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11. 发明申请

US20100201975A1 DISK SURFACE INSPECTION APPARATUS, INSPECTION SYSTEM THEREOF, AND INSPECTION METHOD THEREOF 失效
标题翻译：磁盘表面检查装置及其检查系统及其检查方法
公开(公告)号：US20100201975A1
公开(公告)日：2010-08-12
申请号：US12694297
申请日：2010-01-27
申请人： Tatsuo HARIYAMA , Hideaki Sasazawa , Minoru Yoshida , Shigeru Serikawa
发明人： Tatsuo HARIYAMA , Hideaki Sasazawa , Minoru Yoshida , Shigeru Serikawa
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/94 , G01N21/9506
摘要： The invention has a function of preparing a data base for a relation between a defect shape and an arrangement for the optical system capable of detecting the shape at high sensitivity and automatically adjusting the arrangement for the optical system. As the method of preparing the data base, a method of using optical simulation or an experimental method of using a sample having an optical shape is applied. A pinhole position and a beam size are adjusted automatically so as to attain the optimal arrangement for the optical system to an inputted defect shape based on the data base.
摘要翻译：本发明具有为能够以高灵敏度检测形状并自动调整光学系统的配置的光学系统的缺陷形状和布置之间的关系的准备数据库的功能。作为准备数据库的方法，应用使用光学模拟的方法或使用具有光学形状的样本的实验方法。自动调整针孔位置和光束尺寸，以便根据数据库为光学系统达到输入缺陷形状的最佳布置。

12. 发明授权

US07092348B2 Optical recording apparatus capable of changing the length of synchronization portions 有权
标题翻译：能够改变同步部分的长度的光学记录装置
公开(公告)号：US07092348B2
公开(公告)日：2006-08-15
申请号：US11176339
申请日：2005-07-08
申请人： Hideaki Sasazawa , Tohishiko Nakata , Masahiro Watanabe , Shunichi Matsumoto
发明人： Hideaki Sasazawa , Tohishiko Nakata , Masahiro Watanabe , Shunichi Matsumoto
IPC分类号： G11B7/24 , G11B5/09
CPC分类号： G11B20/1217 , G11B7/0045 , G11B7/00454 , G11B7/006 , G11B7/00718 , G11B7/00745 , G11B7/013 , G11B20/10009 , G11B20/12 , G11B2020/10898 , G11B2020/1285 , G11B2020/1287 , G11B2020/1288 , G11B2220/216 , G11B2220/2537
摘要： A method for recording information on a rewritable recording medium includes recording synchronizing signal information in a synchronizing signal portion on the medium, recording data information in a data portion of the medium after the synchronizing signal portion by forming marks in the data portion, and substantially randomly inverting the marks and spaces between the marks each time the information is recorded. The marks for particular areas of the medium are different in a physical property from other areas of the medium and data information is recorded in association with both ends of each of the marks. Upon rewriting of at least the recorded synchronizing signal information, a length of the synchronizing signal portion changes and a start position of the synchronizing signal portion changes, and wherein a change of the synchronizing signal information start position is smaller than a change of the length of the synchronizing signal portion.
摘要翻译：一种用于在可重写记录介质上记录信息的方法包括：将同步信号信息记录在介质上的同步信号部分中，通过在数据部分中形成标记，将数据信息记录在同步信号部分之后的介质的数据部分中，每次记录信息时，反转标记和标记之间的空格。介质的特定区域的标记在物理属性与介质的其他区域不同，并且与每个标记的两端相关联地记录数据信息。在重写至少记录的同步信号信息时，同步信号部分的长度改变，并且同步信号部分的开始位置改变，并且其中同步信号信息开始位置的改变小于同步信号部分。

13. 发明授权

US07084990B2 Method and its apparatus for measuring size and shape of fine patterns 有权
公开(公告)号：US07084990B2
公开(公告)日：2006-08-01
申请号：US10372270
申请日：2003-02-25
申请人： Hideaki Sasazawa , Tohishiko Nakata , Masahiro Watanabe , Shunichi Matsumoto
发明人： Hideaki Sasazawa , Tohishiko Nakata , Masahiro Watanabe , Shunichi Matsumoto
IPC分类号： G01B11/03
CPC分类号： G01B11/02 , G01B11/24
摘要： In size measurement of a semiconductor device, profiles of a pattern formed in a resist process are determined through an exposure/development simulation in respect of individual different combinations of exposure values and focus values to form a profile matrix and scattered light intensity distributions corresponding to the individual profiles are determined through calculation to form a scattered light library, thereby forming a profile library consisting of the profile matrix and scattered light library. A scattered light intensity distribution of an actually measured pattern is compared with the scattered light intensity distributions of the scattered light library and a profile of profile matrix corresponding to a scattered light intensity distribution of scattered light library having the highest coincidence is determined as a three-dimensional shape of the actually measured pattern.

14. 发明申请

US20100182589A1 SPECTRAL DETECTION METHOD AND DEVICE, AND DEFECT INSPECTION METHOD AND APPARATUS USING THE SAME 有权
标题翻译：光谱检测方法和装置，以及缺陷检查方法和使用其的装置
公开(公告)号：US20100182589A1
公开(公告)日：2010-07-22
申请号：US12626963
申请日：2009-11-30
申请人： Takenori HIROSE , Minoru Yoshida , Hideaki Sasazawa , Yasuhiro Yoshitake
发明人： Takenori HIROSE , Minoru Yoshida , Hideaki Sasazawa , Yasuhiro Yoshitake
IPC分类号： G01J3/08 , G01J3/00
CPC分类号： G01J3/02 , G01B2210/56 , G01J3/0208 , G01J3/021 , G01J3/0229 , G01N21/95607
摘要： In spectral detection for detecting the shape of repeating pattern structures uniformly formed on a surface of a test object, it is advantageous to use light having a wide wavelength range in a short wavelength region. However, it is not easy to realize a relatively simple optical system capable of spectral detection of light having a wide wavelength range in a short wavelength region, namely in ultraviolet region. The present invention provides an inspection apparatus for detecting pattern defects. The inspection apparatus includes a spectral detection optical system capable of spectral detection of light in a wavelength range from deep ultraviolet to near infrared. The spectral detection optical system includes a spatially partial mirror serving as a half mirror and a reflecting objective provided with an aperture stop for limiting the angle and direction of light to be applied to and reflected by a test object.
摘要翻译：在用于检测在测试对象的表面上均匀形成的重复图案结构的形状的光谱检测中，有利的是在短波长范围内使用宽波长范围的光。然而，实现能够在短波长区域即紫外线区域中具有宽波长范围的光的光谱检测的相对简单的光学系统是不容易的。本发明提供一种用于检测图案缺陷的检查装置。检查装置包括能够对从深紫外线到近红外线的波长范围内的光进行光谱检测的光谱检测光学系统。光谱检测光学系统包括用作半反射镜的空间部分反射镜和设置有孔径光阑的反射物镜，该孔径光阑用于限制被施加到测试对象并由被测物体反射的光的角度和方向。

15. 发明申请

US20100124370A1 PATTERN SHAPE INSPECTION METHOD AND APPARATUS THEREOF 失效
标题翻译：图案形状检查方法及装置
公开(公告)号：US20100124370A1
公开(公告)日：2010-05-20
申请号：US12620713
申请日：2009-11-18
申请人： Keiya SAITO , Hideaki Sasazawa , Takenori Hirose
发明人： Keiya SAITO , Hideaki Sasazawa , Takenori Hirose
IPC分类号： G06K9/00
CPC分类号： G06K9/4661 , G06T7/0004 , G06T2207/10152
摘要： This invention relates to a pattern shape inspection method and an apparatus thereof for conducting a first step of irradiating wideband illuminating light which contains far ultraviolet light to a sample from a perpendicular direction, inspecting a shape of the pattern based on a spectral waveform of reflecting light detected from the sample, and detecting an edge roughness of the pattern based on the spectral waveform of the reflecting light detected from the sample, and a second step of irradiating a laser beam to the sample from an oblique direction, and detecting the edge roughness of the pattern based on scattered light detected from the sample.
摘要翻译：本发明涉及一种图案形状检查方法及其装置，用于进行从垂直方向向样品照射包含远紫外光的宽带照明光的第一步骤，基于反射光的光谱波形检查图案的形状根据从样品检测的反射光的光谱波形检测图案的边缘粗糙度，以及从倾斜方向照射激光束到样品的第二步骤，并且检测边缘粗糙度基于从样品检测到的散射光的图案。

16. 发明申请

US20090190123A1 METHOD AND APPARATUS FOR DETECTING DEFECTS ON A DISK SURFACE 有权
标题翻译：用于检测磁盘表面缺陷的方法和装置
公开(公告)号：US20090190123A1
公开(公告)日：2009-07-30
申请号：US12359388
申请日：2009-01-26
申请人： Tatsuo HARIYAMA , Hideaki Sasazawa , Minoru Yoshida , Shigeru Serikawa
发明人： Tatsuo HARIYAMA , Hideaki Sasazawa , Minoru Yoshida , Shigeru Serikawa
IPC分类号： G01N21/88 , G06F15/00
CPC分类号： G01N21/8922 , G01N21/9501 , G01N21/9506 , G01N2021/8825 , G01N2021/8854
摘要： The present invention relates to an apparatus for detecting defects on a disk surface which projects light on the disk surface by a light transmitting system, receives specula reflection light and scattered light by a light receiving system, exposes defects by performing a two-dimensional frequency filter process on a signal, and performs a defect determination process to extract a linear-shaped isolative defect candidate. Next, the present invention performs a periodicity determination process to classify and detect the periodically generated linear and circular arc defects and the isolatively generated linear and circular arc defects.
摘要翻译：本发明涉及一种用于检测由透光系统在光盘表面上投射光的盘表面上的缺陷的装置，通过光接收系统接收镜反射光和散射光，通过执行二维频率滤波器来暴露缺陷对信号进行处理，并且执行缺陷确定处理以提取线性形状的隔离缺陷候选。接下来，本发明执行周期性确定处理，以分类和检测周期性产生的线性和圆弧缺陷以及隔离产生的线性和圆弧缺陷。

17. 发明申请

US20060183040A1 Method for controlling semiconductor device production process and a method for producing semiconductor devices 失效
标题翻译：半导体器件制造方法的控制方法以及半导体器件的制造方法
公开(公告)号：US20060183040A1
公开(公告)日：2006-08-17
申请号：US11304778
申请日：2005-12-16
申请人： Hideaki Sasazawa , Yasuhiro Yoshitake
发明人： Hideaki Sasazawa , Yasuhiro Yoshitake
IPC分类号： G03C5/00
CPC分类号： G03F7/70641
摘要： In order to realize individually and easily optimization of exposure conditions such as exposure dose and focus by photolithography in a production process of semiconductor devices, the present invention is such that: light is radiated onto a pattern on a semiconductor wafer; by an optical system that detects information on a pattern shape using scattered light by its reflection, waveforms of an FEM sample wafer having a plurality of shape deformation patterns prepared in advance are detected and stored; one or more characteristic points on a spectral waveform generated in association with a pattern change is recorded; and a variation model of the characteristic points is obtained. As to a pattern to be measured, a spectral waveform is detected in the same manner as that described above, and deviations (exposure dose deviation and focus deviation) of the formation conditions are estimated from a displacement of the characteristic points on the waveform using the variation model. Thereby, the exposure dose and focus can be independently fed back and the process control can be achieved with high accuracy.
摘要翻译：为了在半导体器件的生产过程中实现通过光刻的曝光量和曝光量等的曝光条件的单独和容易的优化，本发明使得：将光照射到半导体晶片上的图案上; 通过利用其反射检测使用散射光的图案形状的信息的光学系统，检测并存储具有预先准备的多个形状变形图案的FEM样品晶片的波形; 记录与图案变化相关联地生成的光谱波形上的一个或多个特征点; 并获得特征点的变化模型。对于要测量的图案，以与上述相同的方式检测光谱波形，并且使用波形的波形上的特征点的位移来估计形成条件的偏差（曝光剂量偏差和聚焦偏差）变异模型。因此，可以独立地反馈曝光剂量和聚焦，并且可以以高精度实现过程控制。

18. 发明申请

US20050243684A1 Information recording method and apparatus 有权
标题翻译：信息记录方法和装置
公开(公告)号：US20050243684A1
公开(公告)日：2005-11-03
申请号：US11176339
申请日：2005-07-08
申请人： Hideaki Sasazawa , Tohishiko Nakata , Masahiro Watanabe , Shunichi Matsumoto
发明人： Hideaki Sasazawa , Tohishiko Nakata , Masahiro Watanabe , Shunichi Matsumoto
IPC分类号： G11B7/00 , G11B7/0045 , G11B7/006 , G11B7/007 , G11B7/013 , G11B20/10 , G11B20/12
CPC分类号： G11B20/1217 , G11B7/0045 , G11B7/00454 , G11B7/006 , G11B7/00718 , G11B7/00745 , G11B7/013 , G11B20/10009 , G11B20/12 , G11B2020/10898 , G11B2020/1285 , G11B2020/1287 , G11B2020/1288 , G11B2220/216 , G11B2220/2537
摘要： A method for recording information on a rewritable recording medium includes recording synchronizing signal information in a synchronizing signal portion on the medium, recording data information in a data portion of the medium after the synchronizing signal portion by forming marks in the data portion, and substantially randomly inverting the marks and spaces between the marks each time the information is recorded. The marks for particular areas of the medium are different in a physical property from other areas of the medium and data information is recorded in association with both ends of each of the marks. Upon rewriting of at least the recorded synchronizing signal information, a length of the synchronizing signal portion changes and a start position of the synchronizing signal portion changes, and wherein a change of the synchronizing signal information start position is smaller than a change of the length of the synchronizing signal portion.
摘要翻译：一种用于在可重写记录介质上记录信息的方法包括：将同步信号信息记录在介质上的同步信号部分中，通过在数据部分中形成标记，将数据信息记录在同步信号部分之后的介质的数据部分中，每次记录信息时，反转标记和标记之间的空格。介质的特定区域的标记在物理属性与介质的其他区域不同，并且与每个标记的两端相关联地记录数据信息。在重写至少记录的同步信号信息时，同步信号部分的长度改变，并且同步信号部分的开始位置改变，并且其中同步信号信息开始位置的改变小于同步信号部分。

19. 发明申请

US20050129304A1 Method and apparatus for measuring shape of bumps 失效
标题翻译：用于测量凸块形状的方法和装置
公开(公告)号：US20050129304A1
公开(公告)日：2005-06-16
申请号：US10964690
申请日：2004-10-15
申请人： Hideaki Sasazawa , Mineo Nomoto , Masatoshi Yamaga , Chikara Iwata , Masashi Uehara
发明人： Hideaki Sasazawa , Mineo Nomoto , Masatoshi Yamaga , Chikara Iwata , Masashi Uehara
IPC分类号： G01B11/24 , G01B11/06 , G06K9/00 , G06T7/00 , H05K3/40 , H05K3/46
CPC分类号： G06T7/0006 , G01B11/0608 , G01B11/24 , G06T2207/30152 , H05K3/4007 , H05K3/4614 , H05K3/4647 , H05K2201/0367 , H05K2203/163
摘要： The present invention provides a bump shape measuring apparatus comprising an illumination optical system which illuminates bumps arranged on a board with illumination light of a low tilt angle to a surface of the board; a detection optical system where reflected light from the bumps is condensed for detection of image signals of the bumps by a high tilt angle to the surface of the board; an image processing unit where an outline of the tip and the base of each of the bumps is calculated based on the image signals of each of the bumps, and geometric characteristics including at least a position and height of each of the bumps are calculated based on the outline of the tip and the base of each of the bumps; and a main control unit where information on the calculated geometric characteristics of the bumps is displayed on a display unit.
摘要翻译：本发明提供一种凸起形状测量装置，包括照明光学系统，其照射布置在基板上的凸起与板的表面具有低倾斜角的照明光; 检测光学系统，其中来自所述凸块的反射光被聚集以便用于检测所述凸块的图像信号与所述板的表面成高度倾斜角; 基于每个凸块的图像信号计算每个凸块的尖端和基部的轮廓的图像处理单元，并且基于每个凸块的至少一个位置和高度的几何特性基于每个凸起的尖端和基部的轮廓; 以及主控制单元，其中在显示单元上显示关于所计算的凸块的几何特性的信息。

20. 发明授权

US06631547B2 Manufacturing method for thin film magnetic heads 失效
标题翻译：薄膜磁头制造方法
公开(公告)号：US06631547B2
公开(公告)日：2003-10-14
申请号：US09778776
申请日：2001-02-08
申请人： Minoru Yoshida , Hideaki Sasazawa , Toshihiko Nakata , Minoru Yamasaka
发明人： Minoru Yoshida , Hideaki Sasazawa , Toshihiko Nakata , Minoru Yamasaka
IPC分类号： G11B5127
CPC分类号： B82Y25/00 , B82Y10/00 , G11B5/3166 , G11B5/3173 , G11B2005/3996 , Y10T29/49004 , Y10T29/49025 , Y10T29/49032 , Y10T29/49036 , Y10T29/49048 , Y10T29/49131
摘要： To measure positions of a plurality of thin film magnetic head elements formed in a line on a bar, the quantity of positions of samples in the bar is estimated from the magnetic head elements the amount of deviation in position of the next element, and the distance between the elements are obtained, and the amount of deviation and distance are estimated by a primary approximate linear or several-order approximate curve. The estimated amount and the distance between the elements are moved simultaneously, and an image formed by a lens optical system is photo-converted to an image signal, and dimensions are computed. The conversion step is carried out immediately after movement of the next element and is continuously repeated, and the computing step is processed in parallel with the conversation step.
摘要翻译：为了测量形成在棒上的线中的多个薄膜磁头元件的位置，从磁头元件估计条中样品的位置数量，下一个元件的位置偏差量以及距离获得元素之间的距离，并且通过初级近似线性或几阶近似曲线来估计偏差量和距离。估计的量和元件之间的距离同时移动，并且由透镜光学系统形成的图像被光转换成图像信号，并且计算尺寸。转换步骤在下一个元素的移动之后立即执行并且被连续地重复，并且计算步骤与对话步骤并行处理。

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