专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

91. 发明授权

US07355791B2 Optical system and photolithography tool comprising same 有权
标题翻译：包括其的光学系统和光刻工具
公开(公告)号：US07355791B2
公开(公告)日：2008-04-08
申请号：US11251300
申请日：2005-10-14
申请人： Vladimir Kamenov , Toralf Gruner
发明人： Vladimir Kamenov , Toralf Gruner
IPC分类号： G02B5/30
CPC分类号： G03F7/70225 , G02B5/3091 , G02B17/02 , G02B17/08 , G02B17/0892 , G03F7/70241 , G03F7/70958 , G03F7/70966
摘要： An optical system, for example a lens for a photolithography tool, includes a group of optical elements (L1, L2) that each comprise a birefringent cubic crystal such as CaF2. The crystal lattices of the crystals have different orientations, e.g. for reducing the overall retardance of the group by mutual compensation. The [110] crystal axis of at least one optical element (L1, L2) is tilted with respect to an optical axis (34) of the system (10) by a predefined tilting angle (θ1, θ2) having an absolute value between 1° and 20°. This reduces the magnitude, but not significantly changes the orientation of intrinsic birefringence. By selecting an appropriate tilting angle it is possible to achieve a better performance of the optical system. For example, the overall retardance of the optical system may be reduced, or the angular retardance distribution may be symmetrized.
摘要翻译：光学系统，例如用于光刻工具的透镜，包括一组各自包括诸如CaF 2 2的双折射立方晶体的光学元件（L 1，L 2）。晶体的晶格具有不同的取向，例如通过相互补偿减少集团的整体延迟。至少一个光学元件（L 1，L 2）的[110]晶轴相对于系统（10）的光轴（34）倾斜预定倾斜角（θ1 >，θ2> 2），其绝对值在1°和20°之间。这降低了幅度，但并没有显着地改变固有双折射的取向。通过选择适当的倾斜角度，可以实现光学系统的更好的性能。例如，可以减小光学系统的总体延迟，或者可以对角度延迟分布进行对称化。

92. 发明申请

US20080019013A1 Lens Made of a Crystalline Material 有权
标题翻译：透镜由结晶材料制成
公开(公告)号：US20080019013A1
公开(公告)日：2008-01-24
申请号：US11864193
申请日：2007-09-28
申请人： Birgit Enkisch , Hartmut Enkisch , Toralf Gruner
发明人： Birgit Enkisch , Hartmut Enkisch , Toralf Gruner
IPC分类号： G02B3/00
CPC分类号： G03F7/70966 , B24B13/00 , G02B1/02 , G02B3/00
摘要： As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal material. As a first step in manufacturing the optical blank, one determines the orientation of a first crystallographic direction that is defined in the crystallographic structure of the material. The material is then machined into an optical blank so that the first crystallographic direction is substantially perpendicular to an optical blank surface of the optical blank. Subsequently, a marking is applied to the optical blank or to a mounting element of the optical blank. The marking has a defined relationship to a second crystallographic direction which is oriented at a non-zero angle relative to the first crystallographic direction.
摘要翻译：作为用于物镜的透镜或透镜部件的制造的初步阶段，特别是用于微光刻投影系统的投影物镜，光学坯料由晶体材料制成。作为制造光学坯料的第一步，确定在材料的晶体结构中限定的第一晶体方向的取向。然后将该材料加工成光学坯料，使得第一结晶方向基本上垂直于光学坯料的光学坯料表面。随后，将标记施加到光学毛坯或光学毛坯的安装元件。标记与第二结晶方向具有定义的关系，其相对于第一结晶方向定向成非零角度。

93. 发明授权

US07292388B2 Lens made of a crystalline material 有权
标题翻译：透镜由结晶材料制成
公开(公告)号：US07292388B2
公开(公告)日：2007-11-06
申请号：US10983569
申请日：2004-11-08
申请人： Birgit Enkisch , Hartmut Enkisch , Toralf Gruner
发明人： Birgit Enkisch , Hartmut Enkisch , Toralf Gruner
IPC分类号： G02B13/14
CPC分类号： G03F7/70966 , B24B13/00 , G02B1/02 , G02B3/00
摘要： As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal material. As a first step in manufacturing the optical blank, one determines the orientation of a first crystallographic direction that is defined in the crystallographic structure of the material. The material is then machined into an optical blank so that the first crystallographic direction is substantially perpendicular to an optical blank surface of the optical blank. Subsequently, a marking is applied to the optical blank or to a mounting element of the optical blank. The marking has a defined relationship to a second crystallographic direction which is oriented at a non-zero angle relative to the first crystallographic direction.
摘要翻译：作为用于物镜的透镜或透镜部件的制造的初步阶段，特别是用于微光刻投影系统的投影物镜，光学坯料由晶体材料制成。作为制造光学坯料的第一步，确定在材料的晶体结构中限定的第一晶体方向的取向。然后将该材料加工成光学坯料，使得第一结晶方向基本上垂直于光学坯料的光学坯料表面。随后，将标记施加到光学毛坯或光学毛坯的安装元件。标记与第二结晶方向具有定义的关系，其相对于第一结晶方向定向成非零角度。

94. 发明授权

US07126765B2 Objective with fluoride crystal lenses 有权
公开(公告)号：US07126765B2
公开(公告)日：2006-10-24
申请号：US11029788
申请日：2005-01-05
申请人： Daniel Krähmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christof Zaczek
发明人： Daniel Krähmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christof Zaczek
IPC分类号： G02B17/00 , G02B13/14
CPC分类号： G03F7/70966 , G02B1/02 , G02B1/08 , G02B5/3083 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , Y10S359/90
摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.

95. 发明授权

US07079331B2 Device for holding a beam splitter element 失效
标题翻译：用于保持分束器元件的装置
公开(公告)号：US07079331B2
公开(公告)日：2006-07-18
申请号：US11109316
申请日：2005-04-19
申请人： Ulrich Weber , Alexander Kohl , Hubert Holderer , Armin Schoeppach , Erwin Gaber , Winfried Kaiser , Reiner Garreis , Toralf Gruner , Chris Reed , Dragos Pariza , Mike Meehan
发明人： Ulrich Weber , Alexander Kohl , Hubert Holderer , Armin Schoeppach , Erwin Gaber , Winfried Kaiser , Reiner Garreis , Toralf Gruner , Chris Reed , Dragos Pariza , Mike Meehan
IPC分类号： G02B7/02 , G02B27/10 , G02B27/14 , G02B7/18 , G02F1/01
CPC分类号： G03F7/70825 , G02B7/008 , G02B7/1805 , G03F7/70891
摘要： The invention relates to a device for holding a beam splitter element having an optically active beam splitter layer in an optical imaging device, the beam splitter element being connected to at least one support element that is fastened in the housing of the imaging device. The connection between the beam splitter element and said at least one support element is designed in such a way that the position of the beam splitter layer of the beam splitter element remains nearly constant relative to the housing independently of temperatures and of thermal stresses acting upon the beam splitter element.
摘要翻译：本发明涉及一种用于在光学成像装置中保持具有光学有源分束器层的分束器元件的装置，所述分束器元件连接到紧固在成像装置的外壳中的至少一个支撑元件。分束器元件和所述至少一个支撑元件之间的连接被设计成使得分束器元件的分束器层的位置相对于壳体保持几乎恒定，而与温度和作用在分束器元件

96. 发明申请

US20060119750A1 Optical system for ultraviolet light 有权
标题翻译：紫外线光学系统
公开(公告)号：US20060119750A1
公开(公告)日：2006-06-08
申请号：US11252598
申请日：2005-10-19
申请人： Alexander Epple , Toralf Gruner , Wolfgang Singer
发明人： Alexander Epple , Toralf Gruner , Wolfgang Singer
IPC分类号： G02F1/1335
CPC分类号： G02B17/0892 , G02B3/12 , G02B3/14 , G02B13/143 , G02B17/0812
摘要： An optical system for ultraviolet light having wavelengths λ≦200 nm, which may be designed in particular as a catadioptric projection objective for microlithography, has a plurality of optical elements including optical elements made of synthetic quartz glass or a fluoride crystal material transparent to a wavelength λ≦200 nm. At least two of the optical elements are utilized for forming at least one liquid lens group including a first delimiting optical element, a second delimiting optical element, and a liquid lens, which is arranged in an interspace between the first delimiting optical element and the second delimiting optical element and contains a liquid transparent to ultraviolet light having wavelengths λ≦200 nm. This enables effective correction of chromatic aberrations even in the case of systems that are difficult to correct chromatically.
摘要翻译：波长λ<= 200nm的紫外光的光学系统可以特别设计为用于微光刻的反射折射投影物镜，具有多个光学元件，包括由合成石英玻璃制成的光学元件或透明于波长λ<= 200nm。至少两个光学元件用于形成至少一个液体透镜组，该液体透镜组包括第一限定光学元件，第二限定光学元件和液体透镜，该液体透镜组布置在第一限定光学元件和第二限定光学元件之间的间隙中限定光学元件并且包含对波长λ<= 200nm的透明紫外光的液体。这使得即使在难以校正色彩的系统的情况下也能够有效地校正色像差。

97. 发明申请

US20050254773A1 Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method 失效
标题翻译：用于改善至少两个光学元件的成像特性和光刻制造方法的方法
公开(公告)号：US20050254773A1
公开(公告)日：2005-11-17
申请号：US11185066
申请日：2005-07-20
申请人： Birgit Kurz , Toralf Gruner , Alexander Kohl
发明人： Birgit Kurz , Toralf Gruner , Alexander Kohl
IPC分类号： G02B7/00 , G02B5/30 , G03F7/20 , H01L21/027 , G02B6/00
CPC分类号： G03F7/70591 , G02B5/3083 , G03F7/70258 , G03F7/70566 , G03F7/70966 , Y10S359/90
摘要： A method for improving imaging properties of two or more optical elements comprises the step of determining for at least one of the two optical elements a polarisation-dependent perturbation. In a further step a polarisation-independent perturbation is determined for at least one of the two optical elements. Then a target position for the at least one movable optical element is calculated such that, in the target position, the total perturbation of the at least two optical elements which is made up of the polarisation-dependent perturbations and polarisation-independent perturbations of the two optical elements, is minimized. Finally the at least one movable optical element is moved the to the calculated target position.
摘要翻译：一种用于改善两个或多个光学元件的成像特性的方法包括确定两个光学元件中的至少一个偏振相关扰动的步骤。在另一步骤中，确定两个光学元件中的至少一个的偏振无关扰动。然后，计算出至少一个可移动光学元件的目标位置，使得在目标位置中，由偏振相关扰动和两极偏振独立扰动构成的至少两个光学元件的总扰动光学元件被最小化。最后，将至少一个可移动光学元件移动到计算出的目标位置。

98. 发明申请

US20050180023A1 Method of optimizing an objective with fluoride crystal lenses, and objective with fluoride crystal lenses 失效
标题翻译：氟化物晶体透镜优化目标的方法，以及氟化物晶体透镜的目标
公开(公告)号：US20050180023A1
公开(公告)日：2005-08-18
申请号：US11071699
申请日：2005-03-02
申请人： Michael Totzeck , Vladimir Kamenov , Toralf Gruner
发明人： Michael Totzeck , Vladimir Kamenov , Toralf Gruner
IPC分类号： G02B1/02 , G02B5/30 , G02B13/14 , G03F7/20 , G02B3/00
CPC分类号： G02B1/08 , G02B1/02 , G02B5/3083 , G02B13/143 , G03F7/70241 , G03F7/705 , G03F7/70966 , Y10S359/90
摘要： A numerical optimizing method serves to reduce harmful effects caused by intrinsic birefringence in lenses of a fluoride crystal material of cubic crystal structure in an objective, particularly a projection objective for a microlithography system. Under the optimizing method, an optimizing function which takes at least one birefringence-related image aberration into account is minimized. The birefringence-related image aberration is determined from a calculation for a light ray passing through the fluoride crystal lenses. To the extent that the birefringence-related image aberration is a function of parameters of the light ray, it depends only on geometric parameters of the light ray. The numerical optimizing method is used to produce objectives in which an optical retardation as well as an asymmetry of the optical retardation are corrected. The lenses are arranged in homogeneous groups, where each homogeneous group is corrected for the optical retardation asymmetry.
摘要翻译：数值优化方法用于减少物镜中的立方晶体结构的氟化物晶体材料的透镜中的固有双折射引起的有害影响，特别是微光刻系统的投影物镜。在优化方法下，考虑到至少一个双折射相关图像像差的优化函数被最小化。从通过氟化物晶体透镜的光线的计算确定双折射相关图像像差。在双折射相关图像像差是光线参数的函数的程度上，其仅取决于光线的几何参数。使用数值优化方法来产生其中光学延迟以及光学延迟的不对称性被校正的目标。透镜被排列成均匀的组，其中每个均匀组被校正用于光学延迟不对称。

99. 发明授权

US09046787B2 Microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置
公开(公告)号：US09046787B2
公开(公告)日：2015-06-02
申请号：US13007039
申请日：2011-01-14
申请人： Toralf Gruner , Alexander Epple , Markus Degünther
发明人： Toralf Gruner , Alexander Epple , Markus Degünther
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/70108 , G03F7/70141 , G03F7/70191
摘要： A projection exposure apparatus has a projection lens with an object plane, an image plane, an optical axis and a non-telecentric entrance pupil. The apparatus further comprises an illumination system having an intermediate field plane and a field stop. The field stop is positioned in or in close proximity to the intermediate field plane and defines an illuminated field in the object plane that does not contain the optical axis of the projection lens. The illumination system is configured such that, in the object plane, a mean of the angles formed between all principal rays emanating from the intermediate field plane on the one hand and the optical axis of the projection lens on the other hand differs from 0°.
摘要翻译：投影曝光装置具有物镜面，像面，光轴和非远心入射光瞳的投影透镜。该装置还包括具有中间场平面和场停止的照明系统。场停止件位于中间场平面中或紧邻中间场平面，并且在物平面中限定不包含投影透镜的光轴的照明场。照明系统被配置为使得在物平面中，从一方面从中间场平面发射的所有主光线与另一方面的投影透镜的光轴之间形成的角度的平均值不同于0°。

100. 发明授权

US08659744B2 Method for correcting a lithography projection objective, and such a projection objective 有权
标题翻译：用于校正光刻投影物镜的方法和这种投影物镜
公开(公告)号：US08659744B2
公开(公告)日：2014-02-25
申请号：US13440226
申请日：2012-04-05
申请人： Wilhelm Ulrich , Thomas Okon , Norbert Wabra , Toralf Gruner , Boris Bittner , Volker Graeschus
发明人： Wilhelm Ulrich , Thomas Okon , Norbert Wabra , Toralf Gruner , Boris Bittner , Volker Graeschus
IPC分类号： G03B27/70 , G03B27/52 , G03F7/20
CPC分类号： G03F7/70308 , G02B17/08 , G02B27/0025 , G03F7/70216 , G03F7/70225 , G03F7/70258 , G03F7/70266
摘要： A method for correcting at least one image defect of a projection objective of a lithography projection exposure machine, the projection objective comprising an optical arrangement composed of a plurality of lenses and at least one mirror, the at least one mirror having an optically operative surface that can be defective and is thus responsible for the at least one image defect, comprises the steps of: at least approximately determining a ratio VM of principal ray height hMH to marginal ray height hMR at the optically operative surface of the at least one mirror, at least approximately determining at least one optically operative lens surface among the lens surfaces of the lenses, at which the magnitude of a ratio VL of principal ray height hLH to marginal ray height hLR comes at least closest to the ratio VM, and selecting the at least one determined lens surface for the correction of the image defect.
摘要翻译：一种用于校正光刻投影曝光机的投影物镜的至少一个图像缺陷的方法，所述投影物镜包括由多个透镜和至少一个反射镜组成的光学装置，所述至少一个反射镜具有光学操作表面，可能是有缺陷的并且因此对至少一个图像缺陷负责，包括以下步骤：至少近似地确定主光线高度hMH与至少一个反射镜的光学操作表面处的边缘光线高度hMR的比率VM，至少近似地确定透镜的透镜表面中的至少一个光学透镜表面，其中主光线高度hLH与边缘光线高度hLR的比值VL的大小至少最接近于比率VM，并且至少选择至少用于校正图像缺陷的一个确定的透镜表面。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式