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1. 发明申请

US20080090087A1 Coating Material For Platinum Material, Platinum Material Coated With Such Coating Material, And Glass Manufacturing Apparatus 审中-公开
标题翻译：铂材料涂层材料，涂有这种涂料的铂材料和玻璃制造设备
公开(公告)号：US20080090087A1
公开(公告)日：2008-04-17
申请号：US11662503
申请日：2005-09-12
申请人： Toru Shoji , Mitsuo Kato , Mikio Hiyama , Tatsuya Takaya , Takashi Aitoku
发明人： Toru Shoji , Mitsuo Kato , Mikio Hiyama , Tatsuya Takaya , Takashi Aitoku
IPC分类号： C23C26/00
CPC分类号： C23C24/00 , C03B5/1672
摘要： Disclosed is a material for coating the surface of a platinum material made of platinum or an platinum alloy. Specifically disclosed is a coating material for platinum materials which contains a fire-resistant material component including alumina and silica, and a glass component.
摘要翻译：公开了一种用于涂覆由铂或铂合金制成的铂材料的表面的材料。具体公开了一种含铂材料的涂料，它含有包含氧化铝和二氧化硅的耐火材料组分和玻璃组分。

2. 发明申请

US20090273879A1 Electrostatic Attraction Apparatus for Glass Substrate and Method of Attracting and Releasing the Same 有权
标题翻译：玻璃基板静电吸引装置及其吸收和释放方法
公开(公告)号：US20090273879A1
公开(公告)日：2009-11-05
申请号：US12225167
申请日：2006-12-26
申请人： Mitsuo Kato , Shigenari Horie , Tatsufumi Aoi , Masaki Kawano , Yoshitaka Tsumoto , Hiroaki Ogasawara , Toshiro Kobayashi
发明人： Mitsuo Kato , Shigenari Horie , Tatsufumi Aoi , Masaki Kawano , Yoshitaka Tsumoto , Hiroaki Ogasawara , Toshiro Kobayashi
IPC分类号： H02N13/00
CPC分类号： B65G49/061 , H01L21/6831 , H02N13/00
摘要： An object is providing an electrostatic attraction apparatus and an attracting/releasing method capable of reliably attracting and quickly releasing a glass substrate. An attraction force for attracting a glass substrate is obtained according to the physical properties of the glass substrate. In addition to obtaining an attraction voltage (Vc(t)) required for obtaining the attraction force, a holding voltage (Vh(t)) for holding an attraction state and a release voltage (Vr(t)) for releasing the glass substrate are also obtained (S1 to S7) Attraction time period (tc) is actually measured and if this measured time is different from a preset attraction time (t1), the holding voltage (Vh(t)) and the release voltage (Vr(t)) are recalculated according to the actually measured attraction time period (tc) (S8 to S11).
摘要翻译：目的在于提供能够可靠地吸引并快速地释放玻璃基板的静电吸引装置和吸引/释放方法。根据玻璃基板的物理性质，得到吸引玻璃基板的吸引力。除了获得获得吸引力所需的吸引电压（Vc（t））之外，用于保持吸引状态的保持电压（Vh（t））和用于释放玻璃基板的释放电压（Vr（t））（S1〜S7）实际测量吸引时间（tc），如果该测定时间与预设吸引时间（t1）不同，则保持电压（Vh（t））和释放电压（Vr（t））根据实际测量的吸引时间周期（tc）重新计算（S8〜S11）。

3. 发明授权

US4649860A Vacuum evaporation coating equipment 失效
标题翻译：真空蒸镀设备
公开(公告)号：US4649860A
公开(公告)日：1987-03-17
申请号：US713743
申请日：1985-03-19
申请人： Heisaburo Furukawa , Kanji Wake , Yoshio Shimozato , Kenichi Yanagi , Mitsuo Kato , Tetsuyoshi Wada , Norio Tsukiji , Takuya Aiko , Toshiharu Kittaka , Yasuji Nakanishi
发明人： Heisaburo Furukawa , Kanji Wake , Yoshio Shimozato , Kenichi Yanagi , Mitsuo Kato , Tetsuyoshi Wada , Norio Tsukiji , Takuya Aiko , Toshiharu Kittaka , Yasuji Nakanishi
IPC分类号： C23C14/26 , C23C14/56 , C23C13/08
CPC分类号： C23C14/562
摘要： A vacuum evaporation equipment for continuous vacuum evaporation of a metal onto a band or strip of product including at least one vacuum sealing station, provision of ducts that are disposed surrounding the band product and extending from the point of vapor deposition where the band product is subjected to a vacuum evaporation process an a chamber held at a reduced pressure or vacuum state to the extent that substantially no reevaporation of once deposited metal is effectively prevented from occurring. The ducts are adapted to be heated to a temperature substantially higher than the temperature of the steel band product. In addition, there is provided at least one vacuum sealing station with rolls rotatably mounted in the interior of a casing and a complementary sealing bar mounted in a complementary engagement relationship with the rolls having a close gap therebetween. A side panel is mounted self-adjustably in sliding motion in the longitudinal direction along the axes of the rolls on the opposite ends thereof, and heaters are provided to heat the rolls, sealing bar and side panel, respectively.
摘要翻译：一种用于将金属连续真空蒸发到包括至少一个真空密封站的产品带或条带上的真空蒸发设备，提供围绕带产品设置并从带状产品所受到的气相沉积点延伸的管道在真空蒸发过程中，保持在减压或真空状态的室被有效地防止发生一次沉积的金属的基本上不再蒸发。管道适于被加热到显着高于钢带产品的温度的温度。此外，提供了至少一个具有可旋转地安装在壳体内部的辊的真空密封站和与辊之间具有紧密间隙的互补啮合关系安装的互补密封条。侧板在其相对端沿辊的轴线沿纵向方向自由调节地安装，并且分别设置加热器以加热辊，密封条和侧板。

4. 发明授权

US4612206A Method of controlling deposition amount distribution in a vacuum deposition plating 失效
标题翻译：控制真空沉积电镀中沉积量分布的方法
公开(公告)号：US4612206A
公开(公告)日：1986-09-16
申请号：US740553
申请日：1985-06-03
申请人： Yoshio Shimozato , Tetsuyoshi Wada , Kenichi Yanagi , Mitsuo Kato , Heizaburo Furukawa , Kanji Wake , Arihiko Morita , Norio Tsukiji , Takuya Aiko , Toshiharu Kittaka , Yasuji Nakanishi
发明人： Yoshio Shimozato , Tetsuyoshi Wada , Kenichi Yanagi , Mitsuo Kato , Heizaburo Furukawa , Kanji Wake , Arihiko Morita , Norio Tsukiji , Takuya Aiko , Toshiharu Kittaka , Yasuji Nakanishi
IPC分类号： C23C14/54 , C23C14/24 , C23C14/56 , C23C16/00 , C23C16/06
CPC分类号： C23C14/24 , C23C14/562
摘要： In a continuous vacuum deposition plating of a metal strip, thinner coating at the edges can be prevented by maintaining the pressure of the deposition chamber in which an evaporation chamber is housed at a properly higher level than the pressure of the evaporation chamber.
摘要翻译：在金属条的连续真空沉积电镀中，可以通过将蒸发室所在的沉积室的压力保持在比蒸发室的压力更高的水平来防止边缘处的较薄的涂层。

5. 发明授权

US4601794A Method and apparatus for continuous electroplating of alloys 失效
标题翻译：用于连续电镀合金的方法和装置
公开(公告)号：US4601794A
公开(公告)日：1986-07-22
申请号：US647738
申请日：1984-09-06
申请人： Tetsuaki Tsuda , Kazuo Asano , Atsuyoshi Shibuya , Minoru Nishihara , Kenichi Yanagi , Mitsuo Kato , Katsuhiko Yamada , Teijiro Fujisaka
发明人： Tetsuaki Tsuda , Kazuo Asano , Atsuyoshi Shibuya , Minoru Nishihara , Kenichi Yanagi , Mitsuo Kato , Katsuhiko Yamada , Teijiro Fujisaka
IPC分类号： C25D21/10 , C25D5/08 , C25D7/06 , C25D17/00 , C25D5/04
CPC分类号： C25D7/0614 , C25D5/08
摘要： A method and apparatus of continuous electroplating of a strip with an alloy by passing the strip through a plating bath of the immersion type in both down-pass and up-pass with an anode being positioned in each pass so as to face at least one side of the strip are disclosed. Said anode is an insoluble anode which is spaced from the strip by a distance of about 10-50 mm, and the plating solution is blown into the gap between said anode and said strip countercurrently with respect to the movement of said strip.
摘要翻译：一种用合金连续电镀条带的方法和装置，该方法和装置是通过将条带浸入浸入式电镀槽中的同时向下通过和向上通过，阳极定位在每个通道中，以便面对至少一个侧面的条带。所述阳极是不溶性阳极，其与条隔开约10-50mm的距离，并且电镀溶液相对于所述带的移动逆流地吹入所述阳极和所述带之间的间隙中。

6. 发明授权

US4587134A Method of rapidly changing deposition amount in a continuous vacuum deposition process 失效
标题翻译：在连续真空沉积工艺中快速改变沉积量的方法
公开(公告)号：US4587134A
公开(公告)日：1986-05-06
申请号：US735442
申请日：1985-05-17
申请人： Yoshio Shimozato , Tetsuyoshi Wada , Kenichi Yanagi , Mitsuo Kato , Heizaburo Furukawa , Kanji Wake , Arihiko Morita , Norio Tsukiji , Takuya Aiko , Toshiharu Kittaka , Yasuji Nakanishi
发明人： Yoshio Shimozato , Tetsuyoshi Wada , Kenichi Yanagi , Mitsuo Kato , Heizaburo Furukawa , Kanji Wake , Arihiko Morita , Norio Tsukiji , Takuya Aiko , Toshiharu Kittaka , Yasuji Nakanishi
IPC分类号： C23C14/54 , C23C14/24 , C23C14/26 , C23C14/56
CPC分类号： C23C14/243 , C23C14/24 , C23C14/562
摘要： In the continuous vapor deposition coating of a metal strip, the coating amount can be rapidly changed by keeping the vapor flow at acoustic velocity and changing the cross-sectional area of the vapor path.
摘要翻译：在金属带的连续气相沉积涂层中，通过以蒸气流速保持声速并改变蒸气路径的横截面积，可以快速地改变涂布量。

7. 发明申请

US20090169720A1 VACUUM VAPOR DESPOSITION APPARATUS 审中-公开
标题翻译：真空蒸气沉降装置
公开(公告)号：US20090169720A1
公开(公告)日：2009-07-02
申请号：US12396988
申请日：2009-03-03
申请人： Keiichi SATO , Toshiro Kobayashi , Mitsuo Kato , Susumu Kamikawa , Kouzuo Wada
发明人： Keiichi SATO , Toshiro Kobayashi , Mitsuo Kato , Susumu Kamikawa , Kouzuo Wada
IPC分类号： C23C16/52
CPC分类号： C23C14/243 , C23C14/543
摘要： A crucible is a monolithic structure extending over an entire area of a vaporizing chamber and has at least one slit groove provided in the upper surface thereof. The at least one slit groove has a length from one end of the upper surface of the crucible to other end thereof. The at least one slit groove is used as a portion for containing the evaporation material (dopant material or the like). Alternatively, a crucible is a monolithic structure extending over the entire area of the vaporizing chamber and has a plurality of holes provided in the upper surface thereof. The holes are used as portions for containing the evaporation material. Further, the crucible is divided into a plurality of regions, and individual electric heaters are provided under the lower surface of the crucible for the respective regions, whereby temperature can be individually controlled for the respective regions by the electric heaters.
摘要翻译：坩埚是在蒸发室的整个区域上延伸的整体结构，并且在其上表面中具有至少一个狭缝槽。所述至少一个狭缝槽具有从所述坩埚的上表面的一端到其另一端的长度。使用至少一个狭缝槽作为容纳蒸发材料（掺杂材料等）的部分。或者，坩埚是在蒸发室的整个区域上延伸的整体结构，并且在其上表面中设置有多个孔。这些孔用作容纳蒸发材料的部分。此外，坩埚被分成多个区域，并且在各个区域的坩埚的下表面之下设置单独的电加热器，由此可以通过电加热器对各个区域单独地控制温度。

8. 发明授权

US5382871A Color selecting structure for a cathode-ray tube 失效
标题翻译：阴极射线管的选色结构
公开(公告)号：US5382871A
公开(公告)日：1995-01-17
申请号：US234629
申请日：1994-04-28
申请人： Hiroko Funahashi , Mitsuo Kato , Hidemi Miyamura , Jun Yamazaki
发明人： Hiroko Funahashi , Mitsuo Kato , Hidemi Miyamura , Jun Yamazaki
IPC分类号： H01J29/07 , H01J29/80
CPC分类号： H01J29/07 , H01J2229/0744 , H01J2229/0761
摘要： A color selecting structure for a TRINITRON cathode-ray tube, in which color phosphor stripes are provided and a single electron gun emits three beams, capable of minimizing vertical fringes that deteriorate the quality of a picture displayed on the screen and of attenuating the vibration of a FAG (framing aperture grille plate), includes a thin plate having a plurality of tape-shaped grid (2a) elements and apertures (2a), and fine wires (3) extended across the surface of the aperture grille plate so as to apply a pressure in the range of 6.73.times.10.sup.-6 lbf., 2.24.times.10.sup.-5 lbf. to each grid element (2a).
摘要翻译：一种用于TRINITRON阴极射线管的颜色选择结构，其中设置有彩色荧光体条纹，并且单个电子枪发射三束光束，其能够使垂直条纹最小化，从而使屏幕上显示的图像的质量劣化，并且衰减振动 FAG（框架孔格栅板）包括具有多个带状栅格（2a）元件和孔（2a）的薄板和跨过格栅板的表面延伸的细线（3），以便施加在6.73×10-6 lbf。，2.24×10-5 lbf范围内的压力。到每个栅格元件（2a）。

9. 发明授权

US5354995A Substrate detecting device for detecting the presence of a transparent and/or an opaque substrate by output of judgement means 失效
标题翻译：基板检测装置，用于通过判断装置的输出来检测透明和/或不透明基板的存在
公开(公告)号：US5354995A
公开(公告)日：1994-10-11
申请号：US109430
申请日：1993-08-20
申请人： Shunetsu Endo , Mitsuo Kato , Masato Asakawa
发明人： Shunetsu Endo , Mitsuo Kato , Masato Asakawa
IPC分类号： G01V8/12 , G01N21/55 , G01N21/59 , G06M7/00 , H01L21/00 , H01L21/67 , H01L31/12 , G01N21/86
CPC分类号： H01L21/67259 , G01N21/55 , G01N21/59
摘要： A device for detecting a semiconductor wafer in a non-contact manner irrespective of transparency or opacity thereof. At positions corresponding to a plurality of wafers loaded on a carrier, a plurality of light emitting/receiving sensors and a plurality of light receiving sensors are correspondingly provided in pairs in such a manner that their respective light emitting/receiving surfaces and their respective light receiving surface in pairs confront each other. The light emitting/receiving sensors and light receiving sensors are alternately arranged in two rows lengthwise on a sensor support board. In the case of a transparent wafer, a light sent out from a light emitting section of the light emitting/receiving sensor strikes on and is reflected by the surface of the wafer. The thus reflected light is then detected by a light receiving section of the same light emitting/receiving sensor. In the presence of an opaque wafer, a light sent out from the light emitting/receiving sensor is not permitted to reach the confronting light receiving sensor. Conversely, in the absence of the opaque wafer, the light reaches the light receiving sensor for detection. On the other hand, there is provided a judgment section switchably inputting one of a light reception signal generated at the light receiving section of the light emitting/receiving sensor and a light reception signal generated at the light receiving section of the light receiving sensor.
摘要翻译：用于以非接触方式检测半导体晶片的装置，而不管其透明度或不透明度如何。在与载置在载体上的多个晶片相对应的位置，成对地设置有多个发光/接收传感器和多个光接收传感器，使得它们各自的发光/接收表面及其各自的光接收表面互相对立。发光/接收传感器和光接收传感器在传感器支撑板上纵向交替布置成两行。在透明晶片的情况下，从发光/接收传感器的发光部分发出的光线撞击并被晶片的表面反射。然后由相同的发光/接收传感器的光接收部检测到这样反射的光。在不透明晶片的存在下，从发光/接收传感器发出的光不允许到达面对的光接收传感器。相反，在不存在不透明晶片的情况下，光到达用于检测的光接收传感器。另一方面，提供了一种可切换地输入在发光/接收传感器的光接收部分处产生的光接收信号和在光接收传感器的光接收部分处产生的光接收信号之一的判断部分。

10. 发明授权

US5288386A Sputtering apparatus and an ion source 失效
标题翻译：溅射装置和离子源
公开(公告)号：US5288386A
公开(公告)日：1994-02-22
申请号：US913927
申请日：1992-07-17
申请人： Kenichi Yanagi , Mitsuo Kato , Kazuya Tsurusaki , Toshio Taguchi , Kenji Atarashiya , Tadashi Rokkaku , Ichiro Yamashita
发明人： Kenichi Yanagi , Mitsuo Kato , Kazuya Tsurusaki , Toshio Taguchi , Kenji Atarashiya , Tadashi Rokkaku , Ichiro Yamashita
IPC分类号： H01J27/08 , H01J27/18 , H01J37/08 , H01J37/317 , C23C14/35
CPC分类号： H01J27/08 , H01J27/18 , H01J37/08 , H01J37/3178 , H01J2237/0822
摘要： A sputtering apparatus including two electrodes, a sputtering target disposed on one of the electrodes, and a gas supply for supplying a discharge gas in a vacuum to produce an electric discharge between the two electrodes and whereby particles sputtered from the target due to impact thereon of ions produced by the discharge, are deposited on a substrate. The target disposed on one electrode is formed into an elongated band and the other electrode is disposed so as to enclose the target. The other electrode is also provided with a magnet for producing a magnetic field thereon, and further includes a narrow elongated slot which defines a narrow sputter particle outlet. The narrow sputter particle outlet permits a pressure to exist near the electrical discharge which is higher than the pressure near the substrate. According to a preferred embodiment, the sputtering apparatus has an ion source combined integrally therewith.
摘要翻译：一种溅射装置，包括两个电极，设置在一个电极上的溅射靶，以及用于在真空中供应放电气体以在两个电极之间产生放电的气体源，由此由于其上的冲击而从靶溅射的颗粒通过放电产生的离子沉积在基底上。设置在一个电极上的靶被形成为细长带，并且另一个电极被设置成包围靶。另一个电极还设置有用于在其上产生磁场的磁体，并且还包括限定窄的溅射颗粒出口的窄的细长槽。窄的溅射粒子出口允许在高于衬底附近的压力的放电附近存在压力。根据优选实施例，溅射装置具有与其一体地组合的离子源。

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