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91. 发明授权

US07372633B2 Lithographic apparatus, aberration correction device and device manufacturing method 有权
标题翻译：光刻设备，像差校正装置和器件制造方法
公开(公告)号：US07372633B2
公开(公告)日：2008-05-13
申请号：US11488172
申请日：2006-07-18
申请人： Tammo Uitterdijk , Laurentius Catrinus Jorritsma
发明人： Tammo Uitterdijk , Laurentius Catrinus Jorritsma
IPC分类号： G02B3/00 , G03B27/42
CPC分类号： G03F7/70891 , G03F7/70308 , G03F7/706
摘要： An aberration correction device useable in lithography comprises two elements, at least one of which is relatively rotatable to the other about, for example, an optical axis. One surface of each element has an aspheric form describable by higher Zernike polynomials. When the two surfaces are rotationally aligned, the device has the optical effect of a plane plate. If there is a small relative rotation of the two elements the effect of the device is a phase shift describable by the derivative of the aspheric form. The correction device may be used to correct aberrations caused by lens heating, especially with illumination modes and pattern types resulting in strong off-axis localized pupil filling in the projection system.
摘要翻译：可用于光刻的像差校正装置包括两个元件，其中至少一个可以例如相对于光轴相对旋转。每个元素的一个表面具有可被较高Zernike多项式描述的非球面形式。当两个表面旋转对准时，该装置具有平板的光学效果。如果两个元件的相对旋转小，器件的影响是由非球面形式的导数描述的相移。校正装置可以用于校正由透镜加热引起的像差，特别是在照明模式和图案类型下，导致在投影系统中强大的离轴局部光瞳填充。

92. 发明授权

US07368744B2 Photon sieve for optical systems in micro-lithography 失效
标题翻译：微光学光学系统的光子筛
公开(公告)号：US07368744B2
公开(公告)日：2008-05-06
申请号：US11356324
申请日：2006-02-17
申请人： Johannes Catharinus Hubertus Mulkens
发明人： Johannes Catharinus Hubertus Mulkens
IPC分类号： G21K5/04 , G01J3/10
CPC分类号： G03F7/70308 , G03F7/70091 , G03F7/70108 , G03F7/70158 , G03F7/70191 , G03F7/7025 , G03F7/70575
摘要： The use of photon sieves may be as a pupil defining element in an illumination system; a field of defining elements in an illumination system; a pupil lens element in a projection lens; a color correction system in the projection system; or as a transmitting diffractive element for EUV.
摘要翻译：光子筛的使用可以是照明系统中的瞳孔限定元件; 在照明系统中定义元件的领域; 投影透镜中的光瞳透镜元件; 投影系统中的色彩校正系统; 或作为EUV的透射衍射元件。

93. 发明授权

US07289192B2 Projection exposure device 有权
标题翻译：投影曝光装置
公开(公告)号：US07289192B2
公开(公告)日：2007-10-30
申请号：US10899816
申请日：2004-07-27
申请人： Akira Otsuka
发明人： Akira Otsuka
IPC分类号： G03B27/42 , G03B27/52 , G03B27/54 , G02B26/00 , G02B21/00 , G02B3/12
CPC分类号： G03F7/70308 , G03F7/70258 , G03F7/70866
摘要： A magnification correction device 1 includes magnification correction optics 2, a pressure adjustment device 3 and a controller 4. The magnification correction optics 2 is formed in a shape of a box with a glass plate 20 and a bottom plate 11 positioned parallel to the glass plate 20 and a frame 10. The inside of the box is an air room 24 connected to a pressure adjustment device 3 via a connecting pipe 12 so that the pressure of the inside can be changed. The cylinder 30 is driven by a motor 35 via a linear movement unit 36 such as a ball screw and the motor 35 is controlled by a controller 4. The moving distance of cylinder 30, which is equal to the moving distance of the piston, is decided by the number of the revolutions of the motor 35, and the capacity of the closed circuit of the pressure adjustment device 3 is also decided.
摘要翻译：倍率校正装置1包括倍率校正光学器件2，压力调节装置3和控制器4。倍率校正光学器件2形成为具有玻璃板20和平行于玻璃板20定位的底板11和框架10的盒子的形状。箱体内部是经由连接管12与压力调节装置3连接的空气室24，能够改变内部的压力。气缸30由马达35通过诸如滚珠丝杠的线性运动单元36驱动，马达35由控制器4控制。气缸30的移动距离等于活塞的移动距离由马达35的转速确定，并且还决定了压力调节装置3的闭合回路的容量。

94. 发明申请

US20070229944A1 Reducing extreme ultraviolet flare in lithographic projection optics 审中-公开
标题翻译：减少光刻投影光学中的极紫外光斑
公开(公告)号：US20070229944A1
公开(公告)日：2007-10-04
申请号：US11395669
申请日：2006-03-31
申请人： Sang Lee , Christof Krautschik
发明人： Sang Lee , Christof Krautschik
IPC分类号： F21V9/04
CPC分类号： G03F7/70941 , G03F7/70308
摘要： An extreme ultraviolet lithography system may have a spatial filtering system in projection optics that reduce flare. A flare filter may be provided at the pupil plane to pass the required diffraction orders (at minimum 0th and +1 or 0th and −1 orders) of the light from the mask, while blocking the effects of scattering from various mirrors used in the projection optics. By reducing flare, process window and critical dimension variation can be improved.
摘要翻译：极紫外光刻系统可以在投影光学中具有减少耀斑的空间滤波系统。可以在光瞳面上设置火炬滤波器，以通过所需的衍射级（最小0和0/1和1或0级）和/ 掩模，同时阻挡投影光学器件中使用的各种反射镜的散射效应。通过减少闪光，可以改善工艺窗口和临界尺寸变化。

95. 发明授权

US07277155B2 Exposure apparatus and method 失效
标题翻译：曝光装置和方法
公开(公告)号：US07277155B2
公开(公告)日：2007-10-02
申请号：US11117447
申请日：2005-04-29
申请人： Minori Noguchi , Yukio Kenbo , Yoshitada Oshida , Masataka Shiba , Yasuhiro Yoshitaka , Makoto Murayama
发明人： Minori Noguchi , Yukio Kenbo , Yoshitada Oshida , Masataka Shiba , Yasuhiro Yoshitaka , Makoto Murayama
IPC分类号： G03B27/42 , G03B27/32 , G03C5/00
CPC分类号： G03F7/705 , G03F7/2002 , G03F7/701 , G03F7/70125 , G03F7/70308 , G03F7/70591 , Y10S430/146
摘要： A production method of a semiconductor device which includes the steps of exposing a resist coated on a substrate of a semiconductor device by projecting a first light pattern on the substrate of the semiconductor device the first light pattern being formed by passing light through a first mask, and exposing the resist by projecting a second light pattern on the substrate, the second light pattern being formed by passing light through a second mask. In the step of exposing the resist by projecting the second light pattern, the second light pattern is formed by excimer laser light having an annular shape and passed through the second mask.
摘要翻译：一种半导体器件的制造方法，包括以下步骤：通过将半导体器件的衬底上的第一光图案投射到通过第一掩模通过光而形成的第一光图案，使涂覆在半导体器件的衬底上的抗蚀剂曝光，并通过在基板上投射第二光图案来曝光抗蚀剂，第二光图案是通过使光通过第二掩模而形成的。在通过投影第二光图案使抗蚀剂曝光的步骤中，第二光图案由具有环形的准分子激光形成并通过第二掩模。

96. 发明申请

US20070177122A1 Lithographic apparatus, device manufacturing method and exchangeable optical element 有权
标题翻译：光刻设备，器件制造方法和可交换光学元件
公开(公告)号：US20070177122A1
公开(公告)日：2007-08-02
申请号：US11341894
申请日：2006-01-30
申请人： Erik Loopstra , Adrianus Engelen , Bernardus Luttikhuis , Maria Rubingh , Johannes Hazenberg , Laurentius Jorritsma , Johannes Klerk , Bernhard Geuppert , Aart Van Beuzekom , Petrus Franciscus Mandigers , Franz Sorg , Peter Deufel
发明人： Erik Loopstra , Adrianus Engelen , Bernardus Luttikhuis , Maria Rubingh , Johannes Hazenberg , Laurentius Jorritsma , Johannes Klerk , Bernhard Geuppert , Aart Van Beuzekom , Petrus Franciscus Mandigers , Franz Sorg , Peter Deufel
IPC分类号： G03B27/54
CPC分类号： G03F7/70308 , G03F7/70825 , G03F7/70933
摘要： A lithographic apparatus has an assembly to exchange optical elements in a pupil plane of its projection system. The optical elements may be pupil filters and may conform to the physical dimensions specified for a reticle standard, e.g. having sides substantially equal to 5, 6 or 9 inches.
摘要翻译：光刻设备具有在其投影系统的光瞳平面中交换光学元件的组件。光学元件可以是光瞳滤光器，并且可以符合对于掩模版标准规定的物理尺寸，例如。侧面基本上等于5,6或9英寸。

97. 发明申请

US20060290913A1 Microlithography exposure method and projection exposure apparatus for carrying out the method 审中-公开
标题翻译：微光曝光方法和投影曝光装置进行该方法
公开(公告)号：US20060290913A1
公开(公告)日：2006-12-28
申请号：US11475871
申请日：2006-06-28
申请人： Nils Dieckmann , Manfred Maul
发明人： Nils Dieckmann , Manfred Maul
IPC分类号： G03B27/42
CPC分类号： G03F7/70308 , G03F7/70566
摘要： In an exposure method for producing an image of a pattern, arranged in the object surface of a projection objective, in the image surface of the projection objective, the mask is illuminated with illumination radiation with the aid of the illumination system. The radiation varied by the mask and which enters the projection objective is thereby produced downstream of the mask. The projection objective is transirradiated with this radiation. An astigmatic variation of the radiation varied by the mask is effected in the region of at least one pupil surface of the projection objective, the astigmatic variation being designed such that an anisotropy of properties of the radiation striking the image surface that leads to direction-dependent contrast differences is at least partially compensated. The astigmatic variation can be achieved, for example, with the aid of an elliptical diaphragm or an elliptical transmission filter.
摘要翻译：在布置在投影物镜的物体表面上的图形图像的曝光方法中，在投影物镜的图像表面中，借助于照明系统照射照射的掩模。由掩模变化并进入投影物镜的辐射由此在掩模的下游产生。投射物镜用这种辐射进行辐照。由掩模变化的辐射的散光变化在投影物镜的至少一个瞳孔表面的区域中进行，散光变化被设计成使得射入图像表面的辐射的各向异性导致方向依赖对比差异至少部分得到补偿。像散变化可以例如借助椭圆形光阑或椭圆形透射滤光片来实现。

98. 发明申请

US20060221440A1 Multi-layer spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby 有权
标题翻译：多层光谱纯度滤光片，包括这种光谱纯度滤光片的光刻设备，器件制造方法以及由此制造的器件
公开(公告)号：US20060221440A1
公开(公告)日：2006-10-05
申请号：US11091923
申请日：2005-03-29
申请人： Vadim Banine , Johannes Moors , Leonid Shmaenok , Nikolay Salashchenko
发明人： Vadim Banine , Johannes Moors , Leonid Shmaenok , Nikolay Salashchenko
IPC分类号： F21V9/04 , G02B1/10
CPC分类号： G03F7/70916 , G03F7/70191 , G03F7/70308 , G03F7/70575 , G03F7/70941
摘要： A multi-layered spectral purity filters improveS the spectral purity of an Extreme Ultra-Violet (EUV) radiation beam and also collect debris emitted from a radiation source.
摘要翻译：多层光谱纯度滤光片提高极紫外（EUV）辐射束的光谱纯度，并且还收集从辐射源发射的碎片。

99. 发明申请

US20060215133A1 Image shift optic for optical system 失效
标题翻译：光学系统的图像转换光学器件
公开(公告)号：US20060215133A1
公开(公告)日：2006-09-28
申请号：US11088210
申请日：2005-03-22
申请人： Andrew Hazelton
发明人： Andrew Hazelton
IPC分类号： G03B27/68
CPC分类号： G03F7/709 , G03F7/70258 , G03F7/70308 , G03F7/70766 , G03F7/70833
摘要： An apparatus for adjusting image formation includes a first stage, a second stage, an optical element, a counterweight, and an actuator. The first stage is operable to project an original image. A final image corresponding to the original image is formed on the second stage. The optical element is movable with at least one degree of freedom operable to shift a position of the final image. The counterweight is movable with the at least one degree of freedom. The actuator is operable to actuate the optical element and the counterweight in opposite directions.
摘要翻译：用于调整图像形成的装置包括第一级，第二级，光学元件，配重和致动器。第一阶段可用于投影原始图像。在第二阶段形成与原始图像对应的最终图像。光学元件可移动至少一个自由度，以移动最终图像的位置。配重可以至少一个自由度移动。致动器可操作以相反方向致动光学元件和配重。

100. 发明申请

US20060134535A1 Lensed fiber array for sub-micron optical lithography patterning 审中-公开
标题翻译：用于亚微米光刻图案的光纤阵列
公开(公告)号：US20060134535A1
公开(公告)日：2006-06-22
申请号：US11020864
申请日：2004-12-22
申请人： Jerome Porque
发明人： Jerome Porque
IPC分类号： G03B27/00 , G03F9/00 , G03C5/00
CPC分类号： G03F7/70275 , G03F7/70291 , G03F7/70308 , G03F7/70391
摘要： In accordance with various embodiments, there is an exposure system for writing a pattern on a photosensitive material. The exposure system can include a waveguide array and a light modulator. The waveguide array can include a plurality of optical fibers that focuses light on the radiation sensitive material. The light modulator can modulate the light coupled into the plurality of optical fibers. Exemplary exposure systems can reduce aberrations due to coma and distortion, and provide improved alignment.
摘要翻译：根据各种实施例，存在用于将图案写在感光材料上的曝光系统。曝光系统可以包括波导阵列和光调制器。波导阵列可以包括将光聚焦在辐射敏感材料上的多个光纤。光调制器可以调制耦合到多个光纤中的光。示例性曝光系统可以减少由于昏迷和失真引起的像差，并提供改进的对准。

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