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    • 94. 发明申请
    • PRISM ROTATION ADJUSTMENT MECHANISM, STEPPER EXPOSURE SYSTEM, AND STEPPER
    • US20190018218A1
    • 2019-01-17
    • US16067375
    • 2016-12-28
    • SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
    • Tongke SU
    • G02B7/18G02B5/04G03F7/20
    • A prism rotation adjustment mechanism, a photolithographic exposure system and a photolithography tool are disclosed. The prism rotation adjustment mechanism includes a frame (200), a flexible mechanism (100) and an actuation mechanism. The flexible mechanism (100) includes a fixing component (110), an actuating component (120), a connecting component (130) and a swinging component (140) that are flexibly articulated in a sequence. The fixing component (110) is fixed to the frame (200). The actuation mechanism is fixed to the frame (200) and coupled to the actuating component (120). On the swinging component (140) are secured a prism wherein an axis of articulation between the swinging component (140) and the fixing component (110) is in correspondence with a rotational center of the prism. The flexible mechanism of the prism rotation adjustment mechanism is a quadrilateral flexibly-articulated assembly, in which, when driven by the actuation mechanism, the actuating component can convert translational movement into rotational movement, allowing the control of the rotational movement to be more accurate and hence improving the rotational control accuracy of the prisms. Moreover, the axis of articulation between the swinging component and the fixing component provides a stable axis for the prisms to rotate thereabout, avoiding crosstalk during the rotation and hence additionally improving the prism rotation control accuracy.