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    • 11. 发明申请
    • Opto-semiconductor devices
    • 光电半导体器件
    • US20060222031A1
    • 2006-10-05
    • US11387986
    • 2006-03-24
    • Yutaka InoueKazunori SaitohHiroshi HamadaMasato HagimotoSusumu Sorimachi
    • Yutaka InoueKazunori SaitohHiroshi HamadaMasato HagimotoSusumu Sorimachi
    • H01S5/00H01S3/04
    • H01S5/0224B82Y20/00H01S5/02212H01S5/02272H01S5/02476H01S5/0425H01S5/16H01S5/2081H01S5/22H01S5/34326H01S2301/14
    • An opto-semiconductor device. An opto-semiconductor element includes a semiconductor substrate, a multilayered semiconductor layer formed on a first surface of the semiconductor substrate and having a resonator, a first electrode with multiple conductive layers formed on the multilayered semiconductor layer, and a second electrode formed on a second surface of the semiconductor substrate. A support substrate has a first surface formed with a fixing portion having a conductive layer for fixing the first electrode connected thereto through a bonding material. Bonding material and conductive layers forming the first electrode react to form a reaction layer. The difference in thermal expansion coefficient between semiconductor substrate and support substrate is not more than ±50%. A second barrier metal layer not reactive with bonding material is formed inside the first electrode uppermost conductive layer, while uppermost layer reacts with the bonding material to form the reaction layer.
    • 光电半导体器件。 光半导体元件包括半导体衬底,形成在半导体衬底的第一表面上并具有谐振器的多层半导体层,形成在多层半导体层上的多个导电层的第一电极和形成在第二层上的第二电极 半导体衬底的表面。 支撑基板具有形成有固定部的第一表面,该固定部具有用于通过接合材料固定与其连接的第一电极的导电层。 形成第一电极的接合材料和导电层反应形成反应层。 半导体衬底和支撑衬底之间的热膨胀系数差不超过±50%。 在第一电极最上层的导电层的内部形成与接合材料不反应的第二阻挡金属层,而最上层与接合材料反应形成反应层。
    • 12. 发明申请
    • Optical semiconductor device, manufacturing method therefor, and optical semiconductor apparatus
    • 光半导体装置及其制造方法以及光半导体装置
    • US20060222030A1
    • 2006-10-05
    • US11349172
    • 2006-02-08
    • Kazunori SaitohHiroshi Hamada
    • Kazunori SaitohHiroshi Hamada
    • H01S5/00
    • H01S5/22B82Y20/00H01L2224/48091H01L2224/48465H01S5/02212H01S5/02461H01S5/0425H01S5/16H01S5/2081H01S5/34326H01L2924/00014H01L2924/00
    • A highly reliable optical semiconductor device insusceptible to degradation in the characteristics thereof. An n-type buffer layer, n-type first cladding layer, active layer, a p-type first layer of the second cladding layer, p-type etch-stop layer, p-type second layer of the second cladding layer, and p-type contact layer are formed an n-type semiconductor substrate. Two lengths of separation grooves are formed in parallel in such a way as to reach the underside of the p-type second layer of the second cladding layer from the top face of the contact layer, and a ridge is formed between the respective separation grooves. The ridge comprises a lower portion thereof, made up of the second layer of the second cladding layer, and a portion of the contact layer, corresponding to the ridge, made up of the contact layer. Side parts of the top face of the portion of the contact layer, corresponding to the ridge, facing the separation grooves, respectively, are turned to tilted faces, respectively, and a barrier metal layer is formed on top of the tilted faces. Portions extending from side faces of the lower portion of the ridge to run across the respective separation grooves are covered with an insulating film. Since the tilted faces are formed at the respective side parts of the top face of the portion of the contact layer, no stepping occurs to the barrier metal layer. Accordingly, Au of an Au layer formed outside of the barrier metal layer is prevented from being diffused into the portion of the contact layer, corresponding to the ridge, made of GaAs, through steeped parts of the barrier metal layer.
    • 高度可靠的光学半导体器件,其特性不易降解。 n型缓冲层,n型第一覆层,有源层,第二覆层的p型第一层,p型蚀刻停止层,第二覆层的p型第二层和p 型接触层形成为n型半导体衬底。 从接触层的顶面到达第二包覆层的p型第二层的下侧的方式平行地形成两段分隔槽,在各分离槽之间形成有脊。 脊包括由第二覆层的第二层构成的下部,以及由接触层构成的与脊相对应的接触层的一部分。 接触层的分别对应于脊的部分的顶面的侧面分别转向倾斜面,并且在倾斜面的顶部上形成阻挡金属层。 从脊的下部的侧面延伸穿过相应的分隔槽的部分被绝缘膜覆盖。 由于倾斜面形成在接触层的部分的顶面的各个侧部,所以不会对阻挡金属层发生阶梯。 因此,通过阻挡金属层的浸渍部分,防止形成在阻挡金属层外侧的Au层的Au扩散到对应于由GaAs制成的脊的接触层的部分中。
    • 14. 发明申请
    • Opto-semiconductor devices
    • 光电半导体器件
    • US20090041076A1
    • 2009-02-12
    • US12232652
    • 2008-09-22
    • Yutaka InoueKazunori SaitohHiroshi HamadaMasato HagimotoSusumu Sorimachi
    • Yutaka InoueKazunori SaitohHiroshi HamadaMasato HagimotoSusumu Sorimachi
    • H01S5/00
    • H01S5/0224B82Y20/00H01S5/02212H01S5/02272H01S5/02476H01S5/0425H01S5/16H01S5/2081H01S5/22H01S5/34326H01S2301/14
    • An opto-semiconductor device. An opto-semiconductor element includes a semiconductor substrate, a multilayered semiconductor layer formed on a first surface of the semiconductor substrate and having a resonator, a first electrode with multiple conductive layers formed on the multilayered semiconductor layer, and a second electrode formed on a second surface of the semiconductor substrate. A support substrate has a first surface formed with a fixing portion having a conductive layer for fixing the first electrode connected thereto through a bonding material. Bonding material and conductive layers forming the first electrode react to form a reaction layer. The difference in thermal expansion coefficient between semiconductor substrate and support substrate is not more than 50%. A second barrier metal layer not reactive with bonding material is formed inside the first electrode uppermost conductive layer, while uppermost layer reacts with the bonding material to form the reaction layer.
    • 光电半导体器件。 光半导体元件包括半导体衬底,形成在半导体衬底的第一表面上并具有谐振器的多层半导体层,形成在多层半导体层上的多个导电层的第一电极和形成在第二层上的第二电极 半导体衬底的表面。 支撑基板具有形成有固定部的第一表面,该固定部具有用于通过接合材料固定与其连接的第一电极的导电层。 形成第一电极的接合材料和导电层反应形成反应层。 半导体衬底和支撑衬底之间的热膨胀系数差不超过50%。 在第一电极最上层的导电层的内部形成与接合材料不反应的第二阻挡金属层,而最上层与接合材料反应形成反应层。
    • 15. 发明授权
    • Optical semiconductor device, manufacturing method therefor, and optical semiconductor apparatus
    • 光半导体装置及其制造方法以及光半导体装置
    • US07463662B2
    • 2008-12-09
    • US11349172
    • 2006-02-08
    • Kazunori SaitohHiroshi Hamada
    • Kazunori SaitohHiroshi Hamada
    • H01S5/00
    • H01S5/22B82Y20/00H01L2224/48091H01L2224/48465H01S5/02212H01S5/02461H01S5/0425H01S5/16H01S5/2081H01S5/34326H01L2924/00014H01L2924/00
    • A highly reliable optical semiconductor device insusceptible to degradation in the characteristics thereof. An n-type buffer layer, n-type first cladding layer, active layer, a p-type first layer of the second cladding layer, p-type etch-stop layer, p-type second layer of the second cladding layer, and p-type contact layer are formed an n-type semiconductor substrate. Two lengths of separation grooves are formed in parallel in such a way as to reach the underside of the p-type second layer of the second cladding layer from the top face of the contact layer, and a ridge is formed between the respective separation grooves. The ridge comprises a lower portion thereof, made up of the second layer of the second cladding layer, and a portion of the contact layer, corresponding to the ridge, made up of the contact layer. Side parts of the top face of the portion of the contact layer, corresponding to the ridge, facing the separation grooves, respectively, are turned to tilted faces, respectively, and a barrier metal layer is formed on top of the tilted faces. Portions extending from side faces of the lower portion of the ridge to run across the respective separation grooves are covered with an insulating film. Since the tilted faces are formed at the respective side parts of the top face of the portion of the contact layer, no stepping occurs to the barrier metal layer. Accordingly, Au of an Au layer formed outside of the barrier metal layer is prevented from being diffused into the portion of the contact layer, corresponding to the ridge, made of GaAs, through steeped parts of the barrier metal layer.
    • 高度可靠的光学半导体器件,其特性不易降解。 n型缓冲层,n型第一覆层,有源层,第二覆层的p型第一层,p型蚀刻停止层,第二覆层的p型第二层和p 型接触层形成为n型半导体衬底。 从接触层的顶面到达第二包覆层的p型第二层的下侧的方式平行地形成两段分隔槽,在各分离槽之间形成有脊。 脊包括由第二覆层的第二层构成的下部,以及由接触层构成的与脊相对应的接触层的一部分。 接触层的分别对应于脊的部分的顶面的侧面分别转向倾斜面,并且在倾斜面的顶部上形成阻挡金属层。 从脊的下部的侧面延伸穿过相应的分隔槽的部分被绝缘膜覆盖。 由于倾斜面形成在接触层的部分的顶面的各个侧部,所以不会对阻挡金属层发生阶梯。 因此,通过阻挡金属层的浸渍部分,防止形成在阻挡金属层外侧的Au层的Au扩散到对应于由GaAs制成的脊的接触层的部分中。
    • 20. 发明授权
    • Opto-semiconductor devices
    • 光电半导体器件
    • US07443901B2
    • 2008-10-28
    • US11387986
    • 2006-03-24
    • Yutaka InoueKazunori SaitohHiroshi HamadaMasato HagimotoSusumu Sorimachi
    • Yutaka InoueKazunori SaitohHiroshi HamadaMasato HagimotoSusumu Sorimachi
    • H01S3/097
    • H01S5/0224B82Y20/00H01S5/02212H01S5/02272H01S5/02476H01S5/0425H01S5/16H01S5/2081H01S5/22H01S5/34326H01S2301/14
    • An opto-semiconductor device. An opto-semiconductor element includes a semiconductor substrate, a multilayered semiconductor layer formed on a first surface of the semiconductor substrate and having a resonator, a first electrode with multiple conductive layers formed on the multilayered semiconductor layer, and a second electrode formed on a second surface of the semiconductor substrate. A support substrate has a first surface formed with a fixing portion having a conductive layer for fixing the first electrode connected thereto through a bonding material. Bonding material and conductive layers forming the first electrode react to form a reaction layer. The difference in thermal expansion coefficient between semiconductor substrate and support substrate is not more than ±50%. A second barrier metal layer not reactive with bonding material is formed inside the first electrode uppermost conductive layer, while uppermost layer reacts with the bonding material to form the reaction layer.
    • 光电半导体器件。 光半导体元件包括半导体衬底,形成在半导体衬底的第一表面上并具有谐振器的多层半导体层,形成在多层半导体层上的多个导电层的第一电极和形成在第二层上的第二电极 半导体衬底的表面。 支撑基板具有形成有固定部的第一表面,该固定部具有用于通过接合材料固定与其连接的第一电极的导电层。 形成第一电极的接合材料和导电层反应形成反应层。 半导体衬底和支撑衬底之间的热膨胀系数差不超过±50%。 在第一电极最上层的导电层的内部形成与接合材料不反应的第二阻挡金属层,而最上层与接合材料反应形成反应层。