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1. 发明申请

US20060127811A1 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060127811A1
公开(公告)日：2006-06-15
申请号：US11007579
申请日：2004-12-09
申请人： Johannes Josephina Moors , Robertus Jacobus Van Ballegoij , Vadim Banine , Gert-Jan Heerens , Frederik Elisabeth Heuts , Johannes Wilhelmus Jacobs , Paulus Liebregts , Hendrik Johannes Neerhof
发明人： Johannes Josephina Moors , Robertus Jacobus Van Ballegoij , Vadim Banine , Gert-Jan Heerens , Frederik Elisabeth Heuts , Johannes Wilhelmus Jacobs , Paulus Liebregts , Hendrik Johannes Neerhof
IPC分类号： G03F7/00
CPC分类号： G03F7/70916 , G03F7/70883 , G03F7/70908
摘要： A device manufacturing method includes projecting a patterned beam of radiation through an optics compartment and a channel that provides an open connection between the optics compartment and a substrate compartment onto a substrate, maintaining an ionized flush gas at a higher pressure in the channel than in the substrate compartment and in the optics compartment during the projecting, intercepting particles that emanate from the substrate with the ionized flush gas, pumping the flush gas carrying the intercepted particles from the substrate compartment using a pump coupled to a gas outlet coupled to at least one of the compartments, and establishing an electrical potential difference between a wall of the channel and the outlet and/or a rotor of the pump so that the outlet and/or the rotor of the pump attracts positively charged ions that stem from the flush gas in the channel.
摘要翻译：一种器件制造方法包括将图案化的辐射束投射通过光学隔室和通道，其在光学隔室和衬底隔室之间提供开放的连接到衬底上，保持电离冲洗气体在通道中的压力高于在衬底隔室和在光电隔室中，在用电离冲洗气体从衬底发射的颗粒中突出，截留颗粒时，使用耦合到与至少一个隔室，并且在通道的壁与出口和/或泵的转子之间建立电势差，使得泵的出口和/或转子吸引来自于冲洗气体的带正电荷的离子渠道。

2. 发明申请

US20050068511A1 Lithographic apparatus and device manufacturing method 审中-公开
公开(公告)号：US20050068511A1
公开(公告)日：2005-03-31
申请号：US10994669
申请日：2004-11-23
申请人： Paulus Liebregts , Arno Bleeker , Erik Loopstra , Harry Borggreve
发明人： Paulus Liebregts , Arno Bleeker , Erik Loopstra , Harry Borggreve
IPC分类号： G03F7/20 , H01L21/027 , G03B27/54
CPC分类号： G03F7/70991 , G03F7/70291
摘要： A lithographic apparatus uses the control signal from a computer to drive two spatial light modulators to pattern two separate projection beams for projection onto two substrates.

3. 发明申请

US20050018157A1 Lithographic projection apparatus and device manufacturing method 失效
标题翻译：平版印刷设备及其制造方法
公开(公告)号：US20050018157A1
公开(公告)日：2005-01-27
申请号：US10875510
申请日：2004-06-25
申请人： Wilhelmus Box , Johannes Wilhelmus Jacobs , Paulus Liebregts , Thijs Harink
发明人： Wilhelmus Box , Johannes Wilhelmus Jacobs , Paulus Liebregts , Thijs Harink
IPC分类号： G03F7/20 , H01L21/027 , G03B27/52
CPC分类号： G03F7/70891 , G03F7/70916
摘要： A lithographic projection apparatus is disclosed. The apparatus includes a substrate support for supporting at least one substrate, a radiation system for providing at least one beam of radiation, and a vacuum chamber. The vacuum chamber includes a patterning device and/or a projection system. The patterning device is arranged for patterning the beam of radiation according to a desired pattern, and the projection system is arranged for projecting the patterned beam of radiation onto a target portion of the substrate. The apparatus also includes at least one thermal shield for thermally conditioning at least part of the apparatus. The thermal shield includes particle transmission channels for transmitting particles through the shield, from a first side of the shield to a second side of the shield.
摘要翻译：公开了一种光刻投影装置。该装置包括用于支撑至少一个基板的基板支撑件，用于提供至少一个辐射束的辐射系统和真空室。真空室包括图案形成装置和/或投影系统。图案形成装置被布置成根据期望的图案图案化辐射束，并且投影系统被布置用于将图案化的辐射束投影到基板的目标部分上。该装置还包括至少一个热屏蔽件，用于热调节装置的至少一部分。热屏蔽包括用于将颗粒从屏蔽件的第一侧传送到屏蔽件的第二侧的颗粒传输通道。

4. 发明申请

US20060109442A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060109442A1
公开(公告)日：2006-05-25
申请号：US10995536
申请日：2004-11-24
申请人： Erik Loopstra , Petrus Bartray , Antonius Van Dijsseldonk , Paulus Liebregts
发明人： Erik Loopstra , Petrus Bartray , Antonius Van Dijsseldonk , Paulus Liebregts
IPC分类号： G03B27/52
CPC分类号： G03F7/70141 , G03F7/70091
摘要： A lithographic apparatus includes an illumination system configured to provide a beam of radiation and projection system configured to project the radiation beam onto a target portion of a substrate. At least one of the illumination system and the projection system includes a focusing element for reflecting or refracting the beam. A plurality of stop discs is provided, each having an aperture therethrough, together with a disc positioner configured to place one of the stop discs adjacent the focusing element to control the numerical aperture (NA) of the projection system or illumination system. The apparatus further includes a disc changer configured to select one of the stop discs and provide the selected stop disc to the disc positioner, the disc changer being external to the projection system or illumination system.
摘要翻译：光刻设备包括被配置为提供辐射束和投影系统的照明系统，其配置成将辐射束投影到基板的目标部分上。照明系统和投影系统中的至少一个包括用于反射或折射光束的聚焦元件。提供了多个止动盘，每个具有穿过其中的孔，以及配置成将止动盘中的一个邻近聚焦元件放置的盘定位器，以控制投影系统或照明系统的数值孔径（NA）。该装置还包括一个换盘器，其被配置为选择一个停止盘并将所选择的停止盘提供给盘定位器，换盘器位于投影系统或照明系统的外部。

5. 发明申请

US20060007414A1 Lithographic apparatus and a device manufacturing method 有权
公开(公告)号：US20060007414A1
公开(公告)日：2006-01-12
申请号：US10888513
申请日：2004-07-12
申请人： Bernardus Antonius Luttikhuis , Petrus Bartray , Johannes Henricus Jacobs , Thijs Harink , Paulus Liebregts
发明人： Bernardus Antonius Luttikhuis , Petrus Bartray , Johannes Henricus Jacobs , Thijs Harink , Paulus Liebregts
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70841
摘要： A lithographic apparatus is disclosed. The apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam. A projection system is configured to project the patterned radiation beam onto a target portion of a substrate. A first vacuum environment contains the projection system, a second vacuum environment contains the patterning device support, and a separator separates the first and second vacuum environments. The separator includes an aperture for passing the projection beam from the first vacuum environment towards the patterning device and/or vice-versa. The patterning device forms at least part of a seal for substantially sealing the aperture of the separator.

6. 发明申请

US20050139784A1 Lithographic apparatus and method of manufacturing a device and method of performing maintenance 有权
标题翻译：平版印刷装置及其制造方法以及进行维护的方法
公开(公告)号：US20050139784A1
公开(公告)日：2005-06-30
申请号：US10744092
申请日：2003-12-24
申请人： Pertrus Bartray , Mustafa Amhaouch , Angelo Van Engelen , Paulus Liebregts , Tim Meesters
发明人： Pertrus Bartray , Mustafa Amhaouch , Angelo Van Engelen , Paulus Liebregts , Tim Meesters
IPC分类号： H01L21/027 , H01J37/18 , H01J37/30
CPC分类号： H01J37/18 , B82Y10/00 , B82Y40/00 , G03F7/70841 , G03F7/70916 , H01J37/3174
摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation. The lithographic apparatus further includes: a support structure for supporting patterning device, the patterning device serving to impart the beam with a pattern in its cross-section; a substrate table for holding a substrate; and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic apparatus includes a vacuum system in which at least the illumination system and the substrate table are present. The vacuum system includes at least two separate vacuum modules. A first vacuum module includes at least the projection system and/or the illumination system. A second vacuum module includes the substrate table. At least two of the vacuum modules are connected to each other via a closable connection.
摘要翻译：光刻设备包括用于提供辐射束的照明系统。光刻设备还包括：用于支撑图案形成装置的支撑结构，所述图案形成装置用于在其横截面中赋予所述光束图案; 用于保持衬底的衬底台; 以及用于将图案化的光束投影到基板的目标部分上的投影系统。光刻设备包括其中存在至少照明系统和衬底台的真空系统。真空系统包括至少两个单独的真空模块。第一真空模块至少包括投影系统和/或照明系统。第二真空模块包括基板台。至少两个真空模块通过可关闭的连接相互连接。

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