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111. 发明申请

US20100026978A1 PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置的投影目标
公开(公告)号：US20100026978A1
公开(公告)日：2010-02-04
申请号：US12539136
申请日：2009-08-11
申请人： Johannes Ruoff , Aurelian Dodoc
发明人： Johannes Ruoff , Aurelian Dodoc
IPC分类号： G03B27/54 , G02B5/30
CPC分类号： G03F7/70341 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G03F7/70966
摘要： The disclosure relates a projection objective of a microlithographic projection exposure apparatus, as well as a related microlithographic projection exposure apparatus and method. The projection objective can include a lens of a cubically crystalline material whose crystal orientation is oriented at an angle of at most 15° relative to the optical axis of the projection objective. The projection objective can also include a polarization correction element which has at least two subelements of birefringent, optically uniaxial material and having at least one respective aspheric surface. During use of the projection objective, the polarization correction element at least partially compensates for an intrinsic birefringence of the lens.
摘要翻译：本公开涉及微光刻投影曝光装置的投影物镜，以及相关的微光刻投影曝光装置和方法。投影物镜可包括立方结晶材料的透镜，其晶体取向相对于投影物镜的光轴以至多15°的角度取向。投影物镜还可以包括偏振校正元件，该偏振校正元件具有至少两个双折射元件，光学单轴材料并具有至少一个相应的非球面表面。在投影物镜的使用期间，偏振校正元件至少部分地补偿透镜的固有双折射。

112. 发明申请

US20090115986A1 Microlithography projection objective 审中-公开
标题翻译：微光刻投影物镜
公开(公告)号：US20090115986A1
公开(公告)日：2009-05-07
申请号：US11916162
申请日：2006-05-23
申请人： Heiko Feldmann , Daniel Kraehmer , Jean-Claude Perrin , Julian Kaller , Aurelian Dodoc , Vladimir Kamenov , Olaf Conradi , Toralf Gruner , Thomas Okon , Alexander Epple
发明人： Heiko Feldmann , Daniel Kraehmer , Jean-Claude Perrin , Julian Kaller , Aurelian Dodoc , Vladimir Kamenov , Olaf Conradi , Toralf Gruner , Thomas Okon , Alexander Epple
IPC分类号： G03F7/20 , G02B17/08
CPC分类号： G03F7/70225 , G02B17/08 , G03F7/702 , G03F7/70283 , G03F7/70941
摘要： Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.
摘要翻译：关于在这样的投影物镜中抑制假光，描述用于成像到平面中的布置在物体平面中的图案的微光刻投影物镜。

113. 发明授权

US07239450B2 Method of determining lens materials for a projection exposure apparatus 有权
标题翻译：确定投影曝光装置的透镜材料的方法
公开(公告)号：US07239450B2
公开(公告)日：2007-07-03
申请号：US11181694
申请日：2005-07-14
申请人： Vladimir Kamenov , Daniel Kraehmer , Michael Totzeck , Toralf Gruner , Aurelian Dodoc
发明人： Vladimir Kamenov , Daniel Kraehmer , Michael Totzeck , Toralf Gruner , Aurelian Dodoc
IPC分类号： G02B3/00
CPC分类号： G03F7/70891 , G02B1/02 , G02B1/08 , G02B17/0812 , G02B17/0892 , G03F7/70966
摘要： A method of determining materials of lenses contained in an optical system of a projection exposure apparatus is described. First, for each lens of a plurality of the lenses, a susceptibility factor KLT/LH is determined. This factor is a measure of the susceptibility of the respective lens to deteriorations caused by at least one of lifetime effects and lens heating effects. Then a birefringent fluoride crystal is selected as a material for each lens for which the susceptibility factor KLT/LH is above a predetermined threshold. Theses lenses are assigned to a first set of lenses. For these lenses, measures are determined for reducing adverse effects caused by birefringence inherent to the fluoride crystals.
摘要翻译：描述了确定投影曝光装置的光学系统中所包含的透镜的材料的方法。首先，对于多个透镜的每个透镜，确定敏感度因子K LT / LH 。该因子是由寿命效应和透镜加热效果中的至少一种引起的各透镜对恶化的敏感性的量度。然后选择双折射氟化物晶体作为敏感度因子K LT / LH <>高于预定阈值的每个透镜的材料。这些镜头被分配到第一组透镜。对于这些透镜，确定了减少由氟化物晶体固有的双折射引起的不利影响的措施。

114. 发明申请

US20060198018A1 Imaging system 审中-公开
标题翻译：成像系统
公开(公告)号：US20060198018A1
公开(公告)日：2006-09-07
申请号：US11347315
申请日：2006-02-06
申请人： David Shafer , Aurelian Dodoc , Karl-Heinz Schuster
发明人： David Shafer , Aurelian Dodoc , Karl-Heinz Schuster
IPC分类号： G02B17/00 , G02B23/00 , G02B21/00
CPC分类号： G03F7/70225 , G02B17/08 , G02B17/0848 , G02B17/0892 , G02B27/0025 , G03F7/70275
摘要： An imaging system for imaging an object field arranged in an object surface of the imaging system onto an image field arranged in an image surface of the optical system while creating at least one intermediate image including: a first imaging subsystem for creating the intermediate image from radiation coming from the object surface, the first imaging subsystem having a first optical axis; and a second imaging subsystem different in construction from the first imaging subsystem for imaging the intermediate image onto the image surface, the second imaging subsystem having a second optical axis; wherein the first optical axis is offset with respect to the second optical axis by an axis offset at the intermediate image and wherein the intermediate image has a correction status adapted to the axis-offset such that the correction status of the image field is essentially free from aberrations caused by the axis-offset.
摘要翻译：一种成像系统，用于将布置在成像系统的物体表面中的物体场成像到布置在光学系统的图像表面中的图像场，同时创建至少一个中间图像，所述中间图像包括：第一成像子系统，用于从辐射创建中间图像来自物体表面的第一成像子系统具有第一光轴; 以及与所述第一成像子系统不同的第二成像子系统，用于将所述中间图像成像到所述图像表面上，所述第二成像子系统具有第二光轴; 其中所述第一光轴相对于所述第二光轴偏移在所述中间图像处的偏移，并且其中所述中间图像具有适于所述轴偏移的校正状态，使得所述图像场的校正状态基本上不含轴偏移造成的像差。

115. 发明授权

US08858099B2 Anamorphic objective 有权
标题翻译：变形目标
公开(公告)号：US08858099B2
公开(公告)日：2014-10-14
申请号：US13523232
申请日：2012-06-14
申请人： Aurelian Dodoc , Christian Bannert , Vladan Blahnik , Holger Sehr
发明人： Aurelian Dodoc , Christian Bannert , Vladan Blahnik , Holger Sehr
IPC分类号： G03B17/00 , G02B13/08
CPC分类号： G02B13/08
摘要： An anamorphic objective is provided for imaging an object onto an image acquisition unit. The anamorphic objective has at least one first plane of symmetry and at least one second plane of symmetry. The first plane of symmetry and the second plane of symmetry are oriented perpendicular to one another. The first plane of symmetry and the second plane of symmetry intersect and have a straight line of intersection (intersection line). A first objective section followed by a second objective section are arranged. A diaphragm is arranged between the first objective section and the second objective section. A first anamorphic optical element is arranged in the first objective section. A second anamorphic optical element is arranged in the second objective section. The anamorphic objective fulfills specified conditions and is suitable for generating a stigmatic imaging of the object on the image acquisition unit.
摘要翻译：提供了一种用于将对象成像到图像获取单元上的变形目标。变形物镜具有至少一个第一对称平面和至少一个第二对称平面。第一对称平面和第二对称平面彼此垂直。第一个对称平面和第二个对称平面交叉并具有一条直线交点（交点）。第一个目标部分是第二个目标部分。在第一目标部分和第二目标部分之间布置有隔膜。第一变形光学元件布置在第一目标部分中。第二变形光学元件布置在第二目标部分中。变形目标满足特定条件，适用于在图像采集单元上产生物体的眩晕成像。

116. 发明授权

US08212991B2 Optical system of a microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置的光学系统
公开(公告)号：US08212991B2
公开(公告)日：2012-07-03
申请号：US12628294
申请日：2009-12-01
申请人： Aurelian Dodoc , Albrecht Ehrmann , Sascha Bleidistel
发明人： Aurelian Dodoc , Albrecht Ehrmann , Sascha Bleidistel
IPC分类号： G03B27/42 , G03B27/68 , G03B27/58
CPC分类号： G02B3/12 , G03F7/70341
摘要： An optical system of a microlithographic projection exposure apparatus contains a module, which can be fitted in the optical system and removed from it as a unit. The module contains a cavity which can be completely filled with a liquid and hermetically sealed, and a concavely curved optical surface which bounds the cavity at the top during operation of the projection exposure apparatus. This makes it possible to fill the module outside the optical system. The module can be tilted there so that no air bubble, which prevents complete filling, can form below the concavely curved optical surface.
摘要翻译：微光刻投影曝光装置的光学系统包含可以安装在光学系统中并作为一个单元从其中移除的模块。该模块包含一个可完全充满液体并密封的空腔，以及在投影曝光设备的操作期间界定顶部空腔的凹曲面的光学表面。这使得可以将模块填充到光学系统外部。模块可以在那里倾斜，从而不会形成阻止完全填充的气泡，可以形成在凹曲面的光学表面之下。

117. 发明申请

US20080170217A1 Optical System of a Microlithographic Projection Exposure Apparatus 审中-公开
标题翻译：微光刻投影曝光装置的光学系统
公开(公告)号：US20080170217A1
公开(公告)日：2008-07-17
申请号：US11911899
申请日：2006-05-13
申请人： Aurelian Dodoc , Albrecht Ehrmann , Sascha Bleidistel
发明人： Aurelian Dodoc , Albrecht Ehrmann , Sascha Bleidistel
IPC分类号： G03B27/54
CPC分类号： G02B3/12 , G03F7/70341
摘要： An optical system of a microlithographic projection exposure apparatus (10) contains a module (50; 150), which can be fitted in the optical system and removed from it as a unit. The module contains a cavity (42; 142) which can be completely filled with a liquid (34; 134) and hermetically sealed, and a concavely curved optical surface (S) which bounds the cavity at the top during operation of the projection exposure apparatus (10). This makes it possible to fill the module outside the optical system, The module can be tilted there so that no air bubble, which prevents complete filling, can form below the concavely curved optical surface.
摘要翻译：微光刻投影曝光装置（10）的光学系统包含可以安装在光学系统中并作为一个单元从其中移除的模块（50; 150）。该模块包括可完全充满液体（34; 134）并气密密封的空腔（42; 142）和在投影曝光设备的操作期间界定顶部空腔的凹曲面光学表面（S）（10）。这使得可以将模块填充到光学系统外部。该模块可以在那里倾斜，使得不会在凹曲面光学表面下方形成防止完全填充的气泡。

118. 发明授权

US07203010B2 Catadioptric projection objective 失效
标题翻译：反射折射投影物镜
公开(公告)号：US07203010B2
公开(公告)日：2007-04-10
申请号：US11036155
申请日：2005-01-18
申请人： Alexander Epple , Aurelian Dodoc
发明人： Alexander Epple , Aurelian Dodoc
IPC分类号： G02B17/00
CPC分类号： G02B17/0892 , G02B5/005 , G02B13/22 , G02B17/08 , G03F7/70225 , G03F7/7025 , G03F7/70275 , G03F7/70341
摘要： A catadioptric projection objective which images a pattern arranged in an object plane of the projection objective into the image plane of the projection objective while generating a real intermediate image has a catadioptric objective part having at least one concave mirror and a beam deflecting device and also a dioptric objective part. The imaging system has a system diaphragm having a variable diaphragm diameter for variably limiting the cross section of the radiation passing through the projection objective. This system diaphragm is arranged in the catadioptric objective part, preferably in direct proximity to the concave mirror. The invention enables a projection objective with a simple construction.
摘要翻译：将产生真实中间图像的布置在投影物镜的物平面中的图案成像到投影物镜的像平面内的反射折射投影物镜具有反射折射物镜部分，其具有至少一个凹面镜和光束偏转装置，并且还具有屈光客观部分。成像系统具有可变光阑直径的系统隔膜，用于可变地限制通过投影物镜的辐射的横截面。该系统隔膜布置在反折射物镜部分中，优选地直接靠近凹面镜。本发明能够实现具有简单结构的投影物镜。

119. 发明申请

US20120212810A1 MIRROR FOR THE EUV WAVELENGTH RANGE, PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY CROMPRISING SUCH A MIRROR, AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY COMPRISING SUCH A PROJECTION OBJECTIVE 审中-公开
标题翻译：用于EUV波长范围的镜像，用于对这样的镜子进行微结构化的投影目标和用于包含这种投影目标的微观计算的投影曝光装置
公开(公告)号：US20120212810A1
公开(公告)日：2012-08-23
申请号：US13347431
申请日：2012-01-10
申请人： Hans-Jochen Paul , Gerhard Braun , Sascha Migura , Aurelian Dodoc , Christoph Zaczek
发明人： Hans-Jochen Paul , Gerhard Braun , Sascha Migura , Aurelian Dodoc , Christoph Zaczek
IPC分类号： G02B5/08
CPC分类号： G03F7/70958 , B82Y10/00 , G02B5/0891 , G03F7/70316 , G03F7/70941 , G21K1/062 , G21K2201/064 , G21K2201/067
摘要： EUV-mirror having a substrate (S) and a layer arrangement that includes plural layer subsystems (P″, P′″) each consisting of a periodic sequence of at least two periods (P2, P3) of individual layers. The periods (P2, P3) include two individual layers composed of different materials for a high refractive index layer (H″, H′″) and a low refractive index layer (L″, L′″) and have within each layer subsystem (P″, P′″) a constant thickness (d2, d3) that deviates from that of the periods of an adjacent layer subsystem. In one alternative, the layer subsystem (P″) second most distant from the substrate has a period sequence (P2) such that the first high refractive index layer (H′″) of the layer subsystem (P′″) most distant from the substrate directly succeeds the last high refractive index layer (H″) of the layer subsystem (P″) second most distant from the substrate
摘要翻译：具有基板（S）的EUV反射镜以及包括多层子系统（P“，P”“）的层布置，每个子系统由各层的至少两个周期（P2，P3）的周期性序列构成。周期（P2，P3）包括由用于高折射率层（H“，H”“）和低折射率层（L”，L“”）的不同材料组成的两个单独层，并且在每个层子系统 P“，P”“）与相邻层子系统的周期偏差的恒定厚度（d2，d3）。在一个替代方案中，距衬底第二最远的层子系统（P“）具有周期序列（P2），使得层子系统（P'”）的第一高折射率层（H“”）最远离衬底直接成为距离衬底最远的层子系统（P“）的最后一个高折射率层（H”）

120. 发明申请

US20120002273A1 CATADIOPTRIC PROJECTION OBJECTIVE WITH PUPIL CORRECTION 有权
标题翻译：具有校正的目标投影目标
公开(公告)号：US20120002273A1
公开(公告)日：2012-01-05
申请号：US13226615
申请日：2011-09-07
申请人： Aurelian Dodoc
发明人： Aurelian Dodoc
IPC分类号： G02B17/08
CPC分类号： G02B17/08 , G02B17/00 , G02B17/0804 , G02B17/0812 , G02B17/0816 , G02B17/0892 , G03F7/70225 , G03F7/70275 , G03F7/70341
摘要： The disclosure provides a catadioptric projection objective which includes a plurality of optical elements, including first, second and third refractive objection parts. Optical elements arranged between an object surface and a first pupil surface form a Fourier lens group that includes a negative lens group arranged optically close to the first pupil surface. The Fourier lens group is configured such that a Petzval radius RP at the first pupil surface satisfies the condition: |RP|>150 mm.
摘要翻译：本公开提供一种反射折射投射物镜，其包括多个光学元件，包括第一，第二和第三折射反射部分。布置在物体表面和第一光瞳表面之间的光学元件形成傅里叶透镜组，其包括光学上靠近第一光瞳表面布置的负透镜组。傅立叶透镜组被配置为使得第一光瞳表面处的彼得兹瓦尔半径RP满足条件：| RP |> 150mm。

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