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121. 发明申请

US20090056738A1 HAIR HOLDER, OPEN/CLOSE DEVICE FOR HAIR-HOLDING MEMBER, AND HAIR HOLDER FOR HAIR TREATMENT 失效
标题翻译：头发保持器，用于护发部件的打开/关闭装置和用于头发处理的头发夹
公开(公告)号：US20090056738A1
公开(公告)日：2009-03-05
申请号：US12281538
申请日：2007-03-02
申请人： Takehiko Tojo , Koji Saito , Hideo Kobayashi , Toshio Watanabe , Haruomi Enomoto
发明人： Takehiko Tojo , Koji Saito , Hideo Kobayashi , Toshio Watanabe , Haruomi Enomoto
IPC分类号： A45D19/00 , A45D8/20
CPC分类号： A45D19/0008 , A45D2/122 , A45D8/24 , A45D2019/0091
摘要： A hair holder includes a tube formed of a sheet in such a design as to allow a hair bundle to be inserted from a one-end opening at one end of the tube toward an other-end opening at the other end thereof. The tube includes an integration mechanism in the vicinity of the one-end opening. The integration mechanism is for a clip-type fixing member having a pair of pinchers. The one-end opening is openable and closable by operating the clip-type fixing member having been integrated with the tube.
摘要翻译：头发保持器包括由片材形成的管，其设计为允许发束从管的一端的一端开口朝向另一端的另一端开口插入。该管包括在一端开口附近的整合机构。整合机构用于具有一对捏合器的夹式固定构件。一端开口通过操作与管一体化的夹式固定构件而可打开和关闭。

122. 外观设计

USD584341S1 Stamp 有权
公开(公告)号：USD584341S1
公开(公告)日：2009-01-06
申请号：US29300782
申请日：2008-05-12
申请人： Toshio Watanabe , Shoichi Inaguma
设计人： Toshio Watanabe , Shoichi Inaguma

123. 发明申请

US20080318503A1 SUBSTRATE HOLDING MECHANISM, SUBSTRATE POLISHING APPARATUS AND SUBSTRATE POLISHING METHOD 有权
标题翻译：基板保持机构，基板抛光装置和基板抛光方法
公开(公告)号：US20080318503A1
公开(公告)日：2008-12-25
申请号：US12184032
申请日：2008-07-31
申请人： Tetsuji TOGAWA , Toshio Watanabe , Hiroyuki Yano , Gen Toyota , Kenji Iwade , Yoshikuni Tateyama
发明人： Tetsuji TOGAWA , Toshio Watanabe , Hiroyuki Yano , Gen Toyota , Kenji Iwade , Yoshikuni Tateyama
IPC分类号： B24B55/00 , B24B55/12
CPC分类号： B24B37/015 , B24B41/061 , B24B55/02
摘要： A substrate holding mechanism, a substrate polishing apparatus and a substrate polishing method have functions capable of minimizing an amount of heat generated during polishing of a substrate to be polished and of effectively cooling a substrate holding part of the substrate holding mechanism, and also capable of effectively preventing a polishing solution and polishing dust from adhering to an outer peripheral portion of the substrate holding part and drying thereon. The substrate holding mechanism has a mounting flange, a support member 6 and a retainer ring. A substrate to be polished is held on a lower side of the support member surrounded by the retainer ring, and the substrate is pressed against a polishing surface of a polishing table. The mounting flange is provided with a flow passage contiguous with at least the retainer ring. A temperature-controlled gas is supplied through the flow passage to cool the mounting flange, the support member and the retainer ring. The retainer ring is provided with a plurality of through-holes communicating with the flow passage to spray the gas flowing through the flow passage onto the polishing surface of the polishing table.
摘要翻译：基板保持机构，基板研磨装置和基板研磨方法具有能够使待研磨基板的抛光时产生的热量最小化的功能，并有效地冷却基板保持机构的基板保持部，并且还能够有效地防止研磨液和抛光尘埃附着在基板保持部的外周部并干燥。基板保持机构具有安装凸缘，支撑构件6和保持环。待研磨的基板被保持在由保持环包围的支撑构件的下侧，并且基板被压靠在抛光台的抛光表面上。安装凸缘设置有至少与保持环相邻的流动通道。通过流路供给温度控制气体以冷却安装凸缘，支撑构件和保持环。保持环设置有与流路连通的多个通孔，以将流过流道的气体喷射到抛光台的抛光表面上。

124. 发明授权

US07449604B2 Production of aromatic ring-containing amino compounds and catalysts 有权
标题翻译：制备含芳环的氨基化合物和催化剂
公开(公告)号：US07449604B2
公开(公告)日：2008-11-11
申请号：US11517360
申请日：2006-09-08
申请人： Atsushi Okamoto , Toshio Watanabe
发明人： Atsushi Okamoto , Toshio Watanabe
IPC分类号： C07C209/48
CPC分类号： C07C209/48 , Y02P20/582 , Y10S526/915 , C07C211/28
摘要： An aromatic dinitrile compound is hydrogenated in an amide solvent in the presence of a solid catalyst and in the absence of ammonia to produce an aromatic ring-containing amino compound by reducing at least one cyano group to aminomethyl group. The solid catalyst is a supported palladium catalyst in which palladium is substantially present on the outer surface of carrier and in a surface layer within a depth of 200 μm from the outer surface. Using such a solid catalyst, the aromatic dinitrile compound is efficiently hydrogenated to the aromatic ring-containing amino compound under mild conditions.
摘要翻译：芳族二腈化合物在酰胺溶剂中，在固体催化剂存在下，在不存在氨的情况下氢化，通过将至少一个氰基还原成氨基甲基来制备含芳环的氨基化合物。固体催化剂是负载的钯催化剂，其中钯基本上存在于载体的外表面上和表面层中，离离外表面200μm的深度。使用这种固体催化剂，芳香族二腈化合物在温和条件下有效氢化成含芳环的氨基化合物。

125. 发明授权

US07419420B2 Substrate holding mechanism, substrate polishing apparatus and substrate polishing method 有权
标题翻译：基板保持机构，基板研磨装置和基板研磨方法
公开(公告)号：US07419420B2
公开(公告)日：2008-09-02
申请号：US10539245
申请日：2003-12-26
申请人： Tetsuji Togawa , Toshio Watanabe , Hiroyuki Yano , Gen Toyota , Kenji Iwade , Yoshikuni Tateyama
发明人： Tetsuji Togawa , Toshio Watanabe , Hiroyuki Yano , Gen Toyota , Kenji Iwade , Yoshikuni Tateyama
IPC分类号： B24B49/00 , B24B5/00
CPC分类号： B24B37/015 , B24B41/061 , B24B55/02
摘要： A substrate holding mechanism, a substrate polishing apparatus and a substrate polishing method have functions capable of minimizing an amount of heat generated during polishing of a substrate to be polished and of effectively cooling a substrate holding part of the substrate holding mechanism, and also capable of effectively preventing a polishing solution and polishing dust from adhering to an outer peripheral portion of the substrate holding part and drying thereon. The substrate holding mechanism has a mounting flange, a support member 6 and a retainer ring. A substrate to be polished is held on a lower side of the support member surrounded by the retainer ring, and the substrate is pressed against a polishing surface of a polishing table. The mounting flange is provided with a flow passage contiguous with at least the retainer ring. A temperature-controlled gas is supplied through the flow passage to cool the mounting flange, the support member and the retainer ring. The retainer ring is provided with a plurality of through-holes communicating with the flow passage to spray the gas flowing through the flow passage onto the polishing surface of the polishing table.
摘要翻译：基板保持机构，基板研磨装置和基板研磨方法具有能够使待研磨基板的抛光时产生的热量最小化的功能，并有效地冷却基板保持机构的基板保持部，并且还能够有效地防止研磨液和抛光尘埃附着在基板保持部的外周部并干燥。基板保持机构具有安装凸缘，支撑构件6和保持环。待研磨的基板被保持在由保持环包围的支撑构件的下侧，并且基板被压靠在抛光台的抛光表面上。安装凸缘设置有至少与保持环相邻的流动通道。通过流路供给温度控制气体以冷却安装凸缘，支撑构件和保持环。保持环设置有与流路连通的多个通孔，以将流过流道的气体喷射到抛光台的抛光表面上。

126. 发明申请

US20080030647A1 Liquid Crystal Display Device and Cellular Phone Provided with the Same 审中-公开
标题翻译：液晶显示装置及配备手机的手机
公开(公告)号：US20080030647A1
公开(公告)日：2008-02-07
申请号：US11629837
申请日：2005-06-22
申请人： Toshio Watanabe , Yasushi Kasajima
发明人： Toshio Watanabe , Yasushi Kasajima
IPC分类号： G02F1/13357
CPC分类号： G02B6/0055 , G02B6/0018 , G02B6/0038 , G02B6/0046 , G02B6/0063 , G02F2001/133342 , H04M1/0214 , H04M1/22 , H04M2250/16
摘要： A liquid crystal display device (B1) according to the present invention includes a first liquid crystal display panel (20A) forming a first display surface (14A), a second liquid crystal display panel (20B) forming a second display surface (14B) which is oriented in an opposite direction from the first display surface (14A), and a light guide plate (30) including a light emitting portion (31) sandwiched between the first and the second liquid crystal display panels (20A), (20B) and a light incident portion (32) provided continuously with the light emitting portion (31) and serving to introduce external light (L) into the light emitting portion (31). The first liquid crystal display panel (20A) is illuminated with external light (L) passed through the second display panel (20B) and the light emitting portion (31) of the light guide plate (30). The second liquid crystal display panel (20B) is illuminated with external light (L) impinged on the light incident surface (32a) of the light guide plate (30) and guided to the second liquid crystal display panel (20B) by the light emitting portion (31).
摘要翻译：根据本发明的液晶显示装置（B 1）包括形成第一显示面（14A）的第一液晶显示面板（20A），形成第二显示面的第二液晶显示面板（20B）（14B），其与第一显示面（14A）相反的方向定向;以及导光板（30），其包括被夹在第一和第二液晶显示面板（20）之间的发光部分（31） A），（20B）和连续设置有发光部分（31）并用于将外部光（L）引入发光部分（31）的光入射部分（32）。第一液晶显示面板（20A）被穿过第二显示面板（20B）的外部光（L）和导光板（30）的发光部分（31）照亮。第二液晶显示面板（20B）被照射在入射到导光板（30）的光入射面（32a）上的外部光（L），并被引导到第二液晶显示面板（20B），由第二液晶显示面板发光部（31）。

127. 发明申请

US20080013966A1 IMAGE-FORMING APPARATUS, CONTROL METHOD THEREOF, AND CONTROL PROGRAM STORING MEDIUM FOR IMAGE-FORMING APPARATUS 失效
标题翻译：图像形成装置，其控制方法和控制图像形成装置的程序存储介质
公开(公告)号：US20080013966A1
公开(公告)日：2008-01-17
申请号：US11687788
申请日：2007-03-19
申请人： Toshio Watanabe , Tomohisa Suzuki
发明人： Toshio Watanabe , Tomohisa Suzuki
IPC分类号： G03G15/00
CPC分类号： G03G21/1892 , G03G15/0855 , G03G15/0863 , G03G15/0865 , G03G2215/0697 , G03G2221/1823
摘要： An image-forming apparatus in which a replacement part is loaded includes a discrimination unit that discriminates whether or not identification data registered in the loaded replacement part correspond to either inherent data or group data registered in the image-forming apparatus; a determination unit that, when no correspondence is found in the discrimination unit, determines in accordance with a registration condition whether or not a value of the identification data is registered as the group data; and an establishment unit that establishes approval or disapproval of use of the loaded replacement part on the basis of a result of discrimination performed in the discrimination unit or determination performed in the determination unit.
摘要翻译：一种图像形成装置，其中加载了替换部件包括鉴别单元，其识别登记在装载的替换部分中的识别数据是否对应于登记在图像形成装置中的固有数据或组数据; 确定单元，当在所述鉴别单元中没有发现对应关系时，根据注册条件确定所述识别数据的值是否被注册为所述组数据; 以及建立单元，其基于在所述判别单元中执行的判别结果或在所述确定单元中执行的确定来确定所述装载的替换部件的使用的批准或不被使用。

128. 发明申请

US20070137779A1 Process for laser welding 审中-公开
标题翻译：激光焊接工艺
公开(公告)号：US20070137779A1
公开(公告)日：2007-06-21
申请号：US11581246
申请日：2006-10-16
申请人： Hiroshi Mori , Mitsunobu Nakatani , Hiroyuki Sumi , Katsuhiko Nakajima , Hideo Nakamura , Toshio Watanabe
发明人： Hiroshi Mori , Mitsunobu Nakatani , Hiroyuki Sumi , Katsuhiko Nakajima , Hideo Nakamura , Toshio Watanabe
IPC分类号： B32B37/00
CPC分类号： B29C65/1658 , B29C65/1616 , B29C65/1635 , B29C65/1677 , B29C65/1687 , B29C65/4815 , B29C65/5057 , B29C65/8207 , B29C66/1282 , B29C66/12841 , B29C66/14 , B29C66/43 , B29C66/71 , B29C66/8266 , B29C66/836 , B29K2059/00 , B29K2067/00 , B29K2067/006 , B29K2069/00 , B29K2077/00 , B29K2995/0027 , B29L2031/7492 , B29K2067/003 , B29K2033/08 , B29K2025/06
摘要： A process for laser welding objects wherein a polymeric film having an absorptivity of 5 percent or less at the wavelength of the laser used is placed between the objects welded prior to welding.
摘要翻译：一种用于激光焊接物体的方法，其中将使用激光波长的吸收率为5％或更小的聚合物膜放置在焊接之前焊接的物体之间。

129. 发明申请

US20070131348A1 Process for laser welding 审中-公开
标题翻译：激光焊接工艺
公开(公告)号：US20070131348A1
公开(公告)日：2007-06-14
申请号：US11581639
申请日：2006-10-16
申请人： Katsuhiko Nakajima , Hideo Nakamura , Toshio Watanabe , Hiroshi Mori , Mitsunobu Nakatani , Makiko Ueda
发明人： Katsuhiko Nakajima , Hideo Nakamura , Toshio Watanabe , Hiroshi Mori , Mitsunobu Nakatani , Makiko Ueda
IPC分类号： B32B37/00
CPC分类号： B29C65/1658 , B29C65/1616 , B29C65/1635 , B29C65/1674 , B29C65/1677 , B29C66/1282 , B29C66/12841 , B29C66/14 , B29C66/342 , B29C66/43 , B29C66/71 , B29C66/727 , B29C66/73113 , B29C66/73776 , B29C66/7392 , B29C66/73921 , B29C66/8266 , B29C66/836 , B29K2023/00 , B29K2059/00 , B29K2067/00 , B29K2077/00 , B29K2101/12 , B29K2105/165 , B29K2309/08 , B29K2995/0027 , B29L2031/7492 , Y10T428/249953
摘要： A process for laser welding objects comprising the thermoplastic polymer compositions comprising a material having voids.
摘要翻译：一种用于激光焊接物体的方法，包括含有具有空隙的材料的热塑性聚合物组合物。

130. 发明申请

US20070084551A1 Method and apparatus for laser welding thermoplastic resin members 审中-公开
标题翻译：用于激光焊接热塑性树脂构件的方法和装置
公开(公告)号：US20070084551A1
公开(公告)日：2007-04-19
申请号：US11582350
申请日：2006-10-18
申请人： Toshio Watanabe , Katsuhiko Nakajima , Hideo Nakamura , Hiroshi Mori , Susumu Fujita , Mitsunobu Nakatani
发明人： Toshio Watanabe , Katsuhiko Nakajima , Hideo Nakamura , Hiroshi Mori , Susumu Fujita , Mitsunobu Nakatani
IPC分类号： B32B37/00
CPC分类号： B29C65/1635 , B29C35/045 , B29C65/10 , B29C65/1606 , B29C65/1616 , B29C65/1638 , B29C65/1658 , B29C65/1661 , B29C65/1664 , B29C65/1677 , B29C65/1687 , B29C65/72 , B29C66/0242 , B29C66/034 , B29C66/1122 , B29C66/324 , B29C66/41 , B29C66/43 , B29C66/71 , B29C66/73117 , B29C66/73772 , B29C66/73774 , B29C66/73921 , B29C66/8161 , B29C66/8242 , B29C66/836 , B29C66/863 , B29C66/91411 , B29C66/91445 , B29C66/9161 , B29C66/91645 , B29C66/919 , B29C66/91935 , B29C66/91943 , B29C66/934 , B29C66/939 , B29K2077/00 , B29K2101/12 , B29K2995/0041
摘要： A method and apparatus for laser welding two members made of thermoplastic resin material whereby high welding strength can be achieved and strength variations can be reduced. A first member 2 comprised of a transmissive thermoplastic resin that transmits a laser beam is brought into contact with a second member 3 comprised of an absorptive thermoplastic resin that absorbs a laser beam. Contact surfaces 4 are melted with a laser beam so as to join the two members. At least the contact surfaces 4 of the two members are pre-heated by a pre-heating means 20 at a temperature lower than the melting temperature of the contact surfaces. The contact surfaces 4 are then irradiated with a laser beam R generated by a laser beam generator 10 that is shone from the side of the first member so as to melt at least one of the contact surfaces of the two members. The melted portion is then post-heated by a post-heating means 20A at a temperature lower than the melting temperature of the melted portion, thereby allowing the melted portion to slowly cool down. The pre-heating and the post-heating are preferably conducted at temperatures above the glass transition temperature of the two members.
摘要翻译：一种用于激光焊接由热塑性树脂材料制成的两个构件的方法和装置，从而可以实现高焊接强度并且可以降低强度变化。由透射激光束的透射性热塑性树脂构成的第一构件2与由吸收激光的吸收性热塑性树脂构成的第二构件3接触。接触表面4用激光束熔化以便连接两个部件。至少两个构件的接触表面4在比接触表面的熔融温度低的温度下由预热装置20预热。然后用由激光束发生器10产生的激光束R照射接触表面4，该激光束从第一部件的侧面照射，以熔化两个部件的至少一个接触表面。然后，在比熔融部分的熔融温度低的温度下，通过后加热装置20A对熔融部分进行后加热，从而允许熔融部分缓慢冷却。预热和后加热优选在高于两个部件的玻璃化转变温度的温度下进行。

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