会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 91. 发明授权
    • Thin oxide dummy tiling as charge protection
    • 薄氧化虚拟平铺作为电荷保护
    • US07977218B2
    • 2011-07-12
    • US11645475
    • 2006-12-26
    • Cinti ChenYi HeWenmei LiZhizheng LiuMing-Sang KwanYu SunJean Yee-Mei Yang
    • Cinti ChenYi HeWenmei LiZhizheng LiuMing-Sang KwanYu SunJean Yee-Mei Yang
    • H01L21/00
    • H01L27/115H01L27/0207H01L27/11568
    • Novel fabrication methods implement the use of dummy tiles to avoid the effects of in-line charging, ESD events, and such charge effects in the formation of a memory device region region. One method involves forming at least a portion of a memory core array upon a semiconductor substrate that involves forming STI structures in the substrate substantially surrounding a memory device region region within the array. An oxide layer is formed over the substrate in the memory device region region and over the STI's, wherein an inner section of the oxide layer formed over the memory device region region is thicker than an outer section of the oxide layer formed over the STI's. A first polysilicon layer is then formed over the inner and outer sections comprising one or more dummy tiles formed over one or more outer sections and electrically connected to at least one inner section.
    • 新颖的制造方法实现使用虚拟瓦片以避免在形成存储器件区域区域中的在线充电,ESD事件和这种电荷效应的影响。 一种方法包括在半导体衬底上形成至少一部分存储器芯阵列,该半导体衬底涉及在衬底中形成基本上围绕阵列内的存储器件区域区域的STI结构。 在存储器件区域和STI之上的衬底上形成氧化物层,其中形成在存储器件区域上的氧化物层的内部部分比在STI上形成的氧化物层的外部部分更厚。 然后在内部和外部部分上形成第一多晶硅层,包括形成在一个或多个外部部分上并且电连接到至少一个内部部分的一个或多个虚拟瓦片。
    • 96. 发明申请
    • Cycling improvement using higher erase bias
    • 使用更高的擦除偏置循环改进
    • US20080151644A1
    • 2008-06-26
    • US11724711
    • 2007-03-16
    • Sheung-Hee ParkXuguang WangWing LeungMing-Sang KwanYi HeEdward Franklin Runnion
    • Sheung-Hee ParkXuguang WangWing LeungMing-Sang KwanYi HeEdward Franklin Runnion
    • G11C16/04G11C11/34
    • G11C16/16G11C16/14
    • Methods of erasing flash memory cells are provided that improve erase cycling speed and reliability. One embodiment comprises interactively applying a stepped or ramped drain voltage pattern to a drain of the memory cells and a pulsed gate voltage pattern to a gate of the memory cells for a predetermined number of gate pulses or until all the memory cells are erased. In another embodiment, an erase bias circuit is provided for erasing a sector of flash memory cells, the circuit comprising row and column decoders that selects wordline rows and columns of cells, respectively, a supply bias arrangement that provides source and drain supply voltages for the sector, and a patterned pulse bias arrangement configured to provide a pulsed gate voltage pattern to gates of the cells selected by the row decoder and a drain voltage pattern to the drains of the cells selected by the column decoder.
    • 提供了擦除闪存单元的方法,其提高了擦除循环速度和可靠性。 一个实施例包括将阶梯式或倾斜的漏极电压图案交互地施加到存储器单元的漏极,以及脉冲栅极电压图案到达预定数量的栅极脉冲的存储器单元的栅极,或者直到所有存储器单元被擦除。 在另一个实施例中,提供擦除偏置电路用于擦除闪速存储器单元的扇区,该电路包括分别选择字线行和单元列的行和列解码器,该电源偏置装置为 以及图案化脉冲偏压装置,其被配置为向由行解码器选择的单元的栅极和漏极电压图案提供脉冲栅极电压图案到由列解码器选择的单元的漏极。
    • 99. 发明授权
    • Flash memory cell and methods for programming and erasing
    • 闪存单元和编程和擦除的方法
    • US07215577B2
    • 2007-05-08
    • US11511763
    • 2006-08-29
    • Zhizheng LiuZengtao LiuYi HeMark Randolph
    • Zhizheng LiuZengtao LiuYi HeMark Randolph
    • G11C11/34G11C16/04H01L29/78
    • G11C16/0466G11C16/0491H01L21/28282H01L29/66833
    • Flash memory cells are presented which comprise a dielectric material formed above a substrate channel region, a charge trapping material formed over the dielectric material, and a control gate formed over the charge trapping material. The cell may be programmed by directing electrons from the control gate into the charge trapping material to raise the cell threshold voltage. The electrons may be directed from the control gate to the charge trapping material by coupling a substrate to a substrate voltage potential, and coupling the control gate to a gate voltage potential, where the gate voltage potential is lower than the substrate voltage potential. The cell may be erased by directing electrons from the charge trapping material into the control gate to lower a threshold voltage of the flash memory cell, such as by coupling the substrate to a substrate voltage potential, and coupling the control gate to a gate voltage potential, where the gate voltage potential is higher than the substrate voltage potential.
    • 提供了闪存单元,其包括形成在衬底沟道区上方的电介质材料,在电介质材料上形成的电荷俘获材料,以及形成在电荷俘获材料上的控制栅。 可以通过将电子从控制栅极引导到电荷捕获材料中来提高电池阈值电压来编程电池。 电子可以通过将衬底耦合到衬底电压电势,并将控制栅极耦合到栅极电压电位,其中栅极电压电位低于衬底电压电位,从控制栅极引导到电荷俘获材料。 可以通过将电子从电荷捕获材料引入控制栅极来降低闪速存储器单元的阈值电压,例如通过将衬底耦合到衬底电压电位,以及将控制栅极耦合到栅极电压电位来擦除电池 ,其中栅极电压电位高于衬底电压电位。