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1. 发明授权

US06934005B2 Reticle focus measurement method using multiple interferometric beams 失效
标题翻译：使用多个干涉光束的光栅聚焦测量方法
公开(公告)号：US06934005B2
公开(公告)日：2005-08-23
申请号：US10235499
申请日：2002-09-06
申请人： Stephen Roux , Todd J. Bednarek
发明人： Stephen Roux , Todd J. Bednarek
IPC分类号： G03F7/20 , G03F9/00 , G01B27/42
CPC分类号： G03F9/7026 , G03F7/70716 , G03F7/70725
摘要： A first set of interferometric measuring beams is used to determine a location of a patterned surface of a reticle and a reticle focus plane for a reticle that is back clamped to a reticle stage. A second set of interferometric measuring beams is used to determine a map of locations of the reticle stage during scanning in a Y direction. The two sets of interferometric measuring beams are correlated to relate the reticle focal plane to the map of the reticle stage. The information is used to control the reticle stage during exposure of a pattern on the patterned surface of the reticle onto a wafer.
摘要翻译：第一组干涉测量光束用于确定掩模版的图案化表面的位置和用于后夹紧到标线片台的掩模版的掩模版聚焦平面。第二组干涉测量光束用于确定在Y方向扫描期间光罩台的位置的图。两组干涉测量光束相关联，将标线片焦平面与标线片平台的图相关。该信息用于在将掩模版的图案化表面上的图案曝光到晶片上时控制掩模版阶段。

2. 发明授权

US5572316A Analog sun sensor 失效
标题翻译：模拟太阳传感器
公开(公告)号：US5572316A
公开(公告)日：1996-11-05
申请号：US350683
申请日：1994-12-07
申请人： Carlo E. Zaffanella , Robert C. Savoca , Todd J. Bednarek
发明人： Carlo E. Zaffanella , Robert C. Savoca , Todd J. Bednarek
IPC分类号： G01C21/24 , G01B11/26
CPC分类号： G01C21/24
摘要： Continuous positional information for an orbiting body such as a spacecraft, satellite, or the like with respect to a reference body, for example, the sun, is provided by a first continuous sensor which continually views the sun from the orbiting body and generates electrical signals which provide two axis information on the orbiting body's position. Analog sensors of this type have low accuracy because of transfer function non-linearity, degradation due to environmental aging, or radiation effects and others. A second periodic sensor is directed at the reference body to provide periodic positional updates. These updates are used as references to which the instantaneous output of a continuous sensor are compared so that error associated with the output of the continuous sensor can be eliminated to the accuracy of the calibration. The first continuous sensor preferably utilizes a first and second double triangle detector arranged to form first and second rectangles each having a slot aperture mounted thereon for projecting a line image normal to each rectangle. The first and second double triangle detectors are arranged orthogonally with respect to each other. An algorithm is used to accurately locate the position of the slit shadows on the first and second detectors on the continuous sensor, and thus provide a continuous position for the reference body such as the sun. The second periodic sensor has a patterned detector mask positioned over a very small area detector for producing periodic positional updates which information can be used to correct the continuous sensor errors and provide an accurate analog sun position sensor.
摘要翻译：相对于参考体（例如太阳）的诸如航天器，卫星等的轨道体的连续位置信息由第一连续传感器提供，第一连续传感器连续地从轨道体观察太阳并产生电信号其提供关于轨道体位置的两轴信息。这种类型的模拟传感器由于传递函数非线性，由于环境老化引起的退化或辐射效应等原因，具有低精度。第二周期性传感器被引导到参考体以提供周期性位置更新。将这些更新用作参考，将连续传感器的瞬时输出进行比较，从而可以消除与连续传感器的输出相关联的误差，使其校准的准确性。第一连续传感器优选地利用布置成形成第一和第二矩形的第一和第二双三角形检测器，每个矩形具有安装在其上的槽孔，用于投影垂直于每个矩形的线图像。第一和第二双三角形检测器相对于彼此正交配置。使用算法来精确地定位连续传感器上的第一和第二检测器上的狭缝阴影的位置，从而为诸如太阳的参考体提供连续的位置。第二周期性传感器具有位于非常小的区域检测器上的图案化检测器掩模，用于产生周期性位置更新，该信息可用于校正连续传感器误差并提供精确的模拟太阳位置传感器。

3. 发明授权

US06850330B2 Reticle focus measurement system using multiple interferometric beams 失效
公开(公告)号：US06850330B2
公开(公告)日：2005-02-01
申请号：US10417257
申请日：2003-04-17
申请人： Stephen Roux , Todd J. Bednarek
发明人： Stephen Roux , Todd J. Bednarek
IPC分类号： G03F7/20 , G03F9/00 , G01B9/02
CPC分类号： G03F9/7026 , G03F7/70716 , G03F7/70725
摘要： A first set of interferometric measuring beams is used to determine a location of a patterned surface of a reticle and a reticle focus plane for a reticle that is back clamped to a reticle stage. A second set of interferometric measuring beams is used to determine a map of locations of the reticle stage during scanning in a Y direction. The two sets of interferometric measuring beams are correlated to relate the reticle focal plane to the map of the reticle stage. The information is used to control the reticle stage during exposure of a pattern on the patterned surface of the reticle onto a wafer.

4. 发明授权

US07016051B2 Reticle focus measurement system using multiple interferometric beams 失效
标题翻译：光栅聚焦测量系统使用多个干涉光束
公开(公告)号：US07016051B2
公开(公告)日：2006-03-21
申请号：US10965026
申请日：2004-10-15
申请人： Stephen Roux , Todd J. Bednarek
发明人： Stephen Roux , Todd J. Bednarek
IPC分类号： G01B9/02
CPC分类号： G03F9/7026 , G03F7/70716 , G03F7/70725
摘要： A first set of interferometric measuring beams is used to determine a location of a patterned surface of a reticle and a reticle focus plane for a reticle that is back clamped to a reticle stage. A second set of interferometric measuring beams is used to determine a map of locations of the reticle stage during scanning in a Y direction. The two sets of interferometric measuring beams are correlated to relate the reticle focal plane to the map of the reticle stage. The information is used to control the reticle stage during exposure of a pattern on the patterned surface of the reticle onto a wafer.
摘要翻译：第一组干涉测量光束用于确定掩模版的图案化表面的位置和用于后夹紧到标线片台的掩模版的掩模版聚焦平面。第二组干涉测量光束用于确定在Y方向扫描期间光罩台的位置的图。两组干涉测量光束相关联，将标线片焦平面与标线片平台的图相关。该信息用于在将掩模版的图案化表面上的图案曝光到晶片上时控制掩模版阶段。

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