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    • 103. 发明授权
    • Process for producing fluoropolymer
    • 生产含氟聚合物的方法
    • US07790817B2
    • 2010-09-07
    • US11618088
    • 2006-12-29
    • Atsushi WatakabeSusumu SaitoAdam Luke Safir
    • Atsushi WatakabeSusumu SaitoAdam Luke Safir
    • C08F2/00
    • C08F214/182C08F214/26C08F214/262
    • Provided is a process for producing a fluoropolymer containing repeating units based on a fluoromonomer represented by the following formula (m) in an amount of from 5 to 50 mol % based on the entire repeating units in the polymer by polymerization reaction of tetrafluoroethylene and the fluoromonomer, wherein the polymerization reaction is carried out by continuously charging the reactor with tetrafluoroethylene and the fluoromonomer: wherein ml is an integer of from 1 to 6. Also provided is an electrolyte material for an electrolyte fuel cell which can be operated at a high temperature to obtain a high output, wherein the electrolyte material contains the fluoropolymer produced by the process.
    • 本发明提供一种含氟聚合物的制造方法,所述含氟聚合物含有基于由下式(m)表示的含氟单体的重复单元,所述重复单元的量为5-40摩尔%,相对于聚合物中的全部重复单元,四氟乙烯与含氟单体的聚合反应 其中聚合反应是通过用四氟乙烯和含氟单体连续地加入反应器来进行的:其中,ml是1至6的整数。还提供了一种用于电解质燃料电池的电解质材料,其可以在高温至 获得高产量,其中电解质材料含有通过该方法生产的含氟聚合物。
    • 105. 发明授权
    • Ion generating element, ion generator and neutralizer
    • 离子发生元件,离子发生器和中和剂
    • US07706120B2
    • 2010-04-27
    • US11884488
    • 2006-02-20
    • Takafumi SetoMakoto HirasawaMasaaki TsujiAkira OkuyamaSusumu Saito
    • Takafumi SetoMakoto HirasawaMasaaki TsujiAkira OkuyamaSusumu Saito
    • H01T23/00
    • H01T23/00
    • An ion generating element capable of cost reduction and space saving while exhibiting a high generation efficiency of positive ions and negative ions and stabilized generation capacity with less variation, and an ion generator and a neutralizer employing it. The ion generating element comprises a dielectric body having at least two faces, at least two discharge electrodes arranged on the at least two faces of the dielectric body, and an induction electrode arranged in the dielectric body and subjected to the action of the at least two discharge electrodes and is characterized in that positive ions and negative ions are generated on the body, and ions are generated from the at least two faces of the dielectric body through discharge generated because of the potential difference between the discharge electrode of the ion generating element and the induction electrode when a drive voltage is applied between them.
    • 一种离子发生元件,其能够显着提高正离子和负离子的发电效率,并且具有较小变化的稳定的发电容量,并且使用离子发生器和使用其的中和器能够节省成本并节约空间。 离子产生元件包括具有至少两个表面的电介质体,布置在电介质体的至少两个表面上的至少两个放电电极,以及布置在电介质体中并受到至少两个 放电电极,其特征在于,在体上产生正离子和负离子,并且通过由于离子产生元件的放电电极和放电电极之间的电位差而产生的放电产生离子从电介质体的至少两个面产生 当在它们之间施加驱动电压时,感应电极。
    • 107. 发明授权
    • Etching method and apparatus
    • 蚀刻方法和装置
    • US07514277B2
    • 2009-04-07
    • US11224949
    • 2005-09-14
    • Susumu SaitoAkitaka Shimizu
    • Susumu SaitoAkitaka Shimizu
    • H01L21/302
    • H01L21/3065H01L21/308H01L22/26
    • An etching method capable of controlling the film thickness of a hard mask layer uniformly is provided. A plasma etching is performed on a native oxide film by using an etching gas containing, for example, CF4 and Ar while a thickness of a silicon nitride film is being monitored and the etching is finished when the thickness of the silicon nitride film reaches a predetermined value. Then, a plasma etching is performed on a silicon substrate by employing an etching gas containing, for example, Cl2, HBr and Ar and using the silicon nitride film as a mask while a depth of a trench is being monitored and the etching is finished when the depth of the trench reaches a specified value.
    • 提供了能够均匀地控制硬掩模层的膜厚的蚀刻方法。 通过使用含有例如CF4和Ar的蚀刻气体来进行等离子体蚀刻,同时在氮化硅膜的厚度被监视的同时蚀刻完成,当氮化硅膜的厚度达到预定值时 值。 然后,通过使用包含例如Cl 2,HBr和Ar的蚀刻气体,并且在监测沟槽的深度并且蚀刻完成时,使用氮化硅膜作为掩模,在硅衬底上进行等离子体蚀刻, 沟槽的深度达到规定值。
    • 110. 发明授权
    • Monitoring method of processing state and processing unit
    • 处理状态和处理单元的监控方法
    • US07329549B2
    • 2008-02-12
    • US10652852
    • 2003-09-02
    • Susumu Saito
    • Susumu Saito
    • H01L21/00
    • H01J37/32935H01L21/31116
    • The present invention is a monitoring method of monitoring a change of a processing state of an object to be processed when a predetermined process is conducted to the object to be processed by using a processing unit. The method includes: a step of respectively setting constant response variables for two states before and after a processing state changes, the response variables being different from each other; and a step of conducting a multiple regression analysis about the response variables in order to produce a model expression, predictor variables of the multiple regression analysis being a plurality of detected data from a plurality of detectors provided in the processing unit. Then, the method includes: a step of actually obtaining a plurality of detected data from the plurality of detectors when the predetermined process is conducted to the object to be processed; and a step of estimating or monitoring a processing state by applying the obtained plurality of detected data to the model expression.
    • 本发明是一种监视方法,当通过使用处理单元对预定处理进行处理时,监视待处理对象的处理状态的变化。 该方法包括:分别在处理状态改变之前和之后为两个状态设置常数响应变量的步骤,响应变量彼此不同; 以及进行关于所述响应变量的多元回归分析以产生模型表达式的步骤,所述多元回归分析的预测变量是来自处理单元中提供的多个检测器的多个检测数据。 然后,该方法包括:当对待处理对象进行预定处理时,从多个检测器中实际获取多个检测数据的步骤; 以及通过将所获得的多个检测数据应用于模型表达来估计或监视处理状态的步骤。