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91. 发明授权

US4871649A Optical recording medium and optical recording method using the same 失效
标题翻译：光记录介质及使用其的光记录方法
公开(公告)号：US4871649A
公开(公告)日：1989-10-03
申请号：US28129
申请日：1987-03-19
申请人： Hiroyuki Imataki , Mizuho Hiraoka , Sachiko Ichikawa , Yoshihiro Ogawa , Hitoshi Yoshino
发明人： Hiroyuki Imataki , Mizuho Hiraoka , Sachiko Ichikawa , Yoshihiro Ogawa , Hitoshi Yoshino
IPC分类号： G11B7/00 , G11B7/0045 , G11B7/24 , G11B7/243 , G11B7/244 , G11B7/258
CPC分类号： G11B7/258 , G11B7/244 , G11B7/2467 , G11B7/2472 , G11B7/2475 , G11B7/249 , Y10S430/146 , Y10S430/165
摘要： An optical recording medium wherein recording information has been recorded as pits, comprises an absorptive layer and a reflective layer placed thereon, the absorptive layer having, on the surface, concave portions thermally deformed by heat generated upon irradiation of light beams, and the reflective layer having concave pits formed by deformation as a consequence of the thermal deformation of the absorptive layer and covering said concave portions of the absorptive layer in such a state that the concave portions are not exposed.An optical recording method comprises irradiating an optical recording medium having an absorptive layer and a reflective layer placed thereon, with light beams to generate a heat, allowing the heat to cause the thermal deformation of the absortive layer to form concave portions on the surface of the absorptive layer, deforming the reflective layer as a consequence of the thermal deformation of the absorptive layer, thereby allowing the deformed reflective layer to cover the concave portions of the absorptive layer in such a state that the concave portions are not exposed and to form concave pits.
摘要翻译：其中记录信息已被记录为凹坑的光学记录介质包括吸收层和放置在其上的反射层，吸收层在表面上具有通过在光束照射时产生的热而热变形的凹部，反射层具有作为吸收层的热变形的变形而形成的凹坑，并且在凹部未露出的状态下覆盖吸收层的所述凹部。光学记录方法包括用光束照射具有吸收层和反射层的光学记录介质，产生热量，使热量引起自由基层的热变形，形成凹部吸收层，由于吸收层的热变形而使反射层变形，从而允许变形的反射层在凹部未露出并形成凹坑的状态下覆盖吸收层的凹部。

92. 发明授权

US08435903B2 Semiconductor substrate surface treatment method 有权
标题翻译：半导体衬底表面处理方法
公开(公告)号：US08435903B2
公开(公告)日：2013-05-07
申请号：US13069164
申请日：2011-03-22
申请人： Yoshihiro Ogawa , Shinsuke Kimura , Tatsuhiko Koide , Hisashi Okuchi , Hiroshi Tomita
发明人： Yoshihiro Ogawa , Shinsuke Kimura , Tatsuhiko Koide , Hisashi Okuchi , Hiroshi Tomita
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： H01L21/0206 , H01L21/0337 , H01L21/31133 , H01L21/67028 , H01L27/11531
摘要： In one embodiment, a method for treating a surface of a semiconductor substrate is disclosed. The semiconductor substrate has a first pattern covered by a resist and a second pattern not covered by the resist. The method includes supplying a resist-insoluble first chemical solution onto a semiconductor substrate to subject the second pattern to a chemical solution process. The method includes supplying a mixed liquid of a water repellency agent and a resist-soluble second chemical solution onto the semiconductor substrate after the supply of the first chemical solution, to form a water-repellent protective film on a surface of at least the second pattern and to release the resist. In addition, the method can rinse the semiconductor substrate using water after the formation of the water-repellent protective film, and dry the rinsed semiconductor substrate.
摘要翻译：在一个实施例中，公开了一种用于处理半导体衬底的表面的方法。半导体衬底具有由抗蚀剂覆盖的第一图案和未被抗蚀剂覆盖的第二图案。该方法包括将抗蚀剂不溶的第一化学溶液提供到半导体衬底上以使第二图案进行化学溶液处理。该方法包括：在供给第一化学溶液之后，在半导体衬底上提供防水剂和可溶解抗蚀剂的第二化学溶液的混合液体，在至少第二图案的表面上形成防水保护膜并释放抗蚀剂。此外，该方法可以在形成防水保护膜之后用水冲洗半导体衬底，并干燥冲洗后的半导体衬底。

93. 发明申请

US20120094493A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE 有权
标题翻译：制造半导体器件的方法和制造半导体器件的装置
公开(公告)号：US20120094493A1
公开(公告)日：2012-04-19
申请号：US13236306
申请日：2011-09-19
申请人： Takeshi Hizawa , Nobuhide Yamada , Yoshihiro Ogawa , Masahiro Kiyotoshi
发明人： Takeshi Hizawa , Nobuhide Yamada , Yoshihiro Ogawa , Masahiro Kiyotoshi
IPC分类号： H01L21/306 , B08B3/08
CPC分类号： H01L21/02076 , H01L21/02164 , H01L21/02222 , H01L21/02282 , H01L21/02301 , H01L21/02326 , H01L21/28273 , H01L27/11524
摘要： A method of manufacturing a semiconductor device in which an insulating film is filled between patterns etched into a workpiece structure is disclosed. The method includes cleaning etch residues residing between the etched patterns by a first chemical liquid; rinsing the workpiece structure cleaned by the first chemical liquid by a rinse liquid; and coating the workpiece structure rinsed by the rinse liquid with a coating liquid for formation of the insulating film. The cleaning to the coating are carried out within the same processing chamber such that a liquid constantly exists between the patterns of the workpiece structure.
摘要翻译：公开了一种制造半导体器件的方法，其中绝缘膜填充在蚀刻到工件结构中的图案之间。该方法包括通过第一化学液体清洁驻留在蚀刻图案之间的蚀刻残留物; 用漂洗液冲洗由第一化学液体清洗的工件结构; 并用用于形成绝缘膜的涂布液涂覆由冲洗液冲洗的工件结构。在相同的处理室中进行对涂层的清洁，使得在工件结构的图案之间始终存在液体。

94. 发明授权

US08124306B2 Magnetic toner 有权
标题翻译：磁性调色剂
公开(公告)号：US08124306B2
公开(公告)日：2012-02-28
申请号：US12298755
申请日：2007-04-25
申请人： Junko Hirata , Yoshihiro Ogawa , Yusuke Hasegawa , Kouji Nishikawa , Miho Okazaki , Takashige Kasuya
发明人： Junko Hirata , Yoshihiro Ogawa , Yusuke Hasegawa , Kouji Nishikawa , Miho Okazaki , Takashige Kasuya
IPC分类号： G03G9/083
CPC分类号： G03G9/0833 , G03G9/0834 , G03G9/0835 , G03G9/0836 , G03G9/08755
摘要： The object of the present invention is to provide a magnetic toner enabling an image with high image density and excellent image reproducibility to be obtained, which is excellent in fluidity, charging stability, and charging uniformity, even for long-term use, and also enabling an image whose fogging, ghost, and scattering are suppressed to be obtained. The magnetic toner has at least a binder resin and a magnetic material, where, the magnetic material is an magnetic iron oxide whose dielectric breakdown voltage of the magnetic material is 160 to 1600 V/cm, and the dielectric loss tangent (tan δ) of the magnetic toner at 100 kHz and 40° C. is 2.0×10−3 to 1.0×10−2.
摘要翻译：本发明的目的是提供一种能够获得具有高图像密度和优异的图像再现性的图像的磁性调色剂，即使长期使用也具有优异的流动性，充电稳定性和充电均匀性，并且还使得抑制雾化，重影和散射的图像。磁性调色剂至少具有粘合剂树脂和磁性材料，其中磁性材料是磁性材料的介电击穿电压为160至1600V / cm的磁性氧化铁，介电损耗角正切（tanδ）为在100kHz和40℃下的磁性调色剂为2.0×10-3〜1.0×10-2。

95. 发明授权

US07927949B2 Semiconductor memory device and method of manufacturing the same 有权
标题翻译：半导体存储器件及其制造方法
公开(公告)号：US07927949B2
公开(公告)日：2011-04-19
申请号：US12755532
申请日：2010-04-07
申请人： Yoshio Ozawa , Isao Kamioka , Junichi Shiozawa , Akihito Yamamoto , Ryota Fujitsuka , Yoshihiro Ogawa , Katsuaki Natori , Katsuyuki Sekine , Masayuki Tanaka , Daisuke Nishida
发明人： Yoshio Ozawa , Isao Kamioka , Junichi Shiozawa , Akihito Yamamoto , Ryota Fujitsuka , Yoshihiro Ogawa , Katsuaki Natori , Katsuyuki Sekine , Masayuki Tanaka , Daisuke Nishida
IPC分类号： H01L21/336 , H01L21/8238 , H01L21/3205 , H01L21/4763
CPC分类号： H01L27/115 , H01L27/11521
摘要： A semiconductor memory device manufacturing method includes forming a floating gate electrode above a semiconductor substrate, forming an interelectrode insulating film above the floating gate electrode, forming a first radical nitride film on a surface of the interelectrode insulating film by first radical nitriding, and forming a control gate electrode on the first radical nitride film.
摘要翻译：一种半导体存储器件制造方法，包括在半导体衬底上形成浮置栅电极，在浮置栅电极上形成电极间绝缘膜，通过第一自由基氮化在电极间绝缘膜的表面上形成第一自由基氮化物膜，第一自由基氮化物膜上的控制栅电极。

96. 发明授权

US07776756B1 Etching apparatus, a method of controlling an etching solution, and a method of manufacturing a semiconductor device 有权
标题翻译：蚀刻装置，蚀刻溶液的控制方法以及半导体装置的制造方法
公开(公告)号：US07776756B1
公开(公告)日：2010-08-17
申请号：US11878965
申请日：2007-07-30
申请人： Hisashi Okuchi , Hiroyasu Iimori , Mami Saito , Yoshihiro Ogawa , Hiroshi Tomita , Soichi Nadahara
发明人： Hisashi Okuchi , Hiroyasu Iimori , Mami Saito , Yoshihiro Ogawa , Hiroshi Tomita , Soichi Nadahara
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： H01L21/67253 , H01L21/31111 , H01L21/67086
摘要： An etching apparatus includes a chamber containing an etching solution including first and second components and water, a concentration of the water in the etching solution is at a specified level or lower; a circulation path circulating the etching solution; a concentration controller sampling the etching liquid from the circulation path and controls concentrations of the etching solution respectively; and a refilling chemical liquid feeder feeding a refilling chemical liquid including the first component having a concentration higher than the first component in the etching solution.
摘要翻译：蚀刻装置包括：包含第一和第二成分和水的蚀刻液的室，蚀刻液中的水的浓度在规定的水平以下; 使蚀刻溶液循环的循环路径; 浓度控制器对来自循环路径的蚀刻液进行采样，并分别控制蚀刻液的浓度; 以及再填充化学液体给料器，其在所述蚀刻溶液中供给包含浓度高于所述第一成分的所述第一成分的再填充药液。

97. 发明授权

US07704659B2 Toner 有权
标题翻译：爽肤水
公开(公告)号：US07704659B2
公开(公告)日：2010-04-27
申请号：US12420336
申请日：2009-04-08
申请人： Yoshihiro Ogawa , Yusuke Hasegawa , Kouji Nishikawa , Miho Okazaki , Takashige Kasuya
发明人： Yoshihiro Ogawa , Yusuke Hasegawa , Kouji Nishikawa , Miho Okazaki , Takashige Kasuya
IPC分类号： G03G9/08
CPC分类号： G03G9/08782 , G03G9/0812
摘要： To provide a toner which has superior low-temperature fixing performance, high-temperature anti-offsetting properties and developing performance and may cause neither melt sticking of toner to photosensitive member nor turn-up of cleaning blade. The toner contains at least a binder resin, a colorant and a wax, and the wax is characterized by i) being an oxidized hydrocarbon wax, ii) having a hydroxyl value of from 5 mgKOH/g or more to 150 mgKOH/g or less, and iii) having, in molecular weight distribution measured by gel permeation chromatography of tetrahydrofuran-soluble matter, a main peak within the range of molecular weight of from 200 or more to 600 or less, and a component with a molecular weight of 700 or more in a content of 3% by mass or less.
摘要翻译：为了提供具有优异的低温定影性能，高温抗粘着性和显影性能的调色剂，并且不会使调色剂熔融粘附到感光构件上，也不会导致清洁刮片的翻转。调色剂至少含有粘合剂树脂，着色剂和蜡，并且蜡的特征在于i）是氧化烃蜡，ii）羟值为5mgKOH / g以上至150mgKOH / g以下，和iii）在分子量为200以上且600以下的主峰和分子量为700以下的成分中，具有通过四氢呋喃可溶物质的凝胶渗透色谱法测定的分子量分布，更多的是3质量％以下的含量。

98. 发明授权

US07633723B2 Tunnel junction device having oxide ferromagnetic electroconductive electrodes and three-layer structure tunneling film 失效
标题翻译：具有氧化铁磁性导电电极和三层结构隧道膜的隧道连接装置
公开(公告)号：US07633723B2
公开(公告)日：2009-12-15
申请号：US10569089
申请日：2004-06-04
申请人： Yoshinori Tokura , Masashi Kawasaki , Hiroyuki Yamada , Yoshihiro Ogawa , Yoshio Kaneko
发明人： Yoshinori Tokura , Masashi Kawasaki , Hiroyuki Yamada , Yoshihiro Ogawa , Yoshio Kaneko
IPC分类号： G11B5/39 , G11C11/00
CPC分类号： B82Y25/00 , G01R33/06 , G11B5/3903 , H01F10/3254 , H01L43/08
摘要： To provide a tunnel junction device having a high MR ratio even at room temperature, a tunneling film as a nonmagnetic layer of three-layer structure of LaMnO3/SrTiO3/LaMnO3 is arranged between a ferromagnetic metal material La0.6Sr0.4MnO3 (12) and a ferromagnetic metal film material La0.6Sr0.4MnO3 (14). The tunneling film comprises two unit layers of LaMnO3 (13A) arranged on the ferromagnetic metal material La0.6Sr0.4MnO3 (12); five unit layers of SrTiO3 (13B); and two unit layers of LaMnO3 (13C) arranged at the interface between the SrTiO3 (13B) and the ferromagnetic metal film material La0.6Sr0.4MnO3 (14).
摘要翻译：为了提供即使在室温下也具有高MR比的隧道结装置，作为LaMnO 3 / SrTiO 3 / LaMnO 3的三层结构的非磁性层的隧道膜设置在强磁性金属材料La0.6Sr0.4MnO3（12）和铁磁金属膜材料La0.6Sr0.4MnO3（14）。隧道膜包括布置在强磁性金属材料La0.6Sr0.4MnO3（12）上的两个单位层的LaMnO3（13A）; 五个单位层的SrTiO3（13B）; 和布置在SrTiO 3（13B）和铁磁性金属膜材料La0.6Sr0.4MnO3（14）之间的界面处的LaMnO 3（13C）的两个单位层。

99. 发明授权

US07514686B2 Radiation detecting apparatus, scintillator panel, their manufacturing method and radiation detecting system 失效
标题翻译：辐射检测装置，闪烁体面板，其制造方法和放射线检测系统
公开(公告)号：US07514686B2
公开(公告)日：2009-04-07
申请号：US11570125
申请日：2005-07-27
申请人： Yoshihiro Ogawa , Satoshi Okada , Tomoyuki Tamura , Shinichi Takeda , Kazumi Nagano , Masato Inoue , Katsuro Takenaka
发明人： Yoshihiro Ogawa , Satoshi Okada , Tomoyuki Tamura , Shinichi Takeda , Kazumi Nagano , Masato Inoue , Katsuro Takenaka
IPC分类号： G01T1/20
CPC分类号： G01T1/2018 , G01T1/2002 , G01T1/202 , H01L27/14632 , H01L27/14663 , H01L27/14687 , H01L27/14689 , H01L31/02322 , H01L31/085
摘要： A radiation detecting apparatus includes a substrate 1, a scintillator layer 7 converting a radiation into light, and scintillator protection members 8, 9 and 10 to cover the scintillator layer 7, wherein the scintillator protection member includes a scintillator protection layer 8 consisting of a hot-melt resin, and the scintillator protection layer 8 touches the scintillator layer 7. As the substrate 1, there is provided a sensor panel including a photoreceiving layer 15 on which photoelectric conversion elements 2, receiving light, are arranged in a two-dimension array, and a protection layer 5 provided on the photoreceiving layer 15 and touching the scintillator layer 7 and the scintillator protection layer 8. By using such a scintillator protection layer, a film formation time of the scintillator protection layer can be shortened, and the film thickness dispersion of the scintillator protection layer can be suppressed. Moreover, the adhesion property to the scintillator foundation layer and to the reflective layer protection layer can be improved.
摘要翻译：辐射检测装置包括基板1，将辐射转换为光的闪烁体层7和闪烁体保护构件8,9和10以覆盖闪烁体层7，其中闪烁体保护构件包括由热的组成的闪烁体保护层8 并且闪烁体保护层8与闪烁体层7相接触。作为基板1，设置有传感器面板，该传感器面板包括光接收层15，光接收光二极管2以二维阵列以及设置在感光层15上并接触闪烁体层7和闪烁体保护层8的保护层5.通过使用这样的闪烁体保护层，可以缩短闪烁体保护层的成膜时间，可以抑制闪烁体保护层的分散。此外，可以提高对闪烁体基础层和反射层保护层的粘附性。

100. 发明申请

US20090021138A1 LIGHT EMITTING APPARATUS 有权
标题翻译：发光装置
公开(公告)号：US20090021138A1
公开(公告)日：2009-01-22
申请号：US12176604
申请日：2008-07-21
申请人： Yoshihiro Ogawa
发明人： Yoshihiro Ogawa
IPC分类号： H01L33/00
CPC分类号： H01L33/62 , H01L23/49838 , H01L24/73 , H01L33/486 , H01L33/54 , H01L2224/32225 , H01L2224/48091 , H01L2224/48227 , H01L2224/48465 , H01L2224/73265 , H01L2924/00014 , H01L2924/00 , H01L2924/00012
摘要： A light emitting apparatus can include a base, a light emitting device and a resin portion on one side of the base for covering the light emitting device, a wiring thereof, and the like. The light emitting apparatus can be configured to prevent the exfoliation of the resin portion from the base even when a substantial amount of load is applied thereon by a mounter during the mounting operation onto a mounting board. The ratio of an occupied area of the patterned electrodes on the base within a predetermined area including an area where the resin portion is provided is made large enough to prevent the patterned electrodes from being flexed during mounting operation, and the ratio of an occupied area of the patterned electrodes on the upper and rear surfaces of the base just outside of the predetermined area is made smaller than the predetermined ratio.
摘要翻译：发光装置可以包括底座，发光装置和位于基座的一侧的树脂部分，用于覆盖发光器件，其布线等。发光装置可以被配置为即使当在安装操作期间通过安装器将大量的负载施加到安装板上时，也可以防止树脂部分从基部脱落。在包括设置树脂部分的区域的预定区域内的图案化电极的占据面积的比例被制成足够大以防止图案化电极在安装操作期间弯曲，并且占据面积的比例位于预定区域正上方的基座的上表面和后表面上的图案化电极被制成小于预定比率。

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