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141. 发明授权

US06484415B2 Vacuum processing apparatus 失效
标题翻译：真空加工设备
公开(公告)号：US06484415B2
公开(公告)日：2002-11-26
申请号：US09782193
申请日：2001-02-14
申请人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
发明人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
IPC分类号： F26B1330
CPC分类号： H01L21/67748 , B01J3/006 , B41J2/36 , B41J2/365 , C23C14/564 , H01L21/67028 , H01L21/67167 , H01L21/67253 , H01L21/67736 , Y10S134/902 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： A wafer conveyor system for used in a vacuum processing apparatus wherein the conveyor structure is provided with a transfer structure and a robot apparatus is arranged on the transfer structure. The robot provides for rotation of the wafer horizontally from a position in a cassette to an opposite postion of the cassette.
摘要翻译：一种用于真空处理设备的晶片传送系统，其中传送结构设置有传送结构，机器人装置设置在传送结构上。机器人使晶片从盒中的位置水平地旋转到盒的相对位置。

142. 发明授权

US06471459B2 Substrate transfer shuttle having a magnetic drive 有权
标题翻译：具有磁力驱动的基板转移梭
公开(公告)号：US06471459B2
公开(公告)日：2002-10-29
申请号：US09447930
申请日：1999-11-23
申请人： Wendell T. Blonigan , John M. White
发明人： Wendell T. Blonigan , John M. White
IPC分类号： B65G4907
CPC分类号： H01L21/67742 , H01L21/67709 , H01L21/6776 , Y10S414/139
摘要： A magnetic drive system for moving a substrate transfer shuttle along a linear path between chambers in a semiconductor fabrication apparatus. A rack with rack magnets is secured to the shuttle, and a rotatable pinion with pinion magnets is positioned adjacent the rack so that the pinion magnets can magnetically engage the rack magnets. Thus, rotation of the pinion will cause the shuttle to move along the linear path. The magnets may be oriented with a helix angle between their primary axis and the axis of rotation of the pinion. One rack and one pinion are located on each side of the shuttle. A set of lower guide rollers supports the shuttle, and a set of upper guide rollers prevents the shuttle from lifting off the lower guide rollers.
摘要翻译：一种磁性驱动系统，用于在半导体制造装置中沿着室之间的线性路径移动基板传送梭。具有齿条磁体的机架固定到梭子上，并且具有小齿轮磁体的可旋转小齿轮定位成邻近齿条，使得小齿轮磁体可以磁性地接合齿条磁体。因此，小齿轮的旋转将使梭子沿线性路径移动。磁体可以在其主轴线和小齿轮的旋转轴线之间具有螺旋角度定向。一个机架和一个小齿轮位于梭子的每一侧。一组下导辊支撑梭子，一组上导辊防止梭子从下导辊上脱落。

143. 发明申请

US20020134310A1 Material handling system and method for a multi-workpiece plasma treatment system 失效
标题翻译：多工件等离子体处理系统的材料处理系统和方法
公开(公告)号：US20020134310A1
公开(公告)日：2002-09-26
申请号：US09998875
申请日：2001-10-31
发明人： Robert S. Condrashoff , James P. Fazio , David E. Hoffman , James S. Tyler
IPC分类号： C23F001/00 , C23C016/00
CPC分类号： H01L21/67069 , H01J37/32743 , Y10S414/139
摘要： A plasma treatment system in which untreated workpieces are serially received one at a time on an infeed table but stored in parallel on the infeed table. The untreated workpieces are transferred simultaneously, in parallel, into a plasma treatment chamber. Thereafter, treated workpieces are transferred simultaneously, in parallel, out of the plasma treatment chamber onto an outfeed table; and the outfeed table serially discharges the treated workpieces one at a time from the outfeed table.
摘要翻译：一种等离子体处理系统，其中在进料台上一次一个地连续地接收未处理的工件，但是平行地存储在进料台上。未处理的工件同时并行地转移到等离子体处理室中。此后，经处理的工件同时并行地从等离子体处理室转移到出料台上; 并且出料台从出料台一次一个地排出经处理的工件。

144. 发明申请

US20020133260A1 Operating method of vacuum processing system and vacuum processing system 有权
标题翻译：真空处理系统和真空处理系统的操作方法
公开(公告)号：US20020133260A1
公开(公告)日：2002-09-19
申请号：US10140120
申请日：2002-05-08
发明人： Kouji Nishihata , Kazuhiro Joo , Shoji Ikuhara , Tetsuya Tahara , Shoji Okiguchi
IPC分类号： G06F019/00
CPC分类号： H01L21/67745 , H01L21/67167 , H01L21/67276 , Y10S414/135 , Y10S414/139 , Y10S414/14 , Y10S438/905 , Y10T29/41
摘要： A vacuum processing apparatus and method wherein a plurality of processing units are for conducting processing, a transfer processing unit is connected with the plurality of processing units for carrying wafers to the processing units, a transfer device is disposed in the transfer processing unit and carries the wafers and cassettes for containing the wafers, and a control unit is provided for conducting transfer control for transferring the wafers from respective cassettes to the transfer processing unit. The wafers are processed by using the plural processing units, and at least two of the cassettes are used. Parallel processing is conducted of applying different processing to the wafers contained on each of the cassettes by applying different recipes and the wafers, after applying the parallel processing, are turned to the original cassette.
摘要翻译：一种真空处理装置和方法，其中多个处理单元用于进行处理，传送处理单元与用于将晶片运送到处理单元的多个处理单元连接，传送装置设置在传送处理单元中，并携带用于容纳晶片的晶片和盒，以及控制单元，用于进行用于将晶片从相应的盒传送到传送处理单元的传送控制。通过使用多个处理单元处理晶片，并且使用至少两个盒。通过施加不同的配方，对包含在每个盒上的晶片进行不同的处理，并行处理，并且在应用并行处理之后将晶片转到原始盒。

145. 发明申请

US20020129476A1 Device for manufacturing semiconductor device and method of manufacturing the same 有权
公开(公告)号：US20020129476A1
公开(公告)日：2002-09-19
申请号：US10150082
申请日：2002-05-20
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Koji Eriguchi
IPC分类号： H01L021/66 , G01R031/26 , H01L021/00 , H01L021/64
CPC分类号： H01L21/67167 , G01B11/0625 , G03F7/70483 , H01L21/67253 , H01L22/20 , Y10S414/139 , Y10T29/41
摘要： There is provided a clustered device for manufacturing a semiconductor device in which a cleaning chamber, a rapid thermal processing chamber, an optical measurement chamber, and the like are arranged around a load-lock room. In an optical measurement system, there are disposed an exciting light source, a measuring light source, a light detector, a control/analyze system, and the like. During the formation of an oxide film, for example, a wafer is cleaned in the cleaning chamber and then the amount of a natural oxide film remaining on the wafer or the like is measured by optical modulation reflectance spectroscopy in the optical measurement chamber. Thereafter, the wafer is oxidized in the rapid thermal processing chamber. As a result, the surface of the wafer is prevented from being oxidized on exposure to an atmosphere and the surface state of the wafer can be monitored in the course of sequential process steps. By measuring the thickness of a film on a semiconductor region by optical evaluation in the clustered manufacturing device, the manufacturing process using the clustered device can be controlled.

146. 发明授权

US06447233B1 Automated door assembly for use in semiconductor wafer manufacturing 有权
标题翻译：用于半导体晶圆制造的自动门组件
公开(公告)号：US06447233B1
公开(公告)日：2002-09-10
申请号：US09641996
申请日：2000-08-18
申请人： Jeffrey M. Denker
发明人： Jeffrey M. Denker
IPC分类号： B65G4902
CPC分类号： H01L21/67772 , Y10S414/139 , Y10S414/14
摘要： An automated door assembly is provided for sealing an opening in a barrier to a contaminant-free environment suitable for semiconductor wafer processing. The door assembly comprises a base pivotable toward and away from the opening along an arcuate path and a closure plate linearly movably coupled to the base and configured to a seal the opening in the barrier. The closure plate is removable in synchronization with the pivoting of the base to traverse a horizontal linear path into contact with the barrier to close the opening. A vacuum system is provided in conjunction with the door assembly to extract particles from the sealed environment. A sensor disposed on the closure plate is operable to sense the position of wafers or other objects disposed adjacent the opening, to detect misalignment or omission thereof. The closure plate can be provided in a number of sizes for interchangeability to accommodate different sized pods; similarly, bezel inserts having different sized openings therein can be provided in the barrier. A latching apparatus for latching a wafer pod or cassette is also provided. The latching apparatus includes a pod support and a platform linearly movably coupled to the pod support. A locking mechanism configured to mate with a corresponding mechanism on the pod is rotatably mounted to the pod support and coupled to the platform for linear motion therewith, such that linear motion of the platform is operative to rotate the locking mechanism into locking engagement with the pod. The platform includes three beveled pins matable with corresponding openings having beveled surfaces on the pod.
摘要翻译：提供了一种自动门组件，用于将屏障中的开口密封到适合于半导体晶片处理的无污染物环境。门组件包括可沿着弧形路径朝向和远离开口枢转的基座，以及可线性地可移动地联接到基座并且构造成密封屏障中的开口的封闭板。闭合板可与基座的枢转同步移动，以横过与屏障接触的水平线性路径以闭合开口。与门组件一起提供真空系统以从密封环境中提取颗粒。设置在封闭板上的传感器可操作以感测与开口相邻设置的晶片或其它物体的位置，以检测其未对准或省略。封闭板可以提供多种尺寸以便互换，以适应不同尺寸的荚; 类似地，可以在屏障中提供具有不同尺寸开口的挡板插入件。还提供了用于锁定晶片盒或盒的闭锁装置。闩锁装置包括荚状物支架和可直线地可移动地联接到荚状物支架的平台。配置成与舱上的对应机构配合的锁定机构可旋转地安装到舱支架并联接到平台以与其平行运动，使得平台的直线运动可操作以将锁定机构旋转成与舱架锁定接合。该平台包括三个斜面销，可与具有在荚上的斜面的相应开口相配合。

147. 发明授权

US06444480B1 Thermal treatment apparatus, semiconductor device fabrication apparatus, load-lock chamber, and method of fabricating semiconductor device 失效
标题翻译：热处理装置，半导体装置制造装置，负载锁定室以及半导体装置的制造方法
公开(公告)号：US06444480B1
公开(公告)日：2002-09-03
申请号：US08413163
申请日：1995-03-29
申请人： Masaki Saito
发明人： Masaki Saito
IPC分类号： C23C1600
CPC分类号： C23C16/54 , C23C16/4401 , Y10S414/137 , Y10S414/139 , Y10S438/909
摘要： A semiconductor device fabrication apparatus includes a thermal treatment device for thermally processing a semiconductor substrate, a first oxygen monitor for monitoring the density of oxygen in said thermal treatment device, a load-lock chamber separably coupled to said thermal treatment device for housing the semiconductor substrate before thermal treatment thereof by said thermal treatment device, and a second oxygen monitor for monitoring the density of oxygen in said load-lock chamber. First, the semiconductor substrate is introduced into the load-lock chamber, and then the load-lock chamber is evacuated. Thereafter, the density of oxygen in the load-lock chamber is measured by the second oxygen monitor, and the thermal treatment device is evacuated, after which the density of oxygen in the thermal treatment device is measured by the first oxygen monitor. The semiconductor substrate is introduced from the load-lock chamber into the thermal treatment device after the densities of oxygen in the load-lock chamber and the thermal treatment device as measured by the first and second oxygen monitors, respectively, have dropped below a predetermined level. A thin film is deposited on the semiconductor substrate in the thermal treatment device.
摘要翻译：半导体器件制造装置包括用于热处理半导体衬底的热处理装置，用于监测所述热处理装置中的氧浓度的第一氧监测器，可分离地耦合到所述用于容纳半导体衬底的热处理装置的负载锁定室在通过所述热处理装置进行热处理之前，以及第二氧气监测器，用于监测所述装载锁定室中的氧浓度。首先，将半导体基板引入负载锁定室，然后将负载锁定室抽真空。此后，通过第二氧监测器测量装载锁定室中的氧浓度，并将热处理装置抽真空，之后通过第一氧监测器测量热处理装置中的氧浓度。在由第一和第二氧气监测器测量的负载锁定室和热处理装置中的氧气密度分别下降到预定水平以下之后，将半导体衬底从负载锁定室引入热处理装置中。在热处理装置中的半导体衬底上沉积有薄膜。

148. 发明申请

US20020112363A1 METHOD OF TRANSFERRING A MATERIAL FROM FIRST APPARATUS TO SECOND APPARATUS IN THE CLEAN ROOM AND AN ASSEMBLY LINE 失效
标题翻译：将材料从第一装置转移到清洁室和组装线中的第二装置的方法
公开(公告)号：US20020112363A1
公开(公告)日：2002-08-22
申请号：US10132185
申请日：2002-04-26
发明人： Shigeki Kuroda
IPC分类号： F26B019/00 , F26B025/06
CPC分类号： H01L21/67724 , H01L21/67715 , H01L21/67727 , H01L21/6776 , Y10S414/139
摘要： A transport enclosure arranged between a first apparatus and a second apparatus, all located in a clean room, is shielded from the clean room and maintained a degree of cleanliness which is cleaner than that of the clean room. Accordingly, the volume of space within the clean room requiring the highest degree of cleanliness is minimized, thereby reducing overall costs.
摘要翻译：布置在第一设备和第二设备之间的运输箱，全部位于洁净室中，与洁净室隔离并保持比洁净室更洁净的洁净度。因此，要求最高清洁度的洁净室内的空间体积最小化，从而降低整体成本。

149. 发明申请

US20020108267A1 Method and apparatus for transporting substrates in oled process 失效
标题翻译：方法和装置，用于在油炸过程中运输基质
公开(公告)号：US20020108267A1
公开(公告)日：2002-08-15
申请号：US10124481
申请日：2002-04-18
申请人： Ritek Display Technology Co.
发明人： Yih Chang , Jung-Lung Liu , Chih-Jen Yang , Chih-Ming Kuo , Jih-Yi Wang , Tien-Rong Lu
IPC分类号： F26B019/00 , F26B025/00 , F26B003/00
CPC分类号： H01L21/67775 , H01L51/0001 , H01L51/5012 , Y10S414/139
摘要： A method and an apparatus for transporting substrates in all organic light emitting diode (OLED) process is disclosed, which has a transferring chamber provided for transporting substrates between processing modules and the atmosphere condition therein is able to be adjusted to be the same as the processing module by an atmosphere conditioner unit. According to the present invention, the substrates are not contaminated by moisture and the process operation and the factory layout are more flexible. Moreover, the OLED yield is improved.
摘要翻译：公开了一种用于在所有有机发光二极管（OLED）工艺中传输衬底的方法和装置，其具有设置用于在处理模块之间传送衬底的传送室，并且其中的气氛条件能够被调整为与处理相同模块由大气调节装置组成。根据本发明，基板不被水分污染，并且工艺操作和工厂布局更灵活。此外，OLED产率提高。

150. 发明授权

US06430839B1 Method of transferring a material from first apparatus to second apparatus in the clean room and an assembly line 失效
标题翻译：将材料从第一装置转移到洁净室和装配线中的第二装置的方法
公开(公告)号：US06430839B1
公开(公告)日：2002-08-13
申请号：US09460983
申请日：1999-12-15
申请人： Shigeki Kuroda
发明人： Shigeki Kuroda
IPC分类号： F26B1900
CPC分类号： H01L21/67724 , H01L21/67715 , H01L21/67727 , H01L21/6776 , Y10S414/139
摘要： A transport enclosure arranged between a first apparatus and a second apparatus, all located in a clean room, is shielded from the clean room and maintained a degree of cleanliness which is cleaner than that of the clean room. Accordingly, the volume of space within the clean room requiring the highest degree of cleanliness is minimized, thereby reducing overall costs.
摘要翻译：布置在第一设备和第二设备之间的运输箱，全部位于洁净室中，与洁净室隔离并保持比洁净室更洁净的洁净度。因此，要求最高清洁度的洁净室内的空间体积最小化，从而降低整体成本。

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