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1. 发明授权

US06631547B2 Manufacturing method for thin film magnetic heads 失效
标题翻译：薄膜磁头制造方法
公开(公告)号：US06631547B2
公开(公告)日：2003-10-14
申请号：US09778776
申请日：2001-02-08
申请人： Minoru Yoshida , Hideaki Sasazawa , Toshihiko Nakata , Minoru Yamasaka
发明人： Minoru Yoshida , Hideaki Sasazawa , Toshihiko Nakata , Minoru Yamasaka
IPC分类号： G11B5127
CPC分类号： B82Y25/00 , B82Y10/00 , G11B5/3166 , G11B5/3173 , G11B2005/3996 , Y10T29/49004 , Y10T29/49025 , Y10T29/49032 , Y10T29/49036 , Y10T29/49048 , Y10T29/49131
摘要： To measure positions of a plurality of thin film magnetic head elements formed in a line on a bar, the quantity of positions of samples in the bar is estimated from the magnetic head elements the amount of deviation in position of the next element, and the distance between the elements are obtained, and the amount of deviation and distance are estimated by a primary approximate linear or several-order approximate curve. The estimated amount and the distance between the elements are moved simultaneously, and an image formed by a lens optical system is photo-converted to an image signal, and dimensions are computed. The conversion step is carried out immediately after movement of the next element and is continuously repeated, and the computing step is processed in parallel with the conversation step.
摘要翻译：为了测量形成在棒上的线中的多个薄膜磁头元件的位置，从磁头元件估计条中样品的位置数量，下一个元件的位置偏差量以及距离获得元素之间的距离，并且通过初级近似线性或几阶近似曲线来估计偏差量和距离。估计的量和元件之间的距离同时移动，并且由透镜光学系统形成的图像被光转换成图像信号，并且计算尺寸。转换步骤在下一个元素的移动之后立即执行并且被连续地重复，并且计算步骤与对话步骤并行处理。

2. 发明授权

US08736830B2 Pattern inspection device of substrate surface and pattern inspection method of the same 有权
标题翻译：基板表面图案检查装置及图案检验方法相同
公开(公告)号：US08736830B2
公开(公告)日：2014-05-27
申请号：US13145968
申请日：2009-12-10
申请人： Masahiro Watanabe , Toshihiko Nakata , Yasuhiro Yoshitake , Hideaki Sasazawa , Minoru Yoshida
发明人： Masahiro Watanabe , Toshihiko Nakata , Yasuhiro Yoshitake , Hideaki Sasazawa , Minoru Yoshida
IPC分类号： G01N21/00
CPC分类号： G01Q60/22 , G01N21/95607 , G11B5/84
摘要： There is provided a pattern inspection device for a substrate surface which can inspect a substrate including a pattern whose size is equal to or smaller than light resolution limit at high speed. The pattern inspection device for the substrate surface includes: a near-field optical head 101 having a fine repetitive pattern; a θ driving unit 311 of scanning an inspected substrate 900 relatively to the near-field optical head 101; a space holding mechanism of holding a space between the near-field optical head 101 and the inspected substrate 900 constant; alight source 110 of irradiating light to the near-field optical head 101; a detection system 201 of detecting an intensity of scattered light generated by interaction between the fine repetitive pattern on the near-field optical head 101 and a fine pattern on a surface of the inspected substrate 900; and a signal processing unit 321 of inspecting the fine pattern on the inspected substrate 900 based on an output of the detection system 201.
摘要翻译：提供了一种用于基板表面的图案检查装置，其能够高速检查尺寸等于或小于光分辨率极限的图案的基板。用于基板表面的图案检查装置包括：具有精细重复图案的近场光学头101; a＆thetas; 驱动单元311，其相对于近场光学头101扫描被检查的基板900; 在近场光学头101和被检查基板900之间保持一定间隔的空间保持机构; 将光照射到近场光学头101的光源110; 检测系统201，用于检测由近场光学头101上的细重复图案与被检查基板900的表面上的微细图案之间的相互作用产生的散射光的强度; 以及基于检测系统201的输出来检查被检查基板900上的精细图案的信号处理单元321。

3. 发明申请

US20120013890A1 PATTERN INSPECTION DEVICE OF SUBSTRATE SURFACE AND PATTERN INSPECTION METHOD OF THE SAME 有权
标题翻译：基板表面图案检测装置及其图案检测方法
公开(公告)号：US20120013890A1
公开(公告)日：2012-01-19
申请号：US13145968
申请日：2009-12-10
申请人： Masahiro Watanabe , Toshihiko Nakata , Yasuhiro Yoshitake , Hideaki Sasazawa , Minoru Yoshida
发明人： Masahiro Watanabe , Toshihiko Nakata , Yasuhiro Yoshitake , Hideaki Sasazawa , Minoru Yoshida
IPC分类号： G01N21/956 , G01N21/47
CPC分类号： G01Q60/22 , G01N21/95607 , G11B5/84
摘要： There is provided a pattern inspection device for a substrate surface which can inspect a substrate including a pattern whose size is equal to or smaller than light resolution limit at high speed. The pattern inspection device for the substrate surface includes: a near-field optical head 101 having a fine repetitive pattern; a θ driving unit 311 of scanning an inspected substrate 900 relatively to the near-field optical head 101; a space holding mechanism of holding a space between the near-field optical head 101 and the inspected substrate 900 constant; alight source 110 of irradiating light to the near-field optical head 101; a detection system 201 of detecting an intensity of scattered light generated by interaction between the fine repetitive pattern on the near-field optical head 101 and a fine pattern on a surface of the inspected substrate 900; and a signal processing unit 321 of inspecting the fine pattern on the inspected substrate 900 based on an output of the detection system 201.
摘要翻译：提供了一种用于基板表面的图案检查装置，其能够高速检查尺寸等于或小于光分辨率极限的图案的基板。用于基板表面的图案检查装置包括：具有精细重复图案的近场光学头101; a＆thetas; 驱动单元311，其相对于近场光学头101扫描被检查的基板900; 在近场光学头101和被检查基板900之间保持一定间隔的空间保持机构; 将光照射到近场光学头101的光源110; 检测系统201，用于检测由近场光学头101上的细重复图案与被检查基板900的表面上的微细图案之间的相互作用产生的散射光的强度; 以及基于检测系统201的输出来检查被检查基板900上的精细图案的信号处理单元321。

4. 发明授权

US07355143B1 Circuit board production method and its apparatus 失效
标题翻译：电路板生产方法及其设备
公开(公告)号：US07355143B1
公开(公告)日：2008-04-08
申请号：US09763735
申请日：1999-12-27
申请人： Hiroyuki Nakano , Toshihiko Nakata , Masayoshi Serizawa , Hideaki Sasazawa
发明人： Hiroyuki Nakano , Toshihiko Nakata , Masayoshi Serizawa , Hideaki Sasazawa
IPC分类号： B23K10/00 , B23K26/00
CPC分类号： G01N15/0227 , G01N15/0211 , G01N2015/0216
摘要： Making it possible to execute the detection of the particles floating inside a processing chamber with the use of an optical system including one observing window and one unit (An object of the present invention is, by using an optical system including one observing window and one unit, to make it possible to execute the detection of the particles floating inside a processing chamber.) Also, in order to be able to detect exceedingly feeble particle scattered-lights with a high-accuracy, when performing a desired thin-film forming or thin-film processing treatment toward a to-be-processed target inside the processing chamber, the following method is employed: First, the irradiation with a beam is executed into the processing chamber through the observing window. Here, the beam is P-polarized and is intensity-modulated with a frequency differing from an exciting source's frequency and its integer-multiples, and the observing window has an inclination that forms Brewster angle toward the P-polarized incident beam. Next, backward scattered-lights scattered by the particles inside the processing chamber are received and image-photographed at a detecting optical system through the above-described one and the same observing window. Moreover, the above-described frequency component and a wavelength component of the above-described intensity-modulated beam are detected out of the received signals. Finally, the detected components and the image-photographed image information are used so as to judge the number, the size, and the distribution of the particles.
摘要翻译：通过使用包括一个观察窗口和一个单元的光学系统，可以执行浮动在处理室内的颗粒的检测。本发明的目的是通过使用包括一个观察窗口和一个单元的光学系统，使得可以执行浮在处理室内的颗粒的检测。）此外，为了能够以高精度检测到极度微弱的粒子散射光，当进行所需的薄膜形成或薄对处理室内的待处理靶材进行膜处理，采用以下方法：首先，通过观察窗口将光束照射进入处理室。这里，光束是P偏振光并且以不同于激发光源的频率和其整数倍的频率进行强度调制，并且观察窗口具有朝向P偏振入射光束形成布鲁斯特角的倾斜度。接下来，通过上述同一观察窗口，在检测光学系统中接收并处理由处理室内的颗粒散射的向后散射光并进行图像拍摄。此外，从接收信号中检测出上述强度调制波束的上述频率分量和波长分量。最后，使用检测到的分量和图像拍摄图像信息来判断粒子的数量，大小和分布。

5. 发明授权

US06831277B1 Method for measuring dimensions and alignment of thin film magnetic head and apparatus therefor 失效
标题翻译：测量薄膜磁头尺寸和对准方法及其设备
公开(公告)号：US06831277B1
公开(公告)日：2004-12-14
申请号：US09437265
申请日：1999-11-10
申请人： Toshihiko Nakata , Hideaki Sasazawa , Kenji Furusawa , Minako Morisato , Hideo Yamakura , Toshio Tamura
发明人： Toshihiko Nakata , Hideaki Sasazawa , Kenji Furusawa , Minako Morisato , Hideo Yamakura , Toshio Tamura
IPC分类号： G01B1100
CPC分类号： G11B5/3173 , G11B5/3103 , G11B5/3166 , G11B5/3169 , G11B5/3189 , G11B5/3903 , G11B5/3967 , Y10T29/49036
摘要： A method of measuring variation in dimensions and alignment error of thin film magnetic heads formed on a raw bar cut-off from a substrate is provided. Such method comprises illuminating a MR element and a resistance detector element which is formed for monitoring a lapping process, both of which are formed on the raw bar, with illuminating light whose wavelength is 300 nm or less; forming an image by imaging light reflected from the elements; and converting the image to an image signal through photoelectric conversion so as to detect variation in dimensions of the MR element and the resistance detector element formed on the raw bar, and alignment error between the MR element and the resistance detector element with a high degree of accuracy.
摘要翻译：提供了一种测量从基板上切割的生条上形成的薄膜磁头的尺寸变化和对准误差的方法。这种方法包括：照射MR元件和电阻检测器元件，该元件形成用于监测两者都是在原料条上形成的研磨过程，其中波长为300nm或更小的照明光; 通过对从元件反射的光进行成像来形成图像; 并且通过光电转换将图像转换成图像信号，以便检测形成在原始条上的MR元件和电阻检测器元件的尺寸变化，以及MR元件和电阻检测器元件之间的对准误差准确性。

6. 发明授权

US07446866B2 Apparatus and method for inspecting pattern 失效
标题翻译：用于检查图案的装置和方法
公开(公告)号：US07446866B2
公开(公告)日：2008-11-04
申请号：US11488620
申请日：2006-07-19
申请人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
发明人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
IPC分类号： G01N21/00
CPC分类号： G01N21/21 , G01N21/33 , G01N21/55 , G01N21/9501 , G01N21/956 , G01N21/95607 , G01N2021/151 , G01N2021/95615 , G01N2201/06113 , G01N2201/1035
摘要： An apparatus for inspecting defects including a table which mounts a specimen to be inspected and which is movable in a plane, an ultraviolet light source for emitting ultraviolet light, an illuminating unit for illuminating the specimen mounted on the table with light emitted from the ultraviolet light source, a detecting unit for forming an image of the specimen illuminated by the illuminating unit and for detecting the image with an image sensor, and an image processing unit for processing the image detected by the image sensor and for outputting information about defects detected on the specimen. The illuminating unit and detecting unit are disposed in a clean environment which is supplied therein with clean gas and which is separated from outside by a wall.
摘要翻译：一种用于检查缺陷的装置，包括安装待检查样本并且可在平面中移动的台面，用于发射紫外线的紫外光源的照明单元，用于对从紫外线发射的光照射安装在桌子上的样本的照明单元源，用于形成由所述照明单元照射的所述样本的图像并且用图像传感器检测图像的检测单元，以及图像处理单元，用于处理由所述图像传感器检测到的图像，并且用于输出关于在所述图像传感器上检测到的缺陷的信息; 标本。照明单元和检测单元设置在清洁的环境中，其中提供有清洁的气体并且由壁与外部分离。

7. 发明申请

US20070052955A1 Method and equipment for detecting pattern defect 失效
标题翻译：检测图案缺陷的方法和设备
公开(公告)号：US20070052955A1
公开(公告)日：2007-03-08
申请号：US11593091
申请日：2006-11-06
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01N21/88 , G01J4/00
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： An Inspection apparatus and method includes utilizing an emitter which emits a light beam, an illumination optical system, a detection optical system, and a processor. The illumination optical system includes a polarization controller, a coherence reducer, and an objective lens, for illuminating a specimen with a polarization condition controlled and coherency reduced light beam through the objective lens. The detection optical system includes an imaging lens and a sensor for detecting an image of the specimen illuminated by the light beam through the illumination optical system. The processor processes a signal outputted from the sensor and detects a defect on the specimen.
摘要翻译：检查装置和方法包括利用发射光束的发射器，照明光学系统，检测光学系统和处理器。照明光学系统包括偏振控制器，相干减少器和物镜，用于照射具有偏振状态的样本并通过物镜降低光束的相干性。检测光学系统包括成像透镜和用于检测由通过照明光学系统的光束照射的样本的图像的传感器。处理器处理从传感器输出的信号并检测样本上的缺陷。

8. 发明授权

US07132669B2 Method and equipment for detecting pattern defect 有权
标题翻译：检测图案缺陷的方法和设备
公开(公告)号：US07132669B2
公开(公告)日：2006-11-07
申请号：US11184981
申请日：2005-07-20
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： An Inspection apparatus and method includes utilizing a laser source which emits an ultraviolet laser beam, an illumination optical system, a detection optical system, and a processor. The illumination optical system includes a polarization controller, a coherence reducer and an objective lens for illuminating a specimen with a polarization condition controlled and coherency reduced ultraviolet laser beam through the objective lens. The detection optical system includes an imaging lens and a sensor for detecting an image of the specimen illuminated by the ultraviolet laser beam through the illumination optical system. The processor processes a signal outputted from the sensor and detects a defect on the specimen.
摘要翻译：一种检查装置和方法，包括利用发射紫外激光束的激光源，照明光学系统，检测光学系统和处理器。照明光学系统包括偏振控制器，相干减少器和用于照射具有偏振状态的样本的物镜，并且通过物镜减少紫外激光束的相干性。检测光学系统包括成像透镜和用于检测通过照明光学系统由紫外线激光束照射的样本的图像的传感器。处理器处理从传感器输出的信号并检测样本上的缺陷。

9. 发明授权

US06921905B2 Method and equipment for detecting pattern defect 失效
标题翻译：检测图案缺陷的方法和设备
公开(公告)号：US06921905B2
公开(公告)日：2005-07-26
申请号：US10947262
申请日：2004-09-23
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01N21/00 , G01N21/88 , G01N21/95 , G01N21/956 , G02B5/09 , G02B26/12
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： Inspection apparatus and method in which laser source emits a laser beam and a coherence of the laser beam emitted from the laser source is reduced by a coherence reducer. A detector detects light from the sample irradiated with the coherence reduced laser beam and a processor processes a signal outputted from the detector and detects a defect on the sample. The coherence reducer has an optical path which includes a plurality of at least one of optical fibers and glass rods.
摘要翻译：激光源发射激光束的检查装置和方法，并且通过相干减少器减少从激光源发射的激光束的相干性。检测器检测来自用相干减少的激光束照射的样品的光，处理器处理从检测器输出的信号，并检测样品上的缺陷。相干减光器具有包括光纤和玻璃棒中的至少一个的光路。

10. 发明申请

US20050045830A1 Method and equipment for detecting pattern defect 失效
公开(公告)号：US20050045830A1
公开(公告)日：2005-03-03
申请号：US10947262
申请日：2004-09-23
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01N21/00 , G01N21/88 , G01N21/95 , G01N21/956 , G02B5/09 , G02B26/12
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： Inspection apparatus and method in which laser source emits a laser beam and a coherence of the laser beam emitted from the laser source is reduced by a coherence reducer. A detector detects light from the sample irradiated with the coherence reduced laser beam and a processor processes a signal outputted from the detector and detects a defect on the sample. The coherence reducer has an optical path which includes a plurality of at least one of optical fibers and glass rods.

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