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131. 发明授权

US06704339B2 Lithography laser with beam delivery and beam pointing control 有权
标题翻译：光束激光器具有光束传递和光束指向控制
公开(公告)号：US06704339B2
公开(公告)日：2004-03-09
申请号：US10233253
申请日：2002-08-30
申请人： Leonard Lublin , David J. Warkentin , Palash P. Das , Brian C. Klene , R. Kyle Webb , Herve A. Besaucele , Ronald L. Spangler , Richard L. Sandstrom , Alexander I. Ershov , Shahryar Rokni
发明人： Leonard Lublin , David J. Warkentin , Palash P. Das , Brian C. Klene , R. Kyle Webb , Herve A. Besaucele , Ronald L. Spangler , Richard L. Sandstrom , Alexander I. Ershov , Shahryar Rokni
IPC分类号： H01S3101
CPC分类号： H01S3/005 , G03F7/70025 , G03F7/70041 , G03F7/7055 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/11 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source for a production line machine. The system includes an enclosed and purged beam path with beam pointing control for delivery the laser beam to a desired location such as the entrance port of the production line machine. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. This preferred embodiment is capable of providing illumination at a lithography system wafer plane which is approximately constant throughout the operating life of the lithography system, despite substantial degradation of optical components.
摘要翻译：本发明提供一种用于生产线机器的模块化高重复率紫外线气体放电激光源。该系统包括具有光束指向控制的封闭和清除的光束路径，用于将激光束传送到期望的位置，例如生产线机器的入口。在优选实施例中，生产线机器是光刻机，并且提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。该MOPA系统能够以大大提高的光束质量将输出脉冲能量大约增加到相当的单室激光器系统的两倍。与现有技术的激光系统相比，脉冲放大器使输出脉冲长度加倍，导致脉冲功率（mJ / ns）的降低。该优选实施例能够在光刻系统晶片平面处提供照明，其在光刻系统的整个使用寿命期间大致恒定，尽管光学部件的实质性劣化。

132. 发明授权

US06603549B2 Convolution method for measuring laser bandwidth 有权
公开(公告)号：US06603549B2
公开(公告)日：2003-08-05
申请号：US09931726
申请日：2001-08-16
申请人： Steven F. Haas , Richard L. Sandstrom , Thomas Hofmann , Alexander I. Ershov
发明人： Steven F. Haas , Richard L. Sandstrom , Thomas Hofmann , Alexander I. Ershov
IPC分类号： G01J318
CPC分类号： G01J3/26 , G01J1/4257 , G01J3/02 , G01J3/027 , G01J3/12 , G01J3/1809 , G01J3/22 , G01J3/28 , G01J9/02
摘要： A simple, reliable, easy to use method for calculating bandwidth data of very narrow band laser beams based on bandwidth data obtained with a spectrometer in circumstances where the laser bandwidths are not large compared to the slit function of the spectrometer. The slit function of the spectrometer is determined. Spectral data of the laser beam is measured with the spectrometer to produce a measured laser beam spectrum which represents a convolution of the laser beam spectrum and the spectrometer slit function. This measured laser spectrum is then mathematically convolved with the slit function of the spectrometer to produce a doubly convolved spectrum. Bandwidth values representing true laser bandwidths are determined from measured laser spectrum and the doubly convolved spectrum. Preferably the true laser bandwidths are calculated by determining the difference between “twice a measured laser bandwidth” and a corresponding “doubly convolved bandwidth”. This method provides an excellent estimate of the true laser bandwidth because “twice the measured laser bandwidth” represents two laser bandwidths and two spectrometer slit function bandwidths and the “doubly convolved bandwidth” represents one laser bandwidth and two spectrometer slit function bandwidths. Thus, the difference is a representation of the true laser bandwidth. In a preferred embodiment the bandwidth parameters measured are the full width half-maximum bandwidth and the 95% integral bandwidth.

133. 发明授权

US06529321B2 Protective overcoat for replicated diffraction gratings 有权
$Protective overcoat for replicated diffraction gratings$
标题翻译：复制衍射光栅的保护涂层
公开(公告)号：US06529321B2
公开(公告)日：2003-03-04
申请号：US09731938
申请日：2000-12-07
申请人： Xiaojiang J. Pan , Richard G. Morton , Alexander I. Ershov
发明人： Xiaojiang J. Pan , Richard G. Morton , Alexander I. Ershov
IPC分类号： G02B508
CPC分类号： H01S3/225 , C23C14/0694 , C23C14/16 , C23C14/225 , C23C14/24 , G02B1/105 , G02B1/14 , G02B5/1838 , G02B5/1847 , G02B5/1852 , G02B5/1861 , G03F7/70025 , G03F7/70041 , G03F7/70558 , G03F7/70575 , H01S3/03
摘要： An overcoat protected diffraction grating. A replica grating having a thin aluminum reflective grating surface is produced by replication of a master grating or a submaster grating. The thin aluminum reflective surface may be cracked or have relatively thick grain boundaries containing oxides and hydroxides of aluminum and typically is also naturally coated with an aluminum oxide film. The grating is subsequently recoated in a vacuum chamber with a thin, pure, dense aluminum overcoat and then also in the vacuum the aluminum overcoat is coated with a thin film of MgF2. The grating is especially suited for use for wavelength selection in an ArF laser operating producing an ultraviolet laser beam at a wavelength of about 193 nm. The oxygen free aluminum overcoat prevents the ultraviolet light from causing damage by stimulating chemical reactions in grating materials under the aluminum grating surface or in the aluminum oxide film. The MgF2 additionally prevents oxidation on the surface, of the aluminum overcoat.
摘要翻译：外涂保护衍射光栅。具有薄铝反射光栅表面的复制光栅通过主光栅或子光栅的复制产生。薄的铝反射表面可能是破裂的或具有含有氧化物和铝的氢氧化物的相对较厚的晶界，并且通常也被氧化铝膜自然地涂覆。随后在具有薄的，纯的，致密的铝外涂层的真空室中重新涂覆光栅，然后在真空中将铝外涂层涂覆有MgF 2的薄膜。该光栅特别适合用于在大约193nm的波长下产生紫外激光束的ArF激光器中的波长选择。无氧铝外套防止紫外光通过在铝光栅表面或氧化铝膜下的光栅材料中刺激化学反应而引起损伤。 MgF2另外防止铝外涂层表面的氧化。

134. 发明授权

US06511703B2 Protective overcoat for replicated diffraction gratings 有权
$Protective overcoat for replicated diffraction gratings$
标题翻译：复制衍射光栅的保护涂层
公开(公告)号：US06511703B2
公开(公告)日：2003-01-28
申请号：US09910362
申请日：2001-07-20
申请人： Xiaojiang J. Pan , Richard G. Morton , Alexander I. Ershov
发明人： Xiaojiang J. Pan , Richard G. Morton , Alexander I. Ershov
IPC分类号： C23C1424
CPC分类号： C23C14/225 , C23C14/0694 , C23C14/16 , C23C14/24 , G02B1/105 , G02B1/14 , G02B5/1847 , G02B5/1852 , G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70558 , G03F7/70575
摘要： An overcoat protected diffraction grating. A replica grating having a thin aluminum reflective grating surface is produced by replication of a master grating or a submaster grating. The thin aluminum reflective surface may be cracked or have relatively thick grain boundaries containing oxides and hydroxides of aluminum and typically is also naturally coated with an aluminum oxide film. The grating is subsequently overcoated in a vacuum chamber with one or two thin, pure, dense aluminum overcoat layers and then also in the vacuum the aluminum overcoat layer or layers are coated with one or more thin protective layers of a material transparent to ultraviolet radiation. In preferred embodiments this protective layer is a single layer of MgF2, SiO2 or Al2O3. In other preferred embodiments the layer is a layer of MgF2 or SiO2 covered with a layer of Al2O3 and in a third preferred embodiment the protective layer is made up of four alternating layers of MgF2 and Al2O3 or four alternating layers of SiO2 and Al2O3. Preferably, the thickness of the transparent protective layers are chosen to produce a phase shift at the proposed operating wavelengths of an integral number of 2&pgr;.
摘要翻译：外涂保护衍射光栅。具有薄铝反射光栅表面的复制光栅通过主光栅或子光栅的复制产生。薄的铝反射表面可能是破裂的或具有含有氧化物和铝的氢氧化物的相对较厚的晶界，并且通常也被氧化铝膜自然地涂覆。随后，在具有一个或两个薄的，纯的，致密的铝外涂层的真空室中涂覆光栅，然后在真空中涂覆一层或多层对紫外线辐射透明的材料的薄保护层。在优选的实施方案中，该保护层是MgF 2，SiO 2或Al 2 O 3的单层。在其它优选实施例中，该层是由Al 2 O 3层覆盖的MgF 2或SiO 2层，在第三优选实施例中，保护层由MgF2和Al2O3的四个交替层或SiO 2和Al 2 O 4的四个交替层组成。优选地，选择透明保护层的厚度以在所提出的整数2pi的工作波长下产生相移。

135. 发明授权

US06359693B2 Double pass double etalon spectrometer 有权
标题翻译：双通双标准光谱仪
公开(公告)号：US06359693B2
公开(公告)日：2002-03-19
申请号：US09737181
申请日：2000-12-14
申请人： Scott T. Smith , Alexander I. Ershov , Jesse D. Buck
发明人： Scott T. Smith , Alexander I. Ershov , Jesse D. Buck
IPC分类号： G01B902
CPC分类号： G01J3/26
摘要： A first double pass etalon based spectrometer. In a preferred embodiment a second etalon matched to the first double pass etalon is used to produce extremely precise fringe data. Spectral components of a diffused beam are angularly separated as they are transmitted through an etalon. A retroreflector reflects the transmitted components back through the etalon. Twice transmitted spectral components are directed through a second etalon and focused onto a light detector which in a preferred embodiment is a photo diode array. The spectrometer is very compact producing the extremely precise fringe data permitting bandwidth measurements with precision needed for microlithography for both &Dgr;&lgr;FWHM and &Dgr;&lgr;95%.
摘要翻译：第一个基于双通道标准具的光谱仪。在优选实施例中，与第一双通道标准具匹配的第二标准具用于产生非常精确的边缘数据。扩散光束的光谱分量在透射通过标准具时被角度地分离。后向反射镜通过标准具反射传输的组件。两次透射的光谱分量被引导通过第二标准具并聚焦到光检测器上，在一个优选实施例中是光电二极管阵列。光谱仪非常紧凑，产生极其精确的条纹数据，允许对DELTAlambdFWHM和DELTAlambd 95％的微光刻所需的精度进行带宽测量。

136. 发明授权

US6137821A Durable etalon based output coupler 有权
标题翻译：基于可靠的标准信号输出耦合器
公开(公告)号：US6137821A
公开(公告)日：2000-10-24
申请号：US217340
申请日：1998-12-21
申请人： Alexander I. Ershov
发明人： Alexander I. Ershov
IPC分类号： G03F7/20 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/08 , H01S3/081 , H01S3/0971 , H01S3/098 , H01S3/105 , H01S3/1055 , H01S3/137 , H01S3/139 , H01S3/223 , H01S3/225
CPC分类号： H01S3/139 , G03F7/70025 , G03F7/70041 , G03F7/70558 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/08036 , H01S3/08059 , H01S3/08081 , H01S3/0812 , H01S3/0971 , H01S3/1055 , H01S3/137 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/08004 , H01S3/08009 , H01S3/105
摘要： A durable etalon based laser output coupler. The output coupler is especially useful for ultraviolet lasers such as an ArF excimer laser or an F.sub.2 laser. The principal elements of the etalon based output coupler are two prisms aligned so that a first surface of one of the two prisms is parallel to a first surface of the other prism. The first of the two prisms have a second surface forming an angle with a beam from a laser cavity equal to or approximately equal to Brewster's angle. The second of the two prisms has a second surface forming an angle with the coupler exit beam equal to or approximately equal to Brewster's angle. Preferably, the prisms are comprised of CaF.sub.2 and surrounded by nitrogen at about one atmosphere. Assuming the laser beam is at a wavelength of 193 nm (for ArF excimer laser), Brewster's angle is about 57 degrees and each of the first and second surfaces define an apex angle of about 34 degrees. In a preferred embodiment, the device is used as an output coupler for line narrowed ArF excimer laser having a diffraction grating based line narrowing module. The etalon based output coupler is adjusted to preferentially reflect light at or near the spectral maximum produced by the grating. Substantial improvement in line narrowing results from the amplification in the laser resonance chamber of light at or near the grating spectral maximum which is preferentially reflected by the etalon based output coupler. Several preferred methods are disclosed for tuning the etalon based output coupler to match the wavelength selected by the grating based line narrowing module.
摘要翻译：坚固耐用的基于标准具的激光输出耦合器。输出耦合器对于诸如ArF准分子激光器或F2激光器的紫外激光器特别有用。基于标准具的输出耦合器的主要元件是两个棱镜对准，使得两个棱镜中的一个的第一表面平行于另一个棱镜的第一表面。两个棱镜中的第一个具有与来自等于或近似等于布鲁斯特角的激光腔的光束成一角度的第二表面。两个棱镜中的第二个具有与耦合器出射光束成一角度的第二表面等于或近似等于布鲁斯特角。优选地，棱镜由CaF 2组成并在约一个大气压下被氮包围。假设激光束的波长为193nm（对于ArF准分子激光器），布鲁斯特的角度约为57度，并且第一和第二表面中的每一个限定了约34度的顶角。在优选实施例中，该器件用作具有基于衍射光栅的线窄化模块的线狭窄ArF准分子激光器的输出耦合器。调整基于标准信号的输出耦合器以优先反射由光栅产生的光谱最大值处或附近的光。由于在基于标准具的输出耦合器优先反射的光栅最大值处或附近的激光谐振腔中的放大引起线窄的显着改善。公开了几种优选的方法，用于调谐基于标准具的输出耦合器以匹配由基于光栅的线窄化模块选择的波长。

137. 发明授权

US6061129A Compact high resolution grating spectrometer 有权
标题翻译：紧凑型高分辨率光栅光谱仪
公开(公告)号：US6061129A
公开(公告)日：2000-05-09
申请号：US236148
申请日：1999-01-22
申请人： Alexander I. Ershov , Gamaralalage G. Padmabandu , Palash P. Das
发明人： Alexander I. Ershov , Gamaralalage G. Padmabandu , Palash P. Das
IPC分类号： G01J3/18 , G01J3/22
CPC分类号： G01J3/22 , G01J3/18
摘要： A compact high resolution grating spectrometer. A beam of expanding light from a light source is collimated and the collimated beam is expanded with a beam expander before illuminating a reflecting grating. The expansion of the beam permits high resolution in a small package. In preferred embodiments mirror arrangements are provided to produce double reflections off the reflecting grating to further improve the resolution of the spectrometer.
摘要翻译：紧凑型高分辨率光栅光谱仪。来自光源的扩展光束被准直，并且在照射反射光栅之前用光束扩展器扩展准直光束。梁的扩展允许在小包装中的高分辨率。在优选实施例中，提供反射镜布置以产生离开反射光栅的双反射，以进一步提高光谱仪的分辨率。

138. 发明授权

US6028879A Narrow band laser with etalon based output coupler 有权
标题翻译：窄带激光器与基于标准具的输出耦合器
公开(公告)号：US6028879A
公开(公告)日：2000-02-22
申请号：US204111
申请日：1998-12-02
申请人： Alexander I. Ershov
发明人： Alexander I. Ershov
IPC分类号： G03F7/20 , H01S3/08 , H01S3/137 , H01S3/225 , H01S3/22
CPC分类号： G03F7/70483 , G03F7/70025 , G03F7/70575 , H01S3/08081 , H01S3/137 , H01S3/08009 , H01S3/225
摘要： A line narrowed laser having a grating based line narrowing module, etalon-based line narrowing output coupler and a technique for tuning the laser. The etalon based output coupler is adjusted to preferentially reflect light at or near the spectral maximum produced by the grating. Substantial improvement in line narrowing results from the amplification in the laser resonance chamber of light at or near the grating spectral maximum which is preferentially reflected by the etalon based output coupler. Several preferred methods are disclosed for tuning the etalon based output coupler to match the wavelength selected by the grating based line narrowing module.
摘要翻译：具有基于光栅的线窄化模块，基于标准具的线窄输出耦合器和调谐激光技术的线窄化激光器。调整基于标准信号的输出耦合器以优先反射由光栅产生的光谱最大值处或附近的光。由于在基于标准具的输出耦合器优先反射的光栅最大值处或附近的激光谐振腔中的放大引起线窄的显着改善。公开了几种优选的方法，用于调谐基于标准具的输出耦合器以匹配由基于光栅的线窄化模块选择的波长。

139. 发明授权

US5982800A Narrow band excimer laser 失效
标题翻译：窄带准分子激光器
公开(公告)号：US5982800A
公开(公告)日：1999-11-09
申请号：US947474
申请日：1997-10-10
申请人： Toshihiko Ishihara , Thomas Hofmann , Palash P. Das , Alexander I. Ershov
发明人： Toshihiko Ishihara , Thomas Hofmann , Palash P. Das , Alexander I. Ershov
IPC分类号： H01S3/038 , G03F7/20 , H01S3/03 , H01S3/034 , H01S3/036 , H01S3/08 , H01S3/081 , H01S3/0971 , H01S3/134 , H01S3/225 , H01S3/22
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70216 , G03F7/70558 , G03F7/70575 , H01S3/03 , H01S3/134 , H01S3/225 , H01S3/036 , H01S3/08009 , H01S3/0812 , H01S3/09713 , H01S3/2251 , H01S3/2256
摘要： A very narrow band pulse excimer laser capable of producing pulses at a rate in the range of about 500 to 2000 Hz with enhanced energy dose control and reproducibility. A prior art burst mode "slug effect" occuring at one gas circulation time after the beginning of a burst of pulses is eliminated by the addition of a minute quantity of oxygen. In a preferred embodiment very narrow bandwidth is achieved by reducing fluorine partial pressure to less than 0.10 percent and by increasing the reflectance of the output coupler to greater than 25 percent. In a preferred embodiment, prior art fused silica beam expansion prisms used in the prior art line narrowing module were replaced with calcium fluoride prisms.
摘要翻译：能够以增加的能量剂量控制和再现性，以约500至2000Hz范围内的速率产生脉冲的非常窄带脉冲准分子激光器。通过添加微量的氧来消除在脉冲脉冲开始之后的一个气体循环时间发生的现有技术的脉冲模式“塞子效应”。在优选实施例中，通过将氟分压降低到小于0.10％并通过将输出耦合器的反射率增加到大于25％来实现非常窄的带宽。在优选的实施方案中，现有技术中用于现有技术的线窄化模块的熔融石英束膨胀棱镜被氟化钙棱镜替代。

140. 发明授权

US5835520A Very narrow band KrF laser 失效
标题翻译：非常窄带KrF激光
公开(公告)号：US5835520A
公开(公告)日：1998-11-10
申请号：US842305
申请日：1997-04-23
申请人： Palash Parijat Das , Alexander I. Ershov
发明人： Palash Parijat Das , Alexander I. Ershov
IPC分类号： H01S3/038 , G03F7/20 , H01S3/03 , H01S3/034 , H01S3/08 , H01S3/081 , H01S3/0971 , H01S3/225 , H01S3/22
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70558 , G03F7/70575 , H01S3/03 , H01S3/225 , H01S3/08009 , H01S3/0812 , H01S3/09713 , H01S3/2251 , H01S3/2256
摘要： A very narrow band KrF excimer laser capable of producing 10 mJ laser pulses at 1000 Hz with a bandwidth of less than 0.6 nm (FWHM). The very narrow bandwidth is achieved by reducing fluorine partial pressure to less than 0.08 and by increasing the reflectance of the output coupler to greater than 25 percent. In a preferred embodiment, prior art fused silica beam expansion prisms used in the prior art line narrowing module were replaced with calcium fluoride prisms.
摘要翻译：一种非常窄的KrF准分子激光器，其能够以1000Hz的带宽小于0.6nm（FWHM）产生10mJ激光脉冲。通过将氟分压降低到小于0.08并且通过将输出耦合器的反射率增加到大于25％来实现非常窄的带宽。在优选的实施方案中，现有技术中用于现有技术的线窄化模块的熔融石英束膨胀棱镜被氟化钙棱镜替代。

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