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    • 12. 发明授权
    • Hydraulic-mechanical type continuously variable transmission for vehicle
    • 液压机械式无级变速器
    • US06324843B1
    • 2001-12-04
    • US09281795
    • 1999-03-31
    • Kazuhiro YasudaTsutomu HayashiToru IizukaHiroyuki Kikuchi
    • Kazuhiro YasudaTsutomu HayashiToru IizukaHiroyuki Kikuchi
    • F16D3900
    • F16H39/14
    • To moderate the efficiency of engine braking when it is applied while a continuously variable transmission produces a large transmission ratio. Such a continuously variable transmission is constituted by a hydraulic pump having an input rotary member connected to an internal combustion engine of a vehicle, a hydraulic motor having an output rotational axis connected to a driving wheel. The hydraulic pump and hydraulic motor are coupled via a first oil passageway, which has a low oil pressure during the normal load operation of the engine but has a high oil pressure during the reverse load operation of the engine, and a second oil passageway, which has a high oil pressure during the normal load operation but has a low pressure during the reverse load operation, thereby forming a closed oil passageway circuit. At least the hydraulic pump or the hydraulic motor has a variable capacity. A one-way clutch is interposed between an input rotary member and an output rotational axis in order to directly couple them as the output rotational axis rotates faster than the input rotary member during the reverse load operation.
    • 在无级变速器产生大的传动比时,适用发动机制动的效率。 这种无级变速器由具有连接到车辆的内燃机的输入旋转部件的液压泵构成,液压马达具有连接到驱动轮的输出旋转轴。 液压泵和液压马达通过第一油通道联接,第一油通道在发动机的正常负载运行期间具有低油压,但在发动机的反向加载运行期间具有高油压,以及第二油通道,其中 在正常加载操作期间具有高油压,而在反向加载操作期间具有低压力,从而形成封闭的油通道回路。 至少液压泵或液压马达具有可变容量。 单向离合器介于输入旋转构件和输出旋转轴线之间,以便在反向加载操作期间输出旋转轴线比输入旋转构件旋转得更快时直接联接它们。
    • 13. 发明授权
    • Batch type heat-treating method
    • 批式热处理方法
    • US06306764B1
    • 2001-10-23
    • US09532901
    • 2000-03-22
    • Hitoshi KatoTakako SanoYukio YamamotoHiroyuki Kikuchi
    • Hitoshi KatoTakako SanoYukio YamamotoHiroyuki Kikuchi
    • H01L2144
    • H01L21/67109Y10S438/907
    • In a batch type vertical heat-treating method, first, product wafers and dummy wafers are set to be stacked on an upstream side of a flow of a process gas, in heat treatment, within main holding positions of a holder. The dummy substrates are set more downstream of the process gas than the product wafers. The product wafers and the dummy wafers are set in the holder in a total number smaller than a total number of the main holding positions corresponding to a maximum number of wafers that can be held by the holder, and the holder is in a partially loaded state. The partially loaded holder is loaded in a process vessel, and the product wafers are processed in the process vessel.
    • 在间歇式立式热处理方法中,首先,在保持器的主保持位置内,在处理气体的流动的上游侧将产品晶片和虚设晶片设置在热处理中。 虚设基板设置在处理气体比产品晶片更多的下游。 产品晶片和虚拟晶片被设置在保持器中,总数小于对应于可由保持器保持的最大数量的晶片的主保持位置的总数,并且保持器处于部分负载状态 。 将部分加载的保持器装载在处理容器中,并且在处理容器中处理产品晶片。
    • 17. 发明授权
    • Film deposition apparatus
    • 膜沉积装置
    • US08721790B2
    • 2014-05-13
    • US12963673
    • 2010-12-09
    • Hitoshi KatoManabu HonmaKohichi OritoYasushi TakeuchiHiroyuki Kikuchi
    • Hitoshi KatoManabu HonmaKohichi OritoYasushi TakeuchiHiroyuki Kikuchi
    • C23C16/453C23C16/455C23C16/458H01L21/306C23F1/00C23C16/06C23C16/22
    • C23C16/45551C23C16/4412C23C16/45521C23C16/45578
    • A film deposition apparatus includes a turntable provided in the chamber and having on a first surface a substrate receiving area in which a substrate is placed; first and second reaction gas supplying portions supplying first and second reaction gases to the first surface, respectively; a separation gas supplying portion provided between the first reaction gas supplying portion and the second reaction gas supplying portion and supplying a separation gas that separates the first reaction gas and the second reaction gas; an evacuation port that evacuates the chamber; a space defining member provided for at least one of the first and second reaction gas supplying portions and defining a first space between the at least one of the first and second reaction gas supplying portions and the turntable and a second space so that the separation gas is likely to flow through the second space rather than the first space.
    • 一种成膜装置,包括设置在所述室中并在第一表面上具有放置基板的基板接收区域的转盘; 分别向第一表面供应第一和第二反应气体的第一和第二反应气体供应部分; 分离气体供给部,设置在第一反应气体供给部和第二反应气体供给部之间,供给分离第一反应气体和第二反应气体的分离气体; 疏散室的疏散口; 设置在所述第一反应气体供给部和所述第二反应气体供给部中的至少一个的空间限定部件,在所述第一反应气体供给部和所述第二反应气体供给部中的至少一个与所述转台之间形成第一空间, 可能流经第二空间而不是第一空间。