会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 93. 发明授权
    • Resin-linear organosiloxane block copolymers
    • 树脂线性有机硅氧烷嵌段共聚物
    • US08957147B2
    • 2015-02-17
    • US13822113
    • 2011-09-21
    • Steven SwierJohn Bernard Horstman
    • Steven SwierJohn Bernard Horstman
    • C08G77/44C08G77/48C08G77/54C09D183/10C08G77/14C08G77/26H01L23/29C08G77/04C08G77/00
    • C09D183/10C08G77/04C08G77/14C08G77/26C08G77/44C08G77/48C08G77/54C08G77/70C08G77/80H01L23/296H01L2924/0002H01L2924/00
    • Organosiloxane block copolymers, curable compositions, and solid compositions derived from these block copolymers are disclosed. The organosiloxane block copolymers comprise: 40 to 90 mole percent disiloxy units of the formula [R12—SiO2/2] 10 to 60 mole percent trisiloxy units of the formula [R2SiO3/2] 0.5 to 35 mole percent silanol groups [≡SiOH] where R1 is independently a C1 to C30 hydrocarbyl, R2 is independently a C1 to C20 hydrocarbyl, wherein; the disiloxy units [R12SiO2/2] are arranged in linear blocks having an average of from 10 to 400 disiloxy units [R12SiO2/2] per linear block, the trisiloxy units [R2SiO3/2] are arranged in non-linear blocks having a molecular weight of at least 500 g/mol, and at least 30% of the non-linear blocks are crosslinked with each other, each linear block is linked to at least one non-linear block, and the organosiloxane block copolymer has a molecular weight (Mw) of at least 20,000 g/mole.
    • 公开了有机硅氧烷嵌段共聚物,可固化组合物和衍生自这些嵌段共聚物的固体组合物。 有机硅氧烷嵌段共聚物包含:40至90摩尔%的式[R 12 -SiO 2/2] 10至60摩尔%的式[R 2 SiO 3/2]的3-甲硅烷氧基单元为0.5至35摩尔%的硅烷醇基[≡SiOH] R 1独立地为C 1至C 30烃基,R 2独立地为C 1至C 20烃基,其中: 二甲硅烷氧基单元[R 12 SiO 2/2]排列成每线性嵌段平均为10〜400个二甲硅烷基单元[R 12 SiO 2/2]的线性嵌段,三硅氧烷单元[R 2 SiO 3/2]排列在具有分子 至少500g / mol的重量,至少30%的非线性嵌段彼此交联,每个直链嵌段连接至少一个非线性嵌段,有机硅氧烷嵌段共聚物的分子量( Mw)至少为20,000g / mol。
    • 94. 发明申请
    • HARDMASK COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PROCESS FOR PRODUCING A SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE, AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
    • 用于形成电阻膜的HARDMASK组合物,用于制造半导体集成电路器件的工艺和半导体集成电路器件
    • US20150041959A1
    • 2015-02-12
    • US14522914
    • 2014-10-24
    • SAMSUNG SDI CO., LTD.
    • Sang Ran KOHSang Kyun KIMSang Hak LIMMi Young KIMHui Chan YUNDo Hyeon KIMDong Seon UHJong Seob KIM
    • H01L21/308C08L83/04
    • C08L83/04C08G77/80C09D5/006C09D183/04G03F7/0752H01L21/02126H01L21/02216H01L21/02282H01L21/0332
    • A hardmask composition for forming a resist underlayer film, a process for producing a semiconductor integrated circuit device, and a semiconductor integrated circuit device, the hardmask composition including an organosilane polymer, a stabilizer, the stabilizer including methyl acetoacetate, ethyl-2-ethylacetoacetate, nonanol, decanol, undecanol, dodecanol, acetic acid, phenyltrimethoxysilane, diphenylhexamethoxydisiloxane, diphenylhexaethoxydisiloxane, dioctyltetramethyldisiloxane, tetramethyldisiloxane, decamethyltetrasiloxane, dodecamethylpentasiloxane, hexamethyldisiloxane, or mixtures thereof, and a solvent, wherein the solvent includes acetone, tetrahydrofuran, benzene, toluene, diethyl ether, chloroform, dichloromethane, ethyl acetate, propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, propylene glycol propyl ether acetate, ethyl lactate, γ butyrolactone, methyl isobutyl ketone, or mixtures thereof, the solvent is present in an amount of about 70 to about 99.9% by weight, based on a total weight of the composition, and the stabilizer is present in an amount of about 0.0001 to about 3.0% by weight, based on a total weight of the composition.
    • 用于形成抗蚀剂下层膜的硬掩模组合物,半导体集成电路器件的制造方法以及半导体集成电路器件,所述硬掩模组合物包括有机硅烷聚合物,稳定剂,包括乙酰乙酸甲酯,2-乙基乙酰乙酸乙酯, 壬醇,癸醇,十一烷醇,十二烷醇,乙酸,苯基三甲氧基硅烷,二苯基六甲氧基二硅氧烷,二辛基四甲基二硅氧烷,二辛基四甲基二硅氧烷,四甲基二硅氧烷,十甲基四硅氧烷,十二甲基五硅氧烷,六甲基二硅氧烷或其混合物,以及溶剂,其中溶剂包括丙酮,四氢呋喃,苯,甲苯,乙醚, 氯仿,二氯甲烷,乙酸乙酯,丙二醇甲醚乙酸酯,丙二醇乙醚乙酸酯,丙二醇丙醚乙酸酯,乳酸乙酯,γ-丁内酯,甲基异丁基酮或其混合物,溶剂的存在量为约70〜 约99.9重量%,基于组合物的总重量,稳定剂的存在量为组合物总重量的约0.0001至约3.0重量%。
    • 95. 发明授权
    • Ultraviolet absorbing poly (organic oxidized silicon) particles having improved ultraviolet stability, and method for preparing same
    • 具有改善的紫外线稳定性的紫外线吸收性聚(有机氧化硅)颗粒及其制备方法
    • US08921505B2
    • 2014-12-30
    • US13810177
    • 2011-07-15
    • Young Baek KimGoo Jin JeongIn Whan Kim
    • Young Baek KimGoo Jin JeongIn Whan Kim
    • C08G77/26A61K8/893A61K8/02A61K8/81A61K8/898A61Q17/04C08G77/00
    • A61K8/898A61K8/025A61K8/8158A61K8/893A61K2800/612A61Q17/04C08G77/26C08G77/80
    • The present invention relates to a method for preparing poly(organic oxidized silicon) particles having UV-absorbing groups, including reacting an organoalkoxysilane precursor having a UV-absorbing group selected from a group consisting of organotrialkoxysilane, diorganoalkoxysilane and a mixture thereof, in the presence of a base, with a silane compound selected from a group consisting of tetraalkoxysilane, alkyltrialkoxysilane, tetraalkoxysilane, aryltrialkoxysilane, dialkyldialkoxysilane, diaryldialkoxysilane, arylalkyldialkoxysilane and a mixture thereof, serving as a crosslinking regulator and UV stability enhancer, so as to prepare poly(organic oxidized silicon) particles selected from a group consisting of polysilsesquioxane, silsesquioxane-siloxane copolymer, silsesquioxane-silica copolymer, silsesquioxane-siloxane-silica copolymer and silsesquioxane-siloxane copolymer, having UV-absorbing groups. The poly(organic oxidized silicon) particles significantly solves the problem of poor UV stability, while maintaining UV absorption by the UV-absorbing group contained in the particles. Since the poly(organic oxidized silicon) particles having UV-absorbing groups do not exhibit white turbidity, they can be effectively used in cosmetics. In accordance with the present invention, the poly(organic oxidized silicon) particles having UV-absorbing groups can be prepared economically as compared to the existing methods.
    • 本发明涉及一种制备具有UV吸收基团的聚(有机氧化硅)颗粒的方法,包括使有机烷氧基硅烷前体具有选自有机三烷氧基硅烷,二有机基烷氧基硅烷及其混合物的UV吸收基团的有机烷氧基硅烷前体, 的基团,其具有选自四烷氧基硅烷,烷基三烷氧基硅烷,四烷氧基硅烷,芳基三烷氧基硅烷,二烷基二烷氧基硅烷,二芳基二烷氧基硅烷,芳基烷基二烷氧基硅烷及其混合物的硅烷化合物,用作交联调节剂和UV稳定性增强剂,以制备聚(有机氧化 选自聚倍半硅氧烷,倍半硅氧烷 - 硅氧烷共聚物,倍半硅氧烷 - 二氧化硅共聚物,倍半硅氧烷 - 硅氧烷 - 二氧化硅共聚物,倍半硅氧烷 - 硅氧烷共聚物,硅氧烷 - 硅氧烷共聚物。 聚(有机氧化硅)颗粒显着解决了紫外线稳定性差的问题,同时通过颗粒中所含的紫外线吸收剂保持紫外线吸收。 由于具有UV吸收基团的聚(有机氧化硅)颗粒不显示白色混浊,因此它们可以有效地用于化妆品中。 根据本发明,与现有方法相比,具有UV吸收基团的聚(有机氧化硅)颗粒可以经济地制备。