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    • 93. 发明授权
    • Device for determining the validity of word line conditions and for delaying data sensing operation
    • 用于确定字线条件有效性和延迟数据传感操作的装置
    • US06233180B1
    • 2001-05-15
    • US09244454
    • 1999-02-04
    • Boaz EitanOleg Dadashev
    • Boaz EitanOleg Dadashev
    • G11C708
    • G11C7/22G11C7/06G11C8/18
    • A delay device for delaying the activation of a sensing indication signal includes a reference word-line, a reference word-line driver, and a comparator. The reference word-line driver is controlled by a strobe signal, and is connected to the reference word-line and a reference word-line voltage. Additionally, when so indicated by the strobe signal, the reference word-line driver provides the reference word-line voltage to the reference word-line. The comparator is connected to the reference word-line and to the reference word-line voltage and activates the sensing indication signal when the voltage on the reference word-line is at least equal to a predetermined function of the reference word-line voltage.
    • 用于延迟感测指示信号的激活的延迟装置包括参考字线,参考字线驱动器和比较器。 参考字线驱动器由选通信号控制,并连接到参考字线和参考字线电压。 此外,当由选通信号指示时,参考字线驱动器将参考字线电压提供给参考字线。 比较器连接到参考字线和参考字线电压,并且当参考字线上的电压至少等于参考字线电压的预定函数时,激活感测指示信号。
    • 95. 发明授权
    • Process for producing two bit ROM cell utilizing angled implant
    • 使用倾斜植入物生产两位ROM单元的方法
    • US6030871A
    • 2000-02-29
    • US72462
    • 1998-05-05
    • Boaz Eitan
    • Boaz Eitan
    • G11C11/56G11C16/04H01L21/265H01L21/8246H01L27/112H01L21/8236
    • H01L27/11266G11C11/56G11C11/5671G11C11/5692G11C16/0475H01L21/26586H01L27/112
    • A dual bit read only memory cell has two bits separately stored in two different areas of the channel, such as the left and right bit line junctions of the channel. A programmed bit has a threshold pocket implant self-aligned to its bit line junction and an unprogrammed bit has no such implant. An array of such cells is manufactured by laying down a bit line mask and separately programming the two bit line junctions. For each bit line junction, the bit line junctions which are to remain unprogrammed are first covered, with a junction mask, after which the array is exposed to a threshold pocket implant at a 15-45.degree. angle, to the right or to the left. The junction mask is removed and the process repeated for the other bit line junction. Finally, the bit line mask is removed. In an alternative embodiment, the threshold pocket implant is two implants, of two different materials.
    • 双位只读存储器单元具有分别存储在通道的两个不同区域中的两个位,例如通道的左和右位线结。 编程的位具有与其位线结自对准的阈值口袋注入,并且未编程的位没有这种植入物。 通过放置位线掩模并分别编程两个位线结来制造这样的单元阵列。 对于每个位线结,首先用结合掩模覆盖要保持未编程的位线结,然后将阵列暴露于15-45°角的阈值口袋注入,向右或向左 。 结合掩模被去除,并且对于另一位线结重复该过程。 最后,位线掩模被删除。 在替代实施例中,阈值口袋植入物是两种不同材料的植入物。
    • 96. 发明授权
    • NROM fabrication method with a periphery portion
    • 具有外围部分的NROM制造方法
    • US5966603A
    • 1999-10-12
    • US873384
    • 1997-06-11
    • Boaz Eitan
    • Boaz Eitan
    • H01L21/8246
    • H01L27/11568
    • A method of fabricating a nitride read only memory (NROM) chip creates an oxide-nitride-oxide (ONO) layer on a substrate and etches the ONO layer within the memory portion of the chip into columns. Bit lines are implanted between columns after which bit line oxides are generated on top of the bit lines with the thickness of the bit line oxides being independent of the thickness of the bottom oxide. The thickness of a gate oxide layer in a periphery portion of the chip is also relatively independent of the thicknesses of the other oxides. Finally, rows of polysilicon or polysilicide are formed perpendicular to and on top of the bit line oxides and the ONO columns.
    • 制造氮化物只读存储器(NROM)芯片的方法在衬底上产生氧化物 - 氮化物 - 氧化物(ONO)层,并将芯片的存储器部分内的ONO层蚀刻成列。 将位线注入列之后,在位线之上产生位线氧化物,位线氧化物的厚度与底部氧化物的厚度无关。 芯片周边部分中的栅极氧化物层的厚度也相对独立于其它氧化物的厚度。 最后,多晶硅或聚硅化物行垂直于位线氧化物和ONO柱形成。
    • 98. 发明授权
    • Apparatus and method for producing an output signal from a memory array
    • 用于从存储器阵列产生输出信号的装置和方法
    • US5557229A
    • 1996-09-17
    • US242929
    • 1994-05-16
    • Boaz Eitan
    • Boaz Eitan
    • H03K19/003H03K19/017H03K19/00
    • H03K19/01728H03K19/00361
    • An output device and method of operating it are disclosed. The output device includes a output control unit and an output buffer unit. The output control unit produces a data release (INR) signal after producing an output release (OR) signal, for example, by delaying the OR signal. The INR signal causes release of an output signal from a sense amplifier, resulting in a data signal. The output buffer includes n- and p-channel switching transistors and control units controlling their gates. In response to activation of the OR signal, the control units bring the voltage of the gates of the switching transistors to respectively slightly above and slightly below the threshold levels of their gates. In response to the data signal, the control units fully activate one of the switching transistors and deactivate the other of the switching transistors depending on the voltage level of the data signal. The speed with which the control units respond to the data signal is controlled.
    • 公开了一种输出装置及其操作方法。 输出装置包括输出控制单元和输出缓冲单元。 输出控制单元在产生输出释放(OR)信号之后例如通过延迟OR信号来产生数据释放(INR)信号。 INR信号导致从读出放大器释放输出信号,导致数据信号。 输出缓冲器包括n沟道开关晶体管和p沟道开关晶体管以及控制其栅极的控制单元。 响应于OR信号的激活,控制单元使开关晶体管的栅极的电压分别略高于并稍低于其栅极的阈值水平。 响应于数据信号,控制单元完全启动开关晶体管之一,并根据数据信号的电压电平使另一个开关晶体管停用。 控制单元响应数据信号的速度受到控制。
    • 100. 发明授权
    • EPROM virtual ground array
    • EPROM VIRTUAL GROUND ARRAY
    • US5204835A
    • 1993-04-20
    • US539657
    • 1990-06-13
    • Boaz Eitan
    • Boaz Eitan
    • G11C17/00G11C16/04H01L21/8246H01L21/8247H01L27/112H01L27/115H01L29/788H01L29/792
    • H01L27/115G11C16/0491
    • An electrically programmable read only memory contains alternating metal bit lines and diffused bit lines. Each diffused bit line is broken into a plurality of segments. Each of the segments of the diffused bit line comprises a virtual source. A multiplicity of floating gate transistors are arranged in rows and columns. The floating gate transistors in each column are divided into M groups of N floating gate transistors each. The floating gate transistors in the n.sup.th and the (n+1).sup.th columns, where n is an odd integer given by 1.ltoreq.n.ltoreq.N and (N+1) is the maximum number of columns in the array are connected to the segments of one diffused bit line placed between the n.sup.th and the (n+1).sup.th columns. At least one first transfer transistor is arranged to connect one segment comprising a virtual source to a first metal bit line. The first metal bit line functions as the source for the N floating gate transistors in the (n+1).sup.th column connected to said one segment. At least one second transfer transistor connects the same one segment comprising a virtual source to a second metal bit line. The second metal bit line functions as a source for the N floating gate transistors in the n.sup.th column connected to said one segment. The removal of each select transistor from the cell where it previously resided in series with its corresponding floating gate transistor, and the combining of a plurality of select transistors into one select transistor substantially reduces the area taken by each memory cell in the array.