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91. 发明申请

US20060126036A1 Uniformity correction for lithographic apparatus 失效
标题翻译：光刻设备的均匀性校正
公开(公告)号：US20060126036A1
公开(公告)日：2006-06-15
申请号：US11007580
申请日：2004-12-09
申请人： Alexander Kremer , Marcel Mathijs Marie Dierichs , Erik Loopstra
发明人： Alexander Kremer , Marcel Mathijs Marie Dierichs , Erik Loopstra
IPC分类号： G03B27/52
CPC分类号： G03F7/70083 , G03F7/70066 , G03F7/70558
摘要： A uniformity correction module for improving the uniformity of a radiation distribution in a rectangular illumination slit having two longer sides and two shorter sides, including a plurality of movable blades arranged along each long side of the illumination slit and a chamber containing a fluid wherein said movable blades are at least partly immersed in said fluid, and wherein the difference between the refractive index of each blade and the refractive index of said fluid is sufficiently small to prevent significant reflection and refraction at the surface of each blade.
摘要翻译：一种用于改善具有两个长边和两个短边的矩形照明狭缝中的辐射分布的均匀性的均匀性校正模块，包括沿着照明狭缝的每个长边布置的多个可动刀片和包含流体的腔室，其中所述可移动叶片至少部分地浸没在所述流体中，并且其中每个叶片的折射率与所述流体的折射率之间的差异足够小以防止在每个叶片的表面处的显着的反射和折射。

92. 发明申请

US20060023178A1 Lithographic apparatus and method for calibrating the same 有权
标题翻译：平版印刷设备及其校准方法
公开(公告)号：US20060023178A1
公开(公告)日：2006-02-02
申请号：US11179665
申请日：2005-07-13
申请人： Erik Loopstra , Leon Levasier , Rene Oesterholt
发明人： Erik Loopstra , Leon Levasier , Rene Oesterholt
IPC分类号： G03B27/42
CPC分类号： G03F7/70775 , G03F7/70458 , G03F7/70516 , G03F9/7011 , G03F9/7019
摘要： Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of the substrate table, each position detector comprises an optical encoder of a single dimensional or multi dimensional type, the optical encoders being arranged for providing together at least 6 position values, at least one position value being provided for each of the 3 dimensions. Some of the optical encoders may be connected to the substrate table at different locations in the 3 dimensional coordinate system. The motion control system is arranged to calculate the position of the substrate table in the 3 dimensional coordinate system from a subset of at least 3 of the 6 position values and to calculate an orientation of the substrate table with respect to the coordinate system from another subset of at least 3 of the 6 position values. Further, a method for calibrating the position detectors is presented.
摘要翻译：光刻设备包括用于控制衬底台的移动的衬底台和运动控制系统。运动控制系统包括构造用于检测衬底台的位置的至少3个位置检测器。为了测量衬底台的位置和取向，每个位置检测器包括一维或多维类型的光学编码器，光学编码器被布置为一起提供至少6个位置值，为每个位置值提供至少一个位置值的三维。一些光学编码器可以在三维坐标系中的不同位置处连接到基板台。运动控制系统被布置为从6个位置值中的至少3个的子集计算三维坐标系中的衬底台的位置，并且从另一个子集计算相对于坐标系的衬底台的取向至少6个位置值中的3个。此外，提出了一种用于校准位置检测器的方法。

93. 发明申请

US20050243297A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050243297A1
公开(公告)日：2005-11-03
申请号：US10836613
申请日：2004-05-03
申请人： Vadim Banine , Levinus Bakker , Jeroen Jonkers , Erik Loopstra
发明人： Vadim Banine , Levinus Bakker , Jeroen Jonkers , Erik Loopstra
IPC分类号： G02B5/08 , G03B27/54 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70008 , G03F7/7005
摘要： A lithographic apparatus includes an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, a substrate table and a projection system. Furthermore, the lithographic apparatus includes a plurality of EUV sources for providing EUV radiation to the illumination system and distribution means which are arranged to convert the EUV radiation from each of the EUV sources into an intermediate beam of radiation. The intermediate beam of radiation is directed from the distribution means in a first direction by a mirror surface. The distribution means further comprise a rotationally driven mirror arrangement, the axis of rotation being non-parallel to the mirror surface.
摘要翻译：光刻设备包括被配置为提供辐射束的照明系统，被配置为支撑图案形成装置的支撑件，衬底台和投影系统。此外，光刻设备包括用于向照明系统提供EUV辐射的多个EUV源和被布置成将来自每个EUV源的EUV辐射转换成中间辐射束的分配装置。中间的辐射束通过镜面从第一方向从分布装置引导。分配装置还包括旋转驱动的反射镜装置，旋转轴线不平行于镜面。

94. 发明申请

US20050170296A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050170296A1
公开(公告)日：2005-08-04
申请号：US10766526
申请日：2004-01-29
申请人： Albert Johannes Jansen , Jan Kuit , Erik Loopstra , Raymond Laurentius Schrijver
发明人： Albert Johannes Jansen , Jan Kuit , Erik Loopstra , Raymond Laurentius Schrijver
IPC分类号： H01L21/027 , G03F7/00 , G03F7/20
CPC分类号： G03F7/70066 , G03F7/70425 , G03F7/70475 , G03F7/707
摘要： A lithographic apparatus has a mask table adapted to accommodate a mask in at least two positions so that a mask with a pattern area larger than the exposure field can be imaged by first performing an exposure with the mask in the first position and then performing a second exposure with the mask in the second position.
摘要翻译：光刻设备具有适于在至少两个位置容纳掩模的掩模台，使得具有大于曝光场的图案区域的掩模可以通过首先在掩模的第一位置进行曝光，然后执行第二第二位置的面罩曝光。

95. 发明申请

US20050157281A1 Off-axis levelling in lithographic projection apparatus 有权
公开(公告)号：US20050157281A1
公开(公告)日：2005-07-21
申请号：US10918700
申请日：2004-08-16
申请人： Johannes Jasper , Erik Loopstra , Theodorus Modderman , Gerrit Nijmeijer , Nicholaas Van Asten , Frederik Heuts , Jacobus Gemen , Richard Du Croo De Jongh , Marcus Boonman , Jacob Klinkhamer , Thomas Castenmiller
发明人： Johannes Jasper , Erik Loopstra , Theodorus Modderman , Gerrit Nijmeijer , Nicholaas Van Asten , Frederik Heuts , Jacobus Gemen , Richard Du Croo De Jongh , Marcus Boonman , Jacob Klinkhamer , Thomas Castenmiller
IPC分类号： G01B9/02 , G01B11/00 , G01B11/02 , G01B11/245 , G01B11/25 , G01B11/30 , G03F7/207 , G03F7/22 , G03F9/00 , H01L21/027 , G03B27/52
CPC分类号： G03F9/7026 , G03F9/70 , G03F9/7034 , G03F9/7049 , G03F9/7096
摘要： In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.

96. 发明申请

US20050132914A1 Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus 失效
标题翻译：平版印刷装置，对准装置，装置制造方法以及转换装置的方法
公开(公告)号：US20050132914A1
公开(公告)日：2005-06-23
申请号：US10743266
申请日：2003-12-23
申请人： Johannes Mulkens , Marinus Van Den Brink , Erik Loopstra
发明人： Johannes Mulkens , Marinus Van Den Brink , Erik Loopstra
IPC分类号： G03F7/20 , B41C1/10 , B41N3/00 , G03F9/00 , H01L21/027
CPC分类号： G03F7/70341 , B41C1/1075 , B41C1/1083 , G03F7/70258 , G03F9/7026
摘要： A detector detects liquid in the path of a projection beam or alignment beam. A controller then determines which one or more of a plurality of compensating optical elements may be provided in the optical path of the projection beam or alignment beam in order to focus the projection beam or alignment beam on the surface of the substrate. The appropriate optical element may be placed in the path of the projection beam or alignment beam directly as a final element of the projection system or alignment system respectively.
摘要翻译：检测器检测投影光束或对准光束的路径中的液体。然后，控制器确定在投影光束或对准光束的光路中可以设置多个补偿光学元件中的哪一个或多个，以便将投影光束或对准光束聚焦在基板的表面上。可以将适当的光学元件直接放置在投影光束或对准光束的路径中，作为投影系统或对准系统的最终元件。

97. 发明申请

US20050094119A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050094119A1
公开(公告)日：2005-05-05
申请号：US10927531
申请日：2004-08-27
申请人： Erik Loopstra , Johannes Baselmans , Marcel Mathijs Theodore Dierichs , Johannes Jasper , Hendricus Meijer , Uwe MicKan , Johannes Catharinus Mulkens , Matthew Lipson , Tammo Utterdijk
发明人： Erik Loopstra , Johannes Baselmans , Marcel Mathijs Theodore Dierichs , Johannes Jasper , Hendricus Meijer , Uwe MicKan , Johannes Catharinus Mulkens , Matthew Lipson , Tammo Utterdijk
IPC分类号： H01L21/027 , G02B1/10 , G03F7/20 , G03B27/54
CPC分类号： G03F7/70966 , G03F7/70341 , G03F7/70958 , G03F7/70983 , Y10S430/162
摘要： A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
摘要翻译：公开了一种与位于投影系统和基板之间的浸没液体一起使用的光刻投影装置。公开了几种方法和机构来保护投影系统，衬底台和液体限制系统的组件。这些包括在投影系统的最终元件上提供保护涂层，以及在部件上游提供一个或多个牺牲体。还公开了CaF 2 2的双组分最终光学元件。

98. 发明申请

US20050068511A1 Lithographic apparatus and device manufacturing method 审中-公开
公开(公告)号：US20050068511A1
公开(公告)日：2005-03-31
申请号：US10994669
申请日：2004-11-23
申请人： Paulus Liebregts , Arno Bleeker , Erik Loopstra , Harry Borggreve
发明人： Paulus Liebregts , Arno Bleeker , Erik Loopstra , Harry Borggreve
IPC分类号： G03F7/20 , H01L21/027 , G03B27/54
CPC分类号： G03F7/70991 , G03F7/70291
摘要： A lithographic apparatus uses the control signal from a computer to drive two spatial light modulators to pattern two separate projection beams for projection onto two substrates.

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