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141. 发明授权

US07641349B1 Systems and methods for collector mirror temperature control using direct contact heat transfer 有权
标题翻译：采用直接接触式传热的集光镜温度控制系统和方法
公开(公告)号：US07641349B1
公开(公告)日：2010-01-05
申请号：US12284585
申请日：2008-09-22
申请人： Christopher P. Chrobak , Igor V. Fomenkov
发明人： Christopher P. Chrobak , Igor V. Fomenkov
IPC分类号： G02B5/08
CPC分类号： G02B7/1815 , G02B5/0891 , G03F7/70783 , G03F7/70891 , G03F7/7095
摘要： As disclosed herein, a device may comprise an optic disposed in a near vacuum environment, the optic formed with a surface portion; a temperature controlled member formed with a surface portion conforming to the optic surface portion; and a liquid interposed between the optic surface portion and the member surface portion to conduct heat therebetween.
摘要翻译：如本文所公开的，设备可以包括设置在近真空环境中的光学元件，光学元件形成有表面部分; 形成有与光学表面部分相符的表面部分的温度控制部件; 以及介于光学表面部分和构件表面部分之间以在其间传导热量的液体。

142. 发明授权

US07382815B2 Laser spectral engineering for lithographic process 有权
标题翻译：激光光谱工程用于光刻工艺
公开(公告)号：US07382815B2
公开(公告)日：2008-06-03
申请号：US10915517
申请日：2004-08-09
申请人： Ronald L. Spangler , Jacob P. Lipcon , John A. Rule , Robert N. Jacques , Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , John M. Algots
发明人： Ronald L. Spangler , Jacob P. Lipcon , John A. Rule , Robert N. Jacques , Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , John M. Algots
IPC分类号： H01S5/00
CPC分类号： G03F7/70575 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70933 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/0812 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258
摘要： An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.
摘要翻译：一种称为光电工程的集成电路光刻技术，用于放电激光器的带宽控制。在优选的方法中，使用计算机模型来模拟光刻参数以确定产生所需光刻结果所需的所需激光光谱。然后使用快速响应的调谐机构来调整脉冲串中的激光脉冲的中心波长，以实现接近所需激光光谱的脉冲串的集成光谱。控制激光束带宽以产生具有至少两个光谱峰值的有效光束光谱，以便在光致抗蚀剂膜中产生改进的图案分辨率。提供了具有至少一个压电驱动器和具有小于约2.0毫秒的时间响应的快速带宽检测控制系统的线窄设备。在优选实施例中，波长调谐镜以与激光器的重复频率相位的每秒超过500次抖动的抖动速率抖动。在一种情况下，用方波信号驱动压电驱动，在第二种情况下，它是用正弦波信号驱动的。在另一个实施例中，最大位移与激光脉冲在一对一的基础上匹配，以便为一系列激光脉冲产生具有两个峰值的所需平均光谱。其它优选实施例利用三个独立的波长调谐位置，产生具有三个独立峰值的光谱。

143. 发明申请

US20080043321A1 EUV optics 有权
标题翻译： EUV光学
公开(公告)号：US20080043321A1
公开(公告)日：2008-02-21
申请号：US11505177
申请日：2006-08-16
申请人： Norbert R. Bowering , Igor V. Fomenkov
发明人： Norbert R. Bowering , Igor V. Fomenkov
IPC分类号： G02B5/08
CPC分类号： G03F7/7015 , G02B5/0891 , G02B7/182 , G21K1/062 , Y10T29/49982
摘要： In a first aspect, a method of fabricating an EUV light source mirror is disclosed which may comprise the acts/steps of providing a plurality of discrete substrates; coating each substrate with a respective multilayer coating; securing the coated substrates in an arrangement wherein each coated substrate is oriented to a common focal point; and thereafter polishing at least one of the multilayer coatings. In another aspect, an optic for use with EUV light is disclosed which may comprise a substrate; a smoothing layer selected from the group of materials consisting of Si, C, Si3N4, B4C, SiC and Cr, the smoothing layer material being deposited using highly energetic deposition conditions and a multilayer dielectric coating. In another aspect, a corrosion resistant, multilayer coating for an EUV mirror may comprise alternating layers of Si and a compound material having nitrogen and a 5th period transition metal.
摘要翻译：在第一方面，公开了一种制造EUV光源反射镜的方法，其可以包括提供多个离散基板的动作/步骤; 用相应的多层涂层涂覆每个基材; 将涂覆的基底固定在其中每个涂覆的基底被定向到公共焦点的布置中; 然后抛光至少一个多层涂层。在另一方面，公开了一种用于EUV光的光学元件，其可以包括基底; 选自由Si，C，Si 3 N 4，B 4 C，SiC和Cr组成的材料组中的平滑层，使用高能沉积条件沉积的平滑层材料和多层介电涂层。另一方面，用于EUV反射镜的耐腐蚀多层涂层可以包括交替的Si层和具有氮和第五阶段过渡金属的复合材料。

144. 发明授权

US07298770B2 Laser spectral engineering for lithographic process 有权
标题翻译：激光光谱工程用于光刻工艺
公开(公告)号：US07298770B2
公开(公告)日：2007-11-20
申请号：US10912933
申请日：2004-08-05
申请人： Ronald L. Spangler , Jacob P. Lipcon , John A. Rule , Robert N. Jacques , Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , John M. Algots
发明人： Ronald L. Spangler , Jacob P. Lipcon , John A. Rule , Robert N. Jacques , Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , John M. Algots
IPC分类号： H01S3/22 , H01S3/223 , H01S3/10 , H01S3/13
CPC分类号： G03F7/70575 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70933 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/0812 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258
摘要： An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.
摘要翻译：一种称为光电工程的集成电路光刻技术，用于放电激光器的带宽控制。在优选的方法中，使用计算机模型来模拟光刻参数以确定产生所需光刻结果所需的所需激光光谱。然后使用快速响应的调谐机构来调整脉冲串中的激光脉冲的中心波长，以实现接近所需激光光谱的脉冲串的集成光谱。控制激光束带宽以产生具有至少两个光谱峰值的有效光束光谱，以便在光致抗蚀剂膜中产生改进的图案分辨率。提供了具有至少一个压电驱动器和具有小于约2.0毫秒的时间响应的快速带宽检测控制系统的线窄设备。在优选实施例中，波长调谐镜以与激光器的重复频率相位的每秒超过500次抖动的抖动速率抖动。在一种情况下，用方波信号驱动压电驱动，在第二种情况下，它是用正弦波信号驱动的。在另一个实施例中，最大位移与激光脉冲在一对一的基础上匹配，以便为一系列激光脉冲产生具有两个峰值的所需平均光谱。其它优选实施例利用三个独立的波长调谐位置，产生具有三个独立峰值的光谱。

145. 发明授权

US07139301B2 Laser spectral engineering for lithographic process 有权
公开(公告)号：US07139301B2
公开(公告)日：2006-11-21
申请号：US10701280
申请日：2003-11-03
申请人： Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , Palash P. Das , Richard L. Sandstrom , John M. Algots , Khurshid Ahmed
发明人： Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , Palash P. Das , Richard L. Sandstrom , John M. Algots , Khurshid Ahmed
IPC分类号： H01S3/22
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2308
摘要： An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.

146. 发明授权

US06618425B1 Virtual laser operator 有权
标题翻译：虚拟激光操作员
公开(公告)号：US06618425B1
公开(公告)日：2003-09-09
申请号：US09442140
申请日：1999-11-17
申请人： Jason R. Carlesi , David J. Dunlap , Igor V. Fomenkov
发明人： Jason R. Carlesi , David J. Dunlap , Igor V. Fomenkov
IPC分类号： H01S300
CPC分类号： H04B10/50 , G03F7/70025 , G03F7/70525 , G03F7/708
摘要： A laser controller interconnected with an electric discharge laser communicates with a remote computer incorporating a display screen programmably emulating a conventional keyboard. The display screen has a plurality of imaged virtual keys each programmably emulating a physical key of a conventional keyboard. Some virtual keys programmably emulate a prescribed sequence of keystrokes, which control, monitor, and record the laser operation. A prescribed sequence can optionally be automated, conditional, or interrupted by operator prompts. The remote computer communicates serially with the laser controller through an electrically conductive cable, a fiberoptic link, or a wireless channel. A keystroke is typically applied by manually pressing the position of a corresponding virtual key on a touch sensitive screen, or alternatively by actuating a conventional pointing device. The electric discharge laser can be a KrF or ArF excimer laser, or a F2 molecular laser, which can be applied as a radiation exposure source for microlithography.
摘要翻译：与放电激光器互连的激光控制器与包含可编程仿真常规键盘的显示屏的远程计算机通信。显示屏具有多个成像的虚拟键，每个可编程地仿真常规键盘的物理键。一些虚拟键可编程地模拟规定的击键序列，其控制，监视和记录激光操作。规定的顺序可以任选地由操作者提示自动化，有条件地或中断。远程计算机通过导电电缆，光纤链路或无线信道与激光控制器串行通信。通常通过在触敏屏幕上手动按下相应的虚拟键的位置，或者通过启动常规的指示设备来应用按键。放电激光器可以是KrF或ArF准分子激光器或F2分子激光器，其可以作为用于微光刻的辐射照射源。

147. 发明授权

US6021150A Laser having baffled enclosure 失效
标题翻译：激光具有挡板外壳
公开(公告)号：US6021150A
公开(公告)日：2000-02-01
申请号：US41832
申请日：1998-03-12
申请人： William N. Partio , Donald G. Larson , Igor V. Fomenkov , Anthony J. de Ruyter , Palash P. Das
发明人： William N. Partio , Donald G. Larson , Igor V. Fomenkov , Anthony J. de Ruyter , Palash P. Das
IPC分类号： H01S3/03 , H01S3/036 , H01S3/04 , H01S3/041 , H01S3/225 , H01S3/22
CPC分类号： H01S3/036 , H01S3/04 , H01S3/041 , F28D2021/0077 , H01S3/225
摘要： Disclosed is a laser useful in, e.g., photolithography or medical surgery. In one embodiment, the laser comprises a discharge chamber and heat-generating electronics that are enclosed in a baffled enclosure that requires less cooling air to reliably cool the components in the enclosure than previous unbaffled enclosures. A method of reducing the amount of conditioned air is also provided. In a further embodiment, the laser has a heat-exchange system that acts quickly in response to changes in laser gas temperature by adjusting a flow-proportioning valve regulating water flow through a heat exchanger, thereby providing a continuously variable rate of heat exchange through the heat exchanger to maintain the lasing gas temperature constant. Methods of providing a laser beam and of improving the uniformity of a laser beam are disclosed, as are photolithography methods utilizing a laser and method of this invention.
摘要翻译：公开了一种可用于例如光刻或医疗手术中的激光。在一个实施例中，激光器包括放电室和发热电子器件，其封闭在挡板外壳中，其需要较少的冷却空气以可靠地冷却外壳中的部件比先前的未封闭的外壳。还提供了减少调节空气量的方法。在另一个实施例中，激光器具有热交换系统，其响应于激光气体温度的变化而快速作用，通过调节调节通过热交换器的水流的流量比例阀，由此通过所述热交换系统提供连续可变的热交换速率热交换器保持激光温度恒定。公开了提供激光束并提高激光束的均匀性的方法，以及利用激光的光刻方法和本发明的方法。

148. 发明授权

US08514486B2 Drive laser for EUV light source 有权
标题翻译：驱动激光用于EUV光源
公开(公告)号：US08514486B2
公开(公告)日：2013-08-20
申请号：US12927012
申请日：2010-11-03
申请人： Alexander I. Ershov , Igor V. Fomenkov , Norbert R. Bowering , Jerzy R. Hoffman
发明人： Alexander I. Ershov , Igor V. Fomenkov , Norbert R. Bowering , Jerzy R. Hoffman
IPC分类号： H01S3/00
CPC分类号： H01S3/105 , G03F7/70033 , H01S3/005 , H01S3/115 , H01S3/2232 , H01S3/225 , H01S3/2325 , H01S2301/02 , H05G2/003 , H05G2/008
摘要： A device comprising a laser source producing a continuous output on a beam path and an amplifier is disclosed. The device further includes a partially transmissive, partially reflective optic disposed on said beam path between said laser source and said amplifier. The device further includes a droplet generator positioned to deliver a droplet moving on a path intersecting said beam path, the droplet reflecting light to establish an optical cavity with said optic.
摘要翻译：公开了一种包括在光束路径上产生连续输出的激光源和放大器的装置。该装置还包括设置在所述激光源和所述放大器之间的所述光束路径上的部分透射的部分反射光学元件。该装置还包括液滴发生器，其定位成输送在与所述光束路径相交的路径上移动的液滴，液滴反射光以与所述光学器件建立光学腔。

149. 发明申请

US20120305810A1 Laser-Produced-Plasma EUV Light Source 有权
标题翻译：激光产生的等离子体EUV光源
公开(公告)号：US20120305810A1
公开(公告)日：2012-12-06
申请号：US13493871
申请日：2012-06-11
申请人： Alexander I. Ershov , Igor V. Fomenkov
发明人： Alexander I. Ershov , Igor V. Fomenkov
IPC分类号： G21K5/04 , F21V21/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/005 , H05G2/008 , Y10S422/906
摘要： Devices and corresponding methods of use are described herein that may include an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.
摘要翻译：本文描述了设备和相应的使用方法，其可以包括限定闭环流动路径的封闭结构和在等离子体位置处产生等离子体的系统，例如，激光产生的等离子体系统，其中等离子体位置可以与流动路径流体连通。对于该装置，气体可以设置在封闭结构中，其可以包括离子停止缓冲气体和/或蚀刻剂。可以提供泵以迫使气体通过闭环流动路径。可以提供一种或多种热交换器来从流动路径中流动的气体中除去热量。在一些布置中，可以使用过滤器来从在流动路径中流动的气体中去除至少一部分目标物种。

150. 发明授权

US07928416B2 Laser produced plasma EUV light source 有权
标题翻译：激光产生等离子体EUV光源
公开(公告)号：US07928416B2
公开(公告)日：2011-04-19
申请号：US11644153
申请日：2006-12-22
申请人： Igor V. Fomenkov
发明人： Igor V. Fomenkov
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： An EUV light source is disclosed which may comprise a plurality of targets, e.g., tin droplets, and a system generating pre-pulses and main-pulses with the pre-pulses for irradiating targets to produce expanded targets. The system may further comprise a continuously pumped laser device generating the main pulses with the main pulses for irradiating expanded targets to produce a burst of EUV light pulses. The system may also have a controller varying at least one pre-pulse parameter during the burst of EUV light pulses. In addition, the EUV light source may also include an instrument measuring an intensity of at least one EUV light pulse within a burst of EUV light pulses and providing a feedback signal to the controller to vary at least one pre-pulse parameter during the burst of EUV light pulses to produce a burst of EUV pulses having a pre-selected dose.
摘要翻译：公开了一种EUV光源，其可以包括多个目标，例如锡滴，以及产生预脉冲和主脉冲的系统，其中具有用于照射目标的预脉冲以产生扩展的目标。该系统还可以包括连续泵浦的激光器装置，其产生具有用于照射扩展目标的主脉冲以产生EUV光脉冲的脉冲的主脉冲。该系统还可以具有在EUV光脉冲的突发期间改变至少一个预脉冲参数的控制器。另外，EUV光源还可以包括测量EUV光脉冲脉冲串内的至少一个EUV光脉冲的强度的仪器，并且向控制器提供反馈信号以在脉冲串的爆发期间改变至少一个预脉冲参数 EUV光脉冲以产生具有预选剂量的EUV脉冲的突发。

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