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11. 发明授权

US08869741B2 Methods and apparatus for dual confinement and ultra-high pressure in an adjustable gap plasma chamber 有权
标题翻译：在可调间隙等离子体室中双重限制和超高压的方法和装置
公开(公告)号：US08869741B2
公开(公告)日：2014-10-28
申请号：US12368843
申请日：2009-02-10
申请人： Andreas Fischer , Eric Hudson
发明人： Andreas Fischer , Eric Hudson
IPC分类号： C23C16/50 , C23C16/503 , C23C16/505 , C23C16/509 , H01L21/306 , C23F1/00 , H01J37/32 , C23C16/06 , C23C16/22
CPC分类号： H01J37/32091 , H01J37/32449 , H01J37/32532 , H01J37/32541 , H01J37/32568 , H01J37/32623 , H01J37/32642 , H01J37/32816 , H01J37/3299 , H01L21/3065
摘要： A plasma processing system having a plasma processing chamber configured for processing a substrate is provided. The plasma processing system includes at least an upper electrode and a lower electrode for processing the substrate. The substrate is disposed on the lower electrode during plasma processing, where the upper electrode and the substrate forms a first gap. The plasma processing system also includes an upper electrode peripheral extension (UE-PE). The UE-PE is mechanically coupled to a periphery of the upper electrode, where the UE-PE is configured to be non-coplanar with the upper electrode. The plasma processing system further includes a cover ring. The cover ring is configured to concentrically surround the lower electrode, where the UE-PE and the cover ring forms a second gap.
摘要翻译：提供了一种等离子体处理系统，其具有用于处理基板的等离子体处理室。等离子体处理系统至少包括用于处理衬底的上电极和下电极。在等离子体处理期间，衬底设置在下电极上，其中上电极和衬底形成第一间隙。等离子体处理系统还包括上电极周边延伸（UE-PE）。 UE-PE机械地耦合到上电极的周边，其中UE-PE被配置为与上电极非共面。等离子体处理系统还包括盖环。盖环被配置为同心地围绕下电极，其中UE-PE和盖环形成第二间隙。

12. 发明申请

US20140054268A1 Electronic Knob for Tuning Radial Etch Non-Uniformity at VHF Frequencies 有权
标题翻译：用于调谐VHF频率径向蚀刻非均匀性的电子旋钮
公开(公告)号：US20140054268A1
公开(公告)日：2014-02-27
申请号：US13594768
申请日：2012-08-24
申请人： Zhigang Chen , Eric Hudson
发明人： Zhigang Chen , Eric Hudson
IPC分类号： H05H1/46 , B44C1/22
CPC分类号： H01L21/70 , H01J37/32091 , H01J37/32183
摘要： System and methods for plasma processing of a wafer include a chamber with an electrode having a support surface and an outer edge region defined thereon. A radio frequency power is communicated to the electrode via a conductive delivery connection and returned through a conductive return connection. A capacitance is applied to a first end that causes appropriate capacitive adjustment and opposite impedance adjustment at a second end of the conductive delivery connection that is coupled to a dielectric surround structure that surrounds the electrode. The dielectric surround structure presents the opposite impedance adjustment near an outer edge of the electrode, such that increasing the capacitance at the first end causes a corresponding increase of impedance at the second end and a corresponding increase in voltage distribution near the outer edge region of the electrode that decreases toward a center of the support surface of the electrode.
摘要翻译：用于等离子体处理晶片的系统和方法包括具有电极的室，其具有支撑表面和限定在其上的外边缘区域。射频功率通过导电输送连接传送到电极，并通过导电返回连接返回。电容被施加到第一端，其导致适当的电容调整，并且在导电输送连接的第二端处相反阻抗调节，该第二端耦合到围绕电极的电介质环绕结构。电介质环绕结构在电极的外边缘附近呈现相反的阻抗调节，使得增加第一端处的电容导致在第二端处的阻抗相应增加，并且在外部边缘区域附近的电压分布相应增加电极朝向电极的支撑表面的中心减小。

13. 发明授权

US08635971B2 Tunable uniformity in a plasma processing system 有权
标题翻译：等离子体处理系统的可调均匀性
公开(公告)号：US08635971B2
公开(公告)日：2014-01-28
申请号：US11393753
申请日：2006-03-31
申请人： Eric Hudson
发明人： Eric Hudson
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306 , H05H1/00
CPC分类号： H01J37/32082 , H01J37/32321 , H01J37/32339
摘要： A method of tuning the uniformity of a plasma with a large sheath potential by locally affecting the density of a plasma is provided. The method comprises illuminating a body exposed to the plasma with electromagnetic radiation from a source, wherein the body and the source are cooperatively configured such that the body will generate photoelectrons upon exposure to the radiation from the source. An example of such electromagnetic radiation is vacuum ultraviolet light, and an example of such a body is the edge ring surrounding a semiconductor substrate. Photoelectrons emitted from the edge ring, captured by the plasma, and accelerated into the plasma with sufficient energy to cause ionization, locally increase plasma density. The source of radiation can be a plurality of discrete sources or one or more extended sources. The source can be arranged to provide substantively uniform illumination, or can illuminate according to a non-uniform intensity distribution to compensate for existing non-uniformities in the plasma density or in the plasma process. Such sources can be embedded in the inner or outer electrode part of a multi-piece showerhead electrode assembly, or elsewhere in the chamber.
摘要翻译：提供了通过局部影响等离子体的密度来调整具有大鞘电位的等离子体的均匀性的方法。该方法包括用来自源的电磁辐射来照射暴露于等离子体的物体，其中主体和源被协同地配置，使得当暴露于来自源的辐射时，主体将产生光电子。这种电磁辐射的一个例子是真空紫外线，这样的一个实例是包围半导体衬底的边缘环。从边缘环发射的光电子由等离子体捕获并以足够的能量加速到等离子体中以引起电离，局部地增加等离子体密度。辐射源可以是多个离散源或一个或多个扩展源。源可以被布置为提供实质上均匀的照明，或者可以根据不均匀的强度分布照亮以补偿等离子体密度或等离子体处理中现有的不均匀性。这样的源可以嵌入在多件式喷头电极组件的内部或外部电极部分中，或者室内的其他地方。

14. 发明授权

US08478548B2 User interface system and method for diagnosing a rotating machine condition not based upon prior measurement history 有权
标题翻译：用户界面系统和方法，用于诊断不基于先前测量历史的旋转机器状态
公开(公告)号：US08478548B2
公开(公告)日：2013-07-02
申请号：US12688736
申请日：2010-01-15
申请人： Eric Hudson , Demet Namli , Rand Peterson , Joseph Ferrante
发明人： Eric Hudson , Demet Namli , Rand Peterson , Joseph Ferrante
IPC分类号： G01M13/02
CPC分类号： G01M99/005 , G01H1/003 , G01M13/028 , G01M13/045 , G05B23/0245
摘要： A vibration data collection and rotating machinery fault diagnostic instrument includes a machine setup engine, a measurement engine, a diagnostic engine, a measurement user interface module, a machine setup user interface module, and a diagnostic user interface module. The machine setup engine requests and receives parameters about the machinery through the machine setup user interface module. The measurement engine requests and receives sensor placement locations through the measurement user interface module and keeps track of locations that have been measured and locations that still need to be measured. The diagnostic engine diagnoses machinery faults and presents the information to the user through the diagnostic user interface module using an intuitive graphical severity scale.
摘要翻译：振动数据采集和旋转机械故障诊断仪器包括机器设置引擎，测量引擎，诊断引擎，测量用户界面模块，机器设置用户界面模块和诊断用户界面模块。机器设置引擎通过机器设置用户界面模块来请求并接收关于机器的参数。测量引擎通过测量用户界面模块请求并接收传感器放置位置，并跟踪已测量的位置和仍需要测量的位置。诊断引擎诊断机械故障，并通过诊断用户界面模块使用直观的图形严重性量表将信息提供给用户。

15. 发明授权

US08450635B2 Method and apparatus for inducing DC voltage on wafer-facing electrode 有权
标题翻译：用于在面向晶片的电极上感应直流电压的方法和装置
公开(公告)号：US08450635B2
公开(公告)日：2013-05-28
申请号：US12047813
申请日：2008-03-13
申请人： Rajinder Dhindsa , Alexei Marakhtanov , Eric Hudson , Andreas Fischer
发明人： Rajinder Dhindsa , Alexei Marakhtanov , Eric Hudson , Andreas Fischer
IPC分类号： B23K10/00
CPC分类号： H01J37/32183 , H01J37/32091
摘要： A method for processing a substrate is disclosed. The method includes supporting the substrate in the plasma-processing chamber configured with a first electrode and a second electrode. The method also includes coupling a passive radio frequency (RF) circuit to the second electrode, the passive RF circuit being configured to adjust one or more of an RF impedance, an RF voltage potential, and a DC bias potential on the second electrode.
摘要翻译：公开了一种处理衬底的方法。该方法包括在配置有第一电极和第二电极的等离子体处理室中支撑衬底。该方法还包括将无源射频（RF）电路耦合到第二电极，被动RF电路被配置为调节第二电极上的RF阻抗，RF电压电位和DC偏置电位中的一个或多个。

16. 发明授权

US07837826B2 Hybrid RF capacitively and inductively coupled plasma source using multifrequency RF powers and methods of use thereof 有权
标题翻译：使用多频RF功率的混合RF电容和电感耦合等离子体源及其使用方法
公开(公告)号：US07837826B2
公开(公告)日：2010-11-23
申请号：US11487999
申请日：2006-07-18
申请人： Alexei Marakhtanov , Rajinder Dhindsa , Eric Hudson , Andreas Fischer
发明人： Alexei Marakhtanov , Rajinder Dhindsa , Eric Hudson , Andreas Fischer
IPC分类号： C23C16/00 , H01L21/306
CPC分类号： H01J37/321 , H01J37/32091 , H01J2237/03
摘要： A device for inductively confining capacitively coupled RF plasma formed in a plasma processing apparatus. The apparatus includes an upper electrode and a lower electrode that is adapted to support a substrate and to generate the plasma between the substrate and the upper electrode. The device includes a dielectric support ring that concentrically surrounds the upper electrode and a plurality of coil units mounted on the dielectric support ring. Each coil unit includes a ferromagnetic core positioned along a radial direction of the dielectric support ring and at least one coil wound around each ferromagnetic core. The coil units generate, upon receiving RF power from an RF power source, electric and magnetic fields that reduce the number of charged particles of the plasma diffusing away from the plasma.
摘要翻译：用于感应地限制在等离子体处理装置中形成的电容耦合RF等离子体等离子体的装置。该装置包括上电极和下电极，其适于支撑衬底并在衬底和上电极之间产生等离子体。该装置包括同心地围绕上电极的电介质支撑环和安装在电介质支撑环上的多个线圈单元。每个线圈单元包括沿着电介质支撑环的径向定位的铁磁芯和缠绕在每个铁磁芯周围的至少一个线圈。线圈单元在从RF电源接收到RF功率时产生电场和磁场，其减少等离子体的带电粒子的数量远离等离子体扩散。

17. 发明申请

US20100253224A1 MODULATED MULTI-FREQUENCY PROCESSING METHOD 有权
标题翻译：调制多频处理方法
公开(公告)号：US20100253224A1
公开(公告)日：2010-10-07
申请号：US12621590
申请日：2009-11-19
申请人： Alexei Marakhtanov , Eric Hudson , Rajhinder Dhindsa , Andrew D. Bailey, III
发明人： Alexei Marakhtanov , Eric Hudson , Rajhinder Dhindsa , Andrew D. Bailey, III
IPC分类号： H05B31/26
CPC分类号： H01L21/3065 , H01J37/32009 , H01J37/32137 , H01J37/32146 , H01J2237/334 , H01J2237/3348
摘要： A method is provided for operating a processing system having a space therein arranged to receive a gas and an electromagnetic field generating portion operable to generate an electromagnetic field within the space. The method includes providing a gas into the space, and operating the electromagnetic field generating portion with a driving potential to generate an electromagnetic field within the space to transform at least a portion of the gas into plasma. The driving potential as a function of time is based on a first potential function portion and a second potential function portion. The first potential function portion comprises a first continuous periodic portion having a first amplitude and a first frequency. The second potential function portion comprises a second periodic portion having an maximum amplitude portion, and minimum amplitude portion and a duty cycle. The maximum amplitude portion is a higher amplitude than the minimum amplitude portion. The duty cycle is the ratio of a duration of the maximum amplitude portion to the sum of the duration of the maximum amplitude portion and the duration of the minimum amplitude portion. The second periodic portion additionally has a second frequency during the maximum amplitude portion. An amplitude modulation of the second periodic portion is phase locked to the first continuous periodic portion.
摘要翻译：提供了一种操作处理系统的方法，该处理系统具有布置成接收气体的空间和可操作以在该空间内产生电磁场的电磁场产生部分。所述方法包括向所述空间提供气体，以及利用驱动电位操作所述电磁场产生部分，以在所述空间内产生电磁场，以将所述气体的至少一部分转化为等离子体。作为时间的函数的驱动电位基于第一潜在功能部分和第二电位功能部分。第一潜在功能部分包括具有第一幅度和第一频率的第一连续周期部分。第二电位功能部分包括具有最大振幅部分和最小振幅部分和占空比的第二周期部分。最大幅度部分比最小振幅部分的幅度更大。占空比是最大幅度部分的持续时间与最大振幅部分的持续时间和最小振幅部分的持续时间之和的比率。第二周期部分在最大振幅部分期间另外具有第二频率。第二周期部分的幅度调制被锁相到第一连续周期部分。

18. 发明申请

US20090277584A1 APPARATUS FOR DETERMINING THE ENDPOINT OF A CLEANING OR CONDITIONING PROCESS IN A PLASMA PROCESSING SYSTEM 失效
标题翻译：用于确定等离子体处理系统中的清洁或调节过程的端点的装置
公开(公告)号：US20090277584A1
公开(公告)日：2009-11-12
申请号：US12504833
申请日：2009-07-17
申请人： Eric Hudson , Douglas Keil , Alexei Marakhtanov
发明人： Eric Hudson , Douglas Keil , Alexei Marakhtanov
IPC分类号： C23F1/08
CPC分类号： H01J37/32963 , H01J37/32935
摘要： An apparatus for determining an endpoint of a process by measuring a thickness of a layer is provided. The layer is disposed on the surface by a prior process. The apparatus includes means for providing a sensor that is coplanar with the surface, wherein the sensor is configured to measure the thickness. The apparatus also includes means for exposing the plasma chamber to a plasma, wherein the thickness is changed by the exposing, and means for determining the thickness as a function of time. The apparatus further includes means for ascertaining a steady state condition in the thickness, the steady state condition being characterized by a substantially stable measurement of the thickness, a start of the steady state condition representing the endpoint.
摘要翻译：提供了一种通过测量层的厚度来确定工艺的端点的装置。该层通过先前的工艺设置在表面上。该装置包括用于提供与表面共面的传感器的装置，其中传感器被配置成测量厚度。该装置还包括用于将等离子体室暴露于等离子体的装置，其中通过曝光改变厚度，以及用于确定作为时间的函数的厚度的装置。该装置还包括用于确定厚度中的稳态条件的装置，稳态条件的特征在于厚度的基本上稳定的测量，表示端点的稳态条件的开始。

19. 发明申请

US20080241420A1 METHOD AND APPARATUS FOR DC VOLTAGE CONTROL ON RF-POWERED ELECTRODE 有权
标题翻译： RF电源直流电压控制方法与装置
公开(公告)号：US20080241420A1
公开(公告)日：2008-10-02
申请号：US12047820
申请日：2008-03-13
申请人： Rajinder Dhindsa , Eric Hudson , Alexei Marakhtanov , Maryam Moravej , Andreas Fischer
发明人： Rajinder Dhindsa , Eric Hudson , Alexei Marakhtanov , Maryam Moravej , Andreas Fischer
IPC分类号： H05H1/24
CPC分类号： H01J37/32642 , H01J37/32091 , H01J37/32174 , H01J37/32623 , H01J37/32697
摘要： In a plasma processing chamber, a method for processing a substrate is provided. The method includes supporting the substrate in the plasma processing chamber configured with an upper electrode (UE) and a lower electrode (LE), configuring at least one radio frequency power source to ignite plasma between the UE and the LE, and providing a conductive coupling ring, the conductive coupling ring is coupled to the LE to provide a conductive path. The method further includes providing a plasma-facing-substrate-periphery (PFSP) ring, the PFSP ring being disposed above the conductive coupling ring. The method yet further includes coupling the PFSP ring to at least one of a direct current (DC) ground through an RF filter, the DC ground through the RF filter and a variable resistor, a positive DC power source through the RF filter, and a negative DC power source through the RF filter to control plasma processing parameters.
摘要翻译：在等离子体处理室中，提供了一种处理基板的方法。该方法包括在配置有上电极（UE）和下电极（LE）的等离子体处理室中支撑衬底，配置至少一个射频电源以点燃UE和LE之间的等离子体，并提供导电耦合导电耦合环耦合到LE以提供导电路径。该方法还包括提供等离子体对衬底周边（PFSP）环，PFSP环设置在导电耦合环上方。该方法还包括将PFSP环耦合到通过RF滤波器的直流（DC）接地中的至少一个，通过RF滤波器的DC接地和可变电阻器，通过RF滤波器的正直流电源，以及负直流电源通过RF滤波器控制等离子体处理参数。

20. 发明申请

US20070012659A1 High aspect ratio etch using modulation of RF powers of various frequencies 有权
标题翻译：使用各种频率的RF功率调制的高纵横比蚀刻
公开(公告)号：US20070012659A1
公开(公告)日：2007-01-18
申请号：US11525602
申请日：2006-09-21
申请人： Camelia Rusu , Rajinder Dhindsa , Eric Hudson , Mukund Srinivasan , Lumin Li , Felix Kozakevich
发明人： Camelia Rusu , Rajinder Dhindsa , Eric Hudson , Mukund Srinivasan , Lumin Li , Felix Kozakevich
IPC分类号： C03C25/68 , C23F1/00 , H01L21/306 , B44C1/22
CPC分类号： H01J37/32165 , H01J37/32082 , H01J37/32155 , H01J2237/3347 , H01L21/31116 , H01L21/67063 , H01L21/67069
摘要： A method for etching a high aspect ratio feature through a mask into a layer to be etched over a substrate is provided. The substrate is placed in a process chamber, which is able to provide RF power at a first frequency, a second frequency different than the first frequency, and a third frequency different than the first and second frequency. An etchant gas is provided to the process chamber. A first etch step is provided, where the first frequency, the second frequency, and the third frequency are at power settings for the first etch step. A second etch step is provided, where the first frequency, the second frequency, and the third frequency are at a different power setting.
摘要翻译：提供了一种通过掩模将高宽比特征蚀刻到衬底上待蚀刻的层中的方法。基板被放置在处理室中，该处理室能够提供第一频率的RF功率，不同于第一频率的第二频率和与第一和第二频率不同的第三频率。向处理室提供蚀刻剂气体。提供了第一蚀刻步骤，其中第一频率，第二频率和第三频率处于第一蚀刻步骤的功率设置。提供了第二蚀刻步骤，其中第一频率，第二频率和第三频率处于不同的功率设置。

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