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    • 13. 发明授权
    • Thermal membrane sensor and method for the production thereof
    • 热膜传感器及其制造方法
    • US06825057B1
    • 2004-11-30
    • US09355373
    • 1999-10-25
    • Klaus HeyersWilhelm Frey
    • Klaus HeyersWilhelm Frey
    • H01L2100
    • G01F1/6845G01K7/028
    • A process for manufacturing a membrane sensor over a silicon substrate, preferably a thermal membrane sensor. A thin layer of silicon carbide or silicon nitride is deposited over an area of porous silicon formed in the surface of the substrate, and then openings that extend as far as the layer of porous silicon are formed in the silicon carbide or silicon nitride layer via a dry etching process. Next, semiconductor structures and conductor path structures are implanted into the upper surface of the membrane layer via lithographic steps, and then the sacrificial layer of porous silicon is removed using a suitable solvent such as ammonia. Thus an empty space that thermally isolates the sensor membrane from the substrate is created beneath the membrane layer.
    • 一种用于在硅衬底,优选热膜传感器上制造膜传感器的方法。 在衬底表面上形成的多孔硅的一个区域上沉积一层薄的碳化硅或氮化硅,然后在碳化硅或氮化硅层中形成延伸至多孔硅层的开口, 干蚀刻工艺。 接下来,通过光刻步骤将半导体结构和导体路径结构注入膜层的上表面,然后使用合适的溶剂如氨除去多孔硅的牺牲层。 因此,在膜层之下产生将隔离传感器膜与基底的空白空间。
    • 14. 发明授权
    • Field effect transistor, especially for use as a sensor element or acceleration sensor
    • 场效应晶体管,特别用作传感器元件或加速度传感器
    • US06724023B2
    • 2004-04-20
    • US09838062
    • 2001-04-19
    • Klaus HeyersBernhard Elsner
    • Klaus HeyersBernhard Elsner
    • H01L2984
    • H01L29/84G01P15/0802G01P15/124G01P2015/0814
    • A field effect transistor suited for use as a sensor element or in an acceleration sensor is described. For this purpose, the field effect transistor within a planar substrate has a drain area and a source area, which are separated from each other by a channel region. In addition, a gate electrode is provided which is arranged so as to be substantially self-supporting above the substrate over the channel region. The gate electrode is flexibly supported such that an external force acting upon it which has a component acting parallel to the surface of the substrate causes a deflection of the gate electrode parallel to the surface of the substrate. A method is also described in which, in a first method step, an integrated circuit having a drain area, a source area, and a channel region is manufactured or made available in a CMOS process, and thereafter, in a second method step, the substantially self-supporting gate electrode is produced on the integrated circuit using electroplating additive technology.
    • 描述适合用作传感器元件或加速度传感器的场效应晶体管。 为此,平面衬底内的场效应晶体管具有通过沟道区彼此分离的漏极区和源极区。 此外,提供栅极电极,其布置成在沟道区域上基板上基本上自支撑。 栅电极被柔性地支撑,使得作用在其上的具有与衬底的表面平行的部件的外力导致栅极平行于衬底的表面的偏转。 还描述了一种方法,其中在第一方法步骤中,在CMOS工艺中制造或制造具有漏极区域,源极区域和沟道区域的集成电路,此后,在第二方法步骤中, 使用电镀添加剂技术在集成电路上产生基本上自支撑的栅电极。
    • 20. 发明授权
    • Method and device for epitaxial deposition of atoms or molecules from a reactive gas on a deposition surface of a substrate
    • 用于从基底的沉积表面上的反应性气体外延沉积原子或分子的方法和装置
    • US06592664B1
    • 2003-07-15
    • US09656546
    • 2000-09-06
    • Wilhelm FreyFranz LaermerKlaus Heyers
    • Wilhelm FreyFranz LaermerKlaus Heyers
    • C30B2508
    • C30B25/105Y10T117/10
    • A method for epitaxial deposition of atoms or molecules from a reactive gas on a deposition surface of a substrate is described. The method includes the following steps: a first amount of energy is supplied by heating at least the deposition surface; and an ionized inert gas is conducted, at least from time to time, onto the deposition surface in order to supply, at least from time to time, a second amount of energy through the effect of ions of the ionized inert gas on the deposition surface. The first amount of energy is less than the energy amount necessary for the epitaxial deposition of atoms or molecules of the reactive gas on the deposition surface. A sum of the first energy amount and the second energy equaling, at least from time to time, a total amount of energy that is sufficient for the epitaxial deposition of atoms or molecules of the reactive gas onto the deposition surface.
    • 描述了从衬底的沉积表面上的反应性气体外延沉积原子或分子的方法。 该方法包括以下步骤:通过至少加热沉积表面来提供第一量的能量; 并且电离惰性气体至少不时地进行到沉积表面上,以便至少通过电离惰性气体的离子在沉积表面上的时间来供应第二量的能量。 第一量的能量小于沉积表面上的反应气体的原子或分子的外延沉积所需的能量。 至少不时地使第一能量和第二能量的总和等于足以将反应气体的原子或分子外延沉积到沉积表面上的能量的总量。