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    • 2. 发明授权
    • Rotary valve device for internal combustion engines
    • 内燃机用旋转阀装置
    • US4858577A
    • 1989-08-22
    • US207030
    • 1988-06-14
    • Masaaki MatsuuraMitsuru IshikawaMasaharu NakamoriMasahiro Kuroki
    • Masaaki MatsuuraMitsuru IshikawaMasaharu NakamoriMasahiro Kuroki
    • F01L7/10F02B75/02
    • F01L7/10F01L2113/00F02B2075/027
    • A rotary valve system for an internal combustion engine having ball-type valves with through bores. The valves are driven by rocking cam mechanisms within passageways for controlling communication through intake and exhaust passages. Valve seats are arranged to either side of the valves such that sealing thereof may occur. In one embodiment, side cut portions are employed to allow either intake or exhaust gases to flow around the valve body as well as through the through bore when the valve is in the opening or closing orientation. In another embodiment, a through bore of square cross section is provided to increase flow during opening and closing thereof. In a third embodiment, a bias mechanism is employed to provide torque on the valves and drive mechanism to eliminate clearances such that impact between components will be reduced or eliminated.
    • 一种用于内燃机的旋转阀系统,其具有带通孔的球形阀。 阀门由通道内的摆动凸轮机构驱动,用于通过进气和排气通道控制连通。 阀座布置在阀的两侧,使得可能发生密封。 在一个实施例中,当阀处于打开或关闭方向时,侧切部分用于允许进气或废气围绕阀体以及通过通孔流动。 在另一个实施例中,提供了一个方形横截面的通孔,以增加其打开和关闭期间的流量。 在第三实施例中,使用偏置机构来提供阀和驱动机构上的扭矩以消除间隙,从而减少或消除部件之间的冲击。
    • 3. 发明申请
    • Polarization modulation imaging ellipsometer
    • 极化调制成像椭偏仪
    • US20080049224A1
    • 2008-02-28
    • US11785134
    • 2007-04-16
    • Soichi OtsukiMitsuru Ishikawa
    • Soichi OtsukiMitsuru Ishikawa
    • G01J4/00
    • G01N21/211
    • The present invention aims to provide a polarization modulation imaging ellipsometer capable of measuring ellipsometric parameters of the surface of a sample for each of the measured points with high precision and at high speed. The present invention provides a polarization modulation imaging ellipsometer having a light source unit that emits light whose intensity periodically changes at a predetermined frequency; an incident-light optical unit having a collimator, a polarizer, and a photoelastic phase modulator which modulates light emitted from the light source unit to sinusoidally vary a phase difference between a p polarized light and an s polarized light of the light and applies the light to a measurement plane of the sample; an emitted-light optical unit having an analyzer which analyzes a polarization state of light that has been reflected from or transmitted through the sample and a two-dimensional detector which converts light received from the analyzer to an electrical signal and outputs the electrical signal; and a control/analysis unit which operates the light source unit and the photoelastic phase modulator at the same frequency, wherein the light source unit sequentially produces a measuring beam having a predetermined time lag relative to an operation clock of the photoelastic phase modulator; and the control/analysis unit calculates ellipsometric parameters of each of the measured points using output signals of the two-dimensional detector and calibration values obtained using a standard sample in advance.
    • 本发明旨在提供一种能够以高精度和高速度测量每个测量点的样品表面的椭偏参数的偏振调制成像椭偏仪。 本发明提供了一种偏振调制成像椭偏仪,具有发光强度以预定频率周期性变化的光源单元; 具有准直器,偏振器和光弹性相位调制器的入射光光学单元,其调制从光源单元发射的光以正弦地改变光源的偏振光和s偏振光之间的相位差,并将光施加到 样品的测量平面; 发射光学单元,其具有分析器,其分析已经从样品反射或透射的光的偏振态;以及二维检测器,其将从分析器接收的光转换为电信号并输出​​电信号; 以及以相同频率操作所述光源单元和所述光弹性相位调制器的控制/分析单元,其中所述光源单元顺序地产生相对于所述光弹性相位调制器的操作时钟具有预定时间滞后的测量光束; 并且控制/分析单元使用二维检测器的输出信号和预先使用标准样本获得的校准值来计算每个测量点的椭圆参数。
    • 8. 发明授权
    • Etching method
    • 蚀刻方法
    • US07582220B1
    • 2009-09-01
    • US09696232
    • 2000-10-26
    • Mitsuru IshikawaMasaaki HagiharaKoichiro Inazawa
    • Mitsuru IshikawaMasaaki HagiharaKoichiro Inazawa
    • H01L21/301
    • H01L21/31116
    • In an etching method for etching an etching target film formed on a substrate placed inside an airtight processing chamber 104 by inducing a processing gas into the processing chamber 104, the processing gas contains CF4, N2 and Ar and the etching target film is constituted of an upper organic polysiloxane film and a lower inorganic SiO2 film. The flow rate ratio of CF4 and N2 in the processing gas is essentially set within a range of 1≦(N2 flow rate/CF4 flow rate)≦4. If (N2 flow rate/CF4 flow rate) is less than 1, an etching stop occurs and, as a result, deep etching is not achieved. If, on the other hand, (N2 flow rate/CF4 flow rate) is larger than 4, bowing tends to occur and, thus, a good etching shape is not achieved. Accordingly, the flow rate ratio of CF4 and N2 in the processing gas should be set essentially within a range of 1≦(N2 flow rate/CF4 flow rate)≦4, to ensure that improvements in both the selection ratio and the etching shape are achieved.
    • 在通过将处理气体引入处理室104中来蚀刻形成在位于气密处理室104内的基板上的蚀刻目标膜的蚀刻方法中,处理气体含有CF4,N2和Ar,并且蚀刻目标膜由 上部有机聚硅氧烷膜和较低的无机SiO 2膜。 处理气体中CF4和N2的流量比基本上设定在1 <=(N2流量/ CF4流量)<= 4的范围内。 如果(N2流量/ CF4流量)小于1,则发生蚀刻停止,结果不能实现深蚀刻。 另一方面,如果(N2流量/ CF4流量)大于4,则容易发生弯曲,因此不能得到良好的蚀刻形状。 因此,处理气体中CF4和N2的流量比应基本上设定在1 <=(N2流量/ CF4流量)<= 4的范围内,以确保选择比和蚀刻两者的改善 形状实现。
    • 10. 发明授权
    • Absorption type refrigerating apparatus
    • 吸收式制冷装置
    • US06176096B1
    • 2001-01-23
    • US09362662
    • 1999-07-29
    • Nobuyuki YuriHidetaka KayanumaMitsuru IshikawaToshimitsu Takaishi
    • Nobuyuki YuriHidetaka KayanumaMitsuru IshikawaToshimitsu Takaishi
    • F25B1500
    • F25B15/02F25B49/043Y02A30/277Y02B30/62
    • The purity of a refrigerant liquid can be maintained to an appropriate level without being varied corresponding to a change in the atmospheric condition and the loading state. A portion of the refrigerant liquid in an evaporator is conveyed from the evaporator to the upper end of a rectifier where it is used as a vapor/liquid contact fluid. A temperature sensor T6 is provided at the upper end of the rectifier for detecting the temperature at the top of the rectifier or the temperature of the refrigerant vapor. The temperature and the purity of the refrigerant vapor are closely related to each other. The higher the temperature, the lower the purity is deteriorated. When the temperature T detected by the temperature sensor T6 is higher than a reference temperature level Tref, a flow control valve V5 is actuated to increase the flow of the refrigerant liquid to the rectifier. This recovers the purity of the refrigerant vapor, thus preventing declination of the purity of the refrigerant vapor in the evaporator.
    • 可以将制冷剂液体的纯度保持在适当的水平,而不会随着大气条件和装载状态的变化而变化。 蒸发器中的一部分制冷剂液体从蒸发器输送到整流器的上端,其中它用作蒸气/液体接触流体。 在整流器的上端设有温度传感器T6,用于检测整流器顶部的温度或制冷剂蒸汽的温度。 制冷剂蒸汽的温度和纯度彼此密切相关。 温度越高,纯度越低劣化。 当由温度传感器T6检测的温度T高于参考温度水平Tref时,启动流量控制阀V5以增加制冷剂流向整流器的流量。 这样可以恢复制冷剂蒸汽的纯度,从而防止蒸发器中的制冷剂蒸汽的纯度下降。