专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

11. 发明申请

US20070183092A1 Magnetic head having notched first magnetic pole 有权
标题翻译：磁头具有切口第一磁极
公开(公告)号：US20070183092A1
公开(公告)日：2007-08-09
申请号：US11347356
申请日：2006-02-03
申请人： Daniel Bedell , Vladimir Nikitin , Aron Pentek
发明人： Daniel Bedell , Vladimir Nikitin , Aron Pentek
IPC分类号： G11B5/147
CPC分类号： G11B5/3116 , G11B5/3163 , Y10T29/49032 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A multi-step process for notching the P1 pole of the write head element of a magnetic head. In a first step following the fabrication of the P2 pole tip, a layer of protective material is deposited on the approximately vertical side surfaces of the P2 pole tip. Thereafter, a first ion milling step, utilizing a species such as argon, is performed to mill through the write gap layer and to notch into the P1 pole layer therebelow. The removal of redeposited material from the side surfaces of the P2 pole tip is thereafter accomplished and the protective material formed on the side surfaces of the P2 pole tip protects the P2 pole tip during the redeposition clean up step. Thereafter, the protective material is removed from the side surfaces of the P2 pole tip, and a second ion milling step is performed to further notch the P1 pole material.
摘要翻译：用于切割磁头的写入头元件的P1极的多步骤过程。在制造P2极尖之后的第一步骤中，在P2极尖的大致垂直侧表面上沉积有一层保护材料。此后，进行利用物质如氩的第一离子研磨步骤，通过写入间隙层研磨并陷入其下方的P1极层。然后，从P2极尖端的侧面去除再沉积材料，并且形成在P2极端部的侧表面上的保护材料在再沉积清洁步骤期间保护P2极尖。然后，从P2极端部的侧面除去保护材料，进行第二离子研磨工序，进一步切断P1极材料。

12. 发明申请

US20060070232A1 Method for reducing pole height loss in the formation of a write pole for a magnetic write head 失效
标题翻译：降低写入磁头写磁极的磁极高度损失的方法
公开(公告)号：US20060070232A1
公开(公告)日：2006-04-06
申请号：US10957038
申请日：2004-09-30
申请人： Daniel Bedell , Jennifer Loo , Aron Pentek , Murali Ramasubramanian
发明人： Daniel Bedell , Jennifer Loo , Aron Pentek , Murali Ramasubramanian
IPC分类号： G11B5/187
CPC分类号： G11B5/3163 , G11B5/187 , Y10T29/49021 , Y10T29/49041 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method for reducing plated pole height loss in the formation of a write pole for a magnetic write head is disclosed. The method includes forming a conductive layer on a thin film substrate, forming a photoresist layer on the conductive layer and forming a trench in the photoresist layer. A thick seed layer is then placed on the trench and on the photoresist layer surface using a collimator. Moreover, the process includes plating while applying a voltage to the thin film substrate where the electrically isolated seed layer is removed and the trench is filled with plating material, removing the photoresist layer, and removing the exposed portions of the conductive layer on the thin film substrate.
摘要翻译：本发明公开了一种在形成写磁头写磁极时降低电极高度损耗的方法。该方法包括在薄膜基板上形成导电层，在导电层上形成光致抗蚀剂层，并在光刻胶层中形成沟槽。然后使用准直器将厚的种子层放置在沟槽和光致抗蚀剂层表面上。此外，该方法包括电镀，同时向薄膜基板施加电压，其中去除电隔离种子层，并且沟槽填充有电镀材料，去除光致抗蚀剂层，以及去除薄膜上的导电层的暴露部分基质。

13. 发明申请

US20050047014A1 Apparatus for patterning a self-aligned coil using a damascene process 有权
标题翻译：用于使用镶嵌工艺图案化自对准线圈的装置
公开(公告)号：US20050047014A1
公开(公告)日：2005-03-03
申请号：US10652877
申请日：2003-08-29
申请人： Daniel Bedell , Quang Le , Edward Lee , Son Nguyen , Vladimir Nikitin , Murali Ramasubramanian
发明人： Daniel Bedell , Quang Le , Edward Lee , Son Nguyen , Vladimir Nikitin , Murali Ramasubramanian
IPC分类号： G11B5/127 , G11B5/147
CPC分类号： G11B5/127
摘要： An apparatus for patterning a self-aligned coil using a damascene process is disclosed. Coil pockets are formed in a first insulation layer disposed over a first pole layer. A barrier/seed layer is deposited along walls of the coil pockets in the insulation layer. Copper is formed in the coil pockets and over the insulation layer. The copper is planarized down to the insulation layer. The self-aligned coil process packs more copper into the same coil pocket and relaxes the coil alignment tolerance. Protrusions are prevented because of the more efficient and uniform spacing of the coil to reduce heat buildup in the head during a write.
摘要翻译：公开了一种使用镶嵌工艺图案化自对准线圈的装置。在设置在第一极层上的第一绝缘层中形成线圈腔。隔离层/籽晶层沿绝缘层中的线圈袋的壁被沉积。在线圈袋中形成铜，并在绝缘层上形成铜。铜平坦化到绝缘层。自对准线圈工艺将更多的铜包装到相同的线圈袋中，并松弛线圈对准公差。由于在写入期间线圈的间隔更加有效和均匀以减少头部的积聚，所以防止了突起。

14. 发明申请

US20050045848A1 Method for patterning a self-aligned coil using a damascene process 失效
标题翻译：使用镶嵌工艺图案化自对准线圈的方法
公开(公告)号：US20050045848A1
公开(公告)日：2005-03-03
申请号：US10652878
申请日：2003-08-29
申请人： Daniel Bedell , Quang Le , Edward Lee , Son Nguyen , Vladimir Nikitin , Murali Ramasubramanian
发明人： Daniel Bedell , Quang Le , Edward Lee , Son Nguyen , Vladimir Nikitin , Murali Ramasubramanian
IPC分类号： A62C2/00 , A62D1/00 , B44C1/22 , G11B5/17 , G11B5/31 , G11B5/39 , H01F41/04
CPC分类号： G11B5/3967 , G11B5/17 , G11B5/3116 , G11B5/313 , G11B5/3136 , G11B5/3163 , H01F41/041 , Y10T29/49021
摘要： A method for patterning a self-aligned coil using a damascene process is disclosed. Coil pockets are formed in a first insulation layer disposed over a first pole layer. A barrier/seed layer is deposited along walls of the coil pockets in the insulation layer. Copper is formed in the coil pockets and over the insulation layer. The copper is planarized down to the insulation layer. The self-aligned coil process packs more copper into the same coil pocket and relaxes the coil alignment tolerance. Protrusions are prevented because of the more efficient and uniform spacing of the coil to reduce heat buildup in the head during a write.
摘要翻译：公开了一种使用镶嵌工艺图案化自对准线圈的方法。在设置在第一极层上的第一绝缘层中形成线圈腔。隔离层/籽晶层沿绝缘层中的线圈袋的壁被沉积。在线圈袋中形成铜，并在绝缘层上形成铜。铜平坦化到绝缘层。自对准线圈工艺将更多的铜包装到相同的线圈袋中，并松弛线圈对准公差。由于在写入期间线圈的间隔更加有效和均匀以减少头部的积聚，所以防止了突起。

15. 发明申请

US20050229354A1 Method and apparatus for removing debris from a surface 审中-公开
标题翻译：从表面去除碎屑的方法和装置
公开(公告)号：US20050229354A1
公开(公告)日：2005-10-20
申请号：US10828006
申请日：2004-04-19
申请人： Bryan Dinteman , Daniel Bedell
发明人： Bryan Dinteman , Daniel Bedell
IPC分类号： A47L5/14 , E01H1/08
CPC分类号： E01H1/0863
摘要： An apparatus for removing debris from a surface employs an air jet to lift the debris from the surface and then vacuums the lifted debris into a container.
摘要翻译：用于从表面去除碎屑的装置使用空气射流来从表面提起碎屑，然后将提升的碎屑真空吸入容器。

16. 发明授权

US06758978B1 Deep bed thickener/clarifiers with enhanced liquid removal 有权
标题翻译：深层增稠剂/澄清剂，具有增强的液体去除效果
公开(公告)号：US06758978B1
公开(公告)日：2004-07-06
申请号：US10049214
申请日：2002-02-05
申请人： Daniel Bedell
发明人： Daniel Bedell
IPC分类号： B01D2106
CPC分类号： B01D21/2461 , B01D21/0042 , B01D21/01 , B01D21/06 , B01D21/18 , B01D21/2405 , B01D21/2427
摘要： The enhanced deliquifying of the compacted bed of deep bed thickener/clarifier is disclosed. Such an apparatus comprises a vessel receiving a slurry of liquid and solid particles suspended in the liquid. The vessel defines a free settling zone, a hindered settling zone intermediate, an upper clarification zone and a lower compaction zone. A deliquifying member is provided in the vessel extending up between at least two zones for facilitating the upward flow of free liquid from one of the lower zones and the settling of particulates. A rotating rake shaft with pickets are so designed to release the interstitial liquid trapped in a lower zone. The pickets provide pathways for liquid to release generally vertically. The release liquid travels upward to the deliquifying member and on into the clarification zone. The lower zone, freed of the interstitial water, further collapses becoming more concentrated or dense.
摘要翻译：公开了深层增稠器/澄清器的压实床的增强的脱色。这种装置包括容纳悬浮在液体中的液体和固体颗粒的浆液的容器。容器限定自由沉降区，受阻沉降区中间体，上澄清区和下压实区。在容器中提供了一种改质构件，其在至少两个区域之间向上延伸，以便于从下部区域之一向上流动游离液体并使颗粒物沉降。具有支柱的旋转式前轮轴被设计成释放被困在下部区域中的间隙液体。纠察者提供液体通常垂直释放的途径。释放液体向上移动到分离构件并进入澄清区。释放间隙水的下部区域进一步塌缩变得更加集中或致密。

17. 发明申请

US20050130078A1 Plating using copolymer 有权
标题翻译：电镀使用共聚物
公开(公告)号：US20050130078A1
公开(公告)日：2005-06-16
申请号：US10733097
申请日：2003-12-10
申请人： Daniel Bedell , Gregory Breyta , Tom Harris , April Hixson-Goldsmith , Murali Ramasubramanian , Alfred Renaldo , Benjamin Wang
发明人： Daniel Bedell , Gregory Breyta , Tom Harris , April Hixson-Goldsmith , Murali Ramasubramanian , Alfred Renaldo , Benjamin Wang
IPC分类号： G03F7/00 , G03F7/085 , G03F7/09 , G03F7/11
CPC分类号： C09D125/18 , G03F7/085 , G03F7/094 , G03F7/11
摘要： Method of plating using a polymeric barrier layer including a polyphenolic polymer which has a repeating unit of the formula: wherein R1, R2, R3, R4, and R5 are individually hydrogen, a hydroxy group or an azo dye.
摘要翻译：使用包含具有下式重复单元的多酚聚合物的聚合物阻挡层的电镀方法：其中R 1，R 2，R 3， R 4，R 5和R 5分别是氢，羟基或偶氮染料。

18. 发明申请

US20070102388A1 Vented, low-drip nursing nipple 审中-公开
标题翻译：通风，低滴乳头
公开(公告)号：US20070102388A1
公开(公告)日：2007-05-10
申请号：US11262016
申请日：2005-10-28
申请人： Julie Lewis , Daniel Bedell
发明人： Julie Lewis , Daniel Bedell
IPC分类号： A61J11/00 , A61J9/00
CPC分类号： A61J11/02 , A61J11/0015 , A61J11/0035 , A61J11/045
摘要： A nipple assembly for a nursing bottle includes a nipple having a slit at the bottom of a concave depression in its tip acting as a fluid outlet valve. The nipple includes a flange seated on the rim of the bottle and held in place by a cap having a central opening through which the nipple extends. A threaded ring on the cap engages the threaded bottle neck with the outer circumferential edge of the nipple's flange compressed between the annular top and the rim of the bottle. The nipple flange includes vent apertures between its inner and outer circumferential edges, and a raised annular bead between its inner circumferential edge and the aperture. The annular bead provides a seal between flange and the cap that prevents fluid from leaking out the vent apertures when air pressure within the bottle is not substantially lower than ambient air pressure. When the air pressure inside the bottle falls below ambient air pressure as the infant suck fluid from the bottle, the annular bead moves away from the cap to break the seal, thereby permitting air to pass through the central opening and into the bottle via the vent apertures. The nipple includes one or more raised annular beads to provide tactile stimulation to a nursing infant and to improve the seal between the infant's lips and the nipple body to limit fluid leakage.
摘要翻译：用于护理瓶的乳头组件包括在其作为流体出口阀的尖端中的凹陷凹陷的底部具有狭缝的乳头。乳头包括位于瓶的边缘上的凸缘，并通过具有中心开口的帽保持在适当的位置，乳头通过该中心开口延伸。盖上的螺纹环与螺纹瓶颈接合，乳头凸缘的外圆周边缘压缩在环形顶部和瓶边缘之间。乳头法兰包括在其内圆周边缘和外圆周边缘之间的通气孔，以及在其内圆周边缘和孔之间的凸起的环形凸缘。环形凸缘在凸缘和盖之间提供密封，当瓶内的空气压力基本上不低于环境空气压力时，防止流体泄漏出通气口。当婴儿从瓶子吸入液体时，瓶内的空气压力下降到环境空气压力以下时，环形小珠离开盖子脱离密封，从而允许空气通过中心开口通过排气口进入瓶子孔。乳头包括一个或多个凸起的环形珠，以向哺乳婴儿提供触觉刺激，并改善婴儿嘴唇和乳头体之间的密封，以限制流体泄漏。

19. 发明申请

US20050152064A1 Magnetic head coil system and damascene/reactive ion etching method for manufacturing the same 失效
标题翻译：磁头线圈系统和镶嵌/反应离子蚀刻方法制造相同
公开(公告)号：US20050152064A1
公开(公告)日：2005-07-14
申请号：US11040387
申请日：2005-01-20
申请人： Daniel Bedell , Richard Hsiao , James Jarratt , Patrick Webb , Sue Zhang
发明人： Daniel Bedell , Richard Hsiao , James Jarratt , Patrick Webb , Sue Zhang
IPC分类号： G11B5/17 , G11B5/31 , G11B5/147
CPC分类号： G11B5/313 , G11B5/3123 , G11B5/3163 , Y10T29/49021 , Y10T29/49032 , Y10T29/4906 , Y10T29/49064 , Y10T29/49073
摘要： A system and method are provided for manufacturing a coil structure for a magnetic head. Initially, an insulating layer is deposited with a photoresist layer deposited on the insulating layer. Moreover, a silicon dielectric layer is deposited on the photoresist layer as a hard mask. The silicon dielectric layer is then masked. A plurality of channels is subsequently formed in the silicon dielectric layer using reactive ion etching (i.e. CF4/CHF3). The silicon dielectric layer is then used as a hard mask to transfer the channel pattern in the photoresist layer using reactive ion etching with, for example, H2/N2/CH3F/C2H4 reducing chemistry. To obtain an optimal channel profile with the desired high aspect ratio, channel formation includes a first segment defining a first angle and a second segment defining a second angle. Thereafter, a conductive seed layer is deposited in the channels and the channels are filled with a conductive material to define a coil structure. Chemical-mechanical polishing may then be used to planarize the conductive material.
摘要翻译：提供一种用于制造用于磁头的线圈结构的系统和方法。首先，沉积有沉积在绝缘层上的光致抗蚀剂层的绝缘层。此外，硅介电层作为硬掩模沉积在光致抗蚀剂层上。然后掩蔽硅介电层。随后使用反应离子蚀刻（即CF 4 / CH 3）3在硅介电层中形成多个通道。然后将硅介电层用作硬掩模，以使用例如H 2/2 N 2 / CH的反应离子蚀刻将光致抗蚀剂层中的沟道图案转印还原化学反应。为了获得具有期望的高纵横比的最佳通道轮廓，通道形成包括限定第一角度的第一段和限定第二角度的第二段。此后，导电种子层沉积在通道中，并且通道填充有导电材料以限定线圈结构。然后可以使用化学机械抛光来平坦化导电材料。

20. 发明申请

US20050066517A1 Ion mill process with sacrificial mask layer to fabricate pole tip for perpendicular recording 失效
标题翻译：离子磨工艺用牺牲掩模层制造极尖用于垂直记录
公开(公告)号：US20050066517A1
公开(公告)日：2005-03-31
申请号：US10676728
申请日：2003-09-30
申请人： Daniel Bedell , Tom Harris , Gautam Khera
发明人： Daniel Bedell , Tom Harris , Gautam Khera
IPC分类号： G11B5/33 , G11B5/127
CPC分类号： G11B5/33 , Y10T29/49041 , Y10T29/49043 , Y10T29/49046 , Y10T29/4906
摘要： A method of fabrication of the write head of a perpendicular recording head allows for production of P3 pole tips of width less than 200 nm (200×10−9 meters). The method includes fabricating the P2 flux shaping layer, depositing the P3 layer, depositing a layer of ion-milling resistant material, depositing at least one sacrificial layer, shaping the P3 layer into P3 pole tip, removing the at least one sacrificial layer to leave the P3 pole tip, and encapsulating the P3 pole tip.
摘要翻译：制造垂直记录头的写入头的方法允许制造宽度小于200nm（200×10 -9米）的P3极尖。该方法包括制造P2通量成形层，沉积P3层，沉积抗离子碾磨材料层，沉积至少一个牺牲层，将P3层成形为P3极尖，去除至少一个牺牲层以离开 P3极尖，并封装P3极尖。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式