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91. 发明授权

US07072023B2 Position detection apparatus having a plurality of detection sections, and exposure apparatus 失效
公开(公告)号：US07072023B2
公开(公告)日：2006-07-04
申请号：US10059294
申请日：2002-01-31
申请人： Hisaaki Oguri , Toyoshige Sasaki , Masanobu Hasegawa
发明人： Hisaaki Oguri , Toyoshige Sasaki , Masanobu Hasegawa
IPC分类号： G03B27/42 , G03B27/52 , G01R31/26 , G01J1/00 , G01B11/00
CPC分类号： G03F9/7053 , G03F9/00 , G03F9/7026 , G03F9/7034
摘要： A surface position detection apparatus of this invention includes a position detection section having a plurality of electrodes opposing the object surface to be measured, and a measurement device for selecting at least one electrode of the plurality of electrodes in accordance with the shape of the object surface, supplying an AC current to the selected electrode, and measuring the current flowing to the electrode, thereby measuring the distance between the electrode and object surface.

92. 发明申请

US20060130692A1 Alignment tool for precise pattern transfer 失效
标题翻译：校准工具，用于精确的图案转移
公开(公告)号：US20060130692A1
公开(公告)日：2006-06-22
申请号：US10905210
申请日：2004-12-21
申请人： Mark Peterman , David Bloom
发明人： Mark Peterman , David Bloom
IPC分类号： B41F1/34
CPC分类号： G03F9/7034 , G02B21/0024 , G02B21/26 , G03F9/7026 , G03F9/7042 , G03F9/7088
摘要： Multi-point confocal microscopy, bright field microscope imaging, computer-controlled positioning stages, and an algorithm for automated leveling are the basis for a powerful but simple tool for aligning stamps used in precise pattern transfer to substrates. The system is relatively inexpensive and brings a capability similar to that of a photolithographic mask aligner to the world of elastomeric-stamp-based lithography. Alignment of the stamp and substrate is possible without contact between the two before printing.
摘要翻译：多点共聚焦显微镜，明视野显微镜成像，计算机控制定位阶段和自动调平算法是用于将精确图案转印到基板上使用的标记对齐的强大而简单的工具的基础。该系统相对便宜，并且具有与光刻掩模对准器类似的功能，适用于基于弹性体印记的光刻领域。在打印之前，印模和基板的对准可以在两者之间没有接触。

93. 发明授权

US07050151B2 Exposure apparatus, exposure method, and device manufacturing method 有权
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US07050151B2
公开(公告)日：2006-05-23
申请号：US10798817
申请日：2004-03-10
申请人： Seiya Miura
发明人： Seiya Miura
IPC分类号： G03B27/42 , G03B27/52 , G03B27/32
CPC分类号： G03F9/7026 , G03F9/7034
摘要： To provide an exposure apparatus with which a wafer surface to be exposed can be aligned with a best imaging plane with respect to a reduced focal depth and a high resolution can be attained. The exposure apparatus for exposing a pattern formed on a reticle to an object to be exposed includes: a detecting unit for measuring a position of the object to be exposed at a plurality of first measurement positions that meet a predetermined relative positional relationship in an exposure region of the object to be exposed to which the pattern is exposed and for measuring a position of the object to be exposed at a plurality of second measurement positions that meet the predetermined relative positional relationship in regions outside the exposure region; and a control unit for controlling at least one of a position, a height, and a tilt of the object to be exposed based on information on the position of the object to be exposed which is measured by the detecting unit.
摘要翻译：为了提供一种曝光装置，可以使曝光的晶片表面能够相对于减小的焦点深度与最佳成像平面对准，并且可以获得高分辨率。用于将形成在掩模版上的图案曝光到待曝光对象的曝光装置包括：检测单元，用于在曝光区域中满足预定相对位置关系的多个第一测量位置处测量被曝光物体的位置被曝光的物体，并且用于测量在曝光区域外的区域满足预定的相对位置关系的多个第二测量位置处要曝光的物体的位置; 以及控制单元，用于基于由所述检测单元测量的关于待曝光对象的位置的信息来控制待曝光对象的位置，高度和倾斜中的至少一个。

94. 发明授权

US07049618B2 Virtual gauging method for use in lithographic processing 有权
公开(公告)号：US07049618B2
公开(公告)日：2006-05-23
申请号：US11256938
申请日：2005-10-25
申请人： Joseph H. Lyons
发明人： Joseph H. Lyons
IPC分类号： G01J1/20
CPC分类号： H01L21/681 , G03F9/7003 , G03F9/7026 , G03F9/7034
摘要： A virtual gauging method for use in a lithographic process includes gauging a region at a surface of a wafer when the region is located away from an axis of illumination producing wafer surface data, while other portions of the wafer are being illuminated. The method also includes acquiring time-domain measurements representing the wafer surface data and converting the time-domain measurements into space-domain measurements. This conversion can be done using a finite-impulse-response (FIR) filter. The FIR filter can be triggered with a spatial interrupt, and a width of the FIR filter is modified in response to a velocity of travel of the wafer. The method further includes converting space-domain measurements into wafer correction data.

95. 发明授权

US07016051B2 Reticle focus measurement system using multiple interferometric beams 失效
标题翻译：光栅聚焦测量系统使用多个干涉光束
公开(公告)号：US07016051B2
公开(公告)日：2006-03-21
申请号：US10965026
申请日：2004-10-15
申请人： Stephen Roux , Todd J. Bednarek
发明人： Stephen Roux , Todd J. Bednarek
IPC分类号： G01B9/02
CPC分类号： G03F9/7026 , G03F7/70716 , G03F7/70725
摘要： A first set of interferometric measuring beams is used to determine a location of a patterned surface of a reticle and a reticle focus plane for a reticle that is back clamped to a reticle stage. A second set of interferometric measuring beams is used to determine a map of locations of the reticle stage during scanning in a Y direction. The two sets of interferometric measuring beams are correlated to relate the reticle focal plane to the map of the reticle stage. The information is used to control the reticle stage during exposure of a pattern on the patterned surface of the reticle onto a wafer.
摘要翻译：第一组干涉测量光束用于确定掩模版的图案化表面的位置和用于后夹紧到标线片台的掩模版的掩模版聚焦平面。第二组干涉测量光束用于确定在Y方向扫描期间光罩台的位置的图。两组干涉测量光束相关联，将标线片焦平面与标线片平台的图相关。该信息用于在将掩模版的图案化表面上的图案曝光到晶片上时控制掩模版阶段。

96. 发明申请

US20060044540A1 Projection lens unit with focus and level control, related exposure apparatus and method 有权
标题翻译：具有焦点和液位控制的投影镜头单元，相关的曝光装置和方法
公开(公告)号：US20060044540A1
公开(公告)日：2006-03-02
申请号：US11216176
申请日：2005-09-01
申请人： Jang-hyun Yun
发明人： Jang-hyun Yun
IPC分类号： G03B27/54
CPC分类号： G03F7/7085 , G03F7/70575 , G03F9/7026 , G03F9/7034 , G03F9/7065 , G03F9/7069 , G03F9/7088
摘要： A projection lens unit, related exposure apparatus and control method are disclosed in which measurement light irradiates a semiconductor substrate after passing through lenses in the projection lens unit and reference light irradiates the semiconductor substrate without passing through the lenses in the projection lens unit are used to derive a control signal adapted to adjust the position of the semiconductor substrate under the projection lens unit.
摘要翻译：公开了一种投影透镜单元，相关的曝光装置和控制方法，其中测量光在通过投影透镜单元中的透镜之后照射半导体衬底，并且参考光照射半导体衬底而不通过投影透镜单元中的透镜被用于导出适于调整投影透镜单元下方的半导体衬底的位置的控制信号。

97. 发明授权

US07006208B2 Defect compensation of lithography on non-planar surface 失效
标题翻译：非平面表面光刻缺陷补偿
公开(公告)号：US07006208B2
公开(公告)日：2006-02-28
申请号：US10338790
申请日：2003-01-07
申请人： Alexander Starikov , Theodore Doros
发明人： Alexander Starikov , Theodore Doros
IPC分类号： G01J1/00
CPC分类号： G03F7/70641 , G03F9/7026 , G03F9/7034
摘要： In an embodiment in accordance with the present invention, methods for dynamic detection and correction of focus and tilt variations that occur during a specific product layer exposure is by focus and tilt pre-compensation during wafer exposure. The method provides two spaced apart paths that provide both defocus and tilt measurements. A reference plane is defined by using three reference areas or fields. The data is fitted, using least squares or max/min error, to a “plane”, that is, to straight equidistant lines, the deviation from “plane” is computed as error from a set of straight equidistant lines. Lateral displacements of each band into focus error is converted using the formula: ΔZ=ΔX*θ.
摘要翻译：在根据本发明的实施例中，用于在特定产品层曝光期间发生的焦点和倾斜变化的动态检测和校正的方法是通过在晶片曝光期间的焦点和倾斜预补偿。该方法提供两个间隔开的路径，其提供散焦和倾斜测量。通过使用三个参考区域或场来定义参考平面。使用最小二乘法或最大/最小误差将数据拟合到“平面”，即对于直线等距线，从一组直线等距线计算出与“平面”的偏差作为误差。每个频带的横向位移转换为聚焦误差，使用公式：DeltaZ = DeltaX * theta。

98. 发明申请

US20060033055A1 Surface position detection apparatus and method, and exposure apparatus and device manufacturing method using the exposure apparatus 有权
标题翻译：表面位置检测装置和方法以及使用曝光装置的曝光装置和装置的制造方法
公开(公告)号：US20060033055A1
公开(公告)日：2006-02-16
申请号：US11212689
申请日：2005-08-29
申请人： Yuji Kosugi
发明人： Yuji Kosugi
IPC分类号： G01N21/86
CPC分类号： G03F9/7069 , G03F9/7003 , G03F9/7015 , G03F9/7026 , H01L21/681 , H01L21/682 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： An exposure apparatus for exposing a substrate moving in a scan direction to light directed via an original. The apparatus includes a projection optical system configured to image a pattern of the original on the substrate, a substrate stage configured to hold the substrate and to move, and a detector configured to detect a surface position of the substrate, held and moved in the scan direction at a scan speed by the substrate stage, in a direction parallel to an optical axis of the projection optical system over a detection region preset on the substrate. The apparatus further includes a controller configured to preset the detection region, to change a detection time over which the detector detects a surface position of the substrate based on a change in the scan speed of the substrate stage so that the detector detects a surface position of the substrate over the preset detection region, and to control at least one of a position and a tilt of the substrate stage with respect to the direction parallel to the optical axis based on a detection obtained by the detector.
摘要翻译：一种曝光装置，用于将沿扫描方向移动的衬底暴露于通过原稿指向的光。该设备包括：投影光学系统，被配置为在基板上成像原稿的图案，被配置为保持基板并移动的基板台;以及检测器，被配置为检测在扫描中保持和移动的基板的表面位置在基板台上以预先设置的检测区域在与投影光学系统的光轴平行的方向上以基板载台的扫描速度的方向。该装置还包括控制器，其被配置为基于衬底台的扫描速度的变化来预设检测区域，以改变检测器检测到衬底的表面位置的检测时间，使得检测器检测到衬底台的表面位置基板在预设检测区域上，并且基于由检测器获得的检测来控制基板台相对于与光轴平行的方向的位置和倾斜中的至少一个。

99. 发明申请

US20060018560A1 Exposure device and exposure method 审中-公开
标题翻译：曝光装置和曝光方法
公开(公告)号：US20060018560A1
公开(公告)日：2006-01-26
申请号：US11175262
申请日：2005-07-07
申请人： Tomoya Kitagawa , Kaoru Ohno
发明人： Tomoya Kitagawa , Kaoru Ohno
IPC分类号： G06K9/40
CPC分类号： G03F7/70291 , G03F9/7026 , G03F9/7092
摘要： An exposure device includes a distance measurement section, which measures heights of positions of an exposure surface of a photosensitive material, a hole position identification section, which determines positions of holes in the exposure surface of the photosensitive material, a hole co-ordinate measurement section, which identifies hole positions at the photosensitive material, a displacement data generation section, and a focusing section, which performs focusing control for aligning a focusing position of a light beam from an exposure section with the exposure surface. When a displacement amount of at least a predetermined magnitude is detected by the distance measurement section, the displacement data generation section excludes a position which is judged to be a hole on the basis of results of determinations by the hole position identification section and the hole position identification section, and the displacement data generation section prepares displacement data for focusing control by the focusing section.
摘要翻译：曝光装置包括距离测量部分，其测量感光材料的曝光表面的位置的高度，确定感光材料的曝光表面中的孔的位置的孔位置识别部分，空穴坐标测量部分，其识别感光材料上的孔位置，位移数据生成部分和聚焦部分，其执行用于使来自曝光部分的光束的聚焦位置与曝光表面对准的聚焦控制。当通过距离测量部检测到至少预定大小的位移量时，位移数据生成部根据孔位置识别部的判断结果和孔位置排除被判断为孔的位置识别部分和位移数据生成部分准备用于聚焦部分的聚焦控制的位移数据。

100. 发明授权

US06970244B2 Scan exposure apparatus and method, and device manufacturing method 失效
标题翻译：扫描曝光装置和方法以及装置制造方法
公开(公告)号：US06970244B2
公开(公告)日：2005-11-29
申请号：US10263957
申请日：2002-10-04
申请人： Hiroaki Takeishi
发明人： Hiroaki Takeishi
IPC分类号： G01B11/00 , G03F7/20 , G03F7/22 , G03F9/00 , H01L21/027
CPC分类号： G03F9/7026 , G03F7/70358 , G03F7/70725
摘要： A scan exposure apparatus includes a stage which moves while mounting a substrate thereon, a projection optical system which projects a pattern on the stage, a horizontal position measurement unit which measures a horizontal position of the stage, and a measurement unit which measures a plane position of the substrate. A controller controls the stage so as to make an image plane of the projection optical system and a plane of the substrate coincide with each other on the basis of a measurement result by the measurement unit if a deviation of the horizontal position of the stage measured by the horizontal position measurement unit during scan exposure from a predetermined position falls within a tolerance. The tolerance is determined on the basis of a scan velocity of the stage.
摘要翻译：扫描曝光装置包括在其上安装基板的同时移动的台，投影台上的图案的投影光学系统，测量台的水平位置的水平位置测量单元和测量平面位置的测量单元的基底。根据测量单元的测量结果，控制器控制舞台，以便使投影光学系统的像平面和衬底的平面彼此一致，如果舞台的水平位置的偏差由来自预定位置的扫描曝光期间的水平位置测量单元落入公差内。公差是根据舞台的扫描速度来确定的。

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