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131. 发明申请

US20050217793A1 Substrate treating apparatus 有权
标题翻译：底物处理装置
公开(公告)号：US20050217793A1
公开(公告)日：2005-10-06
申请号：US11081139
申请日：2005-03-16
申请人： Koji Hasegawa , Akira Morita , Kenichiro Arai
发明人： Koji Hasegawa , Akira Morita , Kenichiro Arai
IPC分类号： B08B3/02 , B08B3/08 , B08B3/10 , B08B11/02 , C23F1/00 , H01L21/00 , H01L21/304
CPC分类号： H01L21/67086 , B08B3/10 , B08B11/02
摘要： A substrate treating apparatus for treating substrates as immersed in a treating solution includes a treating tank for storing the treating solution and accommodating the substrates, a holding mechanism for holding a plurality of substrates in upstanding posture in the treating tank, and a drive mechanism for revolving the holding mechanism about a virtual horizontal axis extending in a direction of alignment of the plurality of substrates. The plurality of substrates are treated, while the holding mechanism holding the plurality of substrates is immersed in the treating solution, and the drive mechanism is operated to revolve the plurality of substrates about the horizontal axis.
摘要翻译：用于处理浸没在处理溶液中的基板的基板处理装置包括：处理槽，用于储存处理液并容纳基板;保持机构，用于将多个基板以直立姿态保持在处理槽中;以及驱动机构，所述保持机构围绕在所述多个基板的对准方向上延伸的虚拟水平轴线。处理多个基板，同时将保持多个基板的保持机构浸入处理溶液中，并且操作驱动机构以围绕水平轴线旋转多个基板。

132. 发明申请

US20050106500A1 Nitrogen-containing organic compound, resist composition and patterning process 有权
标题翻译：含氮有机化合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US20050106500A1
公开(公告)日：2005-05-19
申请号：US10984933
申请日：2004-11-10
申请人： Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Katsuya Takemura , Kazumi Noda , Katsuhiro Kobayashi
发明人： Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Katsuya Takemura , Kazumi Noda , Katsuhiro Kobayashi
IPC分类号： G03C1/492 , G03F7/004 , G03F7/038 , G03F7/039
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0382
摘要： Chemically amplified resist compositions comprising nitrogen-containing organic compounds having an aromatic carboxylic acid ester structure have an excellent resolution and provide a precise pattern profile and are useful in microfabrication using electron beams or deep-UV light.
摘要翻译：包含具有芳族羧酸酯结构的含氮有机化合物的化学扩增抗蚀剂组合物具有优异的分辨率并提供精确的图案轮廓，并且可用于使用电子束或深紫外光的微细加工。

133. 发明授权

US06713612B2 Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process 有权
标题翻译：磺酰基重氮甲烷，光酸产生剂，抗蚀剂组合物和图案化工艺
公开(公告)号：US06713612B2
公开(公告)日：2004-03-30
申请号：US10426623
申请日：2003-05-01
申请人： Katsuhiro Kobayashi , Youichi Ohsawa , Koji Hasegawa , Takao Yoshihara , Kazunori Maeda , Toshihiko Fujii
发明人： Katsuhiro Kobayashi , Youichi Ohsawa , Koji Hasegawa , Takao Yoshihara , Kazunori Maeda , Toshihiko Fujii
IPC分类号： C07C24514
CPC分类号： G03F7/0382 , C07C317/28 , G03F7/0045 , G03F7/0392
摘要： Sulfonyldiazomethane compounds containing a long-chain alkylcyclohexyl group are novel and useful as photoacid generators. Chemical amplification type resist compositions comprising the same are suited for microfabrication because of many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development.
摘要翻译：含有长链烷基环己基的磺酰基重氮甲烷化合物是新颖的，可用作光致酸发生剂。包含该化合物的化学放大型抗蚀剂组合物由于包括改进的分辨率，改善的聚焦纬度，最小化的线宽变化或最小化的线宽变化或形状退化，甚至在长时间的PED，最小的残留在涂层，显影和剥离之后的碎片以及改进的许多优点也适用于微细加工。开发后的图案样式。

134. 发明授权

US06624112B2 Hydrogenolysis catalyst 失效
标题翻译：氢解催化剂
公开(公告)号：US06624112B2
公开(公告)日：2003-09-23
申请号：US10067242
申请日：2002-02-07
申请人： Koji Hasegawa , Toshihiko Sakurai
发明人： Koji Hasegawa , Toshihiko Sakurai
IPC分类号： B01J2344
CPC分类号： B01J23/44 , B01J23/40
摘要： A hydrogenolysis catalyst that possesses high hydrogenolysis performance at low temperatures and during the debenzylation reaction of a compound wherein a benzyl group combines with a nitrogen atom, which is difficult for conventional catalysts. The catalyst comprises (a) a component comprising at least one compound selected from the group consisting of palladium oxide, palladium oxide monohydrate, and palladium hydroxide wherein the oxidation state of palladium is divalent, and (b) a component comprising at least one element selected from the group consisting of Pt, Ru, Rh, Ir and Au, carried on a non-organic porous substance.
摘要翻译：一种氢解催化剂，其在低温下和在其中苄基与氮原子结合的化合物的脱苄基反应中具有高的氢解性能，这对于常规的催化剂是困难的。催化剂包含（a）包含至少一种选自氧化钯，一氧化钯和氢氧化钯的化合物的组分，其中钯的氧化态是二价的，和（b）包含至少一种元素的组分来自由Pt，Ru，Rh，Ir和Au组成的组，承载在非有机多孔物质上。

135. 发明授权

US06470726B1 Method for manufacturing an extruded article changing in cross-section and an apparatus for extruding said extruded article 失效
标题翻译：用于制造横截面变化的挤出制品的方法和用于挤出所述挤压制品的装置
公开(公告)号：US06470726B1
公开(公告)日：2002-10-29
申请号：US09723175
申请日：2000-11-27
申请人： Makoto Murata , Koji Hasegawa , Masatoshi Enomoto
发明人： Makoto Murata , Koji Hasegawa , Masatoshi Enomoto
IPC分类号： B21C2508
CPC分类号： B21C25/08 , B21C37/16
摘要： An extruded article which has at least one hollow portion and changes in cross-section along a direction of an extrusion axis is manufactured by the method. The method includes the step of advancing a punch to extrude a billet while controlling a movement of a mandrel for defining an inner periphery of the hollow portion relative to a die for defining an outer periphery of the extruded article.
摘要翻译：通过该方法制造具有至少一个中空部分并且沿挤出轴线的方向变化的挤压制品。该方法包括在控制用于限定中空部分的内周的心轴的移动的同时推进冲头以挤出坯料的步骤，相对于用于限定挤出制品的外周的模具。

136. 发明授权

US06291696B1 Preparation of tris (trimethylsilyl) silylethyl esters 有权
公开(公告)号：US06291696B1
公开(公告)日：2001-09-18
申请号：US09754320
申请日：2001-01-05
申请人： Takeshi Kinsho , Koji Hasegawa , Takeru Watanabe , Tohru Kubota , Ayumu Kiyomori
发明人： Takeshi Kinsho , Koji Hasegawa , Takeru Watanabe , Tohru Kubota , Ayumu Kiyomori
IPC分类号： C07F708
摘要： An industrially acceptable process for preparing 2-[tris(trimethylsilyl)silyl]ethyl (meth)acrylate in high yields involves reacting 2-[tris(trimethylsilyl)silyl]ethyl acetate with an alcohol in the presence of a catalyst to form 2-[tris(trimethylsilyl)silyl]ethanol, then reacting it with a (meth)acrylate ester.

137. 发明授权

US5367230A Cathode-ray tube with convergence yoke lens systems 失效
标题翻译：具有会聚偏转透镜系统的阴极射线管
公开(公告)号：US5367230A
公开(公告)日：1994-11-22
申请号：US974714
申请日：1992-11-12
申请人： Yukinobu Iguchi , Koji Hasegawa
发明人： Yukinobu Iguchi , Koji Hasegawa
IPC分类号： H01J29/48 , H01J29/62 , H01J29/46 , H01J29/51 , H01J29/56
CPC分类号： H01J29/628
摘要： A cathode-ray tube has an electron gun disposed in its neck in confronting relationship to a phosphor screen through a deflection yoke mounted on the funnel. The electron gun has a cathode assembly for emitting three electron beams, and a main lens for passing the electron beams therethrough. The main lens includes a quadruple lens system responsive to focusing voltages for canceling an astigmatic effect produced on the electron beams when the electron beams are deflected by the deflection yoke, at a peripheral edge of the phosphor screen. The cathode-ray tube also has a first quadruple convergence yoke lens system disposed between the main lens and the deflection yoke for generating an astigmatic effect which is opposite to the deflection-induced astigmatic effect, and a second quadruple convergence yoke lens system disposed between the emitting means and the main lens means for generating an astigmatic effect which is in the same direction as the astigmatic effect generated by the first quadruple convergence yoke lens system.
摘要翻译：阴极射线管具有通过安装在漏斗上的偏转线圈与荧光屏相对的关系而设置在其颈部的电子枪。电子枪具有用于发射三束电子束的阴极组件和用于使电子束通过的主透镜。主透镜包括四倍透镜系统，响应于聚焦电压，用于消除当电子束被偏转线圈偏转时在电子束上产生的散光效应，在荧光屏的外围边缘处。阴极射线管还具有设置在主透镜和偏转线圈之间的第一四重会聚偏转透镜系统，用于产生与偏转引起的散光效应相反的像散效应，以及设置在第二四极会聚偏转透镜系统发光装置和主透镜装置，用于产生与由第一四元会聚偏转透镜系统产生的散光效果相同的散光效果。

138. 发明授权

US09266142B2 Coating device 有权
标题翻译：涂装装置
公开(公告)号：US09266142B2
公开(公告)日：2016-02-23
申请号：US14232341
申请日：2012-09-06
申请人： Koji Hasegawa , Yasuhiro Hotta , Naotoshi Kinoshita , Tarou Endou , Shuichiro Fukuda , Kazuhiro Uchida , Yosuke Tomita , Hitoshi Kamada , Kazunori Wakabayashi
发明人： Koji Hasegawa , Yasuhiro Hotta , Naotoshi Kinoshita , Tarou Endou , Shuichiro Fukuda , Kazuhiro Uchida , Yosuke Tomita , Hitoshi Kamada , Kazunori Wakabayashi
IPC分类号： B05C9/12 , B05C3/08 , B01J2/00 , A23G3/20 , A23P1/08 , A23G3/26 , B01J2/12 , B01J2/14
CPC分类号： B05C9/12 , A23G3/2076 , A23G3/26 , A23P20/13 , B01J2/00 , B01J2/006 , B01J2/12 , B01J2/14 , B05C3/08
摘要： A partition portion includes a proximal portion fixed to the outer periphery of the peripheral wall portion and a sealing member mounted to the proximal portion in a manner that the sealing member is allowed to move in inner and outer circumferential directions of the peripheral wall portion. When receiving a force toward an outer circumferential direction, the sealing member is moved in the outer circumferential direction, and a distal end portion thereof is held in press-contact with a sliding contact portion of a ventilation member with a force generated along with the above-mentioned force.
摘要翻译：分隔部包括固定在周壁部的外周的基部部分和以允许密封部件在周壁部的内周向和外周方向移动的方式安装在基部的密封部件。当向外周方向受力时，密封构件沿外周方向移动，其前端部与通气构件的滑动接触部保持与上述同时产生的力压接所谓的力量。

139. 发明授权

US08900793B2 Polymer, chemically amplified resist composition, and patterning process using said chemically amplified resist composition 有权
标题翻译：聚合物，化学放大抗蚀剂组合物和使用所述化学放大抗蚀剂组合物的图案化工艺
公开(公告)号：US08900793B2
公开(公告)日：2014-12-02
申请号：US13476700
申请日：2012-05-21
申请人： Masayoshi Sagehashi , Youichi Ohsawa , Koji Hasegawa , Tomohiro Kobayashi
发明人： Masayoshi Sagehashi , Youichi Ohsawa , Koji Hasegawa , Tomohiro Kobayashi
IPC分类号： G03F7/004 , G03F7/30 , C08F220/38 , C08F24/00 , G03F7/20 , G03F7/039 , G03F7/11
CPC分类号： G03F7/2041 , C08F24/00 , C08F220/38 , G03F7/0045 , G03F7/0397 , G03F7/11 , G03F7/30 , Y10S430/111
摘要： There is disclosed a polymer having a repeating unit shown by the following general formula (1). There can be, in a photolithography using a high energy beam such as an ArF excimer laser beam and an EUV as a light source, (1) a polymer that gives a resist composition having an appropriate adhesion with a substrate and being capable of forming a pattern having excellent resolution, especially an excellent rectangular pattern profile, (2) a chemically amplified resist composition containing the said polymer, and (3) a patterning process using the said chemically amplified resist composition.
摘要翻译：公开了具有下述通式（1）所示的重复单元的聚合物。在使用诸如ArF准分子激光束和EUV作为光源的高能量光束的光刻中可以存在：（1）提供具有与基板的适当粘合性并且能够形成具有优异分辨率的图案，特别是优异的矩形图案，（2）含有所述聚合物的化学放大抗蚀剂组合物，和（3）使用所述化学放大抗蚀剂组合物的图案化工艺。

140. 发明授权

US08835094B2 Fluoroalcohol, fluorinated monomer, polymer, resist composition and patterning process 有权
标题翻译：氟醇，氟化单体，聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US08835094B2
公开(公告)日：2014-09-16
申请号：US13235719
申请日：2011-09-19
申请人： Koji Hasegawa , Takeru Watanabe , Tomohiro Kobayashi , Takeshi Kinsho
发明人： Koji Hasegawa , Takeru Watanabe , Tomohiro Kobayashi , Takeshi Kinsho
IPC分类号： G03F7/004 , G03F7/039 , C08F18/20 , C08F22/18 , C08F220/22 , G03F7/20 , C07C69/675 , C08F220/30 , C07C69/67 , C07C69/708 , C08F220/18 , C08F220/24
CPC分类号： C07C69/675 , C07C69/67 , C07C69/708 , C08F220/18 , C08F220/24 , C08F220/30 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： Fluoroalcohol compounds of formula (1) are useful in producing polymers which are used as the base resin to formulate radiation-sensitive resist compositions having transparency to radiation having a wavelength of up to 500 nm and improved development characteristics. R1 is hydrogen or a monovalent C1-C20 hydrocarbon group in which any constituent —CH2— moiety may be replaced by —O— or —C(═O)—, Aa is a (k1+1)-valent C1-C20 hydrocarbon or fluorinated hydrocarbon group, and k1 is 1, 2 or 3.
摘要翻译：式（1）的氟醇化合物可用于制备用作基础树脂的聚合物，以配制具有高达500nm波长的辐射透明度和改进的显影特性的对透射性的辐射敏感性抗蚀剂组合物。 R1是氢或一价C1-C20烃基，其中任何组成的-CH 2 - 部分可以被-O-或-C（= O） - 代替，A a是（k1 + 1）价的C1-C20烃或氟化烃基，k1为1,2或3。

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