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    • 11. 发明授权
    • Method for improving MOS mobility
    • 提高MOS迁移率的方法
    • US06921704B1
    • 2005-07-26
    • US10700557
    • 2003-11-05
    • David WuAkif SultanBin Yu
    • David WuAkif SultanBin Yu
    • H01L21/762H01L21/764H01L21/8234H01L21/8238H01L21/76
    • H01L21/764H01L21/76224H01L21/823481H01L21/823878
    • A method of forming a silicon-on-insulator semiconductor device including providing a substrate and forming a trench in the substrate, wherein the trench includes opposing side walls extending upwardly from a base of the trench. The method also includes depositing at least two insulating layers into the trench to form a shallow trench isolation structure, wherein an innermost of the insulating layers substantially conforms to the base and the two side walls of the trench and an outermost of the insulating layers spans the side walls of the trench so that a gap is formed between the insulating layers in the trench. The gap creates compressive forces within the shallow trench isolation structure, which in turn creates tensile stress within the surrounding substrate to enhance mobility of the device.
    • 一种形成绝缘体上半导体器件的方法,包括提供衬底并在衬底中形成沟槽,其中沟槽包括从沟槽的基底向上延伸的相对的侧壁。 该方法还包括将至少两个绝缘层沉积到沟槽中以形成浅沟槽隔离结构,其中绝缘层的最内层基本上与基底一致并且沟槽的两个侧壁和绝缘层的最外层横跨 沟槽的侧壁,使得在沟槽中的绝缘层之间形成间隙。 间隙在浅沟槽隔离结构内产生压缩力,这反过来在周围的衬底内产生拉伸应力,以增强器件的移动性。
    • 15. 发明授权
    • Formation of ultra-shallow depth source/drain extensions for MOS transistors
    • 形成MOS晶体管的超浅深度源极/漏极延伸
    • US06727136B1
    • 2004-04-27
    • US10273291
    • 2002-10-18
    • James F. BullerDerick J. WristersDavid WuAkif Sultan
    • James F. BullerDerick J. WristersDavid WuAkif Sultan
    • H01L21336
    • H01L29/6659H01L21/823418H01L21/823814H01L29/1054H01L29/7833
    • A method of manufacturing a semiconductor device, comprising sequential steps of: (a) providing a semiconductor substrate including a pre-selected thickness strained lattice layer of a first semiconductor material at an upper surface thereof and an underlying layer of a second semiconductor material; and (b) introducing a dopant-containing species of one conductivity type into at least one pre-selected portion of the strained lattice layer of first semiconductor material to form a dopant-containing region therein with a junction at a depth substantially equal to the pre-selected thickness, wherein the second semiconductor material of the underlying layer inhibits diffusion thereinto of the dopant-containing species from the strained lattice layer, thereby controlling/limiting the depth of the junction to substantially the pre-selected thickness of the strained lattice layer.
    • 一种制造半导体器件的方法,包括以下顺序的步骤:(a)提供半导体衬底,该半导体衬底在其上表面包括预先选定的第一半导体材料的应变晶格层和第二半导体材料的下层; 和(b)将含有一种导电类型的含掺杂剂的物质引入到第一半导体材料的应变晶格层的至少一个预先选择的部分中,以在其中形成含有掺杂剂的区域,其中接合部的深度基本上等于预先 - 选择的厚度,其中下层的第二半导体材料抑制来自应变晶格层的含掺杂剂物质的扩散,从而将结的深度控制/限制到基本上预应变晶格层的预选厚度。
    • 17. 发明授权
    • Control trimming of hard mask for sub-100 nanometer transistor gate
    • 对100纳米晶体管栅极的硬掩模进行控制修整
    • US06482726B1
    • 2002-11-19
    • US09690152
    • 2000-10-17
    • Massud AminpurDavid WuScott Luning
    • Massud AminpurDavid WuScott Luning
    • H01L213205
    • H01L21/28123H01L29/6659
    • A method is provided, the method including forming a gate dielectric layer above a substrate layer, forming a gate conductor layer above the gate dielectric layer, forming a first hard mask layer above the gate conductor layer, and forming a second hard mask layer above the first hard mask layer. The method also includes forming a trimmed photoresist mask above the second hard mask layer, and forming a patterned hard mask in the second hard mask layer using the trimmed photoresist mask to remove portions of the second hard mask layer, the patterned hard mask having a first dimension. The method further includes forming a selectively etched hard mask in the first hard mask layer by removing portions of the first hard mask layer adjacent the patterned hard mask, the selectively etched hard mask having a second dimension less than the first dimension, and forming a gate structure using the selectively etched hard mask to remove portions of the gate conductor layer above the gate dielectric layer.
    • 提供了一种方法,该方法包括在衬底层上方形成栅介质层,在栅极介电层上方形成栅极导体层,在栅极导体层之上形成第一硬掩模层,并形成第二硬掩模层 第一硬掩模层。 该方法还包括在第二硬掩模层之上形成修整的光致抗蚀剂掩模,并且在第二硬掩模层中使用经修剪的光致抗蚀剂掩模形成图案化的硬掩模以去除第二硬掩模层的部分,图案化硬掩模具有第一 尺寸。 该方法还包括通过去除与图案化的硬掩模相邻的第一硬掩模层的部分来形成第一硬掩模层中的选择性蚀刻的硬掩模,该选择性蚀刻的硬掩模具有小于第一尺寸的第二尺寸,以及形成栅极 结构,其使用选择性蚀刻的硬掩模以去除栅极介电层上方的栅极导体层的部分。
    • 19. 发明授权
    • Wheel holder assembly and main shaft arrangement of a golf cart
    • 高尔夫球车的车轮组件和主轴装置
    • US6126182A
    • 2000-10-03
    • US136063
    • 1998-08-19
    • David Wu
    • David Wu
    • B62B1/04B62B3/02
    • B62B1/045B62B2202/404Y10S280/06
    • A wheel holder assembly and main shaft arrangement includes a main shaft made of a triangular section bar and having an upper bag cradle and a lower bag cradle for holding a golf bag, and a wheel holder assembly mounted on the main shaft to hold a pair of wheels, the wheel holder assembly including a mounting frame fastened to the main shaft, two wheel frames each holding a wheel, two pairs of legs respectively coupled between the mounting frame and the wheel frames at two opposite sides of the main shaft, and two links respectively pivotably connected between the legs and the upper bag cradle, the mounting frame having a hollow frame base with a triangular inner diameter sleeved onto the main shaft and fixedly secured thereto by fastening means and two substantially U-shaped coupling plates integral with the hollow frame base at two opposite sides, the main shaft having a first sloping side wall and a second sloping side wall joined at the top and a bottom side wall connected between the first sloping side wall and the second sloping side wall at the bottom; the U-shaped coupling plates of the mounting frame each having two parallel walls closely attached to the top ends of the legs at top and bottom sides and respectively supported on the sloping side walls of the main shaft.
    • 轮架组件和主轴装置包括由三角形截面杆制成的主轴,具有用于保持高尔夫球袋的上袋支架和下袋支架,以及安装在主轴上以保持一对 车轮组件,其包括固定在主轴上的安装框架,每个保持车轮的两个车轮框架,分别在主轴的两个相对侧分别联接在安装框架和轮架之间的两对脚,以及两个连杆 分别可枢转地连接在腿和上袋支架之间,安装框架具有中空框架底座,其具有套在主轴上的三角形内径,并通过紧固装置固定到其上,并且两个大致U形的联接板与中空框架 基部在两个相对的两侧,主轴具有在顶部连接的第一倾斜侧壁和第二倾斜侧壁,以及连接在 底部的第一倾斜侧壁和第二倾斜侧壁; 安装框架的U形联接板各自具有两个平行的壁,其在顶部和底部侧面紧密地附接到腿的顶端,并且分别支撑在主轴的倾斜侧壁上。