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91. 发明授权

US07978430B2 Apparatus for providing a reverse air bearing surface head with trailing shield design for perpendicular recording 有权
标题翻译：用于提供具有用于垂直记录的后挡板设计的反向空气轴承表面头的装置
公开(公告)号：US07978430B2
公开(公告)日：2011-07-12
申请号：US11852166
申请日：2007-09-07
申请人： Quang Le , James L. Nix , Aron Pentek , Walter E. Weresin , Mason L. Williams
发明人： Quang Le , James L. Nix , Aron Pentek , Walter E. Weresin , Mason L. Williams
IPC分类号： G11B5/127 , G11B5/147
CPC分类号： G11B5/1278 , Y10T29/49039 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method and apparatus for providing a reverse air bearing surface head with trailing shield design for perpendicular recording. A reverse air bearing surface head for perpendicular recording is provided with an inversed bevel shape to handle skew when recording data on a magnetic recording medium.
摘要翻译：一种用于提供具有用于垂直记录的后挡板设计的反向空气轴承表面头的方法和装置。用于垂直记录的反向空气轴承表面头设置有反转的斜面形状，以在磁记录介质上记录数据时处理偏斜。

92. 发明申请

US20110096434A1 SYSTEMS HAVING WRITER WITH DEEPER WRAP AROUND SHIELD AND METHODS FOR MAKING THE SAME 有权
标题翻译：具有写入深度的写入器的系统及其制造方法
公开(公告)号：US20110096434A1
公开(公告)日：2011-04-28
申请号：US12975157
申请日：2010-12-21
申请人： Wen-Chien D. Hsiao , Aron Pentek , Thomas J.A. Roucoux
发明人： Wen-Chien D. Hsiao , Aron Pentek , Thomas J.A. Roucoux
IPC分类号： G11B21/02 , G11B5/10
CPC分类号： G11B5/1278 , G11B5/3116 , G11B5/3146 , G11B5/315 , G11B5/3163
摘要： A method according to one embodiment includes etching an underlayer positioned under a main pole for reducing a thickness thereof and creating an undercut under the main pole; adding a gap material along sides of the main pole and in the undercut; and forming a shield along at least a portion of the gap material. A magnetic head according to one embodiment includes a main pole; an underlayer positioned under the main pole and spaced therefrom, thereby defining an undercut therebetween; a first layer of gap material extending along sides of the main pole and in the undercut; a second layer of gap material extending continuously along the underlayer under the main pole; and a shield encircling the main pole, wherein the shield extends between the first and second layers of gap material in the undercut. Additional systems and methods are also presented.
摘要翻译：根据一个实施例的方法包括蚀刻位于主极下方的底层以减小其厚度并在主极下方产生底切; 在主杆的侧面和底切处添加间隙材料; 以及沿所述间隙材料的至少一部分形成屏蔽。根据一个实施例的磁头包括主极; 位于主极下方并与其间隔开的底层，从而在其间限定底切; 第一层间隙材料沿主极和底切部分的侧面延伸; 沿着主极下方的底层连续延伸的第二层间隙材料; 以及围绕所述主极的屏蔽件，其中所述屏蔽件在所述底切部中在所述第一和第二间隙材料层之间延伸。还介绍了其他系统和方法。

93. 发明授权

US07464458B2 Method for manufacturing a self-aligned, notched trailing shield for perpendicular recording 失效
标题翻译：用于制造用于垂直记录的自对准，带切口的后挡板的方法
公开(公告)号：US07464458B2
公开(公告)日：2008-12-16
申请号：US11830552
申请日：2007-07-30
申请人： Quang Le , Aron Pentek
发明人： Quang Le , Aron Pentek
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/112 , G11B5/1278 , H01F41/32 , Y10T29/49039 , Y10T29/49041 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A perpendicular magnetic write head having a notched, self aligned trailing shield for canting a magnetic field emitted therefrom.
摘要翻译：一种垂直磁性写入头，其具有用于使从其发射的磁场的切口，自对准后挡板。

94. 发明申请

US20080113514A1 Methods for the manufacture of notched trailing shields 失效
标题翻译：开槽后挡板的制造方法
公开(公告)号：US20080113514A1
公开(公告)日：2008-05-15
申请号：US11595654
申请日：2006-11-10
申请人： Amanda Baer , Hung-chin Guthrie , Yimin Hsu , Ming Jiang , Aron Pentek
发明人： Amanda Baer , Hung-chin Guthrie , Yimin Hsu , Ming Jiang , Aron Pentek
IPC分类号： H01L21/311
CPC分类号： G11B5/1278 , G11B5/112 , G11B5/3163 , Y10T29/49032 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： Methods for improving within wafer and wafer to wafer yields during fabrication of notched trailing shield structures are disclosed. Ta/Rh CMP stop layers are deposited prior to planarization and notch formation to ensure a planar surface for trailing shield structures. These stop layers may be blanket deposited or patterened prior to CMP. Patterned stop layers produce the highest yields.
摘要翻译：公开了在制造缺口尾部屏蔽结构期间在晶片和晶片之间改善晶片产量的方法。在平坦化和切口形成之前沉积Ta / Rh CMP停止层以确保用于尾部屏蔽结构的平坦表面。这些停止层可以在CMP之前被铺平或沉积。图案化的停止层产生最高的产量。

95. 发明授权

US07363698B2 Process for creating a write head by forming a bump after the top pole is formed 失效
标题翻译：用于通过在形成顶极之后形成凸起来产生写入头的过程
公开(公告)号：US07363698B2
公开(公告)日：2008-04-29
申请号：US10956221
申请日：2004-09-30
申请人： Amanda Baer , Hamid Balamane , Daniel Wayne Bedell , Jyh-Shuey Jerry Lo , Vladimir Nikitin , Aron Pentek , Yvette Winton
发明人： Amanda Baer , Hamid Balamane , Daniel Wayne Bedell , Jyh-Shuey Jerry Lo , Vladimir Nikitin , Aron Pentek , Yvette Winton
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/1871 , G11B5/3163 , Y10T29/49021 , Y10T29/49032 , Y10T29/49034 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： Methods for creating a write head by forming a bump after the top pole is formed are provided. In one embodiment, a bottom pole is created out of a first layer. A non-magnetic gap material is applied to the surface of the wafer. A top pole is created out of a second layer. After creating the top pole, a bump is created. The bump is used to protect at least a portion of the first layer while etching to create a stray flux absorber.
摘要翻译：提供了通过在形成顶极之后形成凸块来创建写入头的方法。在一个实施例中，从第一层产生底极。将非磁隙材料施加到晶片的表面。第二层创建顶杆。创建顶极后，会创建一个凸起。凸块用于在蚀刻时保护第一层的至少一部分以产生杂散通量吸收体。

96. 发明授权

US07243411B2 Method for protecting write head coil during write pole/shaping 失效
标题翻译：写磁头/整形期间保护写头线圈的方法
公开(公告)号：US07243411B2
公开(公告)日：2007-07-17
申请号：US11037405
申请日：2005-01-18
申请人： David P. Druist , Aron Pentek
发明人： David P. Druist , Aron Pentek
IPC分类号： G11B5/127 , G11B5/147 , C23C13/00
CPC分类号： G11B5/3163 , B82Y10/00 , G11B5/17 , G11B5/3116 , Y10T29/49032 , Y10T29/49041 , Y10T29/4906 , Y10T29/49062 , Y10T29/49064
摘要： A method for protecting a write head coil during write pole notching using ion mill resistant mask formed by reactive ion etching is disclosed. Ion mill shaping of the write pole is performed after depositing an ion mill-resistant material to protect the coil.
摘要翻译：公开了一种使用由反应离子蚀刻形成的离子磨损掩模在写入磁极刻槽期间保护写入磁头线圈的方法。在沉积抗离子磨损材料以保护线圈之后执行写入极的离子磨机成形。

97. 发明申请

US20060288565A1 WRITE POLE FABRICATION FOR PERPENDICULAR RECORDING 失效
标题翻译：写字符制造用于完整记录
公开(公告)号：US20060288565A1
公开(公告)日：2006-12-28
申请号：US11469132
申请日：2006-08-31
申请人： Quang Le , Edward Lee , Jui-Lung Li , Aron Pentek , Nian-Xiang Sun
发明人： Quang Le , Edward Lee , Jui-Lung Li , Aron Pentek , Nian-Xiang Sun
IPC分类号： G11B5/127
CPC分类号： G11B5/1278 , G11B5/112 , Y10T29/49021 , Y10T29/49032 , Y10T29/49041 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052 , Y10T29/49067
摘要： Methods for forming write heads. One method includes forming a mask layer above a pole tip layer; forming a layer of resist above the mask layer; patterning the resist; removing portions of the mask layer not covered by the patterned resist; shaping a pole tip from the pole tip layer; depositing a layer of dielectric material above the pole tip and flux shaping layer, wherein the layer of dielectric material extends about adjacent to the mask layer; depositing a stop layer over the dielectric material, the stop layer abutting the mask layer; and polishing for forming a substantially planar upper surface comprising the mask layer and stop layer. Another method includes depositing a layer of dielectric material at least adjacent the pole tip, wherein the layer of dielectric material extends about adjacent to the mask layer. A further method includes forming dishing in the pole tip.
摘要翻译：形成写头的方法一种方法包括在极尖层上形成掩模层; 在掩模层之上形成抗蚀剂层; 图案化抗蚀剂; 去除未被图案化抗蚀剂覆盖的掩模层的部分; 从极尖层成形极尖; 在极尖和熔剂成形层上沉积介电材料层，其中介电材料层围绕掩模层延伸; 在电介质材料上沉积停止层，停止层邻接掩模层; 以及用于形成包括掩模层和停止层的基本平坦的上表面的抛光。另一种方法包括沉积至少邻近极尖的介电材料层，其中电介质材料层围绕掩模层延伸。另一种方法包括在极尖中形成凹陷。

98. 发明申请

US20060171069A1 P1 write pole with shoulder formation and method of fabrication 失效
标题翻译： P1写杆与肩部形成和制造方法
公开(公告)号：US20060171069A1
公开(公告)日：2006-08-03
申请号：US11046740
申请日：2005-01-31
申请人： Daniel Bedell , Hung-Chin Guthrie , Ming Jiang , Hieu Lam , Jyh-Shuey Lo , Edward Lee , Aron Pentek
发明人： Daniel Bedell , Hung-Chin Guthrie , Ming Jiang , Hieu Lam , Jyh-Shuey Lo , Edward Lee , Aron Pentek
IPC分类号： G11B5/147
CPC分类号： G11B5/1871 , G11B5/3116
摘要： A magnetic disk drive head is disclosed including a write head, which includes a P1 layer having a pedestal portion, a gap layer formed on the P1 layer, and a P2 layer formed on the gap layer. The P1 layer includes a shoulder formation having a neck portion and a beveled portion. Also disclosed is a disk drive having a write head with a P1 layer with shoulder formation, and a method for fabricating a write pole for a magnetic recording head having a P1 layer with shoulder formation.
摘要翻译：公开了一种包括写头的磁盘驱动器头，该写头包括具有基座部分的P 1层，在P 1层上形成的间隙层和形成在间隙层上的P 2层。 P 1层包括具有颈部和斜面部分的肩部结构。还公开了一种具有具有肩部形成的P 1层的写入头的磁盘驱动器，以及用于制造具有具有肩部形成的P 1层的磁性记录头的写入磁极的方法。

99. 发明申请

US20060156537A1 Method for protecting write head coil during write pole notching using ion mill resistant mask formed by reactive ion etching 失效
标题翻译：在使用由反应离子蚀刻形成的离子磨损掩模的写入磁极刻槽期间保护写入磁头线圈的方法
公开(公告)号：US20060156537A1
公开(公告)日：2006-07-20
申请号：US11037405
申请日：2005-01-18
申请人： David Druist , Aron Pentek
发明人： David Druist , Aron Pentek
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/3163 , B82Y10/00 , G11B5/17 , G11B5/3116 , Y10T29/49032 , Y10T29/49041 , Y10T29/4906 , Y10T29/49062 , Y10T29/49064
摘要： A method for protecting a write head coil during write pole notching using ion mill resistant mask formed by reactive ion etching is disclosed. Ion mill shaping of the write pole is performed after depositing an ion mill-resistant material to protect the coil.
摘要翻译：公开了一种使用由反应离子蚀刻形成的离子磨损掩模在写入磁极刻槽期间保护写入磁头线圈的方法。在沉积抗离子磨损材料以保护线圈之后执行写入极的离子磨机成形。

100. 发明申请

US20050264949A1 Recessed SiO2 or Si3N4 overcoat for GMR head in magnetic disk drive 审中-公开
标题翻译：用于磁盘驱动器中的GMR磁头的嵌入式SiO2或Si3N4外涂层
公开(公告)号：US20050264949A1
公开(公告)日：2005-12-01
申请号：US10857036
申请日：2004-05-28
申请人： Yunxiao Gao , Aron Pentek , Alan Tam , Sue Zhang
发明人： Yunxiao Gao , Aron Pentek , Alan Tam , Sue Zhang
IPC分类号： G11B5/127 , G11B5/31 , G11B5/33
CPC分类号： G11B5/3136 , G11B5/3106 , G11B5/3133 , G11B5/3163 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A giant magnetoresistive (GMR) head contains an overcoat layer consisting of silicon dioxide or silicon nitride. These materials have a coefficient of thermal expansion (CTE) that is less than alumina, which is conventionally used for the overcoat layer. As a result, the overcoat layer exhibits a smaller temperature-induced protrusion when the head heats up from friction with the passing air stream. The process of forming the head includes forming a recess in the overcoat layer that reduces the stress on the poles and improves the performance of the head. The process includes depositing a seed layer over the overcoat layer in preparation to plating a metal mask layer with an opening where the recess is to be formed, wet chemical etching the seed layer through the opening in the mask layer and performing an ion milling process to remove any remaining traces of the seed layer. With the seed layer completely removed, a trench having smooth sidewalls and bottom can be etched in the overcoat layer by a reactive ion etch (RIE) process. The saw that is used to separate the head elements in the wafer can be passed through the clean trench without contacting the overcoat layer, thereby avoiding the chipping and cracking that might otherwise result from the use of a silicon dioxide or silicon nitride overcoat layer.
摘要翻译：巨磁阻（GMR）磁头包含由二氧化硅或氮化硅组成的外涂层。这些材料的热膨胀系数（CTE）小于通常用于外涂层的氧化铝。结果，当头部与通过的空气流的摩擦加热时，外涂层表现出较小的温度引起的突起。形成头部的过程包括在外涂层中形成凹陷，其减小了磁极上的应力并提高了磁头的性能。该方法包括在外涂层上沉积种子层，以准备对具有要形成凹部的开口镀金属掩模层，通过掩模层中的开口湿化学蚀刻晶种层并执行离子铣削加工去除种子层的剩余痕迹。随着种子层完全去除，可以通过反应离子蚀刻（RIE）工艺在覆盖层中蚀刻具有平滑侧壁和底部的沟槽。用于分离晶片中的头元件的锯可以通过干净的沟槽而不与外涂层接触，从而避免由于使用二氧化硅或氮化硅外涂层而导致的切屑和裂纹。

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