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    • 3. 发明授权
    • Information processing apparatus, system time synchronization method and computer readable medium
    • 信息处理装置,系统时间同步方法和计算机可读介质
    • US09104609B2
    • 2015-08-11
    • US13846090
    • 2013-03-18
    • Hiroki Arai
    • Hiroki Arai
    • G06F11/00G06F11/14G06F1/14G06F11/20
    • G06F11/1402G06F1/14G06F11/2038
    • The time in the chipset of backup resources is synchronized easily at the system time.An information processing apparatus including: an operational chipset which includes a first Real Time Clock (RTC); a backup chipset which includes a second RTC: a third RTC which times system time; a difference time calculation unit which calculates a difference time between a system time periodically notified of from the first RTC of the operational chipset and the system time which the third RTC times; a holding unit which holds the difference time; a calculation unit which calculates a temporary system time which is set to the second RTC of the backup chipset to which a chipset switching operated, based on the system time of the third RTC and the difference time at the time of the chipset switching; and a configuration unit which sets the temporary system time to the second RTC of the backup chipset.
    • 备份资源芯片组的时间在系统时间很容易同步。 一种信息处理设备,包括:操作芯片组,其包括第一实时时钟(RTC); 包括第二RTC的备用芯片组:第三个RTC,系统时间; 差分时间计算单元,计算从操作芯片组的第一RTC周期性地通知的系统时间与第三RTC时间的系统时间之间的差时间; 保持差时间的保持单元; 计算单元,其基于第三RTC的系统时间和芯片组切换时的差时间,计算设置为进行芯片组切换操作的备用芯片组的第二RTC的临时系统时间; 以及将临时系统时间设置为备用芯片组的第二RTC的配置单元。
    • 4. 发明申请
    • POLYARYLENE SULFIDE RESIN COMPOSITION
    • 聚亚烷基硫酸酯树脂组合物
    • US20130035440A1
    • 2013-02-07
    • US13641839
    • 2011-04-07
    • Raita NishikawaHiroki AraiKatsuhei Ohnishi
    • Raita NishikawaHiroki AraiKatsuhei Ohnishi
    • C08L81/04C08K7/14B29C45/00
    • C08L81/02B29C45/0001B29K2081/00C08K7/14C08L77/12
    • To provide a polyarylene sulfide resin composition which contains decreased amount of chlorine, which has a high fluidity and generates small flashes at the time of molding, which has an excellent heat resistance, which can resist heat-processing under the condition of a high temperature, which has moldability at a low mold temperature, a molded article of which has an extremely small change in surface hue before and after reflow. The resin composition is obtained by blending: 100 parts by weight of a polyarylene sulfide resin (A) containing 500 to 2,000 ppm of chlorine and having 10 to 200 Pa·s of melt viscosity, 10 to 100 parts by weight of a liquid crystalline polyester amide resin (B), and 5 to 250 parts by weight of glass fiber (C) containing 100 ppm or less of nitrogen, and having a total chlorine content of 950 ppm or less,
    • 本发明提供一种聚酰亚胺硫化物树脂组合物,该组合物在高温下能够耐热处理,具有流动性高,成型时产生小的闪光,具有优异的耐热性, 其在低模具温度下具有成型性,其成型制品在回流之前和之后具有非常小的表面色调变化。 树脂组合物通过以下方法获得:将100重量份含有500-2000ppm氯和10-200Pa·s熔体粘度的聚芳硫醚树脂(A),10至100重量份的液晶聚酯 酰胺树脂(B)和5〜250重量份含有100ppm以下的氮,总氯含量为950ppm以下的玻璃纤维(C)
    • 8. 发明申请
    • Reinforcing bar material coated with high adhesion anticorrosion film and method of producing the same
    • 涂覆有高附着力防腐蚀膜的钢筋材料及其制造方法
    • US20090022980A1
    • 2009-01-22
    • US11826470
    • 2007-07-16
    • Teruhiko SugimotoRikuta MurakamiMitsuru TakeuchiYasuhiro AraiHiroki AraiKaoru AraiYasuharu Kida
    • Teruhiko SugimotoRikuta MurakamiMitsuru TakeuchiYasuhiro AraiHiroki AraiKaoru AraiYasuharu Kida
    • B32B5/16B05D1/36
    • B05D7/14B05D1/02B05D5/00B05D5/02B05D7/54B05D2602/00E04C5/015E04C5/03Y10T428/254
    • The present invention provides a reinforcing bar material coated with a high adhesion anticorrosion film that enables to increase adhesion strength to concrete, which comprises forming two layers of anticorrosion films on a surface of a reinforcing bar material by means of spraying an epoxy powder coating material under a temperature condition where performance of the epoxy resin can be retained, so as to solve a pin hole problem that inevitably occurs in an anticorrosion film, and also to exhibit firm projections in a state coated with the epoxy resin on the second layer of anticorrosion film.The present invention comprises heating a reinforcing bar material, spraying and melt-adhering an epoxy powder coating material onto the reinforcing bar material while a temperature on a surface of the reinforcing bar material is between 200 and 250° C. so as to form a first anticorrosion film, and also, under this temperature condition, spraying and melt-adhering an epoxy powder coating material with acrylic resin beads having a particle diameter 2.5 to 3 times that of the epoxy resin powder mixed in on a surface of the first anticorrosion film in a molten state so as to form a second anticorrosion film, followed by cooling the reinforcing bar material coated with the first and second anticorrosion films to prepare the reinforcing bar material coated with a high adhesion anticorrosion film having countless projections formed by the second anticorrosion film.
    • 本发明提供一种涂覆有高粘合性防腐蚀膜的钢筋材料,其能够增加对混凝土的粘合强度,其包括在钢筋材料的表面上通过喷涂环氧粉末涂料来形成两层防腐蚀膜 可以保持环氧树脂的性能的温度条件,以解决在防腐蚀膜中不可避免地发生的针孔问题,并且在涂覆有环氧树脂的状态下在第二层防腐膜上显示出牢固的突起 。 本发明包括加热钢筋材料,将环氧粉末涂料喷涂和熔融粘附到钢筋材料上,同时钢筋材料表面的温度在200-250℃之间,以形成第一 并且在该温度条件下,将环氧粉末涂料与在第一防腐蚀膜的表面上混合的环氧树脂粉末的粒径为2.5〜3倍的丙烯酸树脂珠喷雾和熔融粘合 熔融状态以形成第二防腐蚀膜,然后冷却涂覆有第一和第二防腐蚀膜的钢筋材料,以制备涂覆有具有由第二防腐蚀膜形成的无数突起的高粘附性防腐蚀膜的钢筋材料。
    • 10. 发明授权
    • Method of forming fine pattern
    • 形成精细图案的方法
    • US06586163B1
    • 2003-07-01
    • US09587359
    • 2000-06-02
    • Ichiro OkabeHiroki Arai
    • Ichiro OkabeHiroki Arai
    • G03F700
    • G03F7/091G03F7/0045G03F7/16
    • There is described a method of forming a fine pattern aimed at depositing a silicon-nitride-based anti-reflection film which is stable even at high temperature and involves small internal stress. The method is also intended to preventing occurrence of a footing pattern (a rounded corner) in a boundary surface between a photoresist and a substrate at the time of formation of a chemically-amplified positive resist pattern on the anti-reflection film. The method includes the steps of forming a silicon-nitride-based film directly on a substrate or on a substrate by way of another layer; and forming a photoresist directly on the silicon-nitride-based film or on the silicon-nitride-based film by way of another layer. The silicon-nitride-based film is deposited while the temperature at which the substrate is to be situated is set so as to fall within the range of 400 to 700° C., through use of a plasma CVD system. The method further includes a step of depositing a silicon-oxide-based film immediately below the photoresist. The silicon-oxide-based film is deposited while the temperature at which the substrate is to be situated is set so as to fall within the range of 400 to 700° C., through use of a plasma CVD system.
    • 描述了一种形成精细图案的方法,其目的在于沉积即使在高温下也是稳定且涉及小的内应力的氮化硅基抗反射膜。 该方法还旨在防止在防反射膜上形成化学放大的正抗蚀剂图案时光致抗蚀剂和基板之间的边界表面中的基脚图案(圆角)的发生。 该方法包括以下步骤:通过另一层直接在衬底或衬底上形成氮化硅基膜; 以及通过另一层在氮化硅基膜或氮化硅基膜上直接形成光致抗蚀剂。 通过使用等离子体CVD系统,将基板的位置的温度设定为400〜700℃的范围,来沉积氮化硅基膜。 该方法还包括在光致抗蚀剂正下方沉积氧化硅基膜的步骤。 通过使用等离子体CVD系统,将基板的位置的温度设定为400〜700℃的范围内,沉积硅氧化物系膜。