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热词
    • 11. 发明授权
    • Engine unit and vehicle including the same
    • 发动机单元和车辆包括相同
    • US08047179B2
    • 2011-11-01
    • US12248712
    • 2008-10-09
    • Takayuki Yamada
    • Takayuki Yamada
    • F02D9/10
    • F02D9/1065F02B61/02F02D9/105F02D9/109F02D11/10F02M35/10032F02M35/116F02M35/162F02M69/044
    • An engine unit that has a throttle valve driving actuator securely fixed thereto, and in which the vibration caused on the actuator is small. The engine unit includes a V-type engine and a throttle body assembly. The throttle body assembly has first and second front and rear throttle bodies, an actuator, a transmission gear mechanism, and a casing that houses the actuator and the transmission gear mechanism. The casing has a first casing portion that is fixed to the first front and rear throttle bodies, and a second casing portion that faces the first casing portion in a width direction and is fixed to at least one of the second front and rear throttle bodies.
    • 具有可靠地固定在其上的节气门驱动致动器,并且致动器上产生的振动小的发动机单元。 发动机单元包括V型发动机和节气门体组件。 节气门体组件具有第一和第二前后节流体,致动器,传动齿轮机构和容纳致动器和传动齿轮机构的壳体。 壳体具有固定到第一前后节流体的第一壳体部和与宽度方向相对的第一壳体部的第二壳体部,并且固定在第二前后节流体的至少一个上。
    • 12. 发明授权
    • Semiconductor device and fabrication method for the same
    • 半导体器件及其制造方法相同
    • US07994036B2
    • 2011-08-09
    • US12492605
    • 2009-06-26
    • Riichirou MitsuhashiTakayuki Yamada
    • Riichirou MitsuhashiTakayuki Yamada
    • H01L21/3205H01L21/4763
    • H01L21/82345H01L21/823462H01L21/823842H01L21/823857H01L29/4966H01L29/513H01L29/517
    • The semiconductor device includes a first transistor and a second transistor formed in a semiconductor substrate. The first transistor includes: a first gate insulating film formed on the semiconductor substrate; and a first gate electrode formed on the first gate insulating film. The second transistor includes: a second gate insulating film formed on the semiconductor substrate; and a second gate electrode formed on the second gate insulating film. The first gate insulating film includes a first insulating material with a first element diffused therein, the second gate insulating film includes the first insulating material, and the amount of the first element contained in the first gate insulating film is greater than the amount of the first element contained in the second gate insulating film.
    • 半导体器件包括形成在半导体衬底中的第一晶体管和第二晶体管。 第一晶体管包括:形成在半导体衬底上的第一栅极绝缘膜; 以及形成在第一栅极绝缘膜上的第一栅电极。 第二晶体管包括:形成在半导体衬底上的第二栅极绝缘膜; 以及形成在第二栅极绝缘膜上的第二栅电极。 所述第一栅极绝缘膜包括第一绝缘材料,其中扩散有第一元素,所述第二栅极绝缘膜包括所述第一绝缘材料,并且所述第一栅极绝缘膜中包含的所述第一元素的量大于所述第一绝缘膜的量 元件包含在第二栅极绝缘膜中。