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1. 发明申请

US20120026475A1 Exposure apparatus, exposure method, and device producing method 有权
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US20120026475A1
公开(公告)日：2012-02-02
申请号：US13137692
申请日：2011-09-02
申请人： Yoshiki Kida
发明人： Yoshiki Kida
IPC分类号： G03B27/52
CPC分类号： G03F7/70925 , G03F7/2041 , G03F7/70341 , G03F7/7085 , G03F7/70916 , G03F7/70975
摘要： An exposure apparatus EX is provided with a measuring unit 60 which measures at least one of property and components of a liquid LQ in a state that a liquid immersion area LR is formed on an object different from a substrate P to be exposed. There is provided an exposure apparatus which can accurately perform exposure process and measurement process through the liquid by judging the state of the liquid in advance and by performing a procedure as appropriate.
摘要翻译：曝光装置EX设置有测量单元60，该测量单元60在与要暴露的基板P不同的物体上形成液浸区域LR的状态下，测量液体LQ的特性和分量中的至少一个。提供了一种曝光装置，其可以通过预先判断液体的状态并通过适当地执行过程，通过液体来精确地进行曝光处理和测量处理。

2. 发明授权

US06577382B2 Substrate transport apparatus and method 失效
标题翻译：基板输送装置及方法
公开(公告)号：US06577382B2
公开(公告)日：2003-06-10
申请号：US10060322
申请日：2002-02-01
申请人： Yoshiki Kida , Kenji Nishi
发明人： Yoshiki Kida , Kenji Nishi
IPC分类号： G03B2742
CPC分类号： G03F7/70691 , H01L21/68707 , Y10S414/135 , Y10S414/141
摘要： An object of the invention is to provide a substrate transport apparatus which enables prompt transfer of a substrate, and a substrate processing apparatus incorporating this. A substrate transport apparatus of the invention comprises a transport arm (45, 46, 145, 146) for supporting a peripheral portion of a substrate (W) at at least two places on the peripheral portion, and transporting the substrate to a stage (7). The transport arm comprises: a first arm (45) having a first support portion (45e) for supporting a rear face of one side of the peripheral portions of the substrate in a transport direction (C-D) of the substrate, and a first facing portion (45f) provided on the first support portion and facing a side face of the one peripheral portion of the substrate; a second arm (46) having a second support portion (46e) for supporting a rear face of the other side of the peripheral portions of the substrate in the transport direction of the substrate, and a second facing portion (46f) provided on the second support portion, and facing a side face of the other peripheral portion of the substrate; and a drive mechanism (43, 43a, 45a, 46a) for driving each of the first arm and the second arm so as to approach and separate from each other.
摘要翻译：本发明的目的是提供一种基板输送装置，其能够及时地传送基板，以及基板处理装置。本发明的基板输送装置包括：输送臂（45,46,145,146），用于在周边部分的至少两个位置处支撑基板（W）的周边部分，并将基板输送到载物台）。传送臂包括：第一臂（45），具有第一支撑部分（45e），用于在基板的输送方向（CD）上支撑基板的周边部分的一侧的后表面;以及第一相对部分（45f），其设置在所述第一支撑部分上并且面向所述基板的所述一个周边部分的侧面; 第二臂（46），具有第二支撑部（46e），用于在基板的输送方向上支撑基板的周边部分的另一侧的背面;以及第二面对部（46f），设置在第二支撑部支撑部分，并且面对基板的另一个周边部分的侧面; 以及用于驱动第一臂和第二臂中的每一个以彼此接近和分离的驱动机构（43,43a，45a，46a）。

3. 发明申请

US20090279059A1 Exposure apparatus adjusting method, exposure apparatus, and device fabricating method 有权
标题翻译：曝光装置调节方法，曝光装置和装置制造方法
公开(公告)号：US20090279059A1
公开(公告)日：2009-11-12
申请号：US12219755
申请日：2008-07-28
申请人： Yosuke Shirata , Yoshiki Kida
发明人： Yosuke Shirata , Yoshiki Kida
IPC分类号： G03B27/52
CPC分类号： G03F7/70858 , G03F7/70341 , G03F7/707 , G03F7/7075 , G03F7/7085
摘要： An adjusting method that adjusts an immersion exposure apparatus that comprises a first holder, which holds a substrate, and a second holder, which holds the substrate before the substrate is held by the first holder, and that exposes the substrate, which is held by the first holder, through a liquid. The adjusting method comprises: holding a thermometer with the first holder; holding the thermometer with the second holder; and adjusting the temperature of at least one of the first holder and the second holder based on the detection result of the thermometer held by the first holder and the detection result of the thermometer held by the second holder.
摘要翻译：一种调整浸渍曝光装置的调整方法，该浸渍曝光装置包括保持基板的第一保持架和第二保持器，该第二保持器在基板被第一保持器保持之前保持基板，并且使基板保持第一个持有人，通过一个液体。调节方法包括：用第一保持器保持温度计; 用第二个支架拿住温度计; 并且基于由第一保持器保持的温度计的检测结果和由第二保持器保持的温度计的检测结果来调节第一保持器和第二保持器中的至少一个的温度。

4. 发明授权

US6141108A Position control method in exposure apparatus 失效
标题翻译：曝光装置中的位置控制方法
公开(公告)号：US6141108A
公开(公告)日：2000-10-31
申请号：US258146
申请日：1999-02-26
申请人： Yoshiki Kida , Masahiko Okumura
发明人： Yoshiki Kida , Masahiko Okumura
IPC分类号： G03F9/00 , G03F7/20 , H01L21/027 , G01N11/00
CPC分类号： G03F7/70691 , G03F9/7011 , G03F9/7015
摘要： A method provides a technique for exposing a pattern on a mask that is held by a mask stage onto a substrate. The method includes a first step of detecting a mark on the mask that is held at a first position by the mask stage and determining a corresponding position of the mask stage; a second step of detecting the mark on the mask that is held at a second position different from the first position by the mask stage and determining a corresponding position of the mask stage; a third step of determining a position of the mask relative to the mask stage in accordance with the detection results in the first and second steps; a fourth step of aligning the mask with the substrate; and a fifth step of exposing the pattern on the mask onto the substrate.
摘要翻译：一种方法提供了将由掩模台保持的掩模上的图案曝光到基板上的技术。该方法包括：第一步骤，通过掩模台检测保持在第一位置的掩模上的标记，并确定掩模台的对应位置; 第二步骤，通过掩模台检测保持在与第一位置不同的第二位置的掩模上的标记，并确定掩模台的对应位置; 第三步骤，根据第一和第二步骤中的检测结果确定掩模相对于掩模载物台的位置; 将掩模与衬底对准的第四步骤; 以及将掩模上的图案曝光到基板上的第五步骤。

5. 发明授权

US07714579B2 NMR probe 有权
标题翻译： NMR探针
公开(公告)号：US07714579B2
公开(公告)日：2010-05-11
申请号：US12129060
申请日：2008-05-29
申请人： Hiroto Suematsu , Yoshiki Kida , Yoshiaki Yamakoshi , Hiroshi Ikeda , Tetsuo Miyamoto , Ryoji Tanaka
发明人： Hiroto Suematsu , Yoshiki Kida , Yoshiaki Yamakoshi , Hiroshi Ikeda , Tetsuo Miyamoto , Ryoji Tanaka
IPC分类号： G01V3/00
CPC分类号： G01R33/34046 , G01R33/34061 , G01R33/34092 , G01R33/3635
摘要： An NMR probe permits measurements to be made with its inner coil without replacing the probe. The NMR probe has three coils disposed to surround a sample tube. An inner coil can resonate with the HF and LF. An intermediate coil can resonate with the HF and LF, and produces an RF magnetic field perpendicular to the RF field produced by the inner coil. An outermost coil can resonate at least at a lock frequency. The outermost coil produces an RF magnetic field which is perpendicular to the RF field produced by the intermediate coil but which is coincident in direction with the RF field produced by the inner coil.
摘要翻译： NMR探头允许使用其内部线圈进行测量，而无需更换探头。 NMR探针具有围绕样品管设置的三个线圈。内部线圈可以与HF和LF谐振。中间线圈可以与HF和LF共振，并产生垂直于由内线圈产生的RF场的RF磁场。最外面的线圈可以至少以锁定频率谐振。最外面的线圈产生垂直于由中间线圈产生的RF场的RF磁场，但是它与由内线圈产生的RF场方向一致。

6. 发明申请

US20090261829A1 NMR Probe 有权
标题翻译： NMR探针
公开(公告)号：US20090261829A1
公开(公告)日：2009-10-22
申请号：US12423210
申请日：2009-04-14
申请人： Hiroshi Ikeda , Yoshiki Kida , Hiroto Suematsu
发明人： Hiroshi Ikeda , Yoshiki Kida , Hiroto Suematsu
IPC分类号： G01R33/34
CPC分类号： G01R33/3635 , G01R33/34069 , G01R33/34092 , G01R33/3642
摘要： An NMR probe is offered which enables a 1H/19F compatibility mode having a sample coil, a hollow tubular body, and two rod electrodes disposed inside the tubular body substantially in a parallel relationship to each other. The tubular body is formed by a conductive wall at ground potential. An RF input-output portion corresponding to the resonant frequency of 1H nucleus is connected with the one end of the coil via a tuning and matching device. Another RF input-output port corresponding to the resonant frequency of 19F nucleus is connected with an end of the coil via another tuning and matching device.
摘要翻译：提供了一种NMR探针，其使得具有采样线圈，中空管状体的1H / 19F兼容性模式和布置在管状体内部的两个棒状电极基本上彼此平行。管体由地电位的导电壁形成。对应于1H核的谐振频率的RF输入输出部分经由调谐和匹配装置与线圈的一端连接。对应于19F核的谐振频率的另一个RF输入 - 输出端口通过另一个调谐和匹配设备与线圈的一端连接。

7. 发明申请

US20070252960A1 Exposure Apparatus, Exposure Method, and Device Producing Method 有权
标题翻译：曝光装置，曝光方法和装置制作方法
公开(公告)号：US20070252960A1
公开(公告)日：2007-11-01
申请号：US11660921
申请日：2005-12-09
申请人： Yoshiki Kida
发明人： Yoshiki Kida
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70925 , G03F7/2041 , G03F7/70341 , G03F7/7085 , G03F7/70916 , G03F7/70975
摘要： An exposure apparatus is provided with a measuring unit which measures at least one of property and components of a liquid in a state that a liquid immersion area is formed on an object different from a substrate P to be exposed. There is provided an exposure apparatus which can accurately perform exposure process and measurement process through the liquid by judging the state of the liquid in advance and by performing a procedure as appropriate.
摘要翻译：曝光装置设置有测量单元，该测量单元在与要暴露的基板P不同的物体上形成液浸区域的状态下测量液体的特性和分量中的至少一个。提供了一种曝光装置，其可以通过预先判断液体的状态并通过适当地执行过程，通过液体来精确地进行曝光处理和测量处理。

8. 发明授权

US09025126B2 Exposure apparatus adjusting method, exposure apparatus, and device fabricating method 有权
公开(公告)号：US09025126B2
公开(公告)日：2015-05-05
申请号：US12219755
申请日：2008-07-28
申请人： Yosuke Shirata , Yoshiki Kida
发明人： Yosuke Shirata , Yoshiki Kida
IPC分类号： G03F7/20
CPC分类号： G03F7/70858 , G03F7/70341 , G03F7/707 , G03F7/7075 , G03F7/7085
摘要： An adjusting method that adjusts an immersion exposure apparatus that comprises a first holder, which holds a substrate, and a second holder, which holds the substrate before the substrate is held by the first holder, and that exposes the substrate, which is held by the first holder, through a liquid. The adjusting method comprises: holding a thermometer with the first holder; holding the thermometer with the second holder; and adjusting the temperature of at least one of the first holder and the second holder based on the detection result of the thermometer held by the first holder and the detection result of the thermometer held by the second holder.

9. 发明授权

US08913224B2 Exposure apparatus, exposure method, and device producing method 有权
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US08913224B2
公开(公告)日：2014-12-16
申请号：US13137692
申请日：2011-09-02
申请人： Yoshiki Kida
发明人： Yoshiki Kida
IPC分类号： G03F7/20
CPC分类号： G03F7/70925 , G03F7/2041 , G03F7/70341 , G03F7/7085 , G03F7/70916 , G03F7/70975
摘要： An exposure apparatus EX is provided with a measuring unit 60 which measures at least one of property and components of a liquid LQ in a state that a liquid immersion area LR is formed on an object different from a substrate P to be exposed. There is provided an exposure apparatus which can accurately perform exposure process and measurement process through the liquid by judging the state of the liquid in advance and by performing a procedure as appropriate.
摘要翻译：曝光装置EX设置有测量单元60，该测量单元60在与要暴露的基板P不同的物体上形成液浸区域LR的状态下，测量液体LQ的特性和分量中的至少一个。提供了一种曝光装置，其可以通过预先判断液体的状态并通过适当地执行过程，通过液体来精确地进行曝光处理和测量处理。

10. 发明授权

US07872476B2 NMR probe 有权
标题翻译： NMR探针
公开(公告)号：US07872476B2
公开(公告)日：2011-01-18
申请号：US12423210
申请日：2009-04-14
申请人： Hiroshi Ikeda , Yoshiki Kida , Hiroto Suematsu
发明人： Hiroshi Ikeda , Yoshiki Kida , Hiroto Suematsu
IPC分类号： G01V3/00
CPC分类号： G01R33/3635 , G01R33/34069 , G01R33/34092 , G01R33/3642
摘要： An NMR probe is offered which enables a 1H/19F compatibility mode having a sample coil, a hollow tubular body, and two rod electrodes disposed inside the tubular body substantially in a parallel relationship to each other. The tubular body is formed by a conductive wall at ground potential. An RF input-output portion corresponding to the resonant frequency of 1H nucleus is connected with the one end of the coil via a tuning and matching device. Another RF input-output port corresponding to the resonant frequency of 19F nucleus is connected with an end of the coil via another tuning and matching device.
摘要翻译：提供了一种NMR探针，其使得具有采样线圈，中空管状体的1H / 19F兼容性模式和布置在管状体内部的两个棒电极基本上彼此平行。管体由地电位的导电壁形成。对应于1H核的谐振频率的RF输入输出部分经由调谐和匹配装置与线圈的一端连接。对应于19F核的谐振频率的另一个RF输入 - 输出端口通过另一个调谐和匹配设备与线圈的一端连接。

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