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1. 发明授权

US4833067A Developing solution for positive-working photoresist comprising tmah and non-ionic surfactant 失效
标题翻译：用于正工作光致抗蚀剂的显影溶液包含tmah和非离子表面活性剂
公开(公告)号：US4833067A
公开(公告)日：1989-05-23
申请号：US246930
申请日：1988-09-19
申请人： Hatsuyuki Tanaka , Hidekatsu Kohara , Yoshiyuki Sato , Shingo Asaumi , Toshimasa Nakayama , Akira Yokota , Hisashi Nakane
发明人： Hatsuyuki Tanaka , Hidekatsu Kohara , Yoshiyuki Sato , Shingo Asaumi , Toshimasa Nakayama , Akira Yokota , Hisashi Nakane
IPC分类号： G03C1/72 , G03C5/18 , G03F7/30 , G03F7/32 , H01L21/027 , H01L21/30
CPC分类号： G03F7/322 , G03C5/18
摘要： The aqueous developing solution of the invention for positive-working photoresist compositions contains, in addition to an organic basic compound free from metallic ions, such as tetramethyl ammonium hydroxide and choline, as the principal ingredient, from 50 to 5000 ppm of an acetylene alcohol. In comparison with conventional developing solutions, the inventive developing solution is advantageous in the uniformity of the patterned photoresist layer, higher sensitivity and smaller temperature dependency of development and less drawbacks due to foaming of the solution.
摘要翻译：本发明的正性光致抗蚀剂组合物的水性显影液除了含有金属离子的有机碱性化合物外，还含有氢氧化四甲基铵和胆碱作为主要成分，为50-5000ppm的乙炔醇。与传统的显影液相比，本发明的显影溶液在图案化光刻胶层的均匀性方面是有利的，更高的灵敏度和更小的显影温度依赖性以及由于溶液的发泡而引起的缺点。

2. 发明授权

US4873177A Method for forming a resist pattern on a substrate surface and a scum-remover therefor 失效
标题翻译：在基板表面上形成抗蚀剂图案的方法和用于其的浮渣除去器
公开(公告)号：US4873177A
公开(公告)日：1989-10-10
申请号：US229762
申请日：1988-08-05
申请人： Hatsuyuki Tanaka , Yoshiyuki Sato , Hidekatsu Kohara , Toshimasa Nakayama
发明人： Hatsuyuki Tanaka , Yoshiyuki Sato , Hidekatsu Kohara , Toshimasa Nakayama
IPC分类号： G03F7/32
CPC分类号： G03F7/322
摘要： The pattern-wise photoresist layer formed on the surface of a substrate according to the inventive method is imparted with a greatly improved resolving power as a result of complete removal of the scum residua left after the development treatment. Namely, the positive-working photoresist layer formed on the substrate surface is exposed pattern-wise to actinic rays, developed with a developer solution which is typically a 2-7% aqueous solution of a quaternary ammonium hydroxide and then rinsed with a scum-remover solution which is a mixture of 100 parts of a 0.1-1.5% aqueous solution of a quaternary ammonium hydroxide and 1-30 parts of a water-miscible organic solvent and capable of dissolving away the scum residua in the pattern-wise photoresist layer without affecting the quality of the photoresist pattern reproduction.
摘要翻译：根据本发明方法形成在基材表面上的图案光致抗蚀剂层由于在显影处理后完全除去剩余的浮渣残留物而赋予极大改进的分辨能力。也就是说，形成在基板表面上的正性光致抗蚀剂层以图案方式暴露于光化学射线，用显影剂溶液显影，显影剂溶液通常为2-7％氢氧化季铵水溶液，然后用浮渣除去剂溶液，其为100份0.1-1.5％的季铵氢氧化物水溶液和1-30份水混溶性有机溶剂的混合物，并且能够将浮渣残留物溶解在图案化光致抗蚀剂层中而不影响光刻胶图案再现的质量。

3. 发明授权

US4784937A Developing solution for positive-working photoresist comprising a metal ion free organic base and an anionic surfactant 失效
标题翻译：用于正性光致抗蚀剂的显影液，其包含无金属离子的有机碱和阴离子表面活性剂
公开(公告)号：US4784937A
公开(公告)日：1988-11-15
申请号：US892646
申请日：1986-08-04
申请人： Hatsuyuki Tanaka , Hidekatsu Kohara , Yoshiyuki Sato , Shingo Asaumi , Toshimasa Nakayama , Akira Yokota , Hisashi Nakane
发明人： Hatsuyuki Tanaka , Hidekatsu Kohara , Yoshiyuki Sato , Shingo Asaumi , Toshimasa Nakayama , Akira Yokota , Hisashi Nakane
IPC分类号： G03F7/32
CPC分类号： G03F7/322
摘要： The aqueous developing solution of the invention for positive-working photoresist compositions contains, in addition to an organic basic compound free from metal ions, such as tetramethyl ammonium hydroxide and choline, as the principal ingredient, from 50 to 5000 ppm of an anionic or non-ionic fluorine-containing surface active agent of specific types. In comparison with conventional developing solutions without such a surface active agent, the inventive developing solution is advantageous in the uniformity of the patterned photoresist layer and higher sensitivity and smaller temperature dependency of development.
摘要翻译：本发明的正性光致抗蚀剂组合物的含水显影液除了含有金属离子的有机碱性化合物外，还含有氢氧化四甲基铵和胆碱作为主要成分，含有50-5000ppm阴离子或非离子表面活性剂非离子型含氟表面活性剂。与没有这种表面活性剂的常规显影溶液相比，本发明的显影溶液在图案化光致抗蚀剂层的均匀性方面是有利的，并且具有较高的灵敏度和较小的显影温度依赖性。

4. 发明授权

US4820621A Developer solution for positive-working photoresist compositions comprising a base and a non-ionic surfactant 失效
标题翻译：用于正性光致抗蚀剂组合物的显影剂溶液，其包含碱和非离子表面活性剂
公开(公告)号：US4820621A
公开(公告)日：1989-04-11
申请号：US67312
申请日：1987-06-26
申请人： Hatsuyuki Tanka , Yoshiyuki Sato , Hidekatsu Kohara , Toshimasa Nakayama
发明人： Hatsuyuki Tanka , Yoshiyuki Sato , Hidekatsu Kohara , Toshimasa Nakayama
IPC分类号： G03C1/72 , G03C1/10 , G03F7/00 , G03F7/30 , G03F7/32 , H01L21/027 , H01L21/30 , G03C5/18 , G03F7/26
CPC分类号： G03F7/322
摘要： The aqueous developer solution for a positive-working photoresist composition comprises, as dissolved in an aqueous solvent, a water-soluble organic basic compound and a specific non-ionic surface active agent which may be an alkyl-substituted phenyl or naphthyl ether of polyoxyethyleneglycol in a specified concentration. The developer solution is advantageous in respect of the completeness of removal of film residua and scums from the substrate surface after development so that the patterned photoresist layer is imparted with greatly increased accuracy and fidelity of the pattern reproduction.
摘要翻译：用于正性光致抗蚀剂组合物的水性显影剂溶液包含溶解在水性溶剂中的水溶性有机碱性化合物和特定的非离子表面活性剂，其可以是聚氧乙烯二醇的烷基取代的苯基或萘基醚指定浓度。显影剂溶液在显影后从基材表面除去膜残余物和浮渣的完整性是有利的，使得图案化的光致抗蚀剂层具有大大提高的图案再现的精度和保真度。

5. 发明申请

US20120198956A1 STEERING DEVICE 有权
标题翻译：转向装置
公开(公告)号：US20120198956A1
公开(公告)日：2012-08-09
申请号：US13363299
申请日：2012-01-31
申请人： Naoyuki TAKEZAWA , Yoshiyuki Sato
发明人： Naoyuki TAKEZAWA , Yoshiyuki Sato
IPC分类号： B62D1/187
CPC分类号： B62D1/184 , B62D1/189
摘要： A steering device includes an outer column including fastening pieces formed to face each other at both sides, in the width direction, of a slot portion formed at either of a lower side or an upper side of an embracing body portion along an axial direction thereof, a fixed bracket clamping the outer column, a fastener that fastens the outer column and the fixed bracket, an inner column, and a pushing member having an expanding shaft portion. The two fastening pieces of the embracing body portion are connected by the fastener so that the two fastening pieces can be expanded and contracted, and the expanding shaft portion is elastically biased in an axial center direction of the outer column so as to abut on end zones of the slot portion and expand the two fastening pieces.
摘要翻译：转向装置包括外柱，该外柱包括形成为沿宽度方向彼此面对的紧固件，所述紧固件形成在沿其轴向方向的包围主体部分的下侧或上侧的槽部中，夹紧外柱的固定支架，紧固外柱和固定支架的紧固件，内柱和具有扩张轴部分的推动构件。包围主体部分的两个紧固件通过紧固件连接，使得两个紧固件可以膨胀和收缩，并且扩展轴部分沿外柱的轴向中心方向弹性偏置，以便抵靠端部区域并扩大两个紧固件。

6. 发明申请

US20080305081A1 Novel aminopyrimidine derivatives as PLK1 inhibitors 有权
标题翻译：新型氨基嘧啶衍生物作为PLK1抑制剂
公开(公告)号：US20080305081A1
公开(公告)日：2008-12-11
申请号：US12002546
申请日：2007-12-18
申请人： Takashi Hashihayata , Mikako Kawamura , Morihiro Mitsuya , Yoshiyuki Sato
发明人： Takashi Hashihayata , Mikako Kawamura , Morihiro Mitsuya , Yoshiyuki Sato
IPC分类号： A61K38/21 , C07D471/04 , A61K39/395 , A61K33/24 , A61K38/50 , A61P35/00 , A61K31/506
CPC分类号： C07D471/04
摘要： The present invention relates to a compound represented by Formula [I]: or a pharmaceutically acceptable salt or ester thereof, wherein R1 and R2, which may be the same or different, are each a hydrogen atom, a lower alkyl group, a cycloalkyl group, or the like; R3 and R4, which may be the same or different, are each a hydrogen atom, a lower alkyl group, NRaRb, a phenyl group, a lower alkyl group substituted with a phenyl group, a 4- to 7-membered aliphatic heterocyclic group, a lower alkyl group substituted with a 4- to 7-membered aliphatic heterocyclic group, a 5- or 6-membered aromatic heterocyclic group, a lower alkyl group substituted with a 5- or 6-membered aromatic heterocyclic group, or the like; and R5 is a hydrogen atom, a cyano group, a halogen atom, or a lower alkyl group.
摘要翻译：本发明涉及由式[I]表示的化合物或其药学上可接受的盐或酯，其中R 1和R 2可以相同或不同，分别为氢原子，低级烷基，环烷基，等等; R 3和R 4可以相同或不同，分别为氢原子，低级烷基，NR a R b，苯基，被苯基取代的低级烷基，4-至7-元脂族杂环基，被4-至7-元脂族杂环基取代的低级烷基，5或6元芳族杂环基，被5或6元芳族杂环基取代的低级烷基等; R5为氢原子，氰基，卤素原子或低级烷基。

7. 发明申请

US20080070894A1 Novel Substituted Imidazole Derivative 有权
标题翻译：新型替代咪唑衍生物
公开(公告)号：US20080070894A1
公开(公告)日：2008-03-20
申请号：US11661486
申请日：2005-08-30
申请人： Mikako Kawamura , Takashi Hashihayata , Satoshi Sunami , Tetsuya Sugimoto , Fuyuki Yamamoto , Yoshiyuki Sato , Kaori Kamijo , Morihiro Mitsuya , Yoshikazu Iwasawa , Hideya Komatani
发明人： Mikako Kawamura , Takashi Hashihayata , Satoshi Sunami , Tetsuya Sugimoto , Fuyuki Yamamoto , Yoshiyuki Sato , Kaori Kamijo , Morihiro Mitsuya , Yoshikazu Iwasawa , Hideya Komatani
IPC分类号： A61K31/397 , A61K31/496 , A61K31/497 , A61K31/501 , A61K31/506 , A61K31/52 , A61K31/5377 , A61K31/5513 , A61P35/00 , C07D237/06 , C07D239/24 , C07D243/14 , C07D295/00 , C07D473/00
CPC分类号： C07D471/04 , C07D487/04
摘要： The present invention relates to a compound represented by Formula [I] or a pharmaceutically acceptable salt or ester thereof: wherein: X1, X2, X3, and X4, which may be identical or different, are each C or N, provided that none to two of X1, X2, X3, and X4 is/are N; Y is CH or N; R1, R1′, R2, R2′, R3, R3′, R4, and R4′, which may be identical or different, are each a hydrogen atom, a lower alkyl group, or the like; R5 is a hydrogen atom or a methyl group; R6 and R7, which may be identical or different, are each a hydrogen atom, a lower alkyl group, or the like; R8 and R8′, which may be identical or different, are each a hydrogen atom, a lower alkyl group, or the like; R9 is an aryl group or a heteroaryl group which may be substituted; and n is an integer from 1 to 3, and a PLK1 inhibitor or an anticancer agent containing the same.
摘要翻译：本发明涉及由式[I]表示的化合物或其药学上可接受的盐或酯：其中：X 1，X 2，X 3， / SUB>和X 4可以相同或不同，各自为C或N，条件是X 1，X 2， / SUB>，X 3和X 4是N; Y是CH或N; R 1，R 1，R 2，R 2，R 3，N 3， R 3，R 4，R 4，R 4和R 4可以相同或不同，分别为氢原子，低级烷基等; R 5是氢原子或甲基; R 6和R 7可以相同或不同，分别为氢原子，低级烷基等; R 8和R 8可以相同或不同，分别为氢原子，低级烷基等; R 9是可以被取代的芳基或杂芳基; n为1〜3的整数，PLK1抑制剂或含有该PLK1抑制剂的抗癌剂。

8. 外观设计

USD563213S1 Elastic member of an elastic coupler 有权
标题翻译：弹性联轴器弹性件
公开(公告)号：USD563213S1
公开(公告)日：2008-03-04
申请号：US29262524
申请日：2006-07-05
申请人： Yoshiyuki Sato , Nobushige Fujioka , Satoshi Kimura
设计人： Yoshiyuki Sato , Nobushige Fujioka , Satoshi Kimura

9. 发明授权

US06777410B2 Isoindole derivatives 失效
标题翻译：异吲哚衍生物
公开(公告)号：US06777410B2
公开(公告)日：2004-08-17
申请号：US10408220
申请日：2003-04-08
申请人： Toshio Nagase , Tomoharu Iino , Yoshiyuki Sato , Teruyuki Nishimura , Jun-ichi Eiki
发明人： Toshio Nagase , Tomoharu Iino , Yoshiyuki Sato , Teruyuki Nishimura , Jun-ichi Eiki
IPC分类号： A61K31423
CPC分类号： C07D498/04
摘要： This invention relates to compounds represented by the general formula [I] wherein, R represents an azido group, etc., R1 and R2 are the same or different and represent hydrogen atoms, etc., R3 and R4 are the same or different and represent hydrogen atoms, etc., X1 represents an oxygen atom, etc., X2 represents an oxygen atom, etc., Y represents an oxygen atom, etc., and Z represents a condensed aryl group, etc., or a pharmaceutically acceptable salt thereof, preparation processes thereof, and an agent for treating diabetes, a prophylactic agent for chronic complications of diabetes or a drug against obesity, containing, as an effective ingredient, the compound or the pharmaceutically acceptable salt thereof.
摘要翻译：本发明涉及由通式[I]表示的化合物，其中R表示叠氮基等，R 1和R 2相同或不同，表示氢原子等，R 3，和R 4相同或不同，表示氢原子等，X 1表示氧原子等，X 2表示氧原子等，Y表示氧原子等，Z表示缩合芳基等，或其药学上可接受的盐，其制备方法和用于治疗糖尿病的药物，用于糖尿病慢性并发症的预防剂或抗肥胖药物，其含有作为有效成分的化合物或药学上可接受的盐其可接受的盐。

10. 发明授权

US06468460B2 Method for manufacturing heat-curable resin molded product 有权
标题翻译：热固性树脂成型体的制造方法
公开(公告)号：US06468460B2
公开(公告)日：2002-10-22
申请号：US09330919
申请日：1999-06-11
申请人： Shigeru Kinpara , Yoshiyuki Sato , Hisayoshi Osumi , Senji Suzuki
发明人： Shigeru Kinpara , Yoshiyuki Sato , Hisayoshi Osumi , Senji Suzuki
IPC分类号： B29C4514
CPC分类号： B29C39/405 , B29C33/70 , B29C37/005 , B29C45/0025 , B29C45/4421
摘要： When molding of a heat-curable resin such as unsaturated polyester resin and the like is conducted by means of the casting method, concavities in the molded product generated as a result of the curing shrinkage of this resin are prevented. A central core member comprising ABS resin or the like is disposed in advance within mold, a heat-curable resin liquid is injected thereinto, and heated, and at this time, an amount of expansion in the volume of central core member is caused which corresponds to the amount of volume shrinkage resulting from curing of the heat-curable resin, and the expansion of the central core member is synchronized with the curing shrinkage of the heat-curable resin.
摘要翻译：当通过流延法进行诸如不饱和聚酯树脂等热固性树脂的模塑时，可以防止由于该树脂的固化收缩而产生的模制品中的凹凸。包括ABS树脂等的中心芯部件预先设置在模具内，将热固性树脂液体注入其中并进行加热，此时，引起中心芯体的体积膨胀量与由该固化性树脂固化而产生的体积收缩量相对应，并且中心芯体的膨胀与热固性树脂的固化收缩同步。

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