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1. 发明申请

US20050285035A1 Scanning electron microscope and CD measurement calibration standard specimen 有权
标题翻译：扫描电子显微镜和CD测量校准标准样品
公开(公告)号：US20050285035A1
公开(公告)日：2005-12-29
申请号：US11165223
申请日：2005-06-24
申请人： Takeshi Mizuno , Hiroki Kawada
发明人： Takeshi Mizuno , Hiroki Kawada
IPC分类号： G01N23/00 , H01L23/544
CPC分类号： H01L22/34 , H01L2924/0002 , H01L2924/00
摘要： A calibration standard specimen is provided to have formed therein calibrating patterns of a lattice shape discontinuously arrayed, and particular alignment patterns respectively disposed near the calibrating patterns so that the positioning of the specimen can be made to match the calibrating patterns to the measurement points.
摘要翻译：提供校准标准样品以在其中形成不连续排列的格子形状的校准图案，以及分别设置在校准图案附近的特定对准图案，使得可以使样本的定位使校准图案与测量点相匹配。

2. 发明授权

US07420168B2 Scanning electron microscope and CD measurement calibration standard specimen 有权
标题翻译：扫描电子显微镜和CD测量校准标准样品
公开(公告)号：US07420168B2
公开(公告)日：2008-09-02
申请号：US11902559
申请日：2007-09-24
申请人： Takeshi Mizuno , Hiroki Kawada
发明人： Takeshi Mizuno , Hiroki Kawada
IPC分类号： H01J37/304
CPC分类号： H01L22/34 , H01L2924/0002 , H01L2924/00
摘要： A calibration standard specimen is provided to have formed therein calibrating patterns of a lattice shape discontinuously arrayed, and particular alignment patterns respectively disposed near the calibrating patterns so that the positioning of the specimen can be made to match the calibrating patterns to the measurement points.
摘要翻译：提供校准标准样品以在其中形成不连续排列的格子形状的校准图案，以及分别设置在校准图案附近的特定对准图案，使得可以使样本的定位使校准图案与测量点相匹配。

3. 发明授权

US07361898B2 Scanning electron microscope and CD measurement calibration standard specimen 有权
公开(公告)号：US07361898B2
公开(公告)日：2008-04-22
申请号：US11165223
申请日：2005-06-24
申请人： Takeshi Mizuno , Hiroki Kawada
发明人： Takeshi Mizuno , Hiroki Kawada
IPC分类号： H01J37/304
CPC分类号： H01L22/34 , H01L2924/0002 , H01L2924/00
摘要： A calibration standard specimen is provided to have formed therein calibrating patterns of a lattice shape discontinuously arrayed, and particular alignment patterns respectively disposed near the calibrating patterns so that the positioning of the specimen can be made to match the calibrating patterns to the measurement points.

4. 发明授权

US08399832B2 Scanning electron microscope and CD measurement calibration standard specimen 有权
标题翻译：扫描电子显微镜和CD测量校准标准样品
公开(公告)号：US08399832B2
公开(公告)日：2013-03-19
申请号：US12216136
申请日：2008-06-30
申请人： Takeshi Mizuno , Hiroki Kawada
发明人： Takeshi Mizuno , Hiroki Kawada
IPC分类号： G01N23/04
CPC分类号： H01L22/34 , H01L2924/0002 , H01L2924/00
摘要： A calibration standard specimen is provided to have formed therein calibrating patterns of a lattice shape discontinuously arrayed, and particular alignment patterns respectively disposed near the calibrating patterns so that the positioning of the specimen can be made to match the calibrating patterns to the measurement points.
摘要翻译：提供校准标准样品以在其中形成不连续排列的格子形状的校准图案，以及分别设置在校准图案附近的特定对准图案，使得可以使样本的定位使校准图案与测量点相匹配。

5. 发明申请

US20080272297A1 Scanning electron microscope and CD measurement calibration standard specimen 有权
公开(公告)号：US20080272297A1
公开(公告)日：2008-11-06
申请号：US12216136
申请日：2008-06-30
申请人： Takeshi Mizuno , Hiroki Kawada
发明人： Takeshi Mizuno , Hiroki Kawada
IPC分类号： G01N23/04
CPC分类号： H01L22/34 , H01L2924/0002 , H01L2924/00
摘要： A calibration standard specimen is provided to have formed therein calibrating patterns of a lattice shape discontinuously arrayed, and particular alignment patterns respectively disposed near the calibrating patterns so that the positioning of the specimen can be made to match the calibrating patterns to the measurement points.

6. 发明申请

US20080023627A1 Scanning electron microscope and CD measurement calibration standard specimen 有权
公开(公告)号：US20080023627A1
公开(公告)日：2008-01-31
申请号：US11902559
申请日：2007-09-24
申请人： Takeshi Mizuno , Hiroki Kawada
发明人： Takeshi Mizuno , Hiroki Kawada
IPC分类号： G01D18/00
CPC分类号： H01L22/34 , H01L2924/0002 , H01L2924/00
摘要： A calibration standard specimen is provided to have formed therein calibrating patterns of a lattice shape discontinuously arrayed, and particular alignment patterns respectively disposed near the calibrating patterns so that the positioning of the specimen can be made to match the calibrating patterns to the measurement points.

7. 发明申请

US20150036914A1 METHOD FOR ESTIMATING SHAPE BEFORE SHRINK AND CD-SEM APPARATUS 有权
标题翻译：在收缩和CD-SEM装置之前估算形状的方法
公开(公告)号：US20150036914A1
公开(公告)日：2015-02-05
申请号：US14239803
申请日：2012-05-24
申请人： Tomoko Sekiguchi , Takeyoshi Ohashi , Junichi Tanaka , Zhaohui Cheng , Ruriko Tsuneta , Hiroki Kawada , Seiko Hitomi
发明人： Tomoko Sekiguchi , Takeyoshi Ohashi , Junichi Tanaka , Zhaohui Cheng , Ruriko Tsuneta , Hiroki Kawada , Seiko Hitomi
IPC分类号： G06K9/46 , G06T7/00
CPC分类号： G06K9/4604 , B82Y10/00 , B82Y40/00 , G01B15/04 , G01N23/22 , G06T7/0004 , H01J37/3174 , H01J2237/221 , H01J2237/226 , H01J2237/2816 , H01J2237/31754 , H01J2237/31796 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： In the present invention, at the time of measuring, using a CD-SEM, a length of a resist that shrinks when irradiated with an electron beam, in order to highly accurately estimate a shape and dimensions of the resist before shrink, a shrink database with respect to various patterns is previously prepared, said shrink database containing cross-sectional shape data obtained prior to electron beam irradiation, a cross-sectional shape data group and a CD-SEM image data group, which are obtained under various electron beam irradiation conditions, and models based on such data and data groups, and a CD-SEM image of a resist pattern to be measured is obtained (S102), then, the CD-SEM image and data in the shrink database are compared with each other (S103), and the shape and dimensions of the pattern before the shrink are estimated and outputted (S104).
摘要翻译：在本发明中，在测量时，使用CD-SEM，当用电子束照射时收缩的抗蚀剂的长度为了在收缩之前高精度地估计抗蚀剂的形状和尺寸，收缩数据库预先准备了各种图案，所述收缩数据库包含在电子束照射之前获得的横截面形状数据，横截面形状数据组和CD-SEM图像数据组，其在各种电子束照射条件下获得，以及基于这样的数据和数据组的模型，并且获得要测量的抗蚀剂图案的CD-SEM图像（S102），然后将CD-SEM图像和收缩数据库中的数据彼此进行比较（S103 ），并且估计并输出收缩前的图案的形状和尺寸（S104）。

8. 发明授权

US08502144B2 Tool-to-tool matching control method and its system for scanning electron microscope 有权
标题翻译：刀具对刀匹配控制方法及其扫描电子显微镜系统
公开(公告)号：US08502144B2
公开(公告)日：2013-08-06
申请号：US13190847
申请日：2011-07-26
申请人： Mayuka Oosaki , Chie Shishido , Hiroki Kawada , Tatsuya Maeda
发明人： Mayuka Oosaki , Chie Shishido , Hiroki Kawada , Tatsuya Maeda
IPC分类号： H01J37/28 , H01J37/256 , G01N23/00
CPC分类号： H01J37/28 , H01J2237/282
摘要： A system for controlling a tool-to-tool disparity between a plurality of scanning electron microscopes includes a measuring unit for measuring a tool-to-tool disparity between plural scanning electron microscopes based on information extracted from secondary electron images which are captured by imaging a reference pattern, a tool state monitoring unit for monitoring tool states of each of the plural scanning electron microscopes, and an output unit for displaying on a screen a relationship between the tool-to-tool disparity between the plural scanning electron microscopes and tool states of each of the plural scanning electron microscopes monitored by the tool state monitoring unit. The tool state monitoring unit monitors the tool states of each of the plural scanning electron microscopes while imaging the reference pattern by using each of the plural scanning electron microscopes.
摘要翻译：用于控制多个扫描电子显微镜之间的工具对工具差异的系统包括：测量单元，用于基于通过成像获得的二次电子图像提取的信息来测量多个扫描电子显微镜之间的工具对工具差异参考图案，用于监视多个扫描电子显微镜中的每一个的工具状态的工具状态监视单元和用于在屏幕上显示多个扫描电子显微镜之间的工具与工具之间的差异与工具状态之间的关系的输出单元由工具状态监视单元监视的多个扫描电子显微镜中的每一个。工具状态监视单元通过使用多个扫描电子显微镜中的每一个来对多个扫描电子显微镜中的每个扫描电子显微镜的工具状态进行监视，同时对参考图案进行成像。

9. 发明申请

US20130146763A1 Image Processing Device, Charged Particle Beam Device, Charged Particle Beam Device Adjustment Sample, and Manufacturing Method Thereof 有权
标题翻译：图像处理装置，带电粒子束装置，带电粒子束装置调整样品及其制造方法
公开(公告)号：US20130146763A1
公开(公告)日：2013-06-13
申请号：US13700096
申请日：2011-05-25
申请人： Hiroki Kawada , Osamu Inoue , Miyako Matsui , Takahiro Kawasaki , Naoshi Itabashi , Takashi Takahama , Katsumi Setoguchi , Osamu Komuro
发明人： Hiroki Kawada , Osamu Inoue , Miyako Matsui , Takahiro Kawasaki , Naoshi Itabashi , Takashi Takahama , Katsumi Setoguchi , Osamu Komuro
IPC分类号： G01B15/00 , G06K9/62
CPC分类号： G01B15/00 , G06K9/6201 , H01J37/222 , H01J37/28 , H01J2237/24578 , H01J2237/2817 , H01J2237/2826 , Y10T428/24355
摘要： An object of the present invention is to provide an image processing apparatus that quickly and precisely measures or evaluates a distortion in a field of view and a charged particle beam apparatus. To attain the object, an image processing apparatus or the like is proposed which acquires a first image of a first area of an imaging target and a second image of a second area that is located at a different position than the first area and partially overlaps with the first area and determines the distance between a measurement point in the second image and a second part of the second image that corresponds to a particular area for a plurality of sites in the overlapping area of the first image and the second image.
摘要翻译：本发明的目的是提供一种快速且精确地测量或评估视野中的失真和带电粒子束装置的图像处理装置。为了实现该目的，提出了一种图像处理装置等，其获取成像目标的第一区域的第一图像和位于与第一区域不同的位置的第二区域的第二图像，并且部分地与所述第一区域确定所述第二图像中的测量点和所述第二图像的与所述第一图像和所述第二图像的重叠区域中的多个位置的特定区域相对应的第二部分之间的距离。

10. 发明授权

US08369602B2 Length measurement system 有权
标题翻译：长度测量系统
公开(公告)号：US08369602B2
公开(公告)日：2013-02-05
申请号：US12190818
申请日：2008-08-13
申请人： Atsuko Yamaguchi , Jiro Yamamoto , Hiroki Kawada
发明人： Atsuko Yamaguchi , Jiro Yamamoto , Hiroki Kawada
IPC分类号： G06K9/00
CPC分类号： G06K9/4604 , G06T7/0006 , G06T7/13 , G06T7/60 , G06T2207/10061 , G06T2207/30148
摘要： Disclosed herewith is a length measurement system, which obtains a value closer to its true one when figuring out the size and edge roughness of a pattern from a noise-included pattern image. Among plural band-like regions representing a portion around an edge in an image respectively, the system calculates the dependency of the edge point position on the image processing parameter at each of a narrow width band-like portion and a wide width band-like portion to calculate an image processing condition that calculates each measured value closer to its true value or estimates the true value itself.
摘要翻译：本文公开了一种长度测量系统，当从包含噪声的图案图像中确定图案的尺寸和边缘粗糙度时，其获得接近其真实值的值。在分别表示图像中的边缘周围的多个带状区域中，系统计算边缘点位置对窄幅带状部分和宽幅带状部分中的每一个处的图像处理参数的依赖性以计算更接近其真实值的每个测量值的图像处理条件或估计真实值本身。

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