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1. 发明申请

US20050157281A1 Off-axis levelling in lithographic projection apparatus 有权
公开(公告)号：US20050157281A1
公开(公告)日：2005-07-21
申请号：US10918700
申请日：2004-08-16
申请人： Johannes Jasper , Erik Loopstra , Theodorus Modderman , Gerrit Nijmeijer , Nicholaas Van Asten , Frederik Heuts , Jacobus Gemen , Richard Du Croo De Jongh , Marcus Boonman , Jacob Klinkhamer , Thomas Castenmiller
发明人： Johannes Jasper , Erik Loopstra , Theodorus Modderman , Gerrit Nijmeijer , Nicholaas Van Asten , Frederik Heuts , Jacobus Gemen , Richard Du Croo De Jongh , Marcus Boonman , Jacob Klinkhamer , Thomas Castenmiller
IPC分类号： G01B9/02 , G01B11/00 , G01B11/02 , G01B11/245 , G01B11/25 , G01B11/30 , G03F7/207 , G03F7/22 , G03F9/00 , H01L21/027 , G03B27/52
CPC分类号： G03F9/7026 , G03F9/70 , G03F9/7034 , G03F9/7049 , G03F9/7096
摘要： In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.

2. 发明申请

US20050179880A1 Lithographic apparatus and device manufacturing method with feed-forward focus control 有权
标题翻译：平版印刷设备和具有前馈焦点控制的设备制造方法
公开(公告)号：US20050179880A1
公开(公告)日：2005-08-18
申请号：US10779866
申请日：2004-02-18
申请人： Hans Butler , Marcus Boonman , Petrus Marinus Christianus Van Den Biggelaar
发明人： Hans Butler , Marcus Boonman , Petrus Marinus Christianus Van Den Biggelaar
IPC分类号： H01L21/027 , G03F7/20 , G03F9/00 , G03B27/42
CPC分类号： G03F9/7034 , G03F9/7003 , G03F9/7015
摘要： The present invention discloses a lithographic apparatus a lithographic apparatus with an improved focus control system. The lithographic apparatus includes an illumination system configured to provide a beam of radiation, a first support structure configured to support a patterning device that imparts the beam of radiation with a desired pattern in its cross-section, a second support structure that includes a substrate holder for holding a substrate, a projection system configured to project the patterned beam of radiation onto a target portion on a surface of the substrate, and a servo unit configured to position the substrate holder. The apparatus further includes a sensor unit configured to determine a distance of at least one location point on the surface of the substrate relative to a reference plane, a memory unit configured to store surface information of the substrate based on respective distances of corresponding the at least one location point on the substrate surface, and a calculating unit configured to determine a feed-forward set-point signal based on the stored surface information, such that the feed-forward set-point signal is forwardly fed to the servo unit in order to position the substrate holder.
摘要翻译：本发明公开了一种具有改进的聚焦控制系统的光刻设备的光刻设备。光刻设备包括被配置为提供辐射束的照明系统，第一支撑结构，其构造成支撑图案化装置，该图案形成装置在其横截面中赋予所需图案的辐射束;第二支撑结构，其包括衬底支架用于保持基板的投影系统，被配置为将所述图案化的辐射束投射到所述基板的表面上的目标部分上的投影系统以及配置成定位所述基板支架的伺服单元。所述设备还包括传感器单元，其被配置为确定相对于参考平面的所述基板的表面上的至少一个位置点的距离;存储器单元，其被配置为基于相应于所述基板的相应距离来存储所述基板的表面信息基板表面上的一个位置点，以及计算单元，被配置为基于所存储的表面信息确定前馈设定点信号，使得前馈设定点信号向前馈送到伺服单元，以便定位基板支架。

3. 发明申请

US20050134865A1 Method for determining a map, device manufacturing method, and lithographic apparatus 审中-公开
标题翻译：用于确定地图的方法，设备制造方法和光刻设备
公开(公告)号：US20050134865A1
公开(公告)日：2005-06-23
申请号：US10736987
申请日：2003-12-17
申请人： Hielke Schoonewelle , Marcus Boonman , Ralph Brinkhof , Martin Jules Marie-Emile Nivelle , Jan Stoeten , Erwin Antonius Alphen
发明人： Hielke Schoonewelle , Marcus Boonman , Ralph Brinkhof , Martin Jules Marie-Emile Nivelle , Jan Stoeten , Erwin Antonius Alphen
IPC分类号： H01L21/027 , G01B11/24 , G01B11/30 , G01R31/26 , G03F9/00 , H01L21/336
CPC分类号： G03F9/7034 , G03F9/7011 , G03F9/7019
摘要： A method according to one embodiment of the invention includes determining a map of a first part of a substrate belonging to a group of substrates. The method includes measuring a second part of at least one substrate belonging to the group, the second part being at least partially overlapping with the first part; computing a map (e.g. an average profile map or average height map) of the first part of the substrate belonging to the group, based on the second part; and storing the computed map, e.g. for use during a later determination of a height or tilt of a substrate from the group.
摘要翻译：根据本发明的一个实施例的方法包括确定属于一组基底的基底的第一部分的图。该方法包括测量属于该组的至少一个基板的第二部分，第二部分至少部分地与第一部分重叠; 基于第二部分计算属于该组的基板的第一部分的图（例如，平均轮廓图或平均高度图）; 并存储所计算的图。用于在稍后确定来自该组的基底的高度或倾斜度时使用。

4. 发明申请

US20050088638A1 Off-axis levelling in lithographic projection apparatus 失效
公开(公告)号：US20050088638A1
公开(公告)日：2005-04-28
申请号：US10975429
申请日：2004-10-29
申请人： Johannes Jasper , Erik Loopstra , Theodorus Modderman , Gerrit Nijmeijer , Nicolaas van Asten , Frederik Heuts , Jacobus Geman , Richard Du Croo de Jongh , Marcus Boonman , Jacob Klinkhamer , Thomas Castenmiller
发明人： Johannes Jasper , Erik Loopstra , Theodorus Modderman , Gerrit Nijmeijer , Nicolaas van Asten , Frederik Heuts , Jacobus Geman , Richard Du Croo de Jongh , Marcus Boonman , Jacob Klinkhamer , Thomas Castenmiller
IPC分类号： G01B9/02 , G01B11/00 , G01B11/02 , G01B11/245 , G01B11/25 , G01B11/30 , G03F7/207 , G03F7/22 , G03F9/00 , H01L21/027 , G03B27/52
CPC分类号： G03F9/7026 , G03F9/70 , G03F9/7034 , G03F9/7049 , G03F9/7096
摘要： In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.

5. 发明申请

US20080046183A1 Method for determining a map, device manufacturing method, and lithographic apparatus 有权
标题翻译：用于确定地图的方法，设备制造方法和光刻设备
公开(公告)号：US20080046183A1
公开(公告)日：2008-02-21
申请号：US11907571
申请日：2007-10-15
申请人： Hielke Schoonewelle , Marcus Boonman , Ralph Brinkhof , Martin De Nivelle , Jan Stoeten , Erwin Van Alphen
发明人： Hielke Schoonewelle , Marcus Boonman , Ralph Brinkhof , Martin De Nivelle , Jan Stoeten , Erwin Van Alphen
IPC分类号： G06F19/00
CPC分类号： G03F9/7034 , G03F9/7011 , G03F9/7019
摘要： A method according to one embodiment of the invention includes determining a map of a second part of a substrate belonging to a group of substrates. The method includes measuring a first part of at least one substrate belonging to the group to create an average profile map or average height map and computing a map of the second part of the substrate belonging to the group, based on the average profile map or the average height map. The computed map is stored for use during a later determination of a height or tilt of a substrate from the group.
摘要翻译：根据本发明的一个实施例的方法包括确定属于一组基底的基底的第二部分的图。该方法包括测量属于该组的至少一个底物的第一部分，以创建平均轮廓图或平均高度图，并基于平均轮廓图或计算属于该组的基底的第二部分的图平均高度图。计算的地图被存储以便在稍后确定来自该组的基底的高度或倾斜度期间使用。

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