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91. 发明申请

US20080212053A1 Device manufacturing method, lithographic apparatus and device manufactured thereby 失效
标题翻译：装置制造方法，由此制造的光刻设备和装置
公开(公告)号：US20080212053A1
公开(公告)日：2008-09-04
申请号：US10962744
申请日：2004-10-13
申请人： Joost Jeroen Ottens , Levinus Pieter Bakker , Wilhelmus Josephus Box , Jan Van Elp , Frank Jeroen Pieter Schuurmans , Jan Evert Van Der Werf
发明人： Joost Jeroen Ottens , Levinus Pieter Bakker , Wilhelmus Josephus Box , Jan Van Elp , Frank Jeroen Pieter Schuurmans , Jan Evert Van Der Werf
IPC分类号： G03B27/42 , G03F7/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F7/70425 , G03F7/70433 , H01J37/3026 , H01J2237/31764
摘要： A device manufacturing method is disclosed. The method includes patterning a beam of radiation, projecting the patterned beam of radiation onto a plurality of outer target portions of a substrate in a sequence in which each subsequent outer target portion is spaced-apart from a preceding outer target portion, and subsequent to projecting the patterned beam of radiation on the plurality of outer target portions, projecting the patterned beam of radiation onto an inner target portion of the substrate.
摘要翻译：公开了一种装置制造方法。该方法包括图案化辐射束，将图案化的辐射束投射到基板的多个外部目标部分上，其中每个后续的外部目标部分与先前的外部目标部分间隔开，并且随后突出所述图案化的辐射束在所述多个外部目标部分上，将所述图案化的辐射束投射到所述衬底的内部目标部分上。

92. 发明授权

US07239368B2 Using unflatness information of the substrate table or mask table for decreasing overlay 有权
标题翻译：使用衬底表或掩模台的不平坦信息减少重叠
公开(公告)号：US07239368B2
公开(公告)日：2007-07-03
申请号：US10998179
申请日：2004-11-29
申请人： Rene Oesterholt , Ralph Brinkhof , Tjarko Adriaan Rudolf Van Empel , Leon Martin Levasier , Joost Jeroen Ottens , Koen Jacobus Johannes Maria Zaal , Koenraad Stephan Silvester Salden
发明人： Rene Oesterholt , Ralph Brinkhof , Tjarko Adriaan Rudolf Van Empel , Leon Martin Levasier , Joost Jeroen Ottens , Koen Jacobus Johannes Maria Zaal , Koenraad Stephan Silvester Salden
IPC分类号： G03B27/32 , G03B27/68
CPC分类号： G03F7/70783 , G03F7/707
摘要： A lithographic system includes an illumination system for providing a projection beam of radiation, a mask table for supporting a mask, the mask serving to impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. The system also comprises a processor arranged to calculate overlay corrections using a reference height map representing a surface of the substrate table or the mask table. Feed forward correction of non-flatness induced wafer grid distortion is allowed during alignment and during exposure, thereby reducing overlay errors caused by differences in flatness characteristics. It provides an indirect qualification method for overlay accuracy related to exposure chuck flatness based on height map information.
摘要翻译：光刻系统包括用于提供投射辐射束的照明系统，用于支撑掩模的掩模台，用于使投影光束在其横截面上赋予图案的掩模，用于保持基板的基板台，以及投影系统，用于将图案化的光束投影到基板的目标部分上。该系统还包括处理器，其被布置为使用表示衬底台或掩模台的表面的参考高度图计算覆盖校正。在对准和曝光期间允许非平坦度引起的晶片网格变形的前馈校正，从而减少由平坦度特性的差异引起的重叠误差。它提供了基于高度图信息的与曝光卡盘平坦度相关的覆盖精度的间接鉴定方法。

93. 发明授权

US07119885B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07119885B2
公开(公告)日：2006-10-10
申请号：US10926402
申请日：2004-08-26
申请人： Joost Jeroen Ottens , Tjarko Adriaan Rudolf Van Empel , Aschwin Lodewijk Hendricus Johannes Van Meer , Jan Rein Miedema , Koen Jacobus Johannes Maria Zaal
发明人： Joost Jeroen Ottens , Tjarko Adriaan Rudolf Van Empel , Aschwin Lodewijk Hendricus Johannes Van Meer , Jan Rein Miedema , Koen Jacobus Johannes Maria Zaal
IPC分类号： G03B27/62 , G03B27/58
CPC分类号： G03F7/707 , G03F7/70825
摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system for conditioning a beam of radiation, and an article support for supporting a substantially flat article to be placed in the beam of radiation. The article support includes a plurality of supporting protrusions for supporting the article, and at least one protective member located near a boundary of the supporting protrusions for protecting at least a boundary portion of the supporting protrusions during release of the article. The apparatus also includes a releasing device for releasing said article from said article support.
摘要翻译：公开了一种光刻设备。该装置包括用于调节辐射束的照明系统和用于支撑待放置在辐射束中的基本平坦的制品的物品支撑件。物品支撑件包括用于支撑物品的多个支撑突起和位于支撑突起的边界附近的至少一个保护构件，用于在物品释放期间至少保护支撑突起的边界部分。该装置还包括用于从所述物品支撑件释放所述物品的释放装置。

94. 发明授权

US07110091B2 Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US07110091B2
公开(公告)日：2006-09-19
申请号：US10896367
申请日：2004-07-22
申请人： Koen Jacobus Johannes Maria Zaal , Tjarko Adriaan Rudolf Van Empel , Joost Jeroen Ottens , Jan Hopman
发明人： Koen Jacobus Johannes Maria Zaal , Tjarko Adriaan Rudolf Van Empel , Joost Jeroen Ottens , Jan Hopman
IPC分类号： G03B27/62 , G03B27/58 , H02N13/00
CPC分类号： G03F7/707 , G03F7/70708 , G03F7/70783
摘要： A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation, and at least one clamping electrode for generating an electrostatic clamping force for clamping the article against the article holder. The clamping electrode includes an electric field changer for locally changing the electrostatic clamping force for leveling local height variations of the substrate.
摘要翻译：公开了一种光刻投影装置。该装置包括用于调节辐射束的照明器和物品保持器。物品保持器包括多个突起，其被布置成提供基本平坦的支撑平面，用于支撑待放置在辐射束的光束路径中的物品;以及至少一个夹紧电极，用于产生用于夹紧物品的静电夹紧力反对文章持有人。夹持电极包括用于局部地改变静电夹持力的电场改变器，用于调平衬底的局部高度变化。

95. 发明授权

US07106416B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07106416B2
公开(公告)日：2006-09-12
申请号：US10731428
申请日：2003-12-10
申请人： Wilhelmus Josephus Box , Noud Jan Gilissen , Joost Jeroen Ottens
发明人： Wilhelmus Josephus Box , Noud Jan Gilissen , Joost Jeroen Ottens
IPC分类号： G03B27/42 , G03B27/58
CPC分类号： G03F7/70875
摘要： A lithographic apparatus including an illumination system for providing a beam of radiation and a support structure for supporting a patterning device. The patterning device serving to impart the beam with a pattern in its cross-section. The apparatus also having a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic apparatus further having a chuck for supporting an object and a frame which supports the chuck with respect to other parts of the lithographic apparatus. The chuck is thermally isolated from at least the frame.
摘要翻译：一种光刻设备，包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。图案形成装置用于在其横截面中赋予光束图案。该装置还具有用于保持基板的基板台和用于将图案化的光束投影到基板的目标部分上的投影系统。光刻设备还具有用于支撑物体的卡盘和相对于光刻设备的其它部分支撑卡盘的框架。卡盘至少与框架隔离。

96. 发明授权

US07092231B2 Chuck, lithographic apparatus and device manufacturing method 有权
标题翻译：卡盘，光刻设备和器件制造方法
公开(公告)号：US07092231B2
公开(公告)日：2006-08-15
申请号：US10643167
申请日：2003-08-19
申请人： Martinus Hendricus Hendricus Hoeks , Joost Jeroen Ottens
发明人： Martinus Hendricus Hendricus Hoeks , Joost Jeroen Ottens
IPC分类号： H02N13/00 , G03B27/58 , G03B27/62
CPC分类号： G03F7/70708 , G03F7/707 , H01L21/6833
摘要： A lithographic projection apparatus is provided with an electrostatic chuck. The electrostatic chuck includes a dielectric element which has a plurality of pins formed on a first surface. The item to be clamped is clamped in position on the chuck by applying a potential difference between an electrode located on the surface of the dielectric member opposite to the clamping surface and an electrode located on the clamping surface of the item to be clamped. The pins are provided with at least an upper conducting layer, which serves to reduce the Johnsen-Rahbek effect, allowing the substrate to be released more quickly.
摘要翻译：光刻投影装置设置有静电卡盘。静电卡盘包括形成在第一表面上的多个销的电介质元件。通过施加位于与夹紧表面相对的电介质构件的表面上的电极与位于待夹紧物品的夹紧表面上的电极之间的电位差，待夹紧的物品夹在卡盘上的适当位置。引脚设置有至少一个上导电层，其用于减少约翰森 - 拉贝克效应，允许基板更快地释放。

97. 发明授权

US07030967B2 Lithographic apparatus, device manufacturing method and substrate holder 有权
标题翻译：光刻设备，器件制造方法和衬底保持器
公开(公告)号：US07030967B2
公开(公告)日：2006-04-18
申请号：US10738987
申请日：2003-12-19
申请人： Robertus Nicodemus Jacobus Van Ballegoij , Martinus Agnes Willem Cuijpers , Pieter Johannes Gertrudis Meijers , Gerardus Petrus Matthijs Van Nunen , Joost Jeroen Ottens
发明人： Robertus Nicodemus Jacobus Van Ballegoij , Martinus Agnes Willem Cuijpers , Pieter Johannes Gertrudis Meijers , Gerardus Petrus Matthijs Van Nunen , Joost Jeroen Ottens
IPC分类号： G03B27/58 , G03B27/42
CPC分类号： G03F7/707 , G03F7/70783
摘要： A substrate holder has burls having a height not less than 100 μm and at least 10 vacuum ports arranged within a central region extending to a radius of two thirds the radius of the substrate. Thereby concave wafers can be reliably clamped by generating an initial vacuum in a central region which exerts a clamping force tending to flatten the wafer and allowing the initial vacuum to deepen until the wafer is fully clamped.
摘要翻译：衬底保持器具有高度不小于100μm的孔，并且至少10个真空端口布置在延伸到衬底半径的三分之一半径的中心区域内。由此，可以通过在中心区域产生初始真空来可靠地夹紧凹形晶片，该中心区域施加趋于平坦化晶片的夹紧力并允许初始真空加深直到晶片完全夹紧。

98. 发明授权

US07019820B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07019820B2
公开(公告)日：2006-03-28
申请号：US10735848
申请日：2003-12-16
申请人： Joost Jeroen Ottens , Koen Jacobus Johannes Maria Zaal
发明人： Joost Jeroen Ottens , Koen Jacobus Johannes Maria Zaal
IPC分类号： G03B27/62 , G03B27/58
CPC分类号： G03F7/70708 , G03F7/707 , G03F7/70783 , G03F7/70875
摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation and an article support for supporting an article to be placed in a beam path of the beam of radiation on the article support. The article support has a plurality of supporting protrusions. The plurality of protrusions define a support zone for providing a flat plane of support. A backfill gas feed is arranged in the support zone for providing a backfill gas flow to a backside of the article when supported by the article support, for providing an improved thermal conduction between the article and the article support. According to one aspect of the invention, the support zone is surrounded by a boundary zone having a reduced height relative to the plane of support so that the backfill gas flow is not bounded to the support zone.
摘要翻译：光刻设备包括用于提供辐射束的照明系统和用于支撑待放置在物品支撑件上的辐射束的光束路径中的物品的物品支撑件。物品支撑件具有多个支撑突起。多个突起限定用于提供平坦的支撑平面的支撑区域。在支撑区域中布置有回填气体进料，用于当物品支撑件支撑时提供回填气体到物品的背面，以便在物品和物品支撑件之间提供改进的热传导。根据本发明的一个方面，支撑区被相对于支撑平面具有减小的高度的边界区包围，使得回填气体流不限于支撑区。

99. 发明授权

US06897945B1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US06897945B1
公开(公告)日：2005-05-24
申请号：US10734641
申请日：2003-12-15
申请人： Joost Jeroen Ottens , Hendrik Anthony Johannes Neerhof , Koen Jacobus Johannes Maria Zaal , Marco Le Kluse
发明人： Joost Jeroen Ottens , Hendrik Anthony Johannes Neerhof , Koen Jacobus Johannes Maria Zaal , Marco Le Kluse
IPC分类号： G03F7/20 , H01L21/027 , H01L21/683 , G03B27/58 , G03B27/32 , G03B27/42 , G03B27/62
CPC分类号： H01L21/6831 , G03F7/707 , G03F7/70708
摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation, an article support for supporting a flat article to be placed in a beam path of the beam of radiation on the article support, a backfill gas feed arranged in the article support for feeding backfill gas to a backside of the article when supported by the article support, and a clamp for clamping the article against the article support during projection. According to one aspect of the invention, the apparatus includes a controller for controlling the clamp and/or the backfill gas feed pressure so as to release the clamp prior to reducing the backfill gas feed pressure.
摘要翻译：光刻设备包括用于提供辐射束的照明系统，用于支撑待放置在物品支架上的辐射束的光束路径中的平坦物品的物品支撑件，布置在物品支撑件中用于进给的回填气体供给当由物品支撑件支撑时，将气体回填到物品的背面，以及用于在投影期间将物品夹紧在物品支撑件上的夹具。根据本发明的一个方面，该装置包括用于控制夹紧和/或回填气体进料压力的控制器，以便在减少回填气体进料压力之前释放夹具。

100. 发明授权

US09488919B2 Substrate table, a lithographic apparatus and a method involving an encoder plate 有权
标题翻译：基板，光刻设备和涉及编码器板的方法
公开(公告)号：US09488919B2
公开(公告)日：2016-11-08
申请号：US13022397
申请日：2011-02-07
申请人： Takeshi Kaneko , Joost Jeroen Ottens , Raymond Wilhelmus Louis Lafarre
发明人： Takeshi Kaneko , Joost Jeroen Ottens , Raymond Wilhelmus Louis Lafarre
IPC分类号： G03F7/20
CPC分类号： G03F7/70716 , G03F7/70341 , G03F7/70775
摘要： A table for a lithographic apparatus, the table having an encoder plate located on the table, a gap between the encoder plate and a top surface of the table, the gap located radially inward of the encoder plate relative to the periphery of the table, and a fluid extraction system with an opening in the surface of the gap to extract liquid from the gap.
摘要翻译：一种用于光刻设备的工作台，具有位于工作台上的编码器板的工作台，编码器板和工作台的顶表面之间的间隙，位于编码器板相对于工作台周边的径向内侧的间隙，以及一种在间隙表面上具有开口以从间隙提取液体的流体提取系统。

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