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111. 发明申请

US20090161201A1 Drive laser for EUV light source 有权
标题翻译：驱动激光用于EUV光源
公开(公告)号：US20090161201A1
公开(公告)日：2009-06-25
申请号：US12004905
申请日：2007-12-20
申请人： Alexander I. Ershov , Jerzy R. Hoffman , Norbert R. Bowering , Alexander N. Bykanov
发明人： Alexander I. Ershov , Jerzy R. Hoffman , Norbert R. Bowering , Alexander N. Bykanov
IPC分类号： H01S4/00 , G02B5/22
CPC分类号： H01S3/105 , G03F7/70033 , H01S3/005 , H01S3/115 , H01S3/2232 , H01S3/225 , H01S3/2325 , H01S2301/02 , H05G2/003 , H05G2/008
摘要： A device is described herein which may comprise an oscillator having an oscillator cavity length, Lo, and defining an oscillator path; and a multi-pass optical amplifier coupled with the oscillator to establish a combined optical cavity including the oscillator path, the combined cavity having a length, Lcombined, where Lcombined=(N+x)*Lo, where “N” is an integer and “x” is a number between 0.4 and 0.6.
摘要翻译：本文描述了一种器件，其可以包括具有振荡器腔长度Lo并且限定振荡器路径的振荡器; 和与所述振荡器耦合的多通道光放大器以建立包括所述振荡器路径的组合光腔，所述组合腔具有长度L组合，其中L组合=（N + x）* Lo，其中“N”是整数， “x”是介于0.4和0.6之间的数字。

112. 发明授权

US5970082A Very narrow band laser 失效
标题翻译：非常窄带激光
公开(公告)号：US5970082A
公开(公告)日：1999-10-19
申请号：US886715
申请日：1997-07-01
申请人： Alexander I. Ershov
发明人： Alexander I. Ershov
IPC分类号： H01S3/223 , G03F7/20 , H01S3/08 , H01S3/098 , H01S3/1055 , H01S3/137 , H01S3/139 , H01S3/225
CPC分类号： H01S3/1055 , G03F7/70025 , G03F7/70483 , G03F7/70575 , H01S3/08009 , H01S3/08081 , H01S3/225 , H01S3/08036 , H01S3/139
摘要： A very narrow band laser. The very narrow bandwidth is achieved by creating an unstable resonance cavity using a cylindrical, partially-reflecting mirror to provide an output coupler in combination with a line narrowing module having a beam expander and a curved grating.
摘要翻译：非常窄带激光。通过使用圆柱形部分反射镜产生不稳定的谐振腔来提供非常窄的带宽，以提供输出耦合器与具有光束扩展器和弯曲光栅的线窄化模块的组合。

113. 发明申请

US20100032590A1 Debris protection system having a magnetic field for an EUV light source 有权
标题翻译：具有用于EUV光源的磁场的碎片保护系统
公开(公告)号：US20100032590A1
公开(公告)日：2010-02-11
申请号：US12221822
申请日：2008-08-06
申请人： Alexander N. Bykanov , Alexander I. Ershov
发明人： Alexander N. Bykanov , Alexander I. Ershov
IPC分类号： G01J3/10
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70858 , G03F7/70916 , G03F7/70983 , H05G2/005 , H05G2/008
摘要： Devices are disclosed herein which may comprise a vessel; a material disposed in the vessel for creating an EUV light emitting plasma at a plasma site, the plasma generating debris; a near normal incidence EUV reflective optic disposed in the vessel; and a source of a magnetic field for deflecting debris in the vessel to protect the optic, the source positioned to interpose the optic between the source and the plasma site.
摘要翻译：本文公开的装置可以包括容器; 设置在容器中的用于在等离子体位置处产生EUV发光等离子体的材料，等离子体产生碎片; 设置在容器中的近似正常入射的EUV反射光学器件; 以及用于偏转容器中的碎屑以保护光学元件的磁场源，所述源被定位成将光学元件插入在源和等离子体位置之间。

114. 发明授权

US07476887B2 EUV light source optical elements 有权
公开(公告)号：US07476887B2
公开(公告)日：2009-01-13
申请号：US11725940
申请日：2007-03-19
申请人： Norbert R. Bowering , Alexander I. Ershov , Timothy S. Dyer , Hugh R. Grinolds
发明人： Norbert R. Bowering , Alexander I. Ershov , Timothy S. Dyer , Hugh R. Grinolds
IPC分类号： G01J1/00 , G02B1/00
摘要： Apparatus and methods are disclosed for forming plasma generated EUV light source optical elements, e.g., reflectors comprising MLM stacks employing various binary layer materials and capping layer(s) including single and binary capping layers for utilization in plasma generated EUV light source chambers, particularly where the plasma source material is reactive with one or more of the MLM materials.

115. 发明授权

US06243170B1 Double pass etalon spectrometer 有权
标题翻译：双通标准光谱仪
公开(公告)号：US06243170B1
公开(公告)日：2001-06-05
申请号：US09245134
申请日：1999-02-04
申请人： Alexander I. Ershov
发明人： Alexander I. Ershov
IPC分类号： G01B902
CPC分类号： G01J3/26 , G01J3/02 , G01J3/0205 , G01J3/021 , G01J3/0224 , G01J3/0229 , G01J3/027
摘要： A double pass etalon based spectrometer. Spectral components of a diffused beam are angularly separated as they are transmitted through an etalon. A retroreflector reflects the transmitted components back through the etalon. Twice transmitted spectral components are focused onto a light detector which in a preferred embodiment is a photo diode array. The spectrometer is very compact producing precise fringe data permitting bandwidth measurements with precision needed for microlithography for both &Dgr;&lgr;FWHM and &Dgr;&lgr;95%.
摘要翻译：基于双通道标准仪的光谱仪。扩散光束的光谱分量在透射通过标准具时被角度地分离。后向反射镜通过标准具反射传输的组件。两次透射的光谱分量被聚焦到光检测器上，在优选实施例中光检测器是光电二极管阵列。光谱仪非常紧凑，产生精确的条纹数据，允许DELTAlambdFWHM和DELTAlambd 95％的微光刻所需的精度进行带宽测量。

116. 发明授权

US06229639B1 Multiplexer for laser lithography 失效
标题翻译：用于激光光刻的多路复用器
公开(公告)号：US06229639B1
公开(公告)日：2001-05-08
申请号：US09112631
申请日：1998-07-09
申请人： Robert G. Ozarski , Alexander I. Ershov
发明人： Robert G. Ozarski , Alexander I. Ershov
IPC分类号： G02B2608
CPC分类号： G03F7/7005 , G03F7/70991
摘要： A laser lithography system in which two or more lasers provide laser illumination for two or more lithography exposure tools through a laser beam multiplexer. The mulitplexer contain several mirror devices each having a multi-reflectance mirror with surfaces of different reflectance and an adjusting mechanism for positioning one of the surfaces to intersect a laser beam from at least one of the lasers and direct a portion of it to at least one of the exposure tools.
摘要翻译：激光光刻系统，其中两个或更多个激光器通过激光束多路复用器为两个或更多个光刻曝光工具提供激光照明。多路复用器包含多个反射镜装置，每个反射镜具有不同反射率的表面的多反射镜，以及调整机构，用于将一个表面定位成与来自至少一个激光器的激光束交叉，并将其一部分引导至至少一个的曝光工具。

117. 发明授权

US6014398A Narrow band excimer laser with gas additive 失效
标题翻译：窄带准分子激光与气体添加剂
公开(公告)号：US6014398A
公开(公告)日：2000-01-11
申请号：US082139
申请日：1998-05-20
申请人： Thomas Hofmann , Toshihiko Ishihara , Palash P. Das , Alexander I. Ershov
发明人： Thomas Hofmann , Toshihiko Ishihara , Palash P. Das , Alexander I. Ershov
IPC分类号： H01S3/038 , G03F7/20 , H01S3/02 , H01S3/03 , H01S3/034 , H01S3/036 , H01S3/08 , H01S3/0971 , H01S3/1055 , H01S3/225 , H01S3/22
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70558 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/0971 , H01S3/225 , H01S3/08009 , H01S3/2251 , H01S3/2256
摘要： The present invention provides a very narrow band pulse excimer laser capable of producing pulses at a rate in the range of about 500 to 2000 Hz with enhanced energy dose control and reproducibility. Very small quantities of a stablizing additive consisting of oxygen or a heavy noble gas (xenon or radon for KrF lasers, or krypton, xenon or radon for ArF lasers), are added to the gas mixture. Tests performed show substantial improvements in energy stability with the addition of about 30 ppm of xenon to a KrF laser. Tests show improved performance for the ArF lasers with the addition of about 6-10 ppm of Xe or 40 ppm of Kr. In a preferred embodiment very narrow bandwidth is achieved on a KrF laser by reducing fluorine partial pressure to less than 0.10 percent and by increasing the reflectance of the output coupler to greater than 25 percent. In a preferred embodiment, prior art fused silica beam expansion prisms used in the prior art line-narrowing module were replaced with calcium fluoride prisms.
摘要翻译：本发明提供了一种非常窄带脉冲准分子激光器，其能够以增加的能量剂量控制和再现性以大约500至2000Hz范围内的速率产生脉冲。将非常少量由氧气或重稀有气体（用于KrF激光器的氙气或氪气，或用于ArF激光器的氪气，氙气或氡气）组成的稳定添加剂加入气体混合物中。进行的测试显示出能量稳定性的显着改善，其中向KrF激光器添加约30ppm的氙。测试表明，ArF激光器的性能提高了约6-10ppm的Xe或40ppm的Kr。在一个优选实施例中，通过将氟分压降低到小于0.10％，并通过将输出耦合器的反射率提高到大于25％，在KrF激光器上实现非常窄的带宽。在一个优选实施例中，现有技术的线缩窄模块中使用的现有技术的熔融石英束膨胀棱镜被氟化钙棱镜代替。

118. 发明授权

US5978409A Line narrowing apparatus with high transparency prism beam expander 有权
标题翻译：具有高透明棱镜光束扩张器的线条变窄装置
公开(公告)号：US5978409A
公开(公告)日：1999-11-02
申请号：US162341
申请日：1998-09-28
申请人： Palash P. Das , Alexander I. Ershov , Richard G. Morton
发明人： Palash P. Das , Alexander I. Ershov , Richard G. Morton
IPC分类号： G03F7/20 , H01S3/03 , H01S3/08 , H01S3/1055 , H01S3/137 , H01S3/225
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70558 , G03F7/70575 , H01S3/03 , H01S3/08009 , H01S3/225 , H01S3/1055
摘要： A grating based line-narrowing apparatus having a prism beam expander with at least four prisms. Each prism is positioned at an incidence angle between 67 and 71 degrees. A single layer coating of high refractive index, robust material, such as Al.sub.2 O.sub.3, is applied to the hypotenuse face of each prism, providing an efficient, anti-reflection coating. In a preferred embodiment the incident angle of the four prisms are each at about 68.2 degrees. The laser of the preferred embodiment has similar line narrowing efficiency and bandwidth as that for a laser with a 3 prism, ideal multi-layer anti-reflection coated beam expander. The primary benefit of the new four prism arrangement is that the prism coatings should be much less expensive and have greatly increased durability. Applicants have tested the new prisms for 30 million, 10 mJ pulses in air with no noticeable degradation. No present day dielectric multi-layer stack coating could survive such exposure.
摘要翻译：一种基于光栅的线条变窄装置，具有至少具有四个棱镜的棱镜扩束器。每个棱镜定位在67和71度之间的入射角。高折射率的单层涂层，诸如Al2O3的坚固材料被施加到每个棱镜的斜边面，从而提供有效的抗反射涂层。在一个优选实施例中，四个棱镜的入射角分别为约68.2度。优选实施例的激光器具有与具有3棱镜，理想的多层抗反射涂层光束扩展器的激光器相似的线窄化效率和带宽。新的四棱镜布置的主要优点是棱镜涂层应该便宜得多，并且耐久性大大提高。申请人已经在空气中测试了新的棱镜3000万，10 mJ脉冲，没有明显的退化。没有现在的电介质多层堆叠涂层可以经受这样的曝光。

119. 发明授权

US08604452B2 Drive laser delivery systems for EUV light source 有权
标题翻译：驱动用于EUV光源的激光输送系统
公开(公告)号：US08604452B2
公开(公告)日：2013-12-10
申请号：US13050198
申请日：2011-03-17
申请人： Alexander I. Ershov
发明人： Alexander I. Ershov
IPC分类号： G21K5/04
CPC分类号： H05G2/008 , G03F7/70025 , G03F7/70033 , G03F7/70983 , H01S3/10061 , H01S3/2232 , H01S3/2316 , H01S3/2383 , H05G2/003 , H05G2/005
摘要： An EUV light source is disclosed herein which may comprise a droplet generator producing a stream of target material droplets, a first optical gain medium amplifying light on a first beam path without a seed laser providing a seed laser output to the first beam path, a second optical gain medium amplifying light on a second beam path without a seed laser providing a seed laser output to the second beam path, and a beam combiner combining light from the first beam path and the second beam path for interaction with a target material droplet to produce EUV light emitting plasma.
摘要翻译：本文公开了一种EUV光源，其可以包括产生目标材料液滴流的液滴发生器，第一光学增益介质，在第一光束路径上放大光，而没有提供种子激光器输出到第一光束路径的种子激光器，第二光学增益介质光学增益介质，在第二光束路径上放大光，而没有提供种子激光器输出到第二光束路径的种子激光器;以及光束组合器，其组合来自第一光束路径和第二光束路径的光，以与靶材料液滴相互作用 EUV发光等离子体。

120. 发明申请

US20130306110A1 Light Collector Mirror Cleaning 有权
标题翻译：集光镜镜面清洁
公开(公告)号：US20130306110A1
公开(公告)日：2013-11-21
申请号：US13473529
申请日：2012-05-16
申请人： Silvia De Dea , Michael Varga , Alexander I. Ershov , Robert L. Morse
发明人： Silvia De Dea , Michael Varga , Alexander I. Ershov , Robert L. Morse
IPC分类号： B08B3/00
CPC分类号： B08B11/02 , B08B3/02 , B23K26/0643 , B23K26/16 , G02B27/0006 , G03F7/70925
摘要： A collector mirror of an extreme ultraviolet light source is cleaned by removing the collector mirror from a chamber of the extreme ultraviolet light source; mounting the collector mirror to a carrier; inserting the carrier with the collector mirror into a cleaning tank; applying a cleaning agent to a reflective surface of the collector mirror by spraying the cleaning agent through a plurality of nozzles directed toward the collector mirror reflective surface until the collector mirror reflective surface is clean; rinsing the applied cleaning agent from the collector mirror reflective surface; and drying the collector mirror reflective surface.
摘要翻译：通过从极紫外光源的室中除去集光镜来清洁极紫外光源的集光镜; 将集电镜安装到载体上; 将带有收集镜的载体插入清洗槽中; 通过喷射清洁剂通过指向集光镜反射表面的多个喷嘴将清洁剂施加到收集反射镜的反射表面，直到收集器反射表面清洁; 从收集器反射表面冲洗所施加的清洁剂; 并干燥收集器反射镜。

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