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1. 发明授权

US6163369A Plane position detecting method and exposing method and exposure apparatus using same 有权
标题翻译：平面位置检测方法和曝光方法以及使用其的曝光装置
公开(公告)号：US6163369A
公开(公告)日：2000-12-19
申请号：US205173
申请日：1998-12-04
申请人： Yuichi Yamada , Atsushi Kawahara
发明人： Yuichi Yamada , Atsushi Kawahara
IPC分类号： G01B11/00 , G01B11/26 , G03F9/00 , G03F9/02 , H01L21/027 , G03B27/52
CPC分类号： G03F9/7026 , G03F9/7046
摘要： The position or the inclination of a substrate surface is detected at a high accuracy and a high speed, and corrected. When moving the substrate in a direction substantially at right angles to an optical axis of a projection optical system and feeding an area on the substrate into an image space of the projection optical system, at least one of the position and inclination in the optical axis direction of the substrate is detected, to bring that area into focus with the focal plane of the projection optical system. One of a first mode of conducting the measurement during travel of the substrate and a second mode of performing the measurement in a state in which that area has substantially been positioned in the image space is selected.
摘要翻译：以高精度和高速检测基板表面的位置或倾斜度并进行校正。当基板垂直于投影光学系统的光轴移动基板并将基板上的区域馈送到投影光学系统的图像空间中时，光轴方向上的位置和倾斜中的至少一个检测基板，使该区域与投影光学系统的焦平面对准。选择在基板行进期间进行测量的第一模式和在该区域基本上位于图像空间中的状态下执行测量的第二模式之一。

2. 发明授权

US06236447B1 Exposure method and apparatus, and semiconductor device manufactured using the method 有权
标题翻译：曝光方法和装置，以及使用该方法制造的半导体器件
公开(公告)号：US06236447B1
公开(公告)日：2001-05-22
申请号：US09141141
申请日：1998-08-27
申请人： Yuichi Yamada , Atsushi Kawahara
发明人： Yuichi Yamada , Atsushi Kawahara
IPC分类号： G03B2742
CPC分类号： G03F9/7034 , G03F9/7046
摘要： An exposure method for exposing a surface to be exposed via a projection optical system after a substrate moves stepwise in a direction perpendicular to an optical axis of the projection optical system to feed to a predetermined exposure position a plurality of shots on the substrate, in turn, in which at least one of a position and tilt of the surface to be exposed of a fed shot to be exposed in the direction of the optical axis is measured during the stepwise movement, and the surface to be exposed is brought to a position of a focal plane of the projection optical system on the basis of a measurement value. The method includes a step of obtaining, in advance, a focus offset as a measurement error resulting from different measurement points for the measurement during the stepwise movement and a deformation of a main body structure, in each shot, and a step of bringing the surface to be exposed for the shot to be exposed to the position of the focal plane on the basis of a correction result of the measurement, in each shot to be exposed, using the focus offset, in an exposure sequence.
摘要翻译：一种曝光方法，用于在基板沿着与投影光学系统的光轴垂直的方向上逐步移动之后经由投影光学系统曝光待曝光的表面，从而在基板上进行多次投射到预定的曝光位置其中在逐步运动期间测量要沿着光轴方向暴露的馈送镜头要暴露的表面的位置和倾斜中的至少一个，并且待曝光的表面被带到基于测量值的投影光学系统的焦平面。该方法包括以下步骤：预先获得作为在逐次移动期间的测量的不同测量点和每个镜头中的主体结构的变形产生的测量误差的聚焦偏移，以及使表面根据测量的校正结果，在曝光顺序中使用焦点偏移的每个要被曝光的镜头中的曝光曝光到焦平面的位置。

3. 发明申请

US20130033125A1 LINEAR MOTOR ARMATURE AND LINEAR MOTOR 审中-公开
标题翻译：线性电动机和线性电动机
公开(公告)号：US20130033125A1
公开(公告)日：2013-02-07
申请号：US13316561
申请日：2011-12-12
申请人： Seigo NAGAMATSU , Yasuaki Kamiki , Atsushi Kawahara , Kazuya Yugawa , Keiji Yanagi
发明人： Seigo NAGAMATSU , Yasuaki Kamiki , Atsushi Kawahara , Kazuya Yugawa , Keiji Yanagi
IPC分类号： H02K41/02
CPC分类号： H02K41/031 , H02K11/21
摘要： A linear motor armature according to embodiments includes an armature core, supporting teeth, and a detecting unit. The armature core includes main teeth. The supporting teeth are provided on stroke direction ends of the armature core. The detecting unit detects a position of the armature core. Moreover, the detecting unit is provided at a position overlapping with the supporting teeth in the stroke direction.
摘要翻译：根据实施例的线性电动机电枢包括电枢铁芯，支撑齿和检测单元。电枢铁芯包括主齿。支撑齿设置在电枢铁芯的冲程方向端。检测单元检测电枢铁芯的位置。此外，检测单元设置在与支撑齿在行程方向上重叠的位置。

4. 发明申请

US20080206427A1 W1/O/W2 TYPE COMPOSITE EMULSIFIED DRESSING AND METHOD FOR PREPARING THE SAME 有权
标题翻译： W1 / O / W2型复合纤维织物及其制备方法
公开(公告)号：US20080206427A1
公开(公告)日：2008-08-28
申请号：US12102443
申请日：2008-04-14
申请人： Jiro Taki , Takashi Isomura , Kazumichi Kanda , Atsushi Kawahara , Kentaro Maruyama , Soichiro Kusumoto
发明人： Jiro Taki , Takashi Isomura , Kazumichi Kanda , Atsushi Kawahara , Kentaro Maruyama , Soichiro Kusumoto
IPC分类号： A23L1/0524 , A23D7/00
CPC分类号： A23L35/10 , A23L27/60 , A23L29/10 , A23L29/231 , A23V2002/00 , A23V2200/222 , A23V2250/50722
摘要： The invention provides a W1/O/W2 type composite emulsified dressing characterized in that it comprises a polyglycerol polyricinoleate having a degree of esterification of 10-30% and a degree of ricinoleic acid-condensation of 5-8 and that it has a viscosity of 1,000-300,000 mPa·s, and a method for the preparation of the dressing which comprises the steps of 90-10 parts by mass of an aqueous phase (W1) is mixed with 10-90 parts by mass of an oily phase (O) to thus form a W1/O type emulsion and then 100 parts by mass of the resulting W1/O type emulsion is blended with 25-150 parts by mass of an aqueous phase (W2) to thus give a W1/O/W2 type composite emulsified dressing, wherein the dressing comprises a polyglycerol polyricinoleate having a degree of esterification of 10-30% and a degree of ricinoleic acid-condensation of 5-8, in an amount ranging from 0.01-5% by mass on the basis of the total mass of the W1/O/W2 type composite emulsified dressing. The dressing are quite excellent in their storage stability.
摘要翻译：本发明提供一种W1 / O / W2型复合乳化敷料，其特征在于，其包含酯化度为10-30％，蓖麻油酸缩合度为5-8的聚甘油聚蓖麻油酸酯，其粘度为 1000-300,000mPa.s和一种制备敷料的方法，该方法包括以下步骤：将90-10质量份水相（W1）与10-90质量份油相（O）混合，从而形成W1 / O型乳液，然后将100质量份所得W1 / O型乳液与25〜150质量份水相（W2）混合，得到W1 / O / W2型复合物乳化敷料，其中所述敷料包含基于总量为0.01-5质量％的酯化度为10-30％，蓖麻油酸缩合度为5-8的聚甘油聚蓖麻油酸酯质量的W1 / O / W2型复合乳化敷料。敷料相当优秀的储存稳定性。

5. 发明授权

US4506382A Apparatus for detecting two-dimensional pattern and method for transforming the pattern into binary image 失效
标题翻译：用于检测二维图案的装置和将图案转换成二进制图像的方法
公开(公告)号：US4506382A
公开(公告)日：1985-03-19
申请号：US370781
申请日：1982-04-21
申请人： Kazunari Hada , Norio Fujii , Atsushi Kawahara , Toru Azuma , Junji Hazama
发明人： Kazunari Hada , Norio Fujii , Atsushi Kawahara , Toru Azuma , Junji Hazama
IPC分类号： G06K9/56 , G06T5/00 , G06T5/30 , H04N1/409 , H04N5/21
CPC分类号： G06K9/56
摘要： Two-dimensional pattern detecting apparatus provided with register for serially receiving binary signals obtained from analog signals of a two-dimensional pattern and adapted to divide the pattern into pixels and to represent the density of bright and dark for pixels by the binary signals. The apparatus further includes a processing circuit adapted to compare with predetermined patterns a pattern composed of 8 peripheral pixels of a partial area of 3.times.3 pixels within the two-dimensional pattern, on the basis of the binary signals stored in the register. The processing circuit outputs a binary signal of a logic value stored in said register corresponding to a central pixel of the partial area when the pattern of the 8 pixels coincides with one of said predetermined patterns, and to outputs a binary signal of a logic value prevailing in 8 binary signals stored in the register corresponding to the 8 pixels when the pattern of the 8 pixels does not coincide with any of the predetermined patterns.
摘要翻译：二维图案检测装置设置有用于串行接收从二维图案的模拟信号获得的二进制信号的寄存器，并且适于将图案划分为像素并且通过二进制信号表示像素的亮和暗的密度。该装置还包括处理电路，其适于根据存储在寄存器中的二进制信号，与二维图案中的3×3像素的部分区域的8个周边像素组成的图案与预定图案进行比较。当8个像素的图案与所述预定图案中的一个一致时，处理电路输出存储在所述寄存器中的对应于该部分区域的中心像素的逻辑值的二进制信号，并输出主要的逻辑值的二进制信号当8像素的图案与任何预定图案不一致时，存储在对应于8个像素的寄存器中的8个二进制信号。

6. 发明授权

US3980870A Device for measuring contour length of a two-dimensional pattern 失效
标题翻译：用于测量二维图案轮廓长度的装置
公开(公告)号：US3980870A
公开(公告)日：1976-09-14
申请号：US575718
申请日：1975-05-08
申请人： Atsushi Kawahara
发明人： Atsushi Kawahara
IPC分类号： G01B3/12 , G01B11/02 , G01B11/03 , G01B11/24 , G01B21/02 , G01B21/20 , G01B11/00 , G06K9/10
CPC分类号： G01B11/022 , G01B11/24
摘要： A device for measuring the contour length of a two-dimensional pattern comprises means for scanning the pattern and sampling each scanned line at a predetermined length to convert the pattern into digitally coded patterns. A rotary means rotates the two-dimensional pattern relative to the converting means to attain uniform spatial distribution of the two-dimensional pattern. A discriminating means discriminates that the digital coded patterns corresponding to the contour line segments placed between the neighboring scanning lines correspond to the number of times the length of the sample to classify the segments into a number of groups according to the result of the discrimination. A computer multiplies the outputs from the classifying means by predetermined weighting coefficients, respectively, at each rotated position of said two-dimensional pattern to obtain the average of the contour length of the two-dimensional pattern at every rotated position.
摘要翻译：用于测量二维图案的轮廓长度的装置包括用于扫描图案并以预定长度对每条扫描线进行采样的装置，以将图案转换成数字编码图案。旋转装置相对于转换装置旋转二维图案以获得二维图案的均匀的空间分布。鉴别装置鉴别出与相邻扫描线之间的轮廓线段相对应的数字编码图形，与根据鉴别结果将片段长度分类为多个组的样本长度相对应。计算机将分类装置的输出分别乘以在所述二维图形的每个旋转位置处的预定加权系数，以获得每个旋转位置处的二维图案的轮廓长度的平均值。

7. 发明授权

US08059269B2 Particle inspection apparatus, exposure apparatus, and device manufacturing method 有权
标题翻译：粒子检查装置，曝光装置及装置的制造方法
公开(公告)号：US08059269B2
公开(公告)日：2011-11-15
申请号：US12831103
申请日：2010-07-06
申请人： Atsushi Kawahara
发明人： Atsushi Kawahara
IPC分类号： G01N21/88
CPC分类号： G03F1/84
摘要： A particle inspection apparatus includes an irradiation unit configured to apply a light beam onto front and back surfaces of an object to be inspected, first and second detection units configured to detect scattering light from the surfaces, a calculation unit configured to conduct a particle inspection on the surfaces on the basis of outputs from the detection units, and a control unit configured to control the irradiation unit, the detection units, and the calculation unit. The irradiation unit can selectively apply the beam onto the front or back surface. The control unit causes the calculation unit to conduct the particle inspection on the inspection surface on which the light beam is selectively applied, on the basis of outputs made by the detection unit corresponding to simultaneous application and selective application of the light beam.
摘要翻译：一种粒子检查装置，包括：被配置为将被检测体的前后表面施加光束的照射部，配置为检测来自所述表面的散射光的第一检测部和第二检测部，基于来自检测单元的输出的表面，以及被配置为控制照射单元，检测单元和计算单元的控制单元。照射单元可以选择性地将光束施加到前表面或后表面上。控制单元使得计算单元基于对应于同时施加和选择性地施加光束的由检测单元产生的输出，在选择了光束的检查表面上进行粒子检查。

8. 发明申请

US20080218708A1 EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US20080218708A1
公开(公告)日：2008-09-11
申请号：US12038980
申请日：2008-02-28
申请人： Atsushi Kawahara
发明人： Atsushi Kawahara
IPC分类号： G03B27/52
CPC分类号： G03F7/70916 , G03F1/84 , G03F7/70533 , G03F7/70866
摘要： An exposure apparatus is configured to transfer a pattern to a substrate by exposing the substrate to light via a reticle. The apparatus comprises an inspection unit configured to inspect the reticle, an exposure unit configured to expose the substrate to light via the reticle inspected by the inspection unit, and a controller configured to control the inspection unit and the exposure unit. The controller (i) sets a partial region of the reticle, (ii) causes the inspection unit to inspect the reticle on which the partial region is set, and (iii) causes the exposure unit to expose the substrate to light via the partial region if the inspection unit finds no abnormality in the partial region.
摘要翻译：曝光装置被配置为通过经由掩模版曝光基板而将图案转印到基板。所述装置包括：检查单元，被配置为检查所述掩模版;曝光单元，被配置为经由所述检查单元检查的所述掩模版曝光所述基板;以及控制器，被配置为控制所述检查单元和所述曝光单元。控制器（i）设置掩模版的部分区域，（ii）使检查单元检查其上设置有部分区域的掩模版，以及（iii）使曝光单元通过部分区域曝光基板如果检查单元在部分区域中没有发现异常。

9. 发明授权

US06992000B2 Method of plating nonconductor product 失效
标题翻译：非导体产品电镀方法
公开(公告)号：US06992000B2
公开(公告)日：2006-01-31
申请号：US10486169
申请日：2002-08-28
申请人： Hideo Honma , Atsushi Kawahara , Akira Teranishi
发明人： Hideo Honma , Atsushi Kawahara , Akira Teranishi
IPC分类号： H01L21/26 , H01L21/42
CPC分类号： C23C18/1868 , C23C18/2033 , C23C18/204 , C23C18/206 , C23C18/208 , H05K3/181 , Y10S438/903 , Y10T428/31678
摘要： A nonconductor product is soaked in a solution suspending a semiconducting powder and is subjected to light irradiation in the solution so that polar group is formed on the surface of the nonconductor product, and then electroless plating is performed on the surface on which the polar group is formed. A resin product is subjected to electroless plating after ultraviolet treatment in which ultraviolet rays are irradiated through water or a solution is performed. Further, electroless plating or electroplating with a different or the same kind of metal is performed on the electroless-plated layer formed by electroless plating. With the method like this, the plated nonconductor product which does not cause problems such as environmental pollution and waste liquid treatment, and whose surface and plated coating is firmly adhered to each other, and, when a resin product is used as an object to be plated, deformation by heat of the resin product can be prevented, and moreover, the adherent strength of the plated coating can be improved.
摘要翻译：将非导体产物浸泡在悬浮半导体粉末的溶液中并在溶液中进行光照射，使得在非导体产物的表面上形成极性基团，然后在极性基团的表面上进行无电镀形成。紫外线处理后，通过水或溶液照射紫外线，对树脂制品进行化学镀。此外，通过无电解电镀形成的化学镀层进行化学镀或具有不同或相同种类的金属的电镀。通过这样的方法，不会引起诸如环境污染和废液处理等问题的电镀非导体产品，并且其表面和镀层彼此牢固地粘合，并且当使用树脂产品作为对象时可以防止树脂产品的热变形，同时能够提高镀覆层的贴合强度。

10. 发明授权

US4651226A Image scanning signal generating apparatus with pre-scan for exposure control 失效
标题翻译：具有用于曝光控制的预扫描的图像扫描信号发生装置
公开(公告)号：US4651226A
公开(公告)日：1987-03-17
申请号：US661829
申请日：1984-10-17
申请人： Ryuzo Motoori , Makoto Kimura , Masaki Isogai , Akimasa Sato , Atsushi Kawahara
发明人： Ryuzo Motoori , Makoto Kimura , Masaki Isogai , Akimasa Sato , Atsushi Kawahara
IPC分类号： H04N1/40 , H04N1/407 , H04N1/10 , H04N3/04
CPC分类号： H04N1/40056 , H04N1/4072
摘要： An image signal generating apparatus includes an optical system for focusing the image of a photographic film onto a predetermined plane and a scanning device for scanning the image with a photoreceptor positioned at the predetermined plane and generating output signals representing the light intensity distribution of the film. The scanning device performs a first scan of the image and a second scan of the image upon completion of the first scan. During the first scan the levels of the output signals indicative of the maximum density and the minimum density of the film are detected, and during the second scan the exposure of the photoreceptor is controlled in accordance with the detected levels. Also, during the second scan, the output signals are clamped to a clamp level calculated in accordance with the detected maximum density level and the minimum level of the output signals during the first scan.
摘要翻译：图像信号产生装置包括用于将照相胶片的图像聚焦到预定平面上的光学系统和用于利用位于预定平面处的感光体扫描图像的扫描装置，并产生表示胶片的光强度分布的输出信号。扫描装置在完成第一次扫描时执行图像的第一次扫描和图像的第二次扫描。在第一扫描期间，检测指示膜的最大密度和最小密度的输出信号的电平，并且在第二次扫描期间，根据检测到的电平来控制感光体的曝光。此外，在第二扫描期间，输出信号被钳位到根据检测到的最大浓度水平和在第一扫描期间的输出信号的最小电平计算的钳位电平。

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