：1997-03-25
申请号：US564710
申请日：1995-11-29
申请人： Yoshinori Sakamoto , Yoshio Hagiwara , Hatsuyuki Tanaka , Toshimasa Nakayama
发明人： Yoshinori Sakamoto , Yoshio Hagiwara , Hatsuyuki Tanaka , Toshimasa Nakayama
IPC分类号： C08G77/18 , C03C1/00 , C08G77/06 , C09D183/02 , C09D183/04 , C09D183/05 , B05D3/02
CPC分类号： C03C1/008 , C09D183/02 , C09D183/04
摘要： Proposed is a liquid coating composition for the formation of a siliceous coating film having good storage stability against gelation for the protection, levelling or electric insulation of various substrate surfaces. The composition is a uniform solution comprising:(A) a partial cohydrolysis-cocondensation product of(a) a first hydrolyzable silane compound represented by the general formulaHSi(OR).sub.3, in which each R is, independently from the others, an alkyl group having 1 to 4 carbon atoms or a phenyl group, and(b) a second hydrolyzable silane compound represented by the general formulaSi(OR).sub.4, in which each R has the same meaning as defined above,in a molar ratio of (a):(b) in the range from 1:9 to 9:1; and (B) an organic solvent to dissolve the component (A). The storage stability of the coating composition can be improved by removing the alcohol contained therein as the hydrolysis product of the silane compounds to such a content as not to exceed 15% by weight.
摘要翻译：提出了一种液体涂料组合物，用于形成具有良好保存稳定性的硅质涂膜，用于各种基材表面的保护，调平或电绝缘。该组合物是一种均匀溶液，其包含：（A）（a）由通式为H（OR）3表示的第一可水解硅烷化合物的部分共水解 - 缩聚产物，其中每个R独立地为烷基具有1至4个碳原子或苯基，和（b）由通式Si（OR）4表示的第二可水解硅烷化合物，其中每个R具有与上述相同的含义，摩尔比为（a）：（b）在1：9至9：1的范围内; 和（B）有机溶剂以溶解组分（A）。通过将其中含有的醇作为硅烷化合物的水解产物除去不超过15重量％的含量，可以提高涂料组合物的保存稳定性。

17. 发明授权

US5281508A Positive-working photoresist containing o-naphthoquinone diazide sulfonic acid ester and novolak resin consisting of 35 to 43% m-cresol and 65 to 57% p-cresol with substantial absence of o-cresol 失效
标题翻译：含有邻苯二酚二叠氮磺酸酯和酚醛清漆树脂的正性光致抗蚀剂由35至43％的间甲酚和65至57％的对甲酚组成，基本上不存在邻甲酚
公开(公告)号：US5281508A
公开(公告)日：1994-01-25
申请号：US935131
申请日：1992-08-21
申请人： Hidekatsu Kohara , Hatsuyuki Tanaka , Masanori Miyabe , Yoshiaki Arai , Shingo Asaumi , Toshimasa Nakayama , Akira Yokota , Hisashi Nakane
发明人： Hidekatsu Kohara , Hatsuyuki Tanaka , Masanori Miyabe , Yoshiaki Arai , Shingo Asaumi , Toshimasa Nakayama , Akira Yokota , Hisashi Nakane
IPC分类号： C08G8/08 , C08K5/42 , G03F7/032 , G03F7/023
CPC分类号： G03F7/032 , C08G8/08 , C08K5/42
摘要： A positive-working photoresist composition suitable for fine patterning in the manufacture of semiconductor devices, e.g., VLSIs, with high fidelity is proposed. The composition comprises 100 parts by weight of a cresol novolac resin and 25-60 parts by weight of a naphthoquinone diazide sulfonic acid ester as the photosensitive component while the cresol novolac resin component is prepared from a mixture of cresol isomers composed of 35-43% of m-cresol and 65-57% of p-cresol with substantial absence of o-cresol or composed of 35-43% of m-cresol, 65-57% of p-cresol and 1% or less of o-cresol.
摘要翻译：提出了适用于制造高保真度的半导体器件（例如VLSI）中的精细图案化的正性光致抗蚀剂组合物。该组合物包含100重量份的甲酚酚醛清漆树脂和25-60重量份的萘醌二叠氮化物磺酸酯作为感光组分，而甲酚酚醛清漆树脂组分由由35-43％的间甲酚和65-57％的对甲酚，基本上没有邻甲酚或由35-43％的间甲酚，65-57％的对甲酚和1％或更少的邻甲酚组成。

18. 发明授权

US5100758A Positive-working photoresist composition containing quinone diazide compound, novolak resin and alkyl pyruvate solvent 失效
标题翻译：含有醌二叠氮化合物，酚醛清漆树脂和丙酮酸烷基酯溶剂的正性光致抗蚀剂组合物
公开(公告)号：US5100758A
公开(公告)日：1992-03-31
申请号：US623014
申请日：1990-12-06
申请人： Hatsuyuki Tanaka , Hidekatsu Kohara , Toshimasa Nakayama
发明人： Hatsuyuki Tanaka , Hidekatsu Kohara , Toshimasa Nakayama
IPC分类号： G03F7/022 , G03F7/004 , H01L21/027 , H01L21/30
CPC分类号： G03F7/0048
摘要： A proposal is made for the use of an alkyl pyruvate or a solvent mixture mainly composed thereof as a solvent in a positive-working photoresist composition comprising an alkali-soluble novolac resin as the film-forming ingredient and a quinone diazide group-containing compound as the photosensitive ingredient. By virtue of the use of the unique solvent, the photoresist composition is advantageous in the outstandingly high stability with little moisture absorption from ambience not to cause precipitation of solid matters in addition to the quite satisfactory properties in other respects as a photoresist composition.
摘要翻译：提出在主要由它们构成的作为溶剂的烷基丙酮酸盐或其溶剂混合物中使用含有碱溶性酚醛清漆树脂作为成膜成分的正性光致抗蚀剂组合物和含醌二叠氮基化合物作为感光成分。由于使用独特的溶剂，光致抗蚀剂组合物除了在其它方面作为光致抗蚀剂组合物的相当令人满意的性能外，还具有突出的高稳定性，而且从环境几乎没有吸湿性而不会引起固体物质沉淀。

19. 发明授权

US4906549A Positive-working photoresist composition with quinone diazide sulfonic acid ester and novolac made from m-cresol, p-cresol and aliphatic phenol with 2-6 carbon atoms 失效
标题翻译：醌二叠层磺酸酯和由具有2-6个碳原子的间甲酚，对甲酚和脂族苯酚制成的酚醛清漆的正性光致抗蚀剂组合物
公开(公告)号：US4906549A
公开(公告)日：1990-03-06
申请号：US182848
申请日：1988-04-18
申请人： Shingo Asaumi , Hidekatsu Kohara , Hatsuyuki Tanaka , Masanori Miyabe , Toshimasa Nakayama
发明人： Shingo Asaumi , Hidekatsu Kohara , Hatsuyuki Tanaka , Masanori Miyabe , Toshimasa Nakayama
IPC分类号： G03C1/72 , C08G8/12 , C08G8/24 , C08K5/43 , C08L61/08 , G03F7/023 , G03F7/025 , G03F7/22 , H01L21/027
CPC分类号： G03F7/0236 , C08G8/12 , C08G8/24 , C08K5/43
摘要： A positive-working photoresist composition suitable for fine patterning in the manufacturing of semiconductor devices such as VLSIs with high fidelity is proposed. The composition comprises: (A) 100 parts by weight of a phenolic novolac resin prepared by the condensation reaction of a specific ternary mixture of three kinds of phenolic compounds and formaldehyde; and (B) 20-60 parts by weight of a photosensitizer which is preferably an ester of naphthoquinone diazidesulfonic acid and a hydroxylated benzophenone compound. The phenolic mixture is composed of 10-45% by weight of m-cresol, 35-88% by weight of p-cresol and 2-30% by weight of a substituted phenol represented by the general formula R.C.sub.6 H.sub.4.OH, in which R is a monovalent aliphatic hydrocarbon group having 2-6 carbon atoms selected from alkyl and alkenyl groups.
摘要翻译：提出了适用于制造半导体器件（例如具有高保真度的VLSI）的精细图案化的正性光致抗蚀剂组合物。该组合物包括：（A）100重量份通过三种酚类化合物和甲醛的特定三元混合物的缩合反应制备的酚醛清漆树脂; 和（B）20-60重量份的优选萘醌二叠氮磺酸和羟基化二苯甲酮化合物的酯的光敏剂。酚类混合物由10-45重量％的间甲酚，35-88重量％的对甲酚和2-30重量％的由通式R.C 6 H 4.OH表示的取代的苯酚组成，在其中R为选自烷基和烯基的2-6个碳原子的一价脂族烃基。

20. 发明授权

US4784937A Developing solution for positive-working photoresist comprising a metal ion free organic base and an anionic surfactant 失效
标题翻译：用于正性光致抗蚀剂的显影液，其包含无金属离子的有机碱和阴离子表面活性剂
公开(公告)号：US4784937A
公开(公告)日：1988-11-15
申请号：US892646
申请日：1986-08-04
申请人： Hatsuyuki Tanaka , Hidekatsu Kohara , Yoshiyuki Sato , Shingo Asaumi , Toshimasa Nakayama , Akira Yokota , Hisashi Nakane
发明人： Hatsuyuki Tanaka , Hidekatsu Kohara , Yoshiyuki Sato , Shingo Asaumi , Toshimasa Nakayama , Akira Yokota , Hisashi Nakane
IPC分类号： G03F7/32
CPC分类号： G03F7/322
摘要： The aqueous developing solution of the invention for positive-working photoresist compositions contains, in addition to an organic basic compound free from metal ions, such as tetramethyl ammonium hydroxide and choline, as the principal ingredient, from 50 to 5000 ppm of an anionic or non-ionic fluorine-containing surface active agent of specific types. In comparison with conventional developing solutions without such a surface active agent, the inventive developing solution is advantageous in the uniformity of the patterned photoresist layer and higher sensitivity and smaller temperature dependency of development.
摘要翻译：本发明的正性光致抗蚀剂组合物的含水显影液除了含有金属离子的有机碱性化合物外，还含有氢氧化四甲基铵和胆碱作为主要成分，含有50-5000ppm阴离子或非离子表面活性剂非离子型含氟表面活性剂。与没有这种表面活性剂的常规显影溶液相比，本发明的显影溶液在图案化光致抗蚀剂层的均匀性方面是有利的，并且具有较高的灵敏度和较小的显影温度依赖性。

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