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11. 发明授权

US07361895B2 Electron beam apparatus and a device manufacturing method by using said electron beam apparatus 有权
标题翻译：电子束装置和使用所述电子束装置的装置制造方法
公开(公告)号：US07361895B2
公开(公告)日：2008-04-22
申请号：US11304680
申请日：2005-12-16
申请人： Mamoru Nakasuji , Takao Kato , Nobuharu Noji , Tohru Satake , Takeshi Murakami , Kenji Watanabe
发明人： Mamoru Nakasuji , Takao Kato , Nobuharu Noji , Tohru Satake , Takeshi Murakami , Kenji Watanabe
IPC分类号： H01J49/44
CPC分类号： H01J3/10 , B82Y10/00 , B82Y40/00 , G01N23/225 , H01J3/021 , H01J37/063 , H01J37/073 , H01J37/1471 , H01J37/1472 , H01J37/3174 , H01J2237/06316 , H01J2237/2817
摘要： An electron beam apparatus, in which an electron beam emitted from an electron gun having a cathode and an anode is focused and irradiated onto a sample, and secondary electrons emanated from the sample are directed into a detector, the apparatus further comprising means for optimizing irradiation of the electron beam emitted from the electron gun onto the sample, the optimizing means may be two-stage deflectors disposed in proximity to the electron gun which deflects and directs the electron beam emitted in a specific direction so as to be in alignment with the optical axis direction of the electron beam apparatus, the electron beam emitted in the specific direction being at a certain angle with respect to the optical axis due to the fact that, among the crystal orientations of said cathode, a specific crystal orientation allowing a higher level of electron beam emission out of alignment with the optical axis direction.
摘要翻译：电子束装置，其中从具有阴极和阳极的电子枪发射的电子束被聚焦并照射到样品上，并且从样品发出的二次电子被引导到检测器中，该装置还包括用于优化照射的装置从电子枪发射到样品上的电子束的优化装置可以是设置在电子枪附近的两级偏转器，其偏转并引导沿特定方向发射的电子束以与光学器件对准电子束装置的轴方向，由于在所述阴极的晶体取向中具有更高水平的特定晶体取向的事实，在特定方向上发射的电子束相对于光轴成一定角度电子束发射与光轴方向不对准。

12. 发明授权

US07005641B2 Electron beam apparatus and a device manufacturing method by using said electron beam apparatus 失效
公开(公告)号：US07005641B2
公开(公告)日：2006-02-28
申请号：US10731163
申请日：2003-12-10
申请人： Mamoru Nakasuji , Takao Kato , Nobuharu Noji , Tohru Satake , Takeshi Murakami , Kenji Watanabe
发明人： Mamoru Nakasuji , Takao Kato , Nobuharu Noji , Tohru Satake , Takeshi Murakami , Kenji Watanabe
IPC分类号： G21K7/00
CPC分类号： H01J3/10 , B82Y10/00 , B82Y40/00 , G01N23/225 , H01J3/021 , H01J37/063 , H01J37/073 , H01J37/1471 , H01J37/1472 , H01J37/3174 , H01J2237/06316 , H01J2237/2817
摘要： An electron beam apparatus, in which an electron beam emitted from an electron gun having a cathode and an anode is focused and irradiated onto a sample, and secondary electrons emanated from the sample are directed into a detector, the apparatus further comprising means for optimizing irradiation of the electron beam emitted from the electron gun onto the sample, the optimizing means may be two-stage deflectors disposed in proximity to the electron gun which deflects and directs the electron beam emitted in a specific direction so as to be in alignment with the optical axis direction of the electron beam apparatus, the electron beam emitted in the specific direction being at a certain angle with respect to the optical axis due to the fact that, among the crystal orientations of said cathode, a specific crystal orientation allowing a higher level of electron beam emission out of alignment with the optical axis direction.

13. 发明申请

US20060097200A1 Electron beam apparatus and a device manufacturing method by using said electron beam apparatus 有权
公开(公告)号：US20060097200A1
公开(公告)日：2006-05-11
申请号：US11304680
申请日：2005-12-16
申请人： Mamoru Nakasuji , Takao Kato , Nobuharu Noji , Tohru Satake , Takeshi Murakami , Kenji Watanabe
发明人： Mamoru Nakasuji , Takao Kato , Nobuharu Noji , Tohru Satake , Takeshi Murakami , Kenji Watanabe
IPC分类号： G21G4/00
CPC分类号： H01J3/10 , B82Y10/00 , B82Y40/00 , G01N23/225 , H01J3/021 , H01J37/063 , H01J37/073 , H01J37/1471 , H01J37/1472 , H01J37/3174 , H01J2237/06316 , H01J2237/2817
摘要： An electron beam apparatus, in which an electron beam emitted from an electron gun having a cathode and an anode is focused and irradiated onto a sample, and secondary electrons emanated from the sample are directed into a detector, the apparatus further comprising means for optimizing irradiation of the electron beam emitted from the electron gun onto the sample, the optimizing means may be two-stage deflectors disposed in proximity to the electron gun which deflects and directs the electron beam emitted in a specific direction so as to be in alignment with the optical axis direction of the electron beam apparatus, the electron beam emitted in the specific direction being at a certain angle with respect to the optical axis due to the fact that, among the crystal orientations of said cathode, a specific crystal orientation allowing a higher level of electron beam emission out of alignment with the optical axis direction.

14. 发明申请

US20130032716A1 ELECTRON BEAM APPARATUS AND A DEVICE MANUFACTURING METHOD BY USING SAID ELECTRON BEAM APPARATUS 有权
标题翻译：电子束装置和使用电子束装置的装置制造方法
公开(公告)号：US20130032716A1
公开(公告)日：2013-02-07
申请号：US12007511
申请日：2008-01-11
申请人： Mamoru Nakasuji , Takao Kato , Nobuharu Noji , Tohru Satake , Takeshi Murakami , Kenji Watanabe
发明人： Mamoru Nakasuji , Takao Kato , Nobuharu Noji , Tohru Satake , Takeshi Murakami , Kenji Watanabe
IPC分类号： H01J37/07
CPC分类号： H01J3/10 , B82Y10/00 , B82Y40/00 , G01N23/225 , H01J3/021 , H01J37/063 , H01J37/073 , H01J37/1471 , H01J37/1472 , H01J37/3174 , H01J2237/06316 , H01J2237/2817
摘要： An electron beam apparatus, in which an electron beam emitted from an electron gun having a cathode and an anode is focused and irradiated onto a sample, and secondary electrons emanated from the sample are directed into a detector, the apparatus further comprising means for optimizing irradiation of the electron beam emitted from the electron gun onto the sample, the optimizing means may be two-stage deflectors disposed in proximity to the electron gun which deflects and directs the electron beam emitted in a specific direction so as to be in alignment with the optical axis direction of the electron beam apparatus, the electron beam emitted in the specific direction being at a certain angle with respect to the optical axis due to the fact that, among the crystal orientations of said cathode, a specific crystal orientation allowing a higher level of electron beam emission out of alignment with the optical axis direction.
摘要翻译：电子束装置，其中从具有阴极和阳极的电子枪发射的电子束被聚焦并照射到样品上，并且从样品发出的二次电子被引导到检测器中，该装置还包括用于优化照射的装置从电子枪发射到样品上的电子束的优化装置可以是设置在电子枪附近的两级偏转器，其偏转并引导沿特定方向发射的电子束以与光学器件对准电子束装置的轴方向，由于在所述阴极的晶体取向中具有更高水平的特定晶体取向的事实，在特定方向上发射的电子束相对于光轴成一定角度电子束发射与光轴方向不对准。

15. 发明申请

US20050133733A1 Electron beam system and method of manufacturing devices using the system 失效
公开(公告)号：US20050133733A1
公开(公告)日：2005-06-23
申请号：US11034873
申请日：2005-01-14
申请人： Mamoru Nakasuji , Takao Kato , Tohru Satake , Kenji Watanabe , Takeshi Murakami , Nobuharu Noji
发明人： Mamoru Nakasuji , Takao Kato , Tohru Satake , Kenji Watanabe , Takeshi Murakami , Nobuharu Noji
IPC分类号： G01N23/04 , G21K7/00 , H01J37/28 , G21G5/00
CPC分类号： H01J37/28 , G01N23/04 , H01J2237/2817
摘要： An electron beam system wherein a shot noise of an electron beam can be reduced and a beam current can be made higher, and further a shaped beam is formed by a two-stage lenses so as to allow for an operation with high stability. In this electron beam system, an electron beam emitted from an electron gun is irradiated onto a sample and secondary electrons emanated from the sample are detected. The electron gun is a thermionic emission type and designed to operate in a space charge limited condition. A shaping aperture and a NA aperture are arranged in front locations of the electron gun. An image of the shaping aperture formed by an electron beam emitted from the thermionic emission electron gun is focused onto a surface of the sample through the two-stage lenses.

16. 发明授权

US06853143B2 Electron beam system and method of manufacturing devices using the system 有权
标题翻译：电子束系统及其制造方法
公开(公告)号：US06853143B2
公开(公告)日：2005-02-08
申请号：US10337420
申请日：2003-01-07
申请人： Mamoru Nakasuji , Takao Kato , Tohru Satake , Kenji Watanabe , Takeshi Murakami , Nobuharu Noji
发明人： Mamoru Nakasuji , Takao Kato , Tohru Satake , Kenji Watanabe , Takeshi Murakami , Nobuharu Noji
IPC分类号： G01N23/04 , G21K7/00 , H01J37/28 , H01J7/24 , F16K5/00
CPC分类号： H01J37/28 , G01N23/04 , H01J2237/2817
摘要： An electron beam system wherein a shot noise of an electron beam can be reduced and a beam current can be made higher, and further a shaped beam is formed by a two-stage lenses so as to allow for an operation with high stability. In this electron beam system, an electron beam emitted from an electron gun is irradiated onto a sample and secondary electrons emanated from the sample are detected. The electron gun is a thermionic emission type and designed to operate in a space charge limited condition. A shaping aperture and a NA aperture are arranged in front locations of the electron gun. An image of the shaping aperture formed by an electron beam emitted from the thermionic emission electron gun is focused onto a surface of the sample through the two-stage lenses.
摘要翻译：一种电子束系统，其中可以减少电子束的喷射噪声并且可以使束流更高，并且还可以通过两级透镜形成成形梁，以允许具有高稳定性的操作。在该电子束系统中，从电子枪发射的电子束照射到样品上，并检测从样品发出的二次电子。电子枪是一种热离子发射型，设计用于在空间电荷限制条件下工作。成形孔径和NA孔径布置在电子枪的前部位置。由从热电子发射电子枪发射的电子束形成的成形孔的图像通过两级透镜聚焦到样品的表面上。

17. 发明授权

US07888642B2 Electron beam apparatus and method of manufacturing semiconductor device using the apparatus 有权
标题翻译：电子束装置及使用该装置制造半导体器件的方法
公开(公告)号：US07888642B2
公开(公告)日：2011-02-15
申请号：US12188567
申请日：2008-08-08
申请人： Mamoru Nakasuji , Nabuharu Noji , Tohru Satake , Masahiro Hatakeyama , Kenji Watanabe , Takao Kato , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima
发明人： Mamoru Nakasuji , Nabuharu Noji , Tohru Satake , Masahiro Hatakeyama , Kenji Watanabe , Takao Kato , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima
IPC分类号： H01J49/48 , G21K5/04
CPC分类号： B82Y10/00 , B82Y40/00 , G01N23/225 , H01J37/06 , H01J37/063 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J37/3174 , H01J2237/0435 , H01J2237/0635 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/2446 , H01J2237/24485 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.
摘要翻译：本发明提供了一种用于用一次电子束照射样品的电子束装置，以通过用于评估样品表面的照射来检测从样品表面产生的二次电子束。在电子束装置中，电子枪具有用于发射一次电子束的阴极。阴极包括用于发射一次电子束的多个发射器，其以在主电光系统的光轴为中心的圆周彼此分开布置。多个发射器被布置成使得当多个发射器投射到与一次电子束扫描的方向平行的直线上时，直线上的所得点以相等的间隔隔开。

18. 发明申请

US20070018101A1 Electron beam apparatus and method of manufacturing semiconductor device using the apparatus 失效
标题翻译：电子束装置及使用该装置制造半导体器件的方法
公开(公告)号：US20070018101A1
公开(公告)日：2007-01-25
申请号：US11528673
申请日：2006-09-28
申请人： Mamoru Nakasuji , Nobuhara Noji , Tohru Satake , Masahiro Hatakeyama , Kenji Watanabe , Takao Kato , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima
发明人： Mamoru Nakasuji , Nobuhara Noji , Tohru Satake , Masahiro Hatakeyama , Kenji Watanabe , Takao Kato , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima
IPC分类号： G21K7/00
CPC分类号： B82Y10/00 , B82Y40/00 , G01N23/225 , H01J37/06 , H01J37/063 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J37/3174 , H01J2237/0435 , H01J2237/0635 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/2446 , H01J2237/24485 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.
摘要翻译：本发明提供了一种用于用一次电子束照射样品的电子束装置，以通过用于评估样品表面的照射来检测从样品表面产生的二次电子束。在电子束装置中，电子枪具有用于发射一次电子束的阴极。阴极包括用于发射一次电子束的多个发射器，其以在主电光系统的光轴为中心的圆周彼此分开布置。多个发射器被布置成使得当多个发射器投射到与一次电子束扫描的方向平行的直线上时，直线上的所得点以相等的间隔隔开。

19. 发明授权

US07598471B2 Method of electric discharge machining a cathode for an electron gun 有权
标题翻译：放电加工电子枪阴极的方法
公开(公告)号：US07598471B2
公开(公告)日：2009-10-06
申请号：US11714885
申请日：2007-03-07
申请人： Muneki Hamashima , Takao Kato , Mamoru Nakasuji , Nobuharu Noji , Tohru Satake
发明人： Muneki Hamashima , Takao Kato , Mamoru Nakasuji , Nobuharu Noji , Tohru Satake
IPC分类号： B23H9/00 , B23H1/04
CPC分类号： F01N3/2828 , F01N2260/18 , F01N2330/06 , H01J37/06 , H01J37/28
摘要： A method of machining a cathode used in an electron gun. The method includes steps of placing an object to be machined, which is a material of the cathode, and a machining electrode in an electrically insulating oil; applying a discharge current to the machining electrode; and machining the object to be machined to have a shape corresponding to the shape of the machining electrode by means of electric discharge machining of the machining electrode. The machining electrode includes a disk, recesses formed on a front surface of the disk, a protrusion provided on a back surface of the disk, and a hole for mounting a lead wire for applying discharge current to the machining electrode. Bumps corresponding to the shape of the recesses of the machining electrode are formed on the object to be machined by means of the electric discharge machining.
摘要翻译：一种加工电子枪阴极的方法。该方法包括以下步骤：将作为阴极材料的待加工对象和电绝缘油中的加工电极放置; 向加工电极施加放电电流; 并且通过加工电极的放电加工将被加工物加工成具有与加工电极的形状对应的形状。加工电极包括盘，形成在盘的前表面上的凹部，设置在盘的后表面上的突起，以及用于安装用于向加工电极施加放电电流的引线的孔。通过放电加工在被加工物体上形成与加工电极的凹部的形状相对应的凸起。

20. 发明授权

US07235799B2 System and method for evaluation using electron beam and manufacture of devices 失效
标题翻译：使用电子束进行评估的系统和方法以及器件的制造
公开(公告)号：US07235799B2
公开(公告)日：2007-06-26
申请号：US10998160
申请日：2004-11-29
申请人： Mamoru Nakasuji , Tohru Satake , Takao Kato , Nobuharu Noji
发明人： Mamoru Nakasuji , Tohru Satake , Takao Kato , Nobuharu Noji
IPC分类号： H01J1/50
CPC分类号： H01J37/141 , B82Y10/00 , B82Y15/00 , H01J37/09 , H01J37/12 , H01J37/1474 , H01J37/28 , H01J2237/0453 , H01J2237/06316 , H01J2237/244 , H01J2237/2538 , H01J2237/2817
摘要： An electron beam apparatus having a longer life time of cathode, and allowing a plurality of electron beams to be arranged adequately around an optical axis and five or more electron beams to be formed from a single electron gun. The electron beams emitted from a cathode made of ZrO/W (tungsten zirconium oxide) or a cathode made of carbide of transition metal to the off-optical axis directions may be converged on a sample to scan it. The apparatus includes a plate for reducing a vacuum conductance defined between the electron gun chamber side and the sample side, and apertures are formed through the plate at locations offset from the optical axis allowing for the passage of the electron beams. In order to evaluate a pattern on the sample, the electron beam emitted from the electron gun is incident to the sample surface via an objective lens. The objective lens is composed of a flat electrode having an aperture centered on the optical axis and placed in parallel with the sample surface and an electromagnetic lens including a gap formed in a side facing to the sample. Further, in order to inspect a mask, spacing among a plurality of electron beams after having passed through the mask are extended by a magnifying lens and thus widely spaced electron beams are then converted into optical signal in a scintillator.
摘要翻译：一种电子束装置，具有较长的阴极使用寿命，并允许多个电子束在光轴周围适当布置，并可由单个电子枪形成五个或更多个电子束。从由ZrO / W（钨氧化锆）制成的阴极或由过渡金属的碳化物制成的阴极发射到离轴方向的电子束可以会聚在样品上以进行扫描。该装置包括用于减小限定在电子枪室侧和样品侧之间的真空电导的板，并且在偏离光轴的位置处穿过板形成允许电子束通过的孔。为了评估样品上的图案，从电子枪发射的电子束通过物镜入射到样品表面。物镜由平面电极构成，该平面电极具有以光轴为中心并且与样品表面平行放置的孔，以及包括在面向样品的一侧形成的间隙的电磁透镜。此外，为了检查掩模，在通过掩模之后的多个电子束之间的间隔通过放大透镜延伸，并且因此在闪烁体中将大量间隔的电子束转换成光信号。

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