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101. 发明授权

US5608227A Mercury-vapor high-pressure short-arc discharge lamp, and method and apparatus for exposure of semiconductor wafers to radiation emitted from said lamp 失效
标题翻译：汞蒸汽高压短弧放电灯，以及用于将半导体晶片暴露于从所述灯发射的辐射的方法和装置
公开(公告)号：US5608227A
公开(公告)日：1997-03-04
申请号：US517594
申请日：1995-08-22
申请人： Joern Dierks , Juergen Maier
发明人： Joern Dierks , Juergen Maier
IPC分类号： C03C17/23 , C03C17/34 , G02B5/28 , G03F7/20 , H01J61/20 , H01J61/30 , H01J61/40 , H01J61/86
CPC分类号： G03F7/70016 , C03C17/23 , C03C17/3417 , G02B5/283 , H01J61/20 , H01J61/302 , H01J61/40 , H01J61/86 , C03C2217/212 , C03C2217/213 , C03C2217/23 , H01J61/35
摘要： To essentially eliminate short ultraviolet (UV) radiation from a mercury high-pressure short-arc discharge lamp, that is, wavelengths below the radiation band of 365 nm, the lamp includes a discharge vessel of quartz glass which is coated with a selectively reflective outer coating (2a) and, at the inside, with a selectively absorbing inner coating (2b). The outer coating (2a) is formed by a multi-layer interference reflection filter which preferentially reflects wavelengths between about 240 and 300 nm with a filter cut-off, corresponding to 50% transmission, in the wavelength region between about 290 and 330 nm. The inner coating (2b) is a titanium dioxide coating which, preferentially, absorbs radiation below about 250 nm, with a 50% transmission at about 240 nm. In accordance with a preferred feature of the invention, a radiation absorbing titanium dioxide/silicon dioxide mixed-layer coating (2c) is applied at the outside over the multi-layer interference reflection filter (2a). The outer absorbing coating preferentially absorbs radiation below about 280 nm. Preferably, the multi-layer interference reflection filter is formed by at least 8 alternating ZrO.sub.2 and SiO.sub.2 individual layers; all the coating layers preferably have thicknesses between about 30 and 50 nm.
摘要翻译：为了基本上消除来自汞高压短弧放电灯的短波长（UV）辐射，即波长低于365nm的辐射波长的波长，该灯包括石英玻璃的放电容器，该放电容器涂覆有选择性反射外壳涂层（2a）和在内部具有选择性吸收内涂层（2b）。外涂层（2a）由多层干涉反射滤光片形成，多层干涉反射滤光片在约290nm与330nm之间的波长范围内优先反射约240nm至300nm之间的波长，并具有对应于50％透射率的滤光片截止。内涂层（2b）是二氧化钛涂层，其优选地吸收低于约250nm的辐射，在约240nm处具有50％透射率。根据本发明的优选特征，在多层干涉反射滤光器（2a）的外部施加吸收辐射的二氧化钛/二氧化硅混合层涂层（2c）。外部吸收涂层优先吸收低于约280nm的辐射。优选地，多层干涉反射滤光器由至少8个交替的ZrO 2和SiO 2单独层形成; 所有涂层的厚度优选在约30和50nm之间。

102. 发明授权

US5605609A Method for forming low refractive index film comprising silicon dioxide 失效
$Method for forming low refractive index film comprising silicon dioxide$
标题翻译：用于形成包含二氧化硅的低折射率膜的方法
公开(公告)号：US5605609A
公开(公告)日：1997-02-25
申请号：US323579
申请日：1994-10-17
申请人： Eiichi Ando , Akira Mitsui , Junichi Ebisawa , Koichi Suzuki , Kiyoshi Matsumoto , Takuji Oyama
发明人： Eiichi Ando , Akira Mitsui , Junichi Ebisawa , Koichi Suzuki , Kiyoshi Matsumoto , Takuji Oyama
IPC分类号： B32B17/10 , B32B27/06 , C03C17/23 , C03C17/245 , C03C17/25 , C03C17/34 , C03C17/36 , C03C17/38 , C03C17/42 , C23C14/08 , C23C14/10 , C23C14/34 , G02B1/10 , G02B1/11 , G02F1/1333 , G02F1/1335 , H01J37/34
CPC分类号： C03C17/3605 , B32B17/10174 , B32B27/06 , C03C17/23 , C03C17/245 , C03C17/25 , C03C17/3417 , C03C17/3435 , C03C17/3482 , C03C17/3488 , C03C17/36 , C03C17/3613 , C03C17/3618 , C03C17/3639 , C03C17/3644 , C03C17/3652 , C03C17/3657 , C03C17/3681 , C03C17/38 , C03C17/42 , C23C14/08 , C23C14/10 , C23C14/3407 , C23C14/3414 , G02B1/10 , G02B1/105 , G02B1/116 , H01J37/3426 , H01J37/3435 , H01J37/3491 , C03C2217/213 , C03C2217/229 , C03C2217/23 , C03C2217/242 , C03C2217/732 , C03C2218/11 , C03C2218/15 , C03C2218/154 , G02F1/133502 , G02F2001/133337 , Y02T10/88
摘要： The present invention relates to a film comprising silicon dioxide as the main component, which contains Zr, etc., and a method for forming it by reactive DC sputtering. It makes it possible to form reflection preventive films, alkali barrier films and various multi-layered films such as multi-layered films for anti-iridescent glass, which contain said film comprising silicon dioxide as the main component, by a physical vapor deposition method without breaking a vacuum.
摘要翻译：本发明涉及包含二氧化硅作为主要成分的含Zr等的薄膜及其用反应型DC溅射法形成的方法。通过物理气相沉积法可以形成防反射膜，碱阻挡膜和各种多层膜，例如用于防虹彩玻璃的多层膜，其包含以二氧化硅为主要成分的所述膜，而没有打破真空

103. 发明授权

US5599387A Compounds and compositions for coating glass with silicon oxide 失效
标题翻译：用氧化硅涂覆玻璃的化合物和组合物
公开(公告)号：US5599387A
公开(公告)日：1997-02-04
申请号：US472589
申请日：1995-06-07
申请人： George A. Neuman , Patricia R. Athey , Royann L. Stewart-Davis
发明人： George A. Neuman , Patricia R. Athey , Royann L. Stewart-Davis
IPC分类号： C03C17/00 , C03C17/245 , C03C17/34 , C23C16/40 , C23C16/44 , C23C16/453 , C23C16/54 , C09D5/00
CPC分类号： C03C17/002 , C03C17/245 , C03C17/2453 , C03C17/3417 , C23C16/401 , C23C16/402 , C23C16/4412 , C23C16/453 , C23C16/545 , C03C2217/211 , C03C2217/212 , C03C2217/213 , C03C2217/215 , C03C2217/216 , C03C2217/218 , C03C2217/219 , C03C2217/228 , C03C2217/23 , C03C2217/241 , C03C2217/244 , C03C2218/152
摘要： Silicon compounds useful as coating reactants for the chemical vapor deposition of silicon oxide are disclosed, along with compounds useful as accelerants to increase the deposition rate of silicon oxide. The silicon-containing precursor comprises the structural formula ##STR1## wherein R.sup.1 is an alkyl, alkenyl, alkynyl or aryl radical which may be substituted, and R.sub.2 is a functional group which increases the reactivity of the silicon compound by withdrawing electron density away from the silicon atom, such as hydrogen, halogen, alkenyl, alkynyl, halogenated alkyl and perhalogenated alkyl radicals. The accelerant is a compound selected to take advantage of the partial positive charge on the silicon atom. Such accelerant compounds include Lewis acids and bases; water; ozone; trivalent compounds of nitrogen, boron and phosphorus; tetravalent compounds of sulfur and selenium; pentavalent compounds of phosphorus and a variety of metal compounds. Also disclosed are compositions including an additional metal-containing coating precursor, such as an organotin compound, to deposit another metal oxide along with silicon oxide.
摘要翻译：公开了可用作氧化硅的化学气相沉积的涂料反应物的硅化合物，以及可用作增加氧化硅沉积速率的促进剂的化合物。含硅前体包括结构式：其中R 1是可以被取代的烷基，链烯基，炔基或芳基，R 2是通过将电子密度从硅原子，例如氢，卤素，烯基，炔基，卤代烷基和全卤代烷基。促进剂是选择用于利用硅原子上的部分正电荷的化合物。这种促进剂化合物包括路易斯酸和碱; 水; 臭氧; 氮，硼和磷的三价化合物; 硫和硒的四价化合物; 五价磷化合物和各种金属化合物。还公开了包含另外的含金属的涂层前体，例如有机锡化合物，以沉积另外的金属氧化物和氧化硅的组合物。

104. 发明授权

US5576097A High brightness durable retro-reflecting microspheres and method of making the same 失效
标题翻译：高亮度持久的反光反射微球及其制作方法
公开(公告)号：US5576097A
公开(公告)日：1996-11-19
申请号：US428801
申请日：1995-04-24
申请人： Charles W. Wyckoff
发明人： Charles W. Wyckoff
IPC分类号： B05D7/00 , B25G3/00 , B32B5/16 , E01F9/00 , G02B5/128
CPC分类号： C03C12/02 , C03C17/25 , C09C1/28 , C01P2002/02 , C01P2004/84 , C03C2217/213 , C03C2217/23 , Y10T428/252 , Y10T428/259 , Y10T428/2993 , Y10T428/2996
摘要： High brightness durable retro-reflecting microspheres for retro-reflection and related uses (and a novel method of forming the same) is provided embodying a retro-reflective vitreous glass microsphere encapsulated in a hardened clear non-vitreous metal-oxide ceramic shell of substantially the same index of fraction as the microsphere.
摘要翻译：提供了用于回射反射和相关用途的高亮度耐久性回归反射微球（及其形成方法的新颖方法），其实现了包封在硬化的透明非玻璃状金属氧化物陶瓷壳体中的反射玻璃玻璃微球，其基本上与微球相同的分数指数。

105. 发明授权

US5431707A Process for the formation of a barrier layer on a surface of a glass object 失效
标题翻译：用于在玻璃物体的表面上形成阻挡层的工艺
公开(公告)号：US5431707A
公开(公告)日：1995-07-11
申请号：US115423
申请日：1993-09-02
申请人： Sami Dick , Patrick Recourt , Lahchen Ougarane
发明人： Sami Dick , Patrick Recourt , Lahchen Ougarane
IPC分类号： C03C17/22 , C03C17/245 , C23C16/34
CPC分类号： C03C17/225 , C03C17/245 , C03C2217/213 , C03C2217/281 , C03C2218/152
摘要： There is formed a silicon-base antimigration barrier layer by projection, on a hot surface of a glass object, in an unconfined ambient atmosphere from a gaseous mixture comprising neutral gas, a silicon precursor, typically a silane, between 10 and 60% of ammonia and preferably less than 5% oxygen, the ratio of the oxygen and silane contents being comprised between 0 and 4. It is useful particularly for the treatment of sodium-calcium glass receptacles to prevent migration of ions into liquids contained in the receptacles.
摘要翻译：通过在包含中性气体，硅前体（通常为硅烷）的气体混合物的非限制性环境气氛中，在玻璃体的热表面上投影10至60％的氨，形成硅基防迁移障碍层并且优选小于5％的氧，氧和硅烷含量的比例在0和4之间。特别是用于处理钠 - 钙玻璃容器以防止离子迁移到包含在容器中的液体中。

106. 发明授权

US5400489A Method of stabilizing the surface properties of objects to be thermally treated in a vacuum 失效
标题翻译：稳定在真空中进行热处理的物体的表面性质的方法
公开(公告)号：US5400489A
公开(公告)日：1995-03-28
申请号：US968811
申请日：1992-10-30
申请人： Frank Hegner , Ulfert Drewes
发明人： Frank Hegner , Ulfert Drewes
IPC分类号： C03C17/02 , C03C17/25 , C04B37/00 , C04B37/02 , C04B41/80 , C04B41/85 , C04B41/87 , C30B33/00 , C30B33/02 , G01L9/00 , G01L9/04 , G01L9/12 , H01L21/316 , H01G7/00 , B05D3/12 , G01L1/22
CPC分类号： G01L9/0075 , C03C17/25 , C04B37/006 , C04B37/026 , G01L9/0055 , C03C2217/213 , C03C2218/113 , C04B2235/6581 , C04B2237/062 , C04B2237/10 , C04B2237/122 , C04B2237/125 , C04B2237/127 , C04B2237/343 , C04B2237/40 , C04B2237/592 , C04B2237/708 , C04B2237/72 , Y10T29/43 , Y10T29/49103
摘要： To avoid any deterioration of the surface properties of objects of ceramic, glass, or a single-crystal insulating material which are subjected to a vacuum temperature process, a thin layer of a spin-on glass solution with a silicon-dioxide equivalent of not more than 10% is applied to the objects by spinning or spraying prior to the vacuum temperature process. This is particularly important to avoid the strong moisture dependence of capacitive or resistive pressure sensors having a substrate and a diaphragm to be joined together, forming a chamber sealed at least at the edge. The diaphragm is covered with a layer of silicon carbide, niobium, or tantalum serving as one capacitor electrode, or the surface portion of the diaphragm which will lie within the chamber is coated with at least one strain gage; the portion of the substrate surface which will lie within the chamber is coated with at least one additional capacitor electrode or, in the case of the resistive pressure sensor, not coated therewith; over the entire surface portion of the substrate and diaphragm thus coated, a thin layer of the spin-on glass solution is applied and dried; contact is made to the capacitor electrodes or strain gages through the substrate and/or diaphragm, and substrate and diaphragm are brazed together by a ring-shaped part of active brazing material, which also serves as a spacer, or by a sufficient amount of active brazing paste.
摘要翻译：为了避免陶瓷，玻璃或经受真空温度处理的单晶绝缘材料的物体的表面性能的任何劣化，二氧化硅当量不大于的二氧化硅玻璃溶液的薄层在真空温度过程之前通过旋涂或喷涂将10％以上的物质施加到物体上。这对于避免具有要接合在一起的基板和隔膜的电容式或电阻式压力传感器的强的水分依赖性形成至少在边缘处密封的室来说尤为重要。膜片被一层碳化硅，铌或钽覆盖，作为一个电容器电极，或者位于室内的隔膜的表面部分涂覆有至少一个应变计; 将位于室内的衬底表面的部分涂覆有至少一个附加的电容器电极，或者在电阻压力传感器的情况下，其不被涂覆; 在基板的整个表面部分和如此涂覆的隔膜上，施加和干燥旋涂玻璃溶液的薄层; 通过基板和/或隔膜对电容器电极或应变计进行接触，并且基板和隔膜通过活性钎焊材料的环形部分钎焊在一起，活性钎焊材料也用作间隔物，或通过足够量的活性物质钎焊膏

107. 发明授权

US5370904A Method for the formation of silicon oxide films 失效
标题翻译：氧化硅膜形成方法
公开(公告)号：US5370904A
公开(公告)日：1994-12-06
申请号：US148744
申请日：1993-10-29
申请人： Katsutoshi Mine , Takashi Nakamura , Motoshi Sasaki
发明人： Katsutoshi Mine , Takashi Nakamura , Motoshi Sasaki
IPC分类号： C03C17/25 , C03C17/30 , C04B41/50 , C04B41/87 , C09D183/05 , C23C18/12 , H01L21/312 , H01L21/316 , B05D5/12
CPC分类号： C04B41/87 , C03C17/25 , C03C17/30 , C04B41/009 , C04B41/5035 , C23C18/1204 , C23C18/1212 , C23C18/122 , C23C18/1275 , C23C18/1279 , H01L21/02134 , H01L21/02164 , H01L21/02282 , H01L21/3124 , H01L21/316 , C03C2217/213 , C03C2218/11 , C03C2218/32
摘要： Disclosed is a method for the formation of a thick silicon oxide film on the surface of a substrate. The method comprises forming a hydrogen silsesquioxane resin film on the surface of a substrate and converting the hydrogen silsesquioxane resin into silicon oxide ceramic by heating the resin film-bearing substrate in an inert gas atmosphere at 250.degree. C. to 500.degree. C. until the content of silicon-bonded hydrogen in the silicon oxide product has reached .ltoreq.80% of the content of silicon-bonded hydrogen in the hydrogen silsesquioxane.
摘要翻译：公开了在基板的表面上形成厚的氧化硅膜的方法。该方法包括在基材表面上形成氢倍半硅氧烷树脂膜，并在250℃至500℃的惰性气体气氛中加热树脂膜承载基底，将氢倍半硅氧烷树脂转化为氧化硅陶瓷，直到氧化硅产物中硅键合氢的含量已达到氢倍半硅氧烷中与硅键合的氢的含量的80％。

108. 发明授权

US5370903A Method for the formation of a silicon oxide film 失效
标题翻译：氧化硅膜形成方法
公开(公告)号：US5370903A
公开(公告)日：1994-12-06
申请号：US146380
申请日：1993-10-29
申请人： Katsutoshi Mine , Takashi Nakamura , Motoshi Sasaki
发明人： Katsutoshi Mine , Takashi Nakamura , Motoshi Sasaki
IPC分类号： C03C17/23 , C04B41/50 , C04B41/87 , C09D183/05 , C23C18/12 , H01L21/312 , H01L21/314 , H01L21/316 , B05D5/12
CPC分类号： C04B41/87 , C03C17/23 , C04B41/009 , C04B41/5035 , C23C18/1212 , C23C18/122 , C23C18/1275 , H01L21/02134 , H01L21/02164 , H01L21/02282 , H01L21/02337 , H01L21/316 , C03C2217/213 , C03C2218/32 , C04B2111/00844
摘要： Disclosed is a method for the formation of a thick silicon oxide film on the surface of a substrate. The method comprises forming a hydrogen silsesquioxane resin film on the surface of a substrate followed by converting the hydrogen silsesquioxane resin into silicon oxide ceramic by heating the resin film-bearing substrate in a mixed gas atmosphere of above 0 volume % up to 20 volume % oxygen and 80 volume % up to, but not including, 100 vol % inert gas until the content of silicon-bonded hydrogen in the silicon oxide product has reached .ltoreq.80% of the content of silicon-bonded hydrogen in the hydrogen silsesquioxane resin.
摘要翻译：公开了在基板的表面上形成厚的氧化硅膜的方法。该方法包括在基材表面上形成氢倍半硅氧烷树脂膜，然后将氢倍半硅氧烷树脂转化为氧化硅陶瓷，通过在含有0体积％至20体积％氧气的混合气体气氛中加热含树脂膜的基材和80体积％直至但不包括100体积％的惰性气体，直到氧化硅产物中与硅键合的氢的含量达到氢倍半硅氧烷树脂中与硅键合的氢的含量的80％。

109. 发明授权

US5318830A Glass pane with reflectance reducing coating 失效
标题翻译：具有反射率降低涂层的玻璃板
公开(公告)号：US5318830A
公开(公告)日：1994-06-07
申请号：US872033
申请日：1992-04-23
申请人： Atsushi Takamatsu , Kensuke Makita
发明人： Atsushi Takamatsu , Kensuke Makita
IPC分类号： B32B17/10 , G02B1/11 , G02B1/100
CPC分类号： C03C17/3417 , B32B17/10036 , B32B17/10174 , B32B17/10761 , G02B1/115 , C03C2217/212 , C03C2217/213 , C03C2217/22 , C03C2217/23 , C03C2217/734 , C03C2218/355 , Y10S428/913 , Y10T428/24942 , Y10T428/24975 , Y10T428/265 , Y10T428/3163
摘要： The invention relates to a transparent coating on a transparent glass pane which may be a laminated glass pane such as an automobile windshield. The invention provides a two-layer coating made up of a first oxide film, e.g. a TiO.sub.2 -SiO.sub.2 mixed oxide film, which is in contact with the glass pane and has a thickness of 70-100 nm and a refractive index of 1.80-1.90 and an outer second oxide film, e.g. a SiO.sub.2 film, which has a thickness of 110-130 nm and a refractive index of 1.40-1.50. With respect to visible light obliquely incident on the coating side of the glass pane at an angle of 50-70 degrees with the normal, the reflectance of the coated glass pane becomes lower than that of the glass pane without coating by 4.5-6.5%. To reduce the reflectance of perpendicularly incident light the two-layer coating can be modified into a three-layer coating by interposing another oxide film, e.g. a TiO.sub.2 film, having a thickness of 130-160 nm and a refractive index of 2.05-2.30 between the above described first and second oxide films. The three-layer coating is nearly equivalent to the two-layer coating in the ability to reduce the reflectance of obliquely incident light.
摘要翻译：本发明涉及透明玻璃板上的透明涂层，其可以是诸如汽车挡风玻璃的层压玻璃板。本发明提供了由第一氧化膜，例如，与玻璃板接触并且具有70-100nm的厚度和1.80-1.90的折射率和外部的第二氧化物膜的TiO 2 -SiO 2混合氧化物膜。 SiO 2膜，其厚度为110-130nm，折射率为1.40-1.50。对于以正常方式倾斜入射到玻璃板的涂层侧的可见光，与玻璃板的反射率相比，涂层的玻璃板的反射率低于4.5-6.5％。为了降低垂直入射光的反射率，可以通过插入另一氧化膜，例如，将两层涂层改性成三层涂层。在上述第一和第二氧化物膜之间具有130-160nm的厚度和2.05-2.30的折射率的TiO 2膜。三层涂层几乎等同于双层涂层，以降低倾斜入射光的反射率。

110. 发明授权

US5221352A Apparatus for pyrolytically forming an oxide coating on a hot glass substrate 失效
标题翻译：用于在热玻璃基板上热解形成氧化物涂层的装置
公开(公告)号：US5221352A
公开(公告)日：1993-06-22
申请号：US762602
申请日：1991-09-19
申请人： Robert Terneu , Jean-Francois Thomas
发明人： Robert Terneu , Jean-Francois Thomas
IPC分类号： C03C17/00 , C03C17/245
CPC分类号： C03C17/002 , C03C17/245 , C03C2217/213 , C03C2218/152
摘要： Apparatus for pyrolytically forming an oxide coating on an upper face of a moving, hot glass substrate, including a substrate path and a downwardly opening hood positioned along the substrate path and defining together with the substrate path a coating chamber; support device for conveying a hot glass substrate along the substrate path past the coating chamber; a device for introducing coating precursor material in the vapor phase into a carrier gas stream comprised of a carrier gas including a device for inducing turbulence in the carrier gas stream to ensure intimate mixing of the carrier gas and the coating precursor material; a device including at least one venturi for introducing oxygen into the precursor-containing carrier gas stream before it enters the coating chamber and provide a gas mixture stream; a device for supplying to the coating chamber the gas mixture stream; and a device for aspirating atmosphere including coating reaction products and unused coating precursor material from the coating chamber.
摘要翻译：用于在移动的热玻璃基板的上表面上热解形成氧化物涂层的装置，包括基板路径和沿着基板路径定位的向下开口的罩，并与基板路径一起限定涂覆室; 支撑装置，用于沿着衬底路径输送热玻璃基板经过涂覆室; 用于将气相中的涂料前体材料引入载气流的装置，所述载气流包括载气，所述载气包括用于在所述载气流中引起湍流的装置，以确保所述载气和所述涂层前体材料的密集混合; 包括至少一个文丘里管的装置，用于在进入所述含前体载体气流之前将氧气引入所述前体载气流中并提供气体混合物流; 用于向所述涂覆室供应所述气体混合物流的装置; 以及用于从包衣室吸入包括涂料反应产物和未使用的涂料前体材料的气体的装置。

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