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1. 发明授权

US07316023B2 Disc drive tray for holding discs of various shapes and sizes 有权
标题翻译：用于固定各种形状和尺寸的光盘的光盘驱动器托盘
公开(公告)号：US07316023B2
公开(公告)日：2008-01-01
申请号：US10812557
申请日：2004-03-30
申请人： Sang-Tae Kim , Jae-Soo Lee
发明人： Sang-Tae Kim , Jae-Soo Lee
IPC分类号： G11B33/02 , G11B17/04 , G11B17/03
CPC分类号： G11B17/0565
摘要： A disc drive such as an optical disc drive for securely holding discs of various sizes and shapes even in the vertical position. The disc drive includes a tray for holding a disc with a spindle motor installed thereon for rotating a turntable of the spindle motor. The disc is secured to the turntable for being rotated by the spindle motor. A fixing unit disposed by the turntable securely holds the disc to the turntable at locations of a perimeter of a clamping hole of the disc.
摘要翻译：诸如光盘驱动器的盘驱动器，即使在垂直位置也可以牢固地保持各种尺寸和形状的盘。盘驱动器包括用于保持其上安装有主轴电机的盘的盘，用于使主轴电动机的转台旋转。盘被固定到转台上，以便由主轴电机旋转。由转盘设置的固定单元在盘的夹紧孔的周边的位置处将盘牢固地保持在转台上。

2. 发明授权

US08383437B2 Echtant and method for manufacturing display device using the same 有权
标题翻译：用于制造使用该显示装置的显示装置的方法
公开(公告)号：US08383437B2
公开(公告)日：2013-02-26
申请号：US13223958
申请日：2011-09-01
申请人： Ji-Young Park , Shin-Il Choi , Jong-Hyun Choung , Sang Gab Kim , Seon-Il Kim , Sang-Tae Kim , Joon-Woo Lee , Young-Chul Park , Young-Jun Jin , Kyong-Min Kang , Suck-Jun Lee , O-Byoung Kwon , In-Ho Yu , Sang-Hoon Jang , Min-Ki Lim , Yu-Jin Lee
发明人： Ji-Young Park , Shin-Il Choi , Jong-Hyun Choung , Sang Gab Kim , Seon-Il Kim , Sang-Tae Kim , Joon-Woo Lee , Young-Chul Park , Young-Jun Jin , Kyong-Min Kang , Suck-Jun Lee , O-Byoung Kwon , In-Ho Yu , Sang-Hoon Jang , Min-Ki Lim , Yu-Jin Lee
IPC分类号： H01L21/00
CPC分类号： C09K13/08 , C23F1/18 , C23F1/26 , C23F1/44 , H01L21/32134 , H01L27/1259 , H01L29/41733
摘要： An etchant according to exemplary embodiments of the present invention includes about 0.5 wt % to about 20 wt % of persulfate, about 0.01 wt % to about 2 wt % of a fluorine compound, about 1 wt % to about 10 wt % of inorganic acid, about 0.5 wt % to about 5 wt % of a cyclic amine compound, about 0.1 wt % to about 5 wt % of a chlorine compound, about 0.05 wt % to about 3 wt % of copper salt, about 0.1 wt % to about 10 wt % of organic acid or organic acid salt, and water.
摘要翻译：根据本发明的示例性实施方案的蚀刻剂包括约0.5重量％至约20重量％的过硫酸盐，约0.01重量％至约2重量％的氟化合物，约1重量％至约10重量％的无机酸，约0.5重量％至约5重量％的环胺化合物，约0.1重量％至约5重量％的氯化合物，约0.05重量％至约3重量％的铜盐，约0.1重量％至约10重量％％的有机酸或有机酸盐，和水。

3. 发明授权

US08211614B2 Photoresist composition and patterning method thereof 有权
标题翻译：光刻胶组合物及其图案化方法
公开(公告)号：US08211614B2
公开(公告)日：2012-07-03
申请号：US12376107
申请日：2007-08-02
申请人： Shi-Jin Sung , Sang-Haeng Lee , Sang-Tae Kim
发明人： Shi-Jin Sung , Sang-Haeng Lee , Sang-Tae Kim
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0236
摘要： Disclosed is a resist composition which has desirable physical properties such as sensitivity, resolution, residual film ratio and coating property, and forms a pattern having the desirable profile and depth of focus due to excellent light transmissivity during a semiconductor process and a flat panel display process using a short wavelength of 248 nm (KrF) or less, even though the resist composition is applied to a non-chemically amplified resist. The photoresist composition comprises a novolac-based resin A, a photosensitizer B, and a low molecular substance C having low absorbance. The low molecular substance having low absorbance has absorbance that is lower than absorbance of the novolac-based resin at one or more wavelengths of 248 nm, 193 nm, and 157 nm, and the photoresist composition is used at the wavelength of 248 nm or less.
摘要翻译：公开了具有理想的物理性质如光敏度，分辨率，残留膜比和涂布性能的抗蚀剂组合物，并且由于在半导体工艺和平板显示过程中由于优异的透光率而形成具有期望的轮廓和深度聚焦的图案使用248nm（KrF）的短波长，即使将抗蚀剂组合物施加到非化学放大抗蚀剂上。光致抗蚀剂组合物包含酚醛清漆基树脂A，光敏剂B和低吸光度的低分子物质C. 具有低吸光度的低分子物质的吸光度低于在248nm，193nm和157nm的一个或多个波长处的酚醛清漆基树脂的吸光度，并且光致抗蚀剂组合物在248nm或更小的波长下使用。

4. 发明授权

US06276980B1 Method for forming electrode for plasma display panel 有权
标题翻译：用于形成等离子体显示面板用电极的方法
公开(公告)号：US06276980B1
公开(公告)日：2001-08-21
申请号：US09365879
申请日：1999-08-03
申请人： Sang-Tae Kim
发明人： Sang-Tae Kim
IPC分类号： H01J902
CPC分类号： H01J11/24 , H01J9/02 , H01J2211/225 , H01J2211/444
摘要： The present invention relates to a discharge sustaining electrode formed of a transparent electrode and a non-transparent electrode for a plasma display panel (PDP), and it is an object of the present invention to provide a method for an electrode which is well applicable to forming a non-transparent electrode using an Ag material and providing a good productivity and a certain contrast characteristic. The method for forming a bus electrode according to the present invention includes a first step for coating Ag paste including some black powder having different specific gravity particles and some Ag white powder on the transparent electrode, a second step for level-separating the black and white powders contained in the coated Ag paste based on a specific gravity difference for a certain time, and a third step for burning out a binder from the coated Ag paste to thereby implementing a firing process. Therefore, it is possible to implement a two-tier bus electrode structure based on one time paste printing operation to thereby decrease a formation process of an electrode.
摘要翻译：本发明涉及一种由透明电极和等离子体显示面板（PDP）的不透明电极形成的放电维持电极，其目的在于提供一种电极方法，其适用于使用Ag材料形成非透明电极并提供良好的生产率和一定的对比度特性。根据本发明的形成总线电极的方法包括：在透明电极上涂覆包括具有不同比重颗粒的一些黑色粉末和一些Ag白色粉末的Ag浆料的第一步骤，用于将黑色和白色水平分离的第二步骤基于特定时间的比重差包含在涂布的Ag糊料中的粉末，以及从涂覆的Ag糊料烧结粘合剂从而实现烧制过程的第三步骤。因此，可以实现基于一次浆料印刷操作的双层总线电极结构，从而减少电极的形成过程。

5. 发明授权

US08575234B2 Ink composition, and method of forming pattern, color filter and method of preparing color filter using the same 有权
标题翻译：油墨组合物和形成图案的方法，滤色器及使用其制备滤色器的方法
公开(公告)号：US08575234B2
公开(公告)日：2013-11-05
申请号：US13223755
申请日：2011-09-01
申请人： Seung-Jun Lee , Gug Rae Jo , Jae Hyuk Chang , Hyun-Seok Kim , Sung Hee Lee , Sang-Tae Kim , Yong Seok Choi , Sung Bae Moon , In Kak Song , Seung-Yong Lee
发明人： Seung-Jun Lee , Gug Rae Jo , Jae Hyuk Chang , Hyun-Seok Kim , Sung Hee Lee , Sang-Tae Kim , Yong Seok Choi , Sung Bae Moon , In Kak Song , Seung-Yong Lee
IPC分类号： C09D11/00 , C08L31/00 , C08L33/06
CPC分类号： C09D11/10 , C08K5/0025 , C08K5/372 , G02B5/201
摘要： An ink composition, and a method of forming a pattern, a color filter and a method of manufacturing the color filter using the same. The ink composition includes a binder resin, a multifunctional monomer having an ethylenic unsaturated double bond, a coloring agent, a polymerization initiator containing a certain positive ion and a solvent. Therefore, the composition has excellent coating property and chemical resistance and also an improved adhesion to a printing member, and thus the ink composition may be useful in forming a precise micropattern using a roll printing method, particularly a reversed printing method.
摘要翻译：油墨组合物，以及形成图案的方法，滤色器以及使用其制造滤色器的方法。油墨组合物包括粘合剂树脂，具有烯属不饱和双键的多官能单体，着色剂，含有某种正离子的聚合引发剂和溶剂。因此，该组合物具有优异的涂布性和耐化学性，并且还改善了与印刷部件的粘合性，因此该油墨组合物可用于使用辊印方法，特别是反转印刷法形成精确的微图案。

6. 发明申请

US20130082972A1 METHOD AND DEVICE FOR CONTROLLING CONTENTS USING TOUCH, RECORDING MEDIUM THEREFOR, AND USER TERMINAL HAVING SAME 有权
标题翻译：用于通过触摸控制内容的方法和设备，记录介质以及具有相同的用户终端
公开(公告)号：US20130082972A1
公开(公告)日：2013-04-04
申请号：US13702837
申请日：2011-12-20
申请人： Jae-Jeung Kim , Sang-Tae Kim , Ho-Won Lee , Dong-Ho Cho
发明人： Jae-Jeung Kim , Sang-Tae Kim , Ho-Won Lee , Dong-Ho Cho
IPC分类号： G06F3/0488
CPC分类号： G06F3/0488 , G06F3/0484 , G06F3/04886
摘要： The present invention provides a method and a device for controlling contents of a user terminal having a touch screen, a recording medium therefor, and a user terminal having the same. The present invention relates to a method for controlling the contents of a user terminal having a touch screen, wherein, when a touch is detected on the touch screen while executing contents conversion, a part of the contents gets fixed on the basis of the detected location of the touch. Therefore, two or more contents can be easily compared using the fixed contents region as reference contents.
摘要翻译：本发明提供一种用于控制具有触摸屏的用户终端的内容的方法和装置，其记录介质以及具有该触摸屏的用户终端的用户终端。本发明涉及一种用于控制具有触摸屏的用户终端的内容的方法，其中，当在执行内容转换的同时在触摸屏上检测到触摸时，内容的一部分基于检测到的位置而被固定的触摸。因此，可以使用固定内容区域作为参考内容容易地比较两个或更多个内容。

7. 发明申请

US20120208310A1 NON-HALOGENATED ETCHANT AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE NON-HALOGENATED ETCHANT 有权
标题翻译：非对位蚀刻剂和使用非底物蚀刻剂制造显示基板的方法
公开(公告)号：US20120208310A1
公开(公告)日：2012-08-16
申请号：US13330657
申请日：2011-12-19
申请人： Seon-Il KIM , Shin-Il Choi , Ji-Young Park , Sang-Gab Kim , O-Byoung Kwon , Dong-Ki Kim , Sang-Tae Kim , Young-Chul Park , In-Ho Yu , Young-Jin Yoon , Suck-Jun Lee , Joon-Woo Lee , Min-Ki Lim , Sang-Hoon Jang , Young-Jun JIN
发明人： Seon-Il KIM , Shin-Il Choi , Ji-Young Park , Sang-Gab Kim , O-Byoung Kwon , Dong-Ki Kim , Sang-Tae Kim , Young-Chul Park , In-Ho Yu , Young-Jin Yoon , Suck-Jun Lee , Joon-Woo Lee , Min-Ki Lim , Sang-Hoon Jang , Young-Jun JIN
IPC分类号： H01L33/08
CPC分类号： H01L51/0023 , H01L2251/308
摘要： Exemplary embodiments of the present invention disclose a non-halogenated etchant for etching an indium oxide layer and a method of manufacturing a display substrate using the non-halogenated etchant, the non-halogenated etchant including nitric acid, sulfuric acid, a corrosion inhibitor including ammonium, a cyclic amine-based compound, and water.
摘要翻译：本发明的示例性实施方案公开了用于蚀刻氧化铟层的非卤化蚀刻剂和使用非卤化蚀刻剂制造显示衬底的方法，非卤化蚀刻剂包括硝酸，硫酸，包括铵的腐蚀抑制剂，环胺类化合物和水。

8. 发明申请

US20110236825A1 PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN USING THE SAME 审中-公开
标题翻译：光刻胶组合物和使用其形成光刻胶图案的方法
公开(公告)号：US20110236825A1
公开(公告)日：2011-09-29
申请号：US13010688
申请日：2011-01-20
申请人： Jung-In PARK , Hi-Kuk Lee , Sang-Hyun Yun , Cha-Dong Kim , Shi-Jin Sung , Sung-Yeol Jin , Sang-Tae Kim , Yong-Il Kim , Eun-Sang Lee
发明人： Jung-In PARK , Hi-Kuk Lee , Sang-Hyun Yun , Cha-Dong Kim , Shi-Jin Sung , Sung-Yeol Jin , Sang-Tae Kim , Yong-Il Kim , Eun-Sang Lee
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/0226
摘要： In a photoresist composition suitable for forming a photoresist pattern having a high profile angle, and a method of forming a photoresist pattern using the same, the photoresist composition includes an alkali-soluble resin, a quinone diazide containing compound, a compound represented by Formula 1, and a solvent: wherein R1, R2 and R3 are independently H, C1-4 alkyl, C2-4 alkenyl, C3-8 cycloalkyl, or C6-12 aryl.
摘要翻译：在适于形成具有高轮廓角的光致抗蚀剂图案的光致抗蚀剂组合物中，以及使用其形成光致抗蚀剂图案的方法，光致抗蚀剂组合物包括碱溶性树脂，含醌二化合物，由式1表示的化合物和溶剂：其中R 1，R 2和R 3独立地为H，C 1-4烷基，C 2-4烯基，C 3-8环烷基或C 6-12芳基。

9. 发明申请

US20100203444A1 PHOTORESIST COMPOSITION AND PATTERNING METHOD THEREOF 有权
标题翻译：光电组合物及其方法
公开(公告)号：US20100203444A1
公开(公告)日：2010-08-12
申请号：US12376107
申请日：2007-08-02
申请人： Shi-Jin Sung , Sang-Haeng Lee , Sang-Tae Kim
发明人： Shi-Jin Sung , Sang-Haeng Lee , Sang-Tae Kim
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0236
摘要： Disclosed is a resist composition which has desirable physical properties such as sensitivity, resolution, residual film ratio and coating property, and forms a pattern having the desirable profile and depth of focus due to excellent light transmissivity during a semiconductor process and a flat panel display process using a short wavelength of 248 nm (KrF) or less, even though the resist composition is applied to a non-chemically amplified resist. The photoresist composition comprises a novolac-based resin A, a photosensitizer B, and a low molecular substance C having low absorbance. The low molecular substance having low absorbance has absorbance that is lower than absorbance of the novolac-based resin at one or more wavelengths of 248 nm, 193 nm, and 157 nm, and the photoresist composition is used at the wavelength of 248 nm or less.
摘要翻译：公开了具有理想的物理性质如光敏度，分辨率，残留膜比和涂布性能的抗蚀剂组合物，并且由于在半导体工艺和平板显示过程中由于优异的透光率而形成具有期望的轮廓和深度聚焦的图案使用248nm（KrF）的短波长，即使将抗蚀剂组合物施加到非化学放大抗蚀剂上。光致抗蚀剂组合物包含酚醛清漆基树脂A，光敏剂B和低吸光度的低分子物质C. 具有低吸光度的低分子物质的吸光度低于在248nm，193nm和157nm的一个或多个波长处的酚醛清漆基树脂的吸光度，并且光致抗蚀剂组合物在248nm或更小的波长下使用。

10. 发明授权

US08968983B2 Photoresist composition, method of forming a pattern using the same, and method of manufacturing a display substrate 有权
标题翻译：光刻胶组合物，使用其形成图案的方法，以及制造显示基板的方法
公开(公告)号：US08968983B2
公开(公告)日：2015-03-03
申请号：US13565589
申请日：2012-08-02
申请人： Cha-Dong Kim , Sang Hyun Yun , Jung-In Park , Su-Yeon Sim , Hi-Kuk Lee , Sang-Tae Kim , Yong-Il Kim , Shi-Jin Sung , Eun-Sang Lee , Sung-Yeol Jin
发明人： Cha-Dong Kim , Sang Hyun Yun , Jung-In Park , Su-Yeon Sim , Hi-Kuk Lee , Sang-Tae Kim , Yong-Il Kim , Shi-Jin Sung , Eun-Sang Lee , Sung-Yeol Jin
IPC分类号： G03F7/022 , G03F7/023 , G03F7/40
CPC分类号： G03F7/0226 , G03F7/023 , G03F7/40 , Y10T428/1005
摘要： A photoresist composition, a method of forming a pattern using the photoresist composition, and a method of manufacturing a display substrate are disclosed. A photoresist composition includes an alkali-soluble resin, a quinone diazide-based compound, a multivalent phenol-based compound, and a solvent. Therefore, photosensitivity for light having a wavelength in a range of about 392 nm to about 417 nm may be improved, and reliability of forming a photo pattern and a thin film pattern using the photoresist composition may be improved.
摘要翻译：公开了一种光致抗蚀剂组合物，使用光致抗蚀剂组合物形成图案的方法，以及制造显示基板的方法。光致抗蚀剂组合物包括碱溶性树脂，醌二叠氮化合物，多价酚类化合物和溶剂。因此，可以改善波长在约392nm至约417nm范围内的光的光敏性，并且可以提高使用光致抗蚀剂组合物形成光图案和薄膜图案的可靠性。

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