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131. 发明授权

US06359678B1 Exposure apparatus, method for producing the same, and exposure method 失效
标题翻译：曝光装置及其制造方法以及曝光方法
公开(公告)号：US06359678B1
公开(公告)日：2002-03-19
申请号：US09567971
申请日：2000-05-10
申请人： Kazuya Ota
发明人： Kazuya Ota
IPC分类号： G03B2742
CPC分类号： G03F7/707 , G03F7/70233 , G03F7/7025 , G03F7/70283 , G03F7/70358 , G03F7/70708 , G03F7/70775 , G03F7/70891 , G03F9/70 , G03F9/7026 , G03F9/7034
摘要： When an illumination light beam is radiated by an illumination system at a predetermined angle of incidence &thgr; with respect to a pattern plane of a mask, the illumination light beam is reflected by the pattern plane. The reflected light beam is projected by a projection optical system PO onto a substrate, and a pattern in an area on the mask illuminated with the illumination light beam is transferred onto the substrate. During the transfer, a stage control system is operated to synchronously move a mask stage and a substrate stage in the Y direction, while adjusting a relative position of the mask in the Z direction with respect to the projection optical system, on the basis of predetermined adjusting position information. Accordingly, although the mask side of the projection optical system is non-telecentric, it is possible to effectively suppress the occurrence of the magnification error and the positional discrepancy in a transferred image of the pattern on the substrate due to Z displacement of the mask. As a result, the overlay accuracy is improved. The present invention is especially preferred to perform exposure at high resolution with an illumination light beam in the soft X-ray region.
摘要翻译：当相对于掩模的图案平面以照射系统以预定的入射角照射照明光束时，照明光束被图案平面反射。反射光束通过投影光学系统PO投影到基板上，并且用照明光束照射的掩模上的区域中的图案被转印到基板上。在传送期间，操作台控制系统，以在Y方向上同步移动掩模台和基板台，同时基于预定的方式调整掩模在Z方向上相对于投影光学系统的相对位置调整位置信息。因此，虽然投影光学系统的掩模侧是非远心的，但是由于掩模的Z位移，可以有效地抑制基板上的图案的转印图像的放大误差的发生和位置偏差的发生。结果，覆盖精度提高。本发明特别优选以软X射线区域中的照明光束以高分辨率进行曝光。

132. 发明授权

US06327025B1 Projection exposure apparatus for transferring mask pattern onto photosensitive substrate 有权
标题翻译：将掩模图案转印到感光基片上的投影曝光装置
公开(公告)号：US06327025B1
公开(公告)日：2001-12-04
申请号：US09722311
申请日：2000-11-28
申请人： Yuji Imai
发明人： Yuji Imai
IPC分类号： G03B2742
CPC分类号： G03F9/7026 , G03F9/7034
摘要： A projection exposure apparatus detects positions at the measurement points (P1-P5) in the Z-direction on the shot area of the wafer W, and obtains the distribution of the irregularity of the shot area based on the detected result and the pre-known process structure data. For example, when the pattern leaving the narrowest line width is exposed in the pattern area (40B), the pattern area (40B) is made as a focusing reference plane and the difference in level (ZA−ZB) of another area of which reference is pattern area (40B) is added to the level of the best image plane (42) as an offset value. The pattern area (40B) is focused to the best image plane (42) by fitting image plane (42A) to the exposure surface.
摘要翻译：投影曝光装置检测晶片W的拍摄区域的Z方向上的测量点（P1-P5）的位置，并根据检测结果和预先知道的方式获得拍摄区域的不规则性的分布过程结构数据。例如，当在图案区域（40B）中露出离开最窄线宽度的图案时，图案区域（40B）被制成聚焦基准面，并且其另一区域的参考点（ZA-ZB）将图案区域（40B）添加到最佳图像平面（42）的水平作为偏移值。图案区域（40B）通过将图像平面（42A）装配到曝光表面而聚焦到最佳图像平面（42）。

133. 发明授权

US6163369A Plane position detecting method and exposing method and exposure apparatus using same 有权
标题翻译：平面位置检测方法和曝光方法以及使用其的曝光装置
公开(公告)号：US6163369A
公开(公告)日：2000-12-19
申请号：US205173
申请日：1998-12-04
申请人： Yuichi Yamada , Atsushi Kawahara
发明人： Yuichi Yamada , Atsushi Kawahara
IPC分类号： G01B11/00 , G01B11/26 , G03F9/00 , G03F9/02 , H01L21/027 , G03B27/52
CPC分类号： G03F9/7026 , G03F9/7046
摘要： The position or the inclination of a substrate surface is detected at a high accuracy and a high speed, and corrected. When moving the substrate in a direction substantially at right angles to an optical axis of a projection optical system and feeding an area on the substrate into an image space of the projection optical system, at least one of the position and inclination in the optical axis direction of the substrate is detected, to bring that area into focus with the focal plane of the projection optical system. One of a first mode of conducting the measurement during travel of the substrate and a second mode of performing the measurement in a state in which that area has substantially been positioned in the image space is selected.
摘要翻译：以高精度和高速检测基板表面的位置或倾斜度并进行校正。当基板垂直于投影光学系统的光轴移动基板并将基板上的区域馈送到投影光学系统的图像空间中时，光轴方向上的位置和倾斜中的至少一个检测基板，使该区域与投影光学系统的焦平面对准。选择在基板行进期间进行测量的第一模式和在该区域基本上位于图像空间中的状态下执行测量的第二模式之一。

134. 发明授权

US6005666A Apparatus for and method of optical inspection in total internal reflection holographic imaging system 失效
标题翻译：全内反射全息成像系统的光学检测装置及方法
公开(公告)号：US6005666A
公开(公告)日：1999-12-21
申请号：US588945
申请日：1990-09-26
申请人： Rene Dandliker , John Edward Brook , Massoud Hamidi
发明人： Rene Dandliker , John Edward Brook , Massoud Hamidi
IPC分类号： G01B9/021 , G01N21/88 , G01N21/956 , G02B7/28 , G03F7/20 , G03F9/00 , G03H1/00 , H01L21/027 , G01B11/02
CPC分类号： G03F9/7026 , G03F7/70358 , G03H1/00
摘要： Apparatus for and a method of optical inspection in a total internal reflection holographic imaging system. Multi wavelength laser beams are directed onto a prism supporting a first substrate containing pre-recorded hologram which is to be imaged onto a recording medium of a second substrate, the multi wavelength beams being normal to both substrates. The distance between the two substrates is measured by interferometric techniques. Actuators are provided for adjusting the distance between the two substrates, these actuators being energized to cause minute adjustments of the spacing during a scanning operation whereby the imaging of the pre-recorded hologram is ensured at the correct focus throughout the scanning operation.
摘要翻译：全内反射全息成像系统中的光学检测装置和方法。多波长激光束被引导到支撑包含要被成像到第二基板的记录介质上的预先记录的全息图的第一基板的棱镜上，所述多波长光束垂直于两个基板。通过干涉技术测量两个基板之间的距离。提供致动器用于调节两个基板之间的距离，这些致动器被激励以在扫描操作期间对间隔进行微小调整，从而在整个扫描操作期间以正确的焦点确保预先记录的全息图的成像。

135. 发明授权

US5981119A Lithography tool adjustment and semiconductor integrated circuit fabrication utilizing latent imagery 有权
标题翻译：平版印刷工具调整和利用潜像的半导体集成电路制造
公开(公告)号：US5981119A
公开(公告)日：1999-11-09
申请号：US247301
申请日：1999-02-09
申请人： Thomas Evans Adams
发明人： Thomas Evans Adams
IPC分类号： B82B1/00 , G03F7/20 , G03F7/207 , G03F9/00 , G06Q30/00 , H01L21/027
CPC分类号： G03F7/70558 , G03F7/70241 , G03F7/70591 , G03F7/706 , G03F7/70641 , G03F7/70675 , G03F9/7026
摘要： A method to achieve good stepper focus and exposure over an entire wafer for a particular mask level before the start of a product run is described. This method can also be used to produce a characterization of lens field curvature (i.e., a surface of optimum focus across the lens) and to characterize lens astigmatism, defocus sensitivity, relative resolution, and other characteristics, and to check the stepper for optical column tilt. The process prevents the complexities of resist development from affecting determination of focus. The process involves forming an array of latent images in a resist and examining the scattered light from the edges of the latent images. Analysis of the scattered light quickly provides information on correct exposure and focus together with lens characteristics over the printing field.
摘要翻译：描述了在产品运行开始之前在特定掩模级别上在整个晶片上实现良好的步进聚焦和曝光的方法。该方法也可以用于产生透镜视场曲率的表征（即，跨透镜的最佳焦点的表面）以及表征透镜散光，散焦灵敏度，相对分辨率等特性，并检查光学柱的步进器倾斜。该过程防止抗蚀剂发展的复杂性影响焦点的确定。该方法包括在抗蚀剂中形成潜像阵列，并检查来自潜像边缘的散射光。散射光的分析快速提供关于正确曝光的信息，并与印刷领域的透镜特性一起聚焦。

136. 发明授权

US5748323A Method and apparatus for wafer-focusing 失效
标题翻译：晶圆聚焦方法和装置
公开(公告)号：US5748323A
公开(公告)日：1998-05-05
申请号：US788124
申请日：1997-01-23
申请人： Harry J. Levinson
发明人： Harry J. Levinson
IPC分类号： G03F7/207 , G03F9/00 , G01B11/00
CPC分类号： G03F9/7026
摘要： A method and apparatus wherein the height over the complete surface of interest on a wafer/material is scanned and mapped, using either a central or non-central focus system. The type of data gathered is similar to that which is normally acquired in operation of the particular focusing system indicative of the wafer/material surface height. The difference is that according to the present invention, a much larger number of data points are sampled and then processed in a novel manner to provide improved focus information. These data are stored and used to calculate corrections in both the vertical position/height and tilt of the material/wafer for each exposure field, such as the areas (34) in FIGS. 5b and 6b. The invention sorts out selected height data indicating periodic variations in surface height. Such data are normally not indicative of true wafer surface height variations, but instead are the result of periodic variations in wafer material composition caused by underlying structure relating to the particular circuitry. These periodic variations are distinguished from non-periodic variations, and are subtracted out of the total height measurement data to yield corrected surface height data. The present invention uses the corrected surface height data to calculate an optimum focus height for a given exposure area such as 34.
摘要翻译：一种方法和装置，其中使用中央或非中心聚焦系统扫描和映射在晶片/材料上的整个感兴趣的表面上的高度。收集的数据类型与通常在指示晶片/材料表面高度的特定聚焦系统的操作中获得的类型相似。不同之处在于，根据本发明，以更新的方式对大量的数据点进行采样和处理，以提供改进的聚焦信息。这些数据被存储并用于计算每个曝光场的材料/晶片的垂直位置/高度和倾斜度的校正，诸如图1和图2中的区域（34）。 5b和6b。本发明对表示高度的周期性变化的所选高度数据进行分类。这样的数据通常不表示真实的晶片表面高度变化，而是由与特定电路相关的底层结构引起的晶片材料组成的周期性变化的结果。这些周期性变化与非周期性变化区分开，并从总高度测量数据中减去，以产生校正的表面高度数据。本发明使用校正的表面高度数据来计算例如34的给定曝光区域的最佳聚焦高度。

137. 发明授权

US5710624A Aligner and contamination detecting method 失效
标题翻译：对准器和污染检测方法
公开(公告)号：US5710624A
公开(公告)日：1998-01-20
申请号：US564564
申请日：1995-11-29
申请人： Shinji Utamura
发明人： Shinji Utamura
IPC分类号： G03F9/02 , G03F7/20 , G03F9/00 , H01L21/027 , G01N21/88
CPC分类号： G03F9/7026 , G03F7/707 , G03F7/70866
摘要： An aligner for exposing a pattern image of an original plate by projecting the image onto an exposure surface of a substrate, which is held on a table, in a focused state through a projection optical system includes a defocusing detection device for detecting a deviation from a focusing position at each of a plurality of points within an exposure region on the surface of the substrate, which is arranged at an exposure position, a device for determining an approximate plane of the exposure surface of the substrate within the exposure region on the basis of deviation detection values detected at the plurality of points by the defocusing detection device and a decision device for determining a deviation of the approximate plane of the exposure surface of the substrate, on the basis of the deviation detection values detected at each of the plurality of points, to decide whether contamination is present between the table and the back side of the substrate. Also disclosed is a contamination detecting method applied to such an aligner.
摘要翻译：用于通过投影光学系统以聚焦状态将图像投影到保持在桌子上的基板的曝光表面上来曝光原版的图案图像的对准器包括：散焦检测装置，用于检测与基于布置在曝光位置的基板的表面上的曝光区域内的多个点中的每一个上的聚焦位置，基于在曝光区域内确定基板的曝光表面的近似平面的装置基于通过散焦检测装置在多个点处检测到的偏差检测值和用于基于在多个点中的每一个点处检测到的偏差检测值来确定基板的曝光表面的近似平面的偏差的判定装置，以确定桌子和衬底的背面之间是否存在污染物。还公开了应用于这种对准器的污染检测方法。

138. 发明授权

US5674651A Alignment method for use in an exposure system 失效
标题翻译：在曝光系统中使用的对准方法
公开(公告)号：US5674651A
公开(公告)日：1997-10-07
申请号：US534037
申请日：1995-09-26
申请人： Kenji Nishi
发明人： Kenji Nishi
IPC分类号： G03F9/00
CPC分类号： G03F9/7026
摘要： An alignment method for aligning a plurality of areas on a substrate with predetermined positions, comprising the steps of (1) measuring the array coordinates of n sample shots where an initial value of n is N, and obtaining three times the standard deviation of the nonlinear error components by processing the results of the measurement; (2) calculating an evaluation value A.sub.n by dividing the value obtained in the step (1) by a predetermined function; (3) for (n-1) sample shots which are obtained by removing a sample shot in which the nonlinear error component is largest, obtaining an evaluation value A.sub.n-1 from three times the standard deviation of the nonlinear error components, and hereinafter in the same way subsequently removing sample shots in which the nonlinear error component is large and calculating evaluation values A.sub.n-2, A.sub.n-3, . . . ; and (4) removing a sample shot in which the nonlinear error component is largest, as a jump shot, in a range where the evaluation value A.sub.n is larger than an average value of the calculated evaluation values.
摘要翻译：一种用于将衬底上的多个区域对准预定位置的对准方法，包括以下步骤：（1）测量n个初始值为N的n个采样镜头的阵列坐标，并获得三次非线性标准偏差误差组件通过处理测量结果; （2）通过将步骤（1）中获得的值除以预定函数来计算评估值An; （3）对于通过去除其中非线性误差分量最大的样本射击而获得的（n-1）个采样点，从非线性误差分量的标准偏差的三倍获得评估值An-1，并且在下文中然后以相同的方式去除非线性误差分量较大的样本，并计算评估值An-2，An-3。。。 ; 以及（4）在评价值An大于计算出的评价值的平均值的范围内，移除非线性误差成分最大的样本拍摄作为跳投。

139. 发明授权

US5587794A Surface position detection apparatus 失效
标题翻译：表面位置检测装置
公开(公告)号：US5587794A
公开(公告)日：1996-12-24
申请号：US239847
申请日：1994-05-09
申请人： Hideo Mizutani , Naoyuki Kobayashi , Nobutaka Magome
发明人： Hideo Mizutani , Naoyuki Kobayashi , Nobutaka Magome
IPC分类号： G01B11/26 , G01B11/00 , G01B11/02 , G01C3/06 , G03F7/20 , G03F7/207 , G03F9/00 , H01L21/027 , H01L21/30
CPC分类号： G03F9/7026 , G01B11/026 , G03F7/70358
摘要： A surface position detection apparatus includes a projection optical system for projecting pattern light having a predetermined pattern on a detection surface from an oblique direction to the detection surface, an imaging optical system for forming an image of the pattern light reflected by the detection surface, a light-receiving-side light-shield arranged at a position substantially conjugate with the detection surface in the imaging optical system, and having an opening portion with a predetermined shape, a scanner for scanning the pattern image formed by the imaging optical system relative to the light-receiving-side light-shield, and a detection device for the pattern light into a plurality of portions, and selectively detecting at least one such portion of the pattern light.
摘要翻译：表面位置检测装置包括：投影光学系统，用于将检测表面上具有预定图案的图案光从倾斜方向投射到检测表面;成像光学系统，用于形成由检测表面反射的图案光的图像; 光接收侧光屏配置在与成像光学系统中的检测面基本共轭的位置，具有规定形状的开口部的扫描器，用于扫描由摄像光学系统形成的图案图像相对于光接收侧光屏蔽和用于将图案光分解为多个部分的检测装置，并且选择性地检测图案光的至少一个部分。

140. 发明授权

US5483056A Method of projecting exposure with a focus detection mechanism for detecting first and second amounts of defocus 失效
标题翻译：用于检测第一和第二量散焦的聚焦检测机构的投影曝光方法
公开(公告)号：US5483056A
公开(公告)日：1996-01-09
申请号：US319634
申请日：1994-10-07
申请人： Yuji Imai
发明人： Yuji Imai
IPC分类号： G03F7/207 , G03F9/00 , H01L21/027 , G01J1/20
CPC分类号： G03F9/7026
摘要： A method of projection exposure of a shot area on a substrate to a mask pattern by detecting, by a focus detection mechanism, an amount of defocus, in the axial direction of a projection optical system, of a measuring point on the substrate with reference to the focal plane of the projection optical system, then loading the substrate, and moving the substrate to a predetermined height by a Z-stage movable in the axial direction of the projection optical system, based on the value detected by the focus detection mechanism; thereby exposing a shot area of the substrate to the mask pattern.
摘要翻译：通过焦点检测机构在投影光学系统的轴向上检测基板上的测量点的散焦量来参考以下方式，将基板上的照射区域投射到掩模图案上的方法：投影光学系统的焦平面，然后装载基板，并且基于由焦点检测机构检测的值，通过可在投影光学系统的轴向方向上移动的Z级将基板移动到预定高度; 从而将衬底的照射区域暴露于掩模图案。

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