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1. 发明授权

US5253626A Rotational speed control system for internal combustion engine 失效
标题翻译：内燃机转速控制系统
公开(公告)号：US5253626A
公开(公告)日：1993-10-19
申请号：US958558
申请日：1992-10-06
申请人： Yasukazu Hatano , Hidetoshi Suzuki , Satoshi Hitomi
发明人： Yasukazu Hatano , Hidetoshi Suzuki , Satoshi Hitomi
IPC分类号： F02D31/00 , F02D41/16 , F02D41/14
CPC分类号： F02D41/16 , F02D31/008
摘要： A rotational speed control system for an internal combustion engine capable of preventing a dead time or dead section from occurring in controlling of a rotational speed of the engine. An integrating circuit is controlled by means of an output of a comparator for comparing a rotational speed detection signal with a target rotational speed setting signal, to thereby obtain an integral voltage which falls and rises when the rotational speed detection signal is above and below the target rotational speed setting signal, respectively. Comparison of the integral voltage with a sawtooth signal voltage leads to a pulse signal subjected to pulse width modulation. The pulse signal is fed to an actuator driving circuit to carry out on-off controlling of a drive current for the actuator. Connection of voltage limiting circuits to the integrating circuit causes a variation of the integral voltage to be limited within a range of amplitude of the integral voltage, to thereby eliminate the dead time or dead section.
摘要翻译：一种用于内燃机的转速控制系统，其能够防止在控制发动机的转速时发生死区时间或死区。通过比较器的输出来控制积分电路，用于将转速检测信号与目标转速设定信号进行比较，从而获得当转速检测信号在目标上方和下方时下降的积分电压转速设定信号。积分电压与锯齿波信号电压的比较导致经脉冲宽度调制的脉冲信号。将脉冲信号馈送到致动器驱动电路，以对致动器的驱动电流进行开关控制。将电压限制电路连接到积分电路会使积分电压的变化被限制在积分电压幅度的范围内，从而消除死区时间或死区。

2. 发明授权

US08601978B2 Substrate processing apparatus, and magnetic recording medium manufacturing method 有权
标题翻译：基板处理装置和磁记录介质的制造方法
公开(公告)号：US08601978B2
公开(公告)日：2013-12-10
申请号：US12502328
申请日：2009-07-14
申请人： Kazuto Yamanaka , Masahiro Shibamoto , Ayumu Miyoshi , Satoshi Hitomi , David Djulianto Djayaprawira
发明人： Kazuto Yamanaka , Masahiro Shibamoto , Ayumu Miyoshi , Satoshi Hitomi , David Djulianto Djayaprawira
IPC分类号： C23C16/00
CPC分类号： G11B5/8404
摘要： The present invention provides a substrate processing apparatus capable of suppressing mutual contamination and/or damage of the insides of ion beam generators arranged opposite each other via a substrate, and a magnetic recording medium manufacturing method. A substrate processing apparatus according to an embodiment of the present invention includes a first ion beam generator that applies an ion beam to one surface to be processed of a substrate, and a second ion beam generator that applies an ion beam to another surface to be processed, which are arranged opposite each other via the substrate, and a first grid in the first ion beam generator, and a second grid in the second ion beam generator are configured so as to be asymmetrical to each other.
摘要翻译：本发明提供一种基板处理装置，其能够抑制经由基板彼此相对布置的离子束发生器的内部的相互污染和/或损坏，以及磁记录介质制造方法。根据本发明实施例的基板处理装置包括：第一离子束发生器，其将离子束施加到待处理的基板的一个表面;以及第二离子束发生器，其将离子束施加到待处理的另一表面，其经由衬底彼此相对布置，并且第一离子束发生器中的第一栅极和第二离子束发生器中的第二栅极被配置为彼此不对称。

3. 发明申请

US20090056878A1 TRANSFER APPARATUS 有权
标题翻译：传送装置
公开(公告)号：US20090056878A1
公开(公告)日：2009-03-05
申请号：US12194951
申请日：2008-08-20
申请人： Naoyuki Nozawa , Hiroshi Sone , Satoshi Hitomi , Yoshiro Hasegawa
发明人： Naoyuki Nozawa , Hiroshi Sone , Satoshi Hitomi , Yoshiro Hasegawa
IPC分类号： H01L21/306
CPC分类号： H01L21/67748 , H01L21/67173 , H01L21/67346 , H01L21/67709 , H01L21/67712 , H01L21/6776 , H01L21/68707 , H01L21/68764
摘要： A transfer apparatus includes a first magnetic member placed in a carrier, and a second magnetic member placed in a carrier supporting unit to oppose the first magnetic member from a position below the first magnetic member in the vertical direction, and having the same polarity as that of the first magnetic member. The repulsive force generated between the first and second magnetic members vertically pulls up the carrier, thereby reducing the weight of the carrier supported by the carrier supporting unit.
摘要翻译：传送装置包括放置在载体中的第一磁性构件和放置在载体支撑单元中的第二磁性构件，以与垂直方向上的第一磁性构件下方的位置相对，并且具有与第一磁性构件相同的极性的第一磁性构件。在第一和第二磁性构件之间产生的排斥力垂直地拉起载体，从而减小由载体支撑单元支撑的载体的重量。

4. 发明授权

US07770714B2 Transfer apparatus 有权
标题翻译：转运设备
公开(公告)号：US07770714B2
公开(公告)日：2010-08-10
申请号：US12194951
申请日：2008-08-20
申请人： Naoyuki Nozawa , Hiroshi Sone , Satoshi Hitomi , Yoshiro Hasegawa
发明人： Naoyuki Nozawa , Hiroshi Sone , Satoshi Hitomi , Yoshiro Hasegawa
IPC分类号： B65G35/00
CPC分类号： H01L21/67748 , H01L21/67173 , H01L21/67346 , H01L21/67709 , H01L21/67712 , H01L21/6776 , H01L21/68707 , H01L21/68764
摘要： A transfer apparatus includes a first magnetic member placed in a carrier, and a second magnetic member placed in a carrier supporting unit to oppose the first magnetic member from a position below the first magnetic member in the vertical direction, and having the same polarity as that of the first magnetic member. The repulsive force generated between the first and second magnetic members vertically pushes up the carrier, thereby reducing the weight of the carrier supported by the carrier supporting unit.
摘要翻译：传送装置包括放置在载体中的第一磁性构件和放置在载体支撑单元中的第二磁性构件，以与垂直方向上的第一磁性构件下方的位置相对，并且具有与第一磁性构件相同的极性的第一磁性构件。在第一和第二磁性构件之间产生的排斥力垂直地向上推动载体，从而减小由载体支撑单元支撑的载体的重量。

5. 发明申请

US20100028529A1 SUBSTRATE PROCESSING APPARATUS, AND MAGNETIC RECORDING MEDIUM MANUFACTURING METHOD 有权
标题翻译：基板加工设备和磁记录介质制造方法
公开(公告)号：US20100028529A1
公开(公告)日：2010-02-04
申请号：US12502328
申请日：2009-07-14
申请人： Kazuto Yamanaka , Masahiro Shibamoto , Ayumu Miyoshi , Satoshi Hitomi , David Djulianto Djayaprawira
发明人： Kazuto Yamanaka , Masahiro Shibamoto , Ayumu Miyoshi , Satoshi Hitomi , David Djulianto Djayaprawira
IPC分类号： B05D3/06 , C23C16/452
CPC分类号： G11B5/8404
摘要： The present invention provides a substrate processing apparatus capable of suppressing mutual contamination and/or damage of the insides of ion beam generators arranged opposite each other via a substrate, and a magnetic recording medium manufacturing method. A substrate processing apparatus according to an embodiment of the present invention includes a first ion beam generator that applies an ion beam to one surface to be processed of a substrate, and a second ion beam generator that applies an ion beam to another surface to be processed, which are arranged opposite each other via the substrate, and a first grid in the first ion beam generator, and a second grid in the second ion beam generator are configured so as to be asymmetrical to each other.
摘要翻译：本发明提供一种基板处理装置，其能够抑制经由基板彼此相对布置的离子束发生器的内部的相互污染和/或损坏，以及磁记录介质制造方法。根据本发明的实施例的基板处理装置包括：将离子束施加到要被处理的基板的一个表面的第一离子束发生器，以及将离子束施加到待处理的另一表面的第二离子束发生器，其经由衬底彼此相对布置，并且第一离子束发生器中的第一栅极和第二离子束发生器中的第二栅极被配置为彼此不对称。

6. 发明授权

US08281740B2 Substrate processing apparatus, and magnetic recording medium manufacturing method 有权
标题翻译：基板处理装置和磁记录介质的制造方法
公开(公告)号：US08281740B2
公开(公告)日：2012-10-09
申请号：US12502344
申请日：2009-07-14
申请人： Kazuto Yamanaka , Masahiro Shibamoto , Ayumu Miyoshi , Satoshi Hitomi , David Djulianto Djayaprawira
发明人： Kazuto Yamanaka , Masahiro Shibamoto , Ayumu Miyoshi , Satoshi Hitomi , David Djulianto Djayaprawira
IPC分类号： C23C16/00
CPC分类号： G11B5/8404 , H01J27/024 , H01J37/04 , H01J37/09 , H01J37/3053 , H01J37/32422 , H01J2237/022 , H01J2237/0453 , H01J2237/0822 , H01J2237/0825
摘要： The present invention provides a substrate processing apparatus capable of suppressing mutual contamination and/or damage of the insides of ion beam generators arranged opposite each other via a substrate, and a magnetic recording medium manufacturing method. A substrate processing apparatus according to an embodiment of the present invention includes a first ion beam generator that applies an ion beam to one surface to be processed of a substrate W, and a second ion beam generator that applies an ion beam to another surface to be processed, which are arranged opposite each other via the substrate W, and an area of a first grid in the first ion beam generator, and an area of a second grid in the second ion beam generator, each area corresponding to an opening of the substrate W, are occluded.
摘要翻译：本发明提供一种基板处理装置，其能够抑制经由基板彼此相对布置的离子束发生器的内部的相互污染和/或损坏，以及磁记录介质制造方法。根据本发明的实施例的基板处理装置包括将离子束施加到待加工基板W的一个表面的第一离子束发生器和将另一个表面施加离子束的第二离子束发生器经由基板W彼此相对布置的第一离子束发生器中的第一格栅的区域和第二离子束发生器中的第二格栅的区域，每个区域对应于基板的开口 W，被遮挡。

7. 发明申请

US20100025363A1 SUBSTRATE PROCESSING APPARATUS, AND MAGNETIC RECORDING MEDIUM MANUFACTURING METHOD 有权
标题翻译：基板加工设备和磁记录介质制造方法
公开(公告)号：US20100025363A1
公开(公告)日：2010-02-04
申请号：US12502344
申请日：2009-07-14
申请人： Kazuto Yamanaka , Masahiro Shibamoto , Ayumu Miyoshi , Satoshi Hitomi , David Djulianto Djayaprawira
发明人： Kazuto Yamanaka , Masahiro Shibamoto , Ayumu Miyoshi , Satoshi Hitomi , David Djulianto Djayaprawira
IPC分类号： C23F1/00 , C23F1/08
CPC分类号： G11B5/8404 , H01J27/024 , H01J37/04 , H01J37/09 , H01J37/3053 , H01J37/32422 , H01J2237/022 , H01J2237/0453 , H01J2237/0822 , H01J2237/0825
摘要： The present invention provides a substrate processing apparatus capable of suppressing mutual contamination and/or damage of the insides of ion beam generators arranged opposite each other via a substrate, and a magnetic recording medium manufacturing method. A substrate processing apparatus according to an embodiment of the present invention includes a first ion beam generator that applies an ion beam to one surface to be processed of a substrate W, and a second ion beam generator that applies an ion beam to another surface to be processed, which are arranged opposite each other via the substrate W, and an area of a first grid in the first ion beam generator, and an area of a second grid in the second ion beam generator, each area corresponding to an opening of the substrate W, are occluded.
摘要翻译：本发明提供一种基板处理装置，其能够抑制经由基板彼此相对布置的离子束发生器的内部的相互污染和/或损坏，以及磁记录介质制造方法。根据本发明的实施例的基板处理装置包括将离子束施加到待加工基板W的一个表面的第一离子束发生器和将另一个表面施加离子束的第二离子束发生器经由基板W彼此相对布置的第一离子束发生器中的第一格栅的区域和第二离子束发生器中的第二格栅的区域，每个区域对应于基板的开口 W，被遮挡。

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